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    Image forming curable resin compositions
    3.
    发明授权
    Image forming curable resin compositions 失效
    成像固化型树脂组合物

    公开(公告)号：US4035189A

    公开(公告)日：1977-07-12

    申请号：US594870

    申请日：1975-07-10

    申请人： Nobuyuki Hayashi ,  Asao Isobe ,  Katsushige Tsukada ,  Ken Ogawa ,  Masahiro Abo

    发明人： Nobuyuki Hayashi ,  Asao Isobe ,  Katsushige Tsukada ,  Ken Ogawa ,  Masahiro Abo

    IPC分类号： G03F7/031 ,  G03F7/38 ,  G03C1/68 ,  C08F8/18

    CPC分类号： G03F7/031 ,  G03F7/38 ,  Y10S430/115 ,  Y10S430/12

    摘要： A resist image, which is excellent in adhesiveness and high in physicochemical strengths, can be obtained by using as a resist material a resin composition having such properties that when it is exposed to actinic rays, a latent image (cure-precursor) is formed therein, and when it is subjected to subsequent heating, only the latent image portion is selectively cured.An example of the above-mentioned resin composition is a latently curable epoxy resin composition composed essentially of (A) an epoxy resin prepolymer and (B) a compound having in the molecule at least two groups represented by the formulas (I) and/or (II), ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 are individually a hydrogen atom, an alkyl group or aryl group.Another example of the resin composition is a curable resin composition composed mainly of photopolymerization sensitizers and N-methylolacrylamide derivatives represented by the formula, ##STR2## wherein R is a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms; and R' is a hydrogen atom or a methyl group.

    摘要翻译： 可以通过使用具有这样的性质的树脂组合物作为抗蚀剂材料来获得粘合性和物理化学强度优异的抗蚀剂图像，当其暴露于光化射线时，在其中形成潜像（固化前体） 并且当其进行随后的加热时，仅选择性地固化潜像部分。

    Photosensitive resin compositions
    4.
    发明授权
    Photosensitive resin compositions 失效
    感光树脂组合物

    公开(公告)号：US4025348A

    公开(公告)日：1977-05-24

    申请号：US574452

    申请日：1975-05-05

    申请人： Katsushige Tsukada ,  Asao Isobe ,  Toshiaki Ishimaru ,  Nobuyuki Hayashi ,  Masahiro Abo

    发明人： Katsushige Tsukada ,  Asao Isobe ,  Toshiaki Ishimaru ,  Nobuyuki Hayashi ,  Masahiro Abo

    IPC分类号： C08F2/50 ,  G03F7/032 ,  G03F7/038 ,  G03C1/68

    CPC分类号： G03F7/038 ,  G03F7/032 ,  Y10S430/106 ,  Y10S430/115 ,  Y10S430/117

    摘要： A photosensitive resin composition consisting essentially of (A) a photo-polymerizable unsaturated compound having at least two terminal ethylene groups, (B) a reactive linear high molecular weight compound having in its side chain one or two functional groups selected from the class consisting of tetrahydrofurfuryl group and N-alkoxymethylcarbamoyl group, (C) a sensitizer capable of initiating polymerization of the above unsaturated compound upon irradiation with active rays, (D) a compound having at least two epoxy groups, and (E) a potential or latent curing agent for epoxy resins. The photosensitive resin composition can give a protective film excellent in solvent resistance, chemical resistance, heat resistance and mechanical strengths, and hence can be used in the production of printed circuit boards and the precision-processing of metals.

    摘要翻译： 基本上由（A）具有至少两个末端亚乙基的光聚合性不饱和化合物组成的光敏树脂组合物，（B）在其侧链中具有一个或两个选自以下的官能团的反应性线性高分子量化合物： 四氢糠基和N-烷氧基甲基氨基甲酰基，（C）能够在用活性射线照射时引发上述不饱和化合物的聚合的敏化剂，（D）具有至少两个环氧基的化合物，和（E）潜在或潜在性固化剂 用于环氧树脂。 感光性树脂组合物可以得到耐溶剂性，耐化学性，耐热性和机械强度优异的保护膜，因此可以用于印刷电路板的制造和金属的精密加工。

    Photosensitive epoxy-acrylate resin compositions
    5.
    发明授权
    Photosensitive epoxy-acrylate resin compositions 失效
    光敏环氧丙烯酸酯树脂组合物

    公开(公告)号：US3989610A

    公开(公告)日：1976-11-02

    申请号：US441795

    申请日：1974-02-12

    申请人： Katsushige Tsukada ,  Asao Isobe ,  Nobuyuki Hayashi ,  Masahiro Abo ,  Ken Ogawa

    发明人： Katsushige Tsukada ,  Asao Isobe ,  Nobuyuki Hayashi ,  Masahiro Abo ,  Ken Ogawa

