Photovoltaic device
    3.
    发明授权
    Photovoltaic device 失效
    光伏装置

    公开(公告)号:US4476346A

    公开(公告)日:1984-10-09

    申请号:US465016

    申请日:1983-02-08

    摘要: A PIN junction photovoltaic device using a P-type or N-type semiconductor having an optical band gap of not less than about 1.8 eV and a dark conductivity of not less than about 10.sup.-8 (.OMEGA..multidot.cm).sup.-1 at 20.degree. C. in the layer positioned on the side opposite to incidence of light. The photovoltaic device has an improved efficiency.

    摘要翻译: 在20℃下使用具有不小于约1.8eV的光学带隙和不小于约10-8(欧米加×cm)-1)的暗电导率的P型或N型半导体的PIN结光电器件。 在位于与光入射相反的一侧的层中。 光伏器件具有提高的效率。

    Method of producing a semiconductor device using a wire mask having a
specified diameter
    4.
    发明授权
    Method of producing a semiconductor device using a wire mask having a specified diameter 失效
    使用规定直径的线掩模制造半导体器件的方法

    公开(公告)号:US5124269A

    公开(公告)日:1992-06-23

    申请号:US633192

    申请日:1990-12-28

    摘要: A semiconductor device producing method wherein a patterned transparent electrode, a patterned amorphous silicon semiconductor layer and a patterned backside electrode are formed on a substrate sequentially in this order, and the patterning of at least one of the amorphous silicon semiconductor layer and the backside electrode is carried out in a step of forming at least one of the amorphous silicon semiconductor layer and the backside electrode with a wire mask being brought into substantially close contact with a surface subjected to film forming and a step of removing a thin film formed at a region between the wire mask and the surface subjected to film forming in the forming step; and a film forming apparatus used in the producing method comprising a holder which holds a substrate having a surface subjected to film forming, a mechanism for fixing and positioning the substrate on the holder and a plurality of wires which are disposed on the film forming surface side of the substrate and are to be brought into substantially close contact with the film forming surface. The method and the apparatus enable the film forming operation and the patterning operation to be carried out simultaneously without lowering the characteristics of a solar cell.

    Integrated solar cell device
    5.
    发明授权
    Integrated solar cell device 失效
    集成太阳能电池装置

    公开(公告)号:US4956023A

    公开(公告)日:1990-09-11

    申请号:US286180

    申请日:1989-01-27

    摘要: An integrated solar cell device characterized in that a plurality of amorphous silicon solar cells, each having a transparent electrode on the light impinging side and a metal electrode on the side opposite of the light impinging side, are placed on a transparent substrate. The plurality of solar cells are connected in series or series-parallel using the transparent electrodes and the metal electrodes thereof, wherein at least a conductive anti-oxidation film is formed at the series connection part between the transparent electrode and the metal electrode. According to the integrated solar cell device of the present invention, the transparent electrode is prevented from oxidizing the metal electrode, so that the contact resistance is prevented from increasing and the output of the solar cell device can be prevented from decreasing. Consequently, the life of the solar cell device is extended, such that the output of the solar cell device can be maintained in the designed range for a long period.

    摘要翻译: PCT No.PCT / JP88 / 00319 Sec。 371日期1989年1月27日第 102(e)日期1989年1月27日PCT提交1988年3月30日PCT公布。 出版物WO88 / 07768 日期:1988年10月6日。一种集成太阳能电池装置,其特征在于,在光入射侧具有透明电极的多个非晶硅太阳能电池和位于与光入射侧相反一侧的金属电极放置在 透明基材。 多个太阳能电池使用透明电极及其金属电极串联或串联并联,其中在透明电极和金属电极之间的串联连接部分至少形成导电性抗氧化膜。 根据本发明的集成太阳能电池装置,能够防止透明电极氧化金属电极,防止接触电阻增加,能够防止太阳能电池装置的输出降低。 因此,延长了太阳能电池装置的寿命,使得太阳能电池装置的输出能够长时间保持在设计范围内。

    Film forming apparatus
    6.
    发明授权
    Film forming apparatus 失效
    成膜装置

    公开(公告)号:US4825806A

    公开(公告)日:1989-05-02

    申请号:US74594

    申请日:1987-07-17

    摘要: A process for forming a film, characterized in that, in forming a film by glow discharge decomposition, one or more electrode pair rows each consisting of a plurality of high frequency electrode pairs are arranged in a line and in parallel and substrates are arranged on both sides of said electrode pair row approximately in parallel to the electrode pair row. According to the process, damage of the film due to plasma can be reduced, a shield on the back of the RF electrode is not needed, and a film of a large area can be obtained.

    摘要翻译: 一种形成膜的方法,其特征在于,在通过辉光放电分解形成膜时,由多个高频电极对组成的一个或多个电极对行被排列成一行并联并且基板被布置在两个 所述电极对排的侧面大致平行于电极对排。 根据该过程,可以减少由于等离子体引起的膜的损伤,不需要RF电极背面的屏蔽,并且可以获得大面积的膜。

    Film forming process
    7.
    发明授权
    Film forming process 失效
    成膜工艺

    公开(公告)号:US4701344A

    公开(公告)日:1987-10-20

    申请号:US800638

    申请日:1985-10-15

    摘要: A process for forming a film, characterized in that, in forming a film by glow discharge decomposition, one or more electrode pair rows each consisting of a plurality of high frequency electrode pairs are arranged in a line and in parallel and substrates are arranged on both sides of said electrode pair row approximately in parallel to the electrode pair row. According to the process, damage of the film due to plasma can be reduced, a shield on the back of the RF electrode is not needed, and a film of a large area can be obtained.

    摘要翻译: PCT No.PCT / JP85 / 00064 Sec。 371日期1985年10月15日第 102(e)1985年10月15日PCT PCT申请日1985年2月15日PCT公布。 公开号WO85 / 03803 日期:1985年8月29日。1。一种形成膜的方法,其特征在于,在通过辉光放电分解形成膜时,由多个高频电极对组成的一个或多个电极对排排列成一行 平行的和基板被布置在大致平行于电极对列的所述电极对行的两侧。 根据该过程,可以减少由于等离子体引起的膜的损伤,不需要RF电极背面的屏蔽,并且可以获得大面积的膜。