公开(公告)号：US5441849A

公开(公告)日：1995-08-15

申请号：US117969

申请日：1993-09-08

申请人： Hiroshi Shiraishi ,  Takumi Ueno ,  Fumio Murai ,  Hajime Hayakawa ,  Asao Isobe

发明人： Hiroshi Shiraishi ,  Takumi Ueno ,  Fumio Murai ,  Hajime Hayakawa ,  Asao Isobe

IPC分类号： G03F7/11 ,  G03F7/095 ,  G03F7/20 ,  G03F7/26 ,  H01L21/027 ,  H01L21/30 ,  H05K3/00 ,  G03C5/00 ,  B44C1/22

CPC分类号： G03F7/095 ,  Y10S430/145 ,  Y10S430/168 ,  Y10S438/95

摘要： Electrical charge accumulation caused by exposure to a charged particle beam during the formation of latent image pattern can be reduced and thus the positional deviation of the pattern by using a bottom-resist layer comprising a radiation-induced conductive composition. Highly integrated semiconductor device can be made easily and in high yields. The positional deviation can further be reduced by exposing a charge particle beam patterning apparatus substantially simultaneously with an actinic radiation such as ultraviolet light, X-ray, and infrared light.

摘要翻译： 通过使用包含辐射诱导的导电组合物的底部抗蚀剂层，可以减少在形成潜像图案期间由带电粒子束曝光引起的电荷积累，从而减小图案的位置偏差。 高度集成的半导体器件可以容易且高产率地制造。 通过使电荷粒子束构图装置与紫外光，X射线和红外光等的光化辐射基本上同时曝光，可以进一步降低位置偏差。

公开(公告)号：US5314783A

公开(公告)日：1994-05-24

申请号：US970031

申请日：1992-11-02

申请人： Shigeru Koibuchi ,  Asao Isobe ,  Michiaki Hashimoto

发明人： Shigeru Koibuchi ,  Asao Isobe ,  Michiaki Hashimoto

IPC分类号： G03C1/00 ,  G03C1/72 ,  G03F7/004 ,  G03F7/022 ,  H01L21/027 ,  G03F7/023 ,  G03C1/61

CPC分类号： G03F7/0226

摘要： A photosensitive resin composition comprising (A) an alkaline aqueous solution-soluble novolak resin, (B) a photosensitizer obtained by reacting a polyhydroxy compound with 1,2-naphthoquinone-(2)-diazido-5(or 4)-sulfonyl chloride, and (C) an ultraviolet absorber such as 2-(2'-hydroxy-5'-methylphenyl)-benzotriazole, has a strong absorption against a light of a wavelength of 365 nm and is suitable for producing semiconductor elements, etc.

摘要翻译： 一种感光性树脂组合物，其包含（A）碱性水溶性溶液型酚醛清漆树脂，（B）通过使多羟基化合物与1,2-萘醌 - （2） - 叠氮基-5（或4） - 磺酰氯反应而得到的光敏剂， 和（C）2-（2'-羟基-5'-甲基苯基） - 苯并三唑等紫外线吸收剂对波长365nm的光具有很强的吸收性，适用于制造半导体元件等。

公开(公告)号：US4554237A

公开(公告)日：1985-11-19

申请号：US452198

申请日：1982-12-22

申请人： Fumio Kataoka ,  Fusaji Shoji ,  Hitoshi Yokono ,  Daisuke Makino ,  Shigeru Koibuchi ,  Asao Isobe

发明人： Fumio Kataoka ,  Fusaji Shoji ,  Hitoshi Yokono ,  Daisuke Makino ,  Shigeru Koibuchi ,  Asao Isobe

IPC分类号： G03C1/72 ,  G03F7/008 ,  G03C1/52 ,  G03C1/60 ,  G03C5/16

CPC分类号： G03F7/008 ,  Y10S430/128

摘要： Disclosed are photosensitive resin composition useful for formation of fine patterns on semiconductor devices, magnetic bubble devices, etc. which is highly sensitive and is excellent in developability and which has no problem such as precipitation of azide compounds and remaining azide particles after development and a method for forming fine patterns with said composition.Said photosensitive resin composition comprises (a) at least one polymer compound selected from the group consisting of a novolak resin and a polyhydroxystyrene resin and (b) an azide compound represented by the general formula (1): ##STR1## [wherein X is --N.sub.3 or --SO.sub.2 N.sub.3, Y is ##STR2## R.sup.1 is a lower alkylene such as --CH.sub.2 CH.sub.2 --, --CH.sub.2 CH.sub.2 CH.sub.2 --, or --CH.sub.2 CH.sub.2 OCH.sub.2 CH.sub.2 CH.sub.2 --, a hydroxyalkylene or an aminoalkylene such as ##STR3## (wherein R.sup.4 and R.sup.5 are lower alkyl or hydrogen, R.sup.6 -R.sup.8 are lower alkyl groups, R.sup.3 is hydrogen, a lower alkyl group or --CH.sub.2 CH.sub.2 O).sub.n R.sup.9 wherein n is an integer of 3 or less and R.sup.9 is hydrogen or a lower alkyl group)].

