Molybdenum or Tungsten Particles, Thin Film Formed from said Particles, and Process for Producing the Same
    1.
    发明申请
    Molybdenum or Tungsten Particles, Thin Film Formed from said Particles, and Process for Producing the Same 失效
    钼或钨颗粒,由所述颗粒形成的薄膜及其制备方法

    公开(公告)号:US20080206552A1

    公开(公告)日:2008-08-28

    申请号:US12036336

    申请日:2008-02-25

    IPC分类号: C22C27/04 C23C16/06 B23B5/16

    摘要: Proposed are molybdenum or tungsten particles having a stable face-centered cubic structure of molybdenum and tungsten belonging to a VI group in a periodic table or a thin film formed from the foregoing particles, and a manufacturing method thereof. Specifically, provided are molybdenum or tungsten particles having a face-centered cubic (fcc) crystal structure or a thin film formed from the foregoing particles, wherein the particles have a large-diameter particle structure that is thermodynamically stable or metastable; and molybdenum or tungsten particles having a face-centered cubic (fcc) crystal structure or a thin film formed from the foregoing particles, wherein the particles have a pentagonal and star-shaped particle structure.

    摘要翻译: 提出的是具有稳定的在周期表中属于VI族的钼和钨的稳定的面心立方结构的钼或钨颗粒或由上述颗粒形成的薄膜及其制造方法。 具体地,提供具有面心立方(fcc)晶体结构的钼或钨颗粒或由上述颗粒形成的薄膜,其中颗粒具有热力学稳定或亚稳态的大直径颗粒结构; 和具有面心立方(fcc)晶体结构的钼或钨颗粒或由上述颗粒形成的薄膜,其中颗粒具有五边形和星形颗粒结构。

    Molybdenum or tungsten particles, thin film formed from said particles, and process for producing the same
    2.
    发明授权
    Molybdenum or tungsten particles, thin film formed from said particles, and process for producing the same 失效
    钼或钨颗粒,由所述颗粒形成的薄膜及其制备方法

    公开(公告)号:US08084127B2

    公开(公告)日:2011-12-27

    申请号:US12036336

    申请日:2008-02-25

    IPC分类号: B32B15/00 B32B15/02

    摘要: Proposed are molybdenum or tungsten particles having a stable face-centered cubic structure of molybdenum and tungsten belonging to a VI group in a periodic table or a thin film formed from the foregoing particles, and a manufacturing method thereof. Specifically, provided are molybdenum or tungsten particles having a face-centered cubic (fcc) crystal structure or a thin film formed from the foregoing particles, wherein the particles have a large-diameter particle structure that is thermodynamically stable or metastable; and molybdenum or tungsten particles having a face-centered cubic (fcc) crystal structure or a thin film formed from the foregoing particles, wherein the particles have a pentagonal and star-shaped particle structure.

    摘要翻译: 提出的是具有稳定的在周期表中属于VI族的钼和钨的稳定的面心立方结构的钼或钨颗粒或由上述颗粒形成的薄膜及其制造方法。 具体地,提供具有面心立方(fcc)晶体结构的钼或钨颗粒或由上述颗粒形成的薄膜,其中颗粒具有热力学稳定或亚稳态的大直径颗粒结构; 和具有面心立方(fcc)晶体结构的钼或钨颗粒或由上述颗粒形成的薄膜,其中颗粒具有五边形和星形颗粒结构。

    Method of fabricating thin film by microplasma processing and apparatus for same
    3.
    发明授权
    Method of fabricating thin film by microplasma processing and apparatus for same 有权
    通过微量加工制造薄膜的方法及其设备

    公开(公告)号:US08512816B2

    公开(公告)日:2013-08-20

    申请号:US12438164

    申请日:2007-07-23

    IPC分类号: C23C16/513 C23C4/12

    摘要: Provided is a method of fabricating, with satisfactory adhesion, a thin film of a metal or a metallic-compound, such as a metal oxide or nitride, on a substrate made of a high-melting-point material such as silicon or ceramics by using a metal or metallic-compound target as the primary raw material so as to eliminate the necessity of using harmful gases such as organometallic gas, and by using an atmospheric-pressure plasma generated under atmospheric pressure as a reaction field and also as a heat source. Additionally provided is an apparatus for fabricating the thin film. The thin-film fabrication method by microplasma processing includes the steps of disposing a raw material for thin-film fabrication in one or more tubes (A) having a uniform inner diameter throughout, introducing an inert gas and applying a high-frequency voltage to the narrow tubes (A) to generate high-frequency plasma in the narrow tubes (A), heating/evaporating the raw material while maintaining the flow rate of the plasma gas in the narrow tubes (A) and maintaining the plasma gas temperature high, ejecting the evaporated material from the narrow tubes (A) to spray it onto the substrate, heating the substrate with the plasma, and depositing the sprayed material on the substrate under atmospheric pressure.