    IPC分类号： C08F2/46 ,  C08F2/50 ,  C08F283/10 ,  C08G59/42 ,  C08L63/00 ,  G03F7/032 ,  G03F7/038 ,  C08F8/00 ,  C08L63/02 ,  C08L63/10 ,  G03C1/70

    CPC分类号： G03F7/038 ,  C08F2/46 ,  C08F283/10 ,  C08G59/4292 ,  C08L63/00 ,  G03F7/032

    摘要： A photosensitive resin composition consisting of, or comprising as the essential components, (A) a photo-polymerizable unsaturated compound having at least two terminal ethylene groups, (B) a sensitizer capable of initiating polymerization of the above unsaturated compound upon irradiation with active rays, (C) a compound containing at least two epoxy groups, and (D) a compound selected from the group consisting of dicyandiamide, p,p'-diaminodiphenyl compounds, polycarboxylic acids having at least two carboxyl groups, polycarboxylic anhydrides and mixtures of the polycarboxylic acids and the polycarboxlic anhydrides. The above photosensitive resin composition can give a protective film excellent in solvent resistance, chemical resistance, heat resistance and mechanical strengths, and hence, can be used in the production of printed circuit boards, precision-processing of metals and as materials for adhesives, paints, plastic relief and the like.

    摘要翻译： 由（A）具有至少两个末端亚乙基的光聚合性不饱和化合物或（B）能够在照射活性射线时能够引发上述不饱和化合物的聚合的敏化剂的组合物或包含作为必需成分的感光性树脂组合物 ，（C）含有至少两个环氧基的化合物，和（D）选自双氰胺，p，p'-二氨基二苯基化合物，具有至少两个羧基的多元羧酸，多元羧酸酐及其混合物 多元羧酸和多羧酸酐。 上述感光性树脂组合物可以得到耐溶剂性，耐化学性，耐热性和机械强度优异的保护膜，因此可用于印刷电路板的制造，金属的精密加工以及粘合剂，涂料的材料 ，塑料浮雕等。

    Fluorescent probe specific to hydrogen peroxide
    6.
    发明授权
    Fluorescent probe specific to hydrogen peroxide 有权
    荧光探针特异于过氧化氢

    公开(公告)号：US08394850B2

    公开(公告)日：2013-03-12

    申请号：US12920684

    申请日：2009-03-04

    申请人： Tetsuo Nagano ,  Yasuteru Urano ,  Masahiro Abo

    发明人： Tetsuo Nagano ,  Yasuteru Urano ,  Masahiro Abo

    IPC分类号： A61K31/352 ,  C07D311/82

    CPC分类号： C07D311/82 ,  G01N31/22 ,  G01N2021/7786 ,  Y10T436/206664

    摘要： A compound represented by the following general formula (IA) or (IB) (R1 represents an electron withdrawing substituent, R2 and R3 represent a hydrogen atom or a halogen atom; R4 and R3 represent a hydrogen atom, an alkylcarbonyl group, or an alkylcarbonyloxymethyl group, and R6 represents a hydrogen atom or an alkyl group) or a salt thereof, and a reagent for measuring hydrogen peroxide comprising the compound or a salt thereof.

    摘要翻译： 由以下通式（IA）或（IB）表示的化合物（R1表示吸电子取代基，R2和R3表示氢原子或卤素原子; R4和R3表示氢原子，烷基羰基或烷基羰氧基甲基 基团，R6表示氢原子或烷基）或其盐，以及含有该化合物或其盐的测量过氧化氢的试剂。

    FLUORESCENT PROBE SPECIFIC TO HYDROGEN PEROXIDE
    7.
    发明申请
    FLUORESCENT PROBE SPECIFIC TO HYDROGEN PEROXIDE 有权
    荧光探针特异性过氧化氢

    公开(公告)号：US20110159603A1

    公开(公告)日：2011-06-30

    申请号：US12920684

    申请日：2009-03-04

    申请人： Tetsuo Nagano ,  Yasuteru Urano ,  Masahiro Abo

    发明人： Tetsuo Nagano ,  Yasuteru Urano ,  Masahiro Abo

    IPC分类号： G01N33/00 ,  C07D311/82

    CPC分类号： C07D311/82 ,  G01N31/22 ,  G01N2021/7786 ,  Y10T436/206664

    摘要： A compound represented by the following general formula (IA) or (IB) (R1 represents an electron withdrawing substituent, R2 and R3 represent a hydrogen atom or a halogen atom; R4 and R3 represent a hydrogen atom, an alkylcarbonyl group, or an alkylcarbonyloxymethyl group, and R6 represents a hydrogen atom or an alkyl group) or a salt thereof, and a reagent for measuring hydrogen peroxide comprising the compound or a salt thereof.

    摘要翻译： 由以下通式（IA）或（IB）表示的化合物（R1表示吸电子取代基，R2和R3表示氢原子或卤素原子; R4和R3表示氢原子，烷基羰基或烷基羰氧基甲基 基团，R6表示氢原子或烷基）或其盐，以及含有该化合物或其盐的测量过氧化氢的试剂。