摘要:
Proposed are molybdenum or tungsten particles having a stable face-centered cubic structure of molybdenum and tungsten belonging to a VI group in a periodic table or a thin film formed from the foregoing particles, and a manufacturing method thereof. Specifically, provided are molybdenum or tungsten particles having a face-centered cubic (fcc) crystal structure or a thin film formed from the foregoing particles, wherein the particles have a large-diameter particle structure that is thermodynamically stable or metastable; and molybdenum or tungsten particles having a face-centered cubic (fcc) crystal structure or a thin film formed from the foregoing particles, wherein the particles have a pentagonal and star-shaped particle structure.
摘要:
Proposed are molybdenum or tungsten particles having a stable face-centered cubic structure of molybdenum and tungsten belonging to a VI group in a periodic table or a thin film formed from the foregoing particles, and a manufacturing method thereof. Specifically, provided are molybdenum or tungsten particles having a face-centered cubic (fcc) crystal structure or a thin film formed from the foregoing particles, wherein the particles have a large-diameter particle structure that is thermodynamically stable or metastable; and molybdenum or tungsten particles having a face-centered cubic (fcc) crystal structure or a thin film formed from the foregoing particles, wherein the particles have a pentagonal and star-shaped particle structure.
摘要:
Provided is a method of fabricating, with satisfactory adhesion, a thin film of a metal or a metallic-compound, such as a metal oxide or nitride, on a substrate made of a high-melting-point material such as silicon or ceramics by using a metal or metallic-compound target as the primary raw material so as to eliminate the necessity of using harmful gases such as organometallic gas, and by using an atmospheric-pressure plasma generated under atmospheric pressure as a reaction field and also as a heat source. Additionally provided is an apparatus for fabricating the thin film. The thin-film fabrication method by microplasma processing includes the steps of disposing a raw material for thin-film fabrication in one or more tubes (A) having a uniform inner diameter throughout, introducing an inert gas and applying a high-frequency voltage to the narrow tubes (A) to generate high-frequency plasma in the narrow tubes (A), heating/evaporating the raw material while maintaining the flow rate of the plasma gas in the narrow tubes (A) and maintaining the plasma gas temperature high, ejecting the evaporated material from the narrow tubes (A) to spray it onto the substrate, heating the substrate with the plasma, and depositing the sprayed material on the substrate under atmospheric pressure.
摘要:
Provided is a method of fabricating, with satisfactory adhesion, a thin film of a metal or a metallic-compound, such as a metal oxide or nitride, on a substrate made of a high-melting-point material such as silicon or ceramics by using a metal or metallic-compound target as the primary raw material so as to eliminate the necessity of using harmful gases such as organometallic gas, and by using an atmospheric-pressure plasma generated under atmospheric pressure as a reaction field and also as a heat source. Additionally provided is an apparatus for fabricating the thin film. The thin-film fabrication method by microplasma processing includes the steps of disposing a raw material for thin-film fabrication in one or more tubes (A) having a uniform inner diameter throughout, introducing an inert gas and applying a high-frequency voltage to the narrow tubes (A) to generate high-frequency plasma in the narrow tubes (A), heating/evaporating the raw material while maintaining the flow rate of the plasma gas in the narrow tubes (A) and maintaining the plasma gas temperature high, ejecting the evaporated material from the narrow tubes (A) to spray it onto the substrate, heating the substrate with the plasma, and depositing the sprayed material on the substrate under atmospheric pressure.
摘要:
Provided are a method and a device for producing nanoparticles of a low melting point material such as gold at more than 10 times faster the rate of conventional technology while maintaining the time-averaged temperature of pulse-modulated atmospheric-pressure plasma at a temperature that is low enough so as not to damage a heat-sensitive material disposed downstream. This method of preparing nanoparticles of a low melting point inorganic material in which a wire made of a low melting point inorganic material is inserted into a plasma-generating capillary tube or a plasma-generating nozzle and atmospheric-pressure high frequency plasma is generated in the capillary tube or nozzle is characterized by generating the plasma by applying a high frequency voltage possessing a waveform which exhibits its maximum value when it rises and then immediately falls, and which is pulse-modulated so that the duty ratio thereof is 10% or less.
摘要:
Provided are a method and a device for producing nanoparticles of a low melting point material such as gold at more than 10 times faster the rate of conventional technology while maintaining the time-averaged temperature of pulse-modulated atmospheric-pressure plasma at a temperature that is low enough so as not to damage a heat-sensitive material disposed downstream. This method of preparing nanoparticles of a low melting point inorganic material in which a wire made of a low melting point inorganic material is inserted into a plasma-generating capillary tube or a plasma-generating nozzle and atmospheric-pressure high frequency plasma is generated in the capillary tube or nozzle is characterized by generating the plasma by applying a high frequency voltage possessing a waveform which exhibits its maximum value when it rises and then immediately falls, and which is pulse-modulated so that the duty ratio thereof is 10% or less.
摘要:
Fluorine-containing alicyclic or aromatic cyclic compounds represented by the formula ##STR1## wherein M is a divalent organic group comprising at least one substituted or unsubstituted alicyclic hydrocarbon group or a divalent organic group comprising at least two substituted or unsubstituted aromatic hydrocarbon group, the alicyclic hydrocarbon group or aromatic hydrocarbon group may be linked by O, S or CH.sub.2, or may form a condensed ring, X is ##STR2## Y is H or CH.sub.3, n is zero or a positive number, are useful as an effective component of the adhesive composition.
摘要:
A stain-proofing agent comprising a compound represented by the formula (1): ##STR1## and non-aqueous composition for paints comprising the stain-proofing agent, resin, curing agent and/or curing catalyst and being capable of forming a coating film remarkably excellent in stain-proofing property.
摘要:
A process for preparing a fluorine-substituted alicyclic diol comprising hydrogenating in the presence of a catalyst a fluorine-substituted aromatic diol represented by formula (I): ##STR1## wherein Ph represents a divalent organic group containing at least one aromatic group, to obtain the fluorine-substituted alicyclic diol represented by formula (II): ##STR2## wherein Ph(H) represents a divalent organic group containing at least one perhydroaromatic group.
摘要:
A fluorine-containing copolymer comprising structural units of the formula (a):--CH.sub.2 --CHF-- (a)structural units of the formula (b): ##STR1## and structural units of the formula (c): ##STR2## wherein X is --H or --F, Y is --OH, --COOH or ##STR3## l is 0 or an integar of 1, m is 0 or an integar of 1 to 6 and n is 0 or an integer of 1 to 4, provided that Y is --COOH when n is 0. The copolymer has a good solubility to solvent and is cross-linkable, and the composition containing the copolymer can be cured at room temperature, and provides a film having an excellent chemical resistance, weatherability, stain resistance, heat resistance and high frictional electrification property.