    摘要翻译: 提供一种在由诸如硅或陶瓷的高熔点材料制成的基板上通过使用如下方法制造具有令人满意的粘附性的金属或金属化合物如金属氧化物或氮化物的薄膜的方法: 金属或金属化合物靶作为主要原料,以消除使用有机金属气体等有害气体的必要性,并且通过使用在大气压下产生的大气压等离子体作为反应场,还可以作为热源。 另外提供了一种用于制造薄膜的装置。 通过微量级处理的薄膜制造方法包括以下步骤:在一个或多个具有均匀内径的管(A)中设置用于薄膜制造的原料,引入惰性气体并向其施加高频电压 窄管(A)在窄管(A)中产生高频等离子体,加热/蒸发原料,同时保持窄管(A)中的等离子体气体的流量并保持等离子体气体温度高,喷射 来自窄管(A)的蒸发材料将其喷射到基板上,用等离子体加热基板,并在大气压下将喷射材料沉积在基板上。

    Method of Fabricating Thin Film by Microplasma Processing and Apparatus for Same
    4.
    发明申请
    Method of Fabricating Thin Film by Microplasma Processing and Apparatus for Same 有权
    通过微量加工制造薄膜的方法及其设备

    公开(公告)号:US20120021132A1

    公开(公告)日:2012-01-26

    申请号:US12438164

    申请日:2007-07-23

    IPC分类号: C23C16/513 C23C4/12

    摘要: Provided is a method of fabricating, with satisfactory adhesion, a thin film of a metal or a metallic-compound, such as a metal oxide or nitride, on a substrate made of a high-melting-point material such as silicon or ceramics by using a metal or metallic-compound target as the primary raw material so as to eliminate the necessity of using harmful gases such as organometallic gas, and by using an atmospheric-pressure plasma generated under atmospheric pressure as a reaction field and also as a heat source. Additionally provided is an apparatus for fabricating the thin film. The thin-film fabrication method by microplasma processing includes the steps of disposing a raw material for thin-film fabrication in one or more tubes (A) having a uniform inner diameter throughout, introducing an inert gas and applying a high-frequency voltage to the narrow tubes (A) to generate high-frequency plasma in the narrow tubes (A), heating/evaporating the raw material while maintaining the flow rate of the plasma gas in the narrow tubes (A) and maintaining the plasma gas temperature high, ejecting the evaporated material from the narrow tubes (A) to spray it onto the substrate, heating the substrate with the plasma, and depositing the sprayed material on the substrate under atmospheric pressure.

    摘要翻译: 提供一种在由诸如硅或陶瓷的高熔点材料制成的基板上通过使用如下方法制造具有令人满意的粘附性的金属或金属化合物如金属氧化物或氮化物的薄膜的方法: 金属或金属化合物靶作为主要原料,以消除使用有机金属气体等有害气体的必要性,并且通过使用在大气压下产生的大气压等离子体作为反应场,还可以作为热源。 另外提供了一种用于制造薄膜的装置。 通过微量级处理的薄膜制造方法包括以下步骤:在一个或多个具有均匀内径的管(A)中设置用于薄膜制造的原料,引入惰性气体并向其施加高频电压 窄管(A)在窄管(A)中产生高频等离子体,加热/蒸发原料,同时保持窄管(A)中的等离子体气体的流量并保持等离子体气体温度高,喷射 来自窄管(A)的蒸发材料将其喷射到基板上,用等离子体加热基板,并在大气压下将喷射材料沉积在基板上。

    Method of producing inorganic nanoparticles in atmosphere and device therefor
    5.
    发明授权
    Method of producing inorganic nanoparticles in atmosphere and device therefor 有权
    在大气中制备无机纳米颗粒的方法及其设备

    公开(公告)号:US08512437B2

    公开(公告)日:2013-08-20

    申请号:US12920228

    申请日:2009-02-26

    IPC分类号: B22F9/14

    摘要: Provided are a method and a device for producing nanoparticles of a low melting point material such as gold at more than 10 times faster the rate of conventional technology while maintaining the time-averaged temperature of pulse-modulated atmospheric-pressure plasma at a temperature that is low enough so as not to damage a heat-sensitive material disposed downstream. This method of preparing nanoparticles of a low melting point inorganic material in which a wire made of a low melting point inorganic material is inserted into a plasma-generating capillary tube or a plasma-generating nozzle and atmospheric-pressure high frequency plasma is generated in the capillary tube or nozzle is characterized by generating the plasma by applying a high frequency voltage possessing a waveform which exhibits its maximum value when it rises and then immediately falls, and which is pulse-modulated so that the duty ratio thereof is 10% or less.

