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公开(公告)号：US06692889B1
公开(公告)日：2004-02-17
申请号：US09806857
申请日：2001-04-05
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/021 , G03F7/023 , G03F7/0233 , G03F7/039 , G03F7/0397 , G03F7/164 , Y10S430/106
摘要： A polymeric compound of the invention includes at least one monomer unit selected from the following formulae (I), (II), (III) and (IV): (wherein R1 is a hydrogen atom or a methyl group, R2 and R3 are each a hydrogen atom, a hydroxyl group or a —COOR4 group, where R4 is, e.g., a t-butyl group or a 2-tetrahydropyranyl group; R5 and R6 are each a hydrogen atom, a hydroxyl group or an oxo group; R7, R8 and R9 are each a hydrogen atom or a methyl group; R10 and R11 are each a hydrocarbon group having 1 to 8 carbon atoms; R12, R13 and R14 are each a hydrogen atom, a hydroxyl group or a methyl group, where if all of R12 to R14 are each a hydrogen atom or a hydroxyl group, R10 and R11 are not coincidentally methyl groups) [wherein, when the compound includes, for example, a monomer unit of Formula (III), the compound further includes at least one monomer unit selected from among, for example, a monomer unit represented by the following Formula (V): (wherein R15 and R16 are each a hydrogen atom, a hydroxyl group or a carboxyl group; R17 is a hydroxyl group, an oxo group or a carboxyl group; and R1 has the same meaning as defined above)]. This polymeric compound has high etching resistance, as well as satisfactory transparency, alkali-solubility and adhesion, and is therefore useful as a photoresist resin.
摘要翻译： 本发明的高分子化合物包括至少一种选自下式（I），（II），（III）和（IV）的单体单元:(其中R 1是氢原子或甲基， 2>和R 3各自为氢原子，羟基或-COOR 4基团，其中R 4为例如叔丁基或2-四氢吡喃基; R 5为氢原子， R 6和R 6各自为氢原子，羟基或氧代基; R 7，R 8和R 9各自为氢原子或甲基; R 10和R 8为氢原子， 11>各自为具有1至8个碳原子的烃基; R 12，R 13和R 14各自为氢原子，羟基或甲基，其中如果全部R 12， 至R 14各自为氢原子或羟基，R 10和R 11不是甲基），其中，当该化合物包括例如式（III）的单体单元时， 该化合物还包括至少一种单体单元，其选自例如由下式（V）表示的单体单元:(其中 R 15和R 16各自为氢原子，羟基或羧基; R 17是羟基，氧代基或羧基; 和R 1具有与上述相同的含义]]。 该高分子化合物具有高耐蚀刻性，以及令人满意的透明度，碱溶性和粘附性，因此可用作光致抗蚀剂树脂。
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公开(公告)号：US06440636B1
公开(公告)日：2002-08-27
申请号：US09703677
申请日：2000-11-02
申请人： Toru Ushirogouchi , Takeshi Okino , Koji Asakawa , Naomi Shida , Yoshinori Funaki , Kiyoharu Tsutsumi , Akira Takaragi , Keizo Inoue
发明人： Toru Ushirogouchi , Takeshi Okino , Koji Asakawa , Naomi Shida , Yoshinori Funaki , Kiyoharu Tsutsumi , Akira Takaragi , Keizo Inoue
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , C08F20/18 , C08F20/30
摘要： A polymeric compound includes at least one monomeric unit of the following formula (I): wherein R1 is a hydrogen atom or a methyl group; and each of R2 and R3 is independently a hydrogen atom or a hydroxyl group. The polymeric compound may include the monomeric unit and at least one monomeric unit selected from monomeric units represented by the following formulae (IIa) and (IIb): wherein R1 is a hydrogen atom or a methyl group; each of R4 and R5 is, for example, a hydrogen atom, a hydroxyl group, an oxo group, or a carboxyl group, wherein R4 and R5 are not concurrently hydrogen atoms; and each of R7 and R8 is independently a hydrogen atom, a hydroxyl group, or an oxo group. The polymeric compound have a high etching resistance in addition to satisfactory transparency, alkali-solubility, and adhesion.
摘要翻译： 聚合化合物包括至少一种下式（I）的单体单元：其中R1是氢原子或甲基; R2和R3各自独立地为氢原子或羟基。 聚合化合物可以包括单体单元和选自下式（IIa）和（IIb）表示的单体单元的至少一种单体单元：其中R 1是氢原子或甲基; R4和R5各自为例如氢原子，羟基，氧代基或羧基，其中R4和R5不同时为氢原子; R 7和R 8各自独立地为氢原子，羟基或氧代基。 除了令人满意的透明性，碱溶性和粘合性之外，高分子化合物具有高的耐蚀刻性。
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公开(公告)号：US06806335B2
公开(公告)日：2004-10-19
申请号：US10375129
申请日：2003-02-28
IPC分类号： C08F12400
CPC分类号： C08F32/08 , C08F232/02 , G03F7/0045 , G03F7/039 , G03F7/0395 , G03F7/0397
摘要： A photoresist polymeric compound includes a monomer unit represented by following Formula (I): The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as described in the specification. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.
摘要翻译： 光致抗蚀剂聚合物包括由下式（I）表示的单体单元：聚合化合物还可包含如本说明书中所述的由式（IIa）至（IIg）表示的单体单元中的至少一种。 光致抗蚀剂聚合物可以表现出对基材的高粘合性，并可高精度地形成精细图案。
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公开(公告)号：US06552143B2
公开(公告)日：2003-04-22
申请号：US09937910
申请日：2001-10-19
IPC分类号： C08F12204
CPC分类号： C08F32/08 , C08F232/02 , G03F7/0045 , G03F7/039 , G03F7/0395 , G03F7/0397
摘要： A photoresist polymeric compound includes a monomer unit represented by following Formula (I): The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as described in the specification. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.
摘要翻译： 光致抗蚀剂聚合物包括由下式（I）表示的单体单元：聚合化合物还可包含如本说明书中所述的由式（IIa）至（IIg）表示的单体单元中的至少一种。 光致抗蚀剂聚合物可以表现出对基材的高粘合性，并可高精度地形成精细图案。
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公开(公告)号：US07105268B2
公开(公告)日：2006-09-12
申请号：US10239051
申请日：2001-12-11
IPC分类号： G03F7/039 , G03F7/26 , C08F20/28 , C07D311/94 , C07D313/20
CPC分类号： G03F7/0395 , G03F7/0397 , Y10S430/109
摘要： A polymeric compound for photoresist of the invention includes at least one monomer unit represented by following Formula (I): wherein R1, R2, R3, R4 and R5 are the same or different and are each a hydrogen atom or a methyl group; m, p and q each denote an integer of from 0 to 2; and n denotes 0 or 1, where the hydroxyl group and carbonyloxy group extending from a principle chain in the formula are independently combined with either of two carbon atoms on the far-left portion of the rings. By using the polymeric compound for photoresist as a base of a photoresist, the resulting photoresist exhibits well-rounded adhesion to substrates and resistance to etching.