    摘要翻译: 提供了一种用于生产低熔点材料如金的纳米颗粒的方法和装置,其比常规技术的速度高出10倍以上,同时将脉冲调制的大气压等离子体的时间平均温度保持在 足够低以便不会损坏设置在下游的热敏材料。 这种制备低熔点无机材料的纳米颗粒的方法,其中将由低熔点无机材料制成的导线插入等离子体产生毛细管或等离子体产生喷嘴和大气压高频等离子体中 毛细管或喷嘴的特征在于通过施加具有波形的高频电压来产生等离子体,该波形在其上升然后立即下降时呈现其最大值,并且被脉冲调制以使其占空比为10%以下。

    Method of Producing Inorganic Nanoparticles in Atmosphere and Device Therefor
    6.
    发明申请
    Method of Producing Inorganic Nanoparticles in Atmosphere and Device Therefor 有权
    在大气中制备无机纳米颗粒的方法及其装置

    公开(公告)号:US20110005352A1

    公开(公告)日:2011-01-13

    申请号:US12920228

    申请日:2009-02-26

    IPC分类号: B22F9/00 B29B9/00 B22F9/14

    摘要: Provided are a method and a device for producing nanoparticles of a low melting point material such as gold at more than 10 times faster the rate of conventional technology while maintaining the time-averaged temperature of pulse-modulated atmospheric-pressure plasma at a temperature that is low enough so as not to damage a heat-sensitive material disposed downstream. This method of preparing nanoparticles of a low melting point inorganic material in which a wire made of a low melting point inorganic material is inserted into a plasma-generating capillary tube or a plasma-generating nozzle and atmospheric-pressure high frequency plasma is generated in the capillary tube or nozzle is characterized by generating the plasma by applying a high frequency voltage possessing a waveform which exhibits its maximum value when it rises and then immediately falls, and which is pulse-modulated so that the duty ratio thereof is 10% or less.

    摘要翻译: 提供了一种用于生产低熔点材料如金的纳米颗粒的方法和装置,其比常规技术的速度高出10倍以上,同时将脉冲调制的大气压等离子体的时间平均温度保持在 足够低以便不会损坏设置在下游的热敏材料。 这种制备低熔点无机材料的纳米颗粒的方法,其中将由低熔点无机材料制成的导线插入等离子体产生毛细管或等离子体产生喷嘴和大气压高频等离子体中 毛细管或喷嘴的特征在于通过施加具有波形的高频电压来产生等离子体,该波形在其上升然后立即下降时呈现其最大值,并且被脉冲调制以使其占空比为10%以下。

    Process for preparing fluorine-substituted alicyclic diol
    9.
    发明授权
    Process for preparing fluorine-substituted alicyclic diol 失效
    制备氟取代脂环族二醇的方法

    公开(公告)号:US4873375A

    公开(公告)日:1989-10-10

    申请号:US180118

    申请日:1988-04-11

    IPC分类号: C07C31/44

    CPC分类号: C07C31/44

    摘要: A process for preparing a fluorine-substituted alicyclic diol comprising hydrogenating in the presence of a catalyst a fluorine-substituted aromatic diol represented by formula (I): ##STR1## wherein Ph represents a divalent organic group containing at least one aromatic group, to obtain the fluorine-substituted alicyclic diol represented by formula (II): ##STR2## wherein Ph(H) represents a divalent organic group containing at least one perhydroaromatic group.

    Fluorine-containing copolymer and composition containing the same for
curing
    10.
    发明授权
    Fluorine-containing copolymer and composition containing the same for curing 失效
    含氟共聚物和含有其的组合物用于固化

    公开(公告)号:US4634754A

    公开(公告)日:1987-01-06

    申请号:US755765

    申请日:1985-07-17

    CPC分类号: C08F214/184 C08L27/12

    摘要: A fluorine-containing copolymer comprising structural units of the formula (a):--CH.sub.2 --CHF-- (a)structural units of the formula (b): ##STR1## and structural units of the formula (c): ##STR2## wherein X is --H or --F, Y is --OH, --COOH or ##STR3## l is 0 or an integar of 1, m is 0 or an integar of 1 to 6 and n is 0 or an integer of 1 to 4, provided that Y is --COOH when n is 0. The copolymer has a good solubility to solvent and is cross-linkable, and the composition containing the copolymer can be cured at room temperature, and provides a film having an excellent chemical resistance, weatherability, stain resistance, heat resistance and high frictional electrification property.

    摘要翻译: 包含式(a)的结构单元的含氟共聚物:-CH 2 -CHF-(a)式(b)的结构单元:图像(b)和式(c)的结构单元:(c)其中X为-H或-F,Y为-OH,-COOH或I为0或1为整数,m为0或1〜6的整数,n为0或整数 为1〜4,条件是当n为0时,Y为-COOH。该共聚物对溶剂的溶解性良好且是可交联的,并且含有该共聚物的组合物可在室温下固化,并提供具有优异的膜 耐化学性,耐候性,耐污性,耐热性和高摩擦带电特性。