摘要翻译： 本发明的光刻胶用高分子化合物包括至少一种由下式（I）表示的单体单元：其中R 1，R 2，R 3， R 4，R 4和R 5相同或不同，各自为氢原子或甲基; m，p和q分别表示0〜2的整数。 并且n表示0或1，其中从式中的主链延伸的羟基和羰氧基独立地与环的最左部分的两个碳原子中的任一个结合。 通过使用光致抗蚀剂的高分子化合物作为光致抗蚀剂的基底，所得到的光致抗蚀剂表现出对基底的良好的圆形粘附性和耐蚀刻性。
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公开(公告)号：US07090925B2
公开(公告)日：2006-08-15
申请号：US10807326
申请日：2004-03-24
CPC分类号： C08J5/18 , C08G73/10 , C08G73/18 , C08J2379/04 , C08L79/04 , Y10T428/1023 , Y10T428/24917 , Y10T428/31504 , Y10T428/31681 , Y10T428/31721
摘要： A material for dielectric films is a polymerizable composition containing an adamantanepolycarboxylic acid represented by following Formula (1):wherein X is a hydrogen atom, a carboxyl group or a hydrocarbon group; and Y1, Y2, Y3 and Y4 are the same as or different from one another and are each a single bond or a bivalent aromatic cyclic group; an aromatic polyamine represented by following Formula (2): wherein Ring Z is a monocyclic or polycyclic aromatic ring; and R1 and R2 are each a substituent bound to Ring Z, are the same as or different from each other and are each an amino group, a mono-substituted amino group, a hydroxyl group or a mercapto group; and a solvent other than ketones and aldehydes, in which the adamantanepolycarboxylic acid and aromatic polyamine are dissolved in the solvent
摘要翻译： 介电膜用材料是含有下述式（1）表示的金刚烷多元羧酸的聚合性组合物：其中X为氢原子，羧基或烃基; 和Y 1，Y 2，Y 3和Y 4相同或不同，并且 各自为单键或二价芳族环基; 由下式（2）表示的芳族多胺：其中环Z是单环或多环芳环; R 1和R 2各自为与环Z结合的取代基，彼此相同或不同，并且各自为氨基，单取代的氨基 基，羟基或巯基; 和除酮和醛之外的溶剂，其中金刚烷多羧酸和芳族多胺溶解在溶剂中
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公开(公告)号：US6054507A
公开(公告)日：2000-04-25
申请号：US37563
申请日：1998-03-09
CPC分类号： B82Y30/00 , B01J31/063 , B01J31/1616 , B01J35/0013 , B01J37/04
摘要： There are disclosed a metal-organic polymer composite structure, particularly a porous metal-organic polymer composite structure, for use as functional materials such as catalysts, and a method for producing the structure. The composite structure is composed of a microphase-separated structure from a block copolymer in which a metalphilic polymer chain and a metalphobic polymer chain are bonded together at each end, and ultrafine metal particles are contained in the metalphilic polymer phase of the microphase-separated structure.
摘要翻译： 公开了用作功能材料如催化剂的金属 - 有机聚合物复合结构，特别是多孔金属 - 有机聚合物复合结构体及其制造方法。 该复合结构由嵌段共聚物的微相分离结构构成，其中金属亲水性聚合物链和金属离子聚合物链各自结合在一起，超细金属颗粒包含在微相分离结构的金属聚合物相中 。
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8.发明授权Cationically polymerizable resin composition and cured object obtained therefrom 有权阳离子聚合性树脂组合物和由其获得的固化物公开(公告)号：US08975349B2
公开(公告)日：2015-03-10
申请号：US13376082
申请日：2010-05-20
IPC分类号： C08F224/00 , C08G63/66 , C08G59/32 , C08G65/18 , C08G65/22
CPC分类号： C08G59/3209 , C08G65/18 , C08G65/22
摘要： Disclosed is a cationically polymerizable resin composition which includes an oxetane-ring-containing vinyl ether compound (A) and/or an alicyclic-epoxy-containing vinyl ether compound (B); and an oligomer or polymer (C) having a molecular weight of 500 or more, being liquid at 0° C., and containing at least one of structures represented by following Formulae (1a) to (1f), wherein Rx represents hydrogen atom or methyl group; R1 to R3 each independently represent a hydrocarbon group having 1 to 5 carbon atoms; “a” is an integer of from 0 to 5; and “b” is 1 or 2. This cationically polymerizable resin composition has a low viscosity, is easy to work, cures extremely rapidly upon irradiation with light, and can give a cured object excellent in flexibility, thermal stability, and bendability after heat treatment.
摘要翻译： 公开了包含含氧杂环丁烷的乙烯基醚化合物（A）和/或含脂环式环氧基的乙烯基醚化合物（B）的阳离子聚合性树脂组合物。 以及分子量为500以上的低分子或聚合物（C），在0℃下为液体，并含有下述式（1a）〜（1f）表示的结构中的至少一种，其中，Rx表示氢原子或 甲基; R 1〜R 3各自独立地表示碳原子数1〜5的烃基。 “a”是0至5的整数; 该“b”为1或2.该阳离子聚合性树脂组合物的粘度低，易于加工，照射后能够极快地固化，能够得到热处理后的柔软性，热稳定性和弯曲性优异的固化物 。
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9.发明申请CATIONICALLY POLYMERIZABLE RESIN, CATIONICALLY POLYMERIZABLE RESIN COMPOSITION, AND CURED PRODUCTS THEREOF 有权阳离子聚合树脂，阳离子聚合树脂组合物及其固化产品公开(公告)号：US20120309930A1
公开(公告)日：2012-12-06
申请号：US13578561
申请日：2011-01-24
IPC分类号： C07D305/06 , C08G65/00
CPC分类号： C08G65/18 , C08F220/32 , C08F2220/282 , C08G65/22
摘要： Provided is a cationically polymerizable resin which is rapidly cured upon irradiation with light and forms a cured product excellent in flexibility and thermal stability. The cationically polymerizable resin is obtained through radical polymerization of an oxetane-ring-containing (meth)acryloyl compound represented by following Formula (1) alone or in combination with another radically polymerizable compound. In the formula, R1 represents hydrogen atom or methyl group; R2 represents hydrogen atom or an alkyl group; and “A” represents a linear or branched chain alkylene group having 2 to 20 carbon atoms.
摘要翻译： 提供一种阳离子聚合性树脂，其在照射光时迅速固化，形成柔软性和热稳定性优异的固化物。 阳离子聚合性树脂通过单独或与其它自由基聚合性化合物的单独或下述式（1）表示的含氧杂环丁烷的（甲基）丙烯酰基化合物自由基聚合而得到。 在该式中，R 1表示氢原子或甲基; R2表示氢原子或烷基; A表示碳原子数2〜20的直链或支链亚烷基。
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公开(公告)号：US07186454B2
公开(公告)日：2007-03-06
申请号：US10807426
申请日：2004-03-24
CPC分类号： C08J5/18 , C08G73/10 , C08G73/18 , C08J2379/04 , C08L79/04 , Y10T428/24917 , Y10T428/31681 , Y10T428/31721
摘要： A material for dielectric films is a polymerizable composition containing an organic solvent, and an adamantanepolycarboxylic acid derivative represented by following Formula (1): wherein X is hydrogen atom, a hydrocarbon group or R4; R1, R2, R3 and R4 and are each independently a protected or unprotected carboxyl group, etc.; and Y1, Y2, Y3 and Y4 are each independently a single bond or a bivalent aromatic cyclic group; and an aromatic polyamine derivative represented by following Formula (2): wherein Ring Z is a monocyclic or polycyclic aromatic ring; and R5, R6, R7 and R8 are each a substituent bound to Ring Z and are each independently a protected or unprotected amino group, etc., dissolved in the organic solvent.
摘要翻译： 电介质膜用材料是含有有机溶剂的聚合性组合物和下述式（1）表示的金刚烷多羧酸衍生物：其中X为氢原子，烃基或R 4; R 1，R 2，R 3和R 4，并且各自独立地是保护的或未被保护的羧基， 等等。; 且Y 1，Y 2，Y 3和Y 4各自独立地为单键或二价芳基 环状基团 和由下式（2）表示的芳族多胺衍生物：其中环Z是单环或多环芳环; R 5，R 6，R 7和R 8各自为与环Z结合的取代基，并且分别为 各自独立地是被溶解在有机溶剂中的被保护或未保护的氨基等。
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