摘要翻译： 公开了用于在半导体器件上形成精细图案的光敏树脂组合物，具有高度敏感性和显影性优异的并且没有问题，例如显影后的叠氮化合物和剩余的叠氮化物颗粒的沉淀，以及方法 用于用所述组合物形成精细图案。 所述光敏树脂组合物包含（a）至少一种选自酚醛清漆树脂和聚羟基苯乙烯树脂的聚合物化合物和（b）由通式（1）表示的叠氮化合物：其中 X是-N3或-SO2N3，Y是低级亚烷基，例如-CH2CH2-，-CH2CH2CH2-或-CH2CH2OCH2CH2CH2-，羟基亚烷基或氨基亚烷基，例如

公开(公告)号：US4108666A

公开(公告)日：1978-08-22

申请号：US665883

申请日：1976-03-11

申请人： Nobuyuki Hayashi ,  Asao Isobe ,  Katsushige Tsukada ,  Toshiaki Ishimaru

发明人： Nobuyuki Hayashi ,  Asao Isobe ,  Katsushige Tsukada ,  Toshiaki Ishimaru

IPC分类号： H05K3/00 ,  B32B27/36 ,  C08F2/50 ,  C23C18/16 ,  C23C18/18 ,  C23C18/31 ,  G03F7/027 ,  H05K3/18 ,  G03C1/68

CPC分类号： G03F7/027

摘要： A photosensitive composition for a photoresist, which comprises (A) a compound having the following general formula: ##STR1## wherein Z is a cyclic dibasic acid anhydride moiety, R.sup.1 is an alkylene group having 1 to 3 carbon atoms, R.sup.2 is hydrogen or methyl, and R.sup.3 is hydrogen, methyl, ethyl or -CH.sub.2 X in which X is chlorine or bromine, (B) a photopolymerization sensitizer, (C) a polymer being capable of giving a film-forming property, (D) a chain transfer agent and (E) a thermal polymerization inhibitor; and a laminated photosensitive element which has a substantially dry photosensitive layer of the photosensitive composition. The composition and element are capable of giving a minute resist pattern which is excellent as an etching resist or metal plating resist and can be readily removed after etching or metal plating.

摘要翻译： 一种光致抗蚀剂用光敏组合物，其包含（A）具有以下通式的化合物：其中Z是环状二元酸酐部分，R 1是具有1至3个碳原子的亚烷基，R 2是氢或甲基 ，R 3为氢，甲基，乙基或-CH 2 X，其中X为氯或溴，（B）光聚合增感剂，（C）能够提供成膜性的聚合物，（D）链转移剂和 （E）热聚合抑制剂; 以及具有基本上干燥的光敏组合物感光层的层压感光元件。 组合物和元素能够提供作为抗蚀剂或金属电镀抗蚀剂优异的微小抗蚀剂图案，并且可以在蚀刻或金属电镀之后容易地除去。

公开(公告)号：US4101364A

公开(公告)日：1978-07-18

申请号：US709400

申请日：1976-07-28

申请人： Katsushige Tsukada ,  Nobuyuki Hayashi ,  Hideo Yamada ,  Toshiaki Ishimaru ,  Asao Isobe ,  Tadazi Sato

发明人： Katsushige Tsukada ,  Nobuyuki Hayashi ,  Hideo Yamada ,  Toshiaki Ishimaru ,  Asao Isobe ,  Tadazi Sato

IPC分类号： H05K3/06 ,  B29C63/00 ,  B29C63/02 ,  B29L9/00 ,  G03C7/30 ,  G03F7/004 ,  G03F7/16 ,  H05K3/00 ,  B29C17/00

CPC分类号： B32B37/10 ,  B29C63/0047 ,  B29C63/0091 ,  G03F7/161 ,  B32B2309/68 ,  H05K3/0079

摘要： It is herein proposed to laminate a film onto a convex-concaved solid surface in a vacuum to accomplish tight contact between the film and the solid surface. The apparatus includes an air tight housing in which lamination press rolls are arranged, wherein feeding-in and feeding-out of materials such as a base plate and a film for lamination are effected through air tight roll assemblies incorporated in the wall structure of the air tight housing.

摘要翻译： 这里提出在真空中将薄膜层压到凸凹固体表面上，以实现薄膜和固体表面之间的紧密接触。 该装置包括一个气密的外壳，其中布置有层叠压力辊，其中馈送和馈送诸如基板和用于层压的薄膜的材料通过结合在空气的壁结构中的气密辊组件来实现 紧密的住房。

公开(公告)号：US4499163A

公开(公告)日：1985-02-12

申请号：US512660

申请日：1983-07-11

申请人： Toshiaki Ishimaru ,  Katsushige Tsukada ,  Nobuyuki Hayashi ,  Shigeru Koibuchi ,  Asao Isobe

发明人： Toshiaki Ishimaru ,  Katsushige Tsukada ,  Nobuyuki Hayashi ,  Shigeru Koibuchi ,  Asao Isobe

IPC分类号： G03F7/004 ,  C08F2/50 ,  C08F299/06 ,  C08G18/67 ,  G03F7/027 ,  G03C5/00 ,  G03C1/78

CPC分类号： G03F7/027 ,  C08F2/50 ,  C08F299/065 ,  C08G18/672

摘要： A photosensitive resin composition comprising (a) 20 to 75 parts by weight of a urethane diacrylate or dimethacrylate compound obtained by reacting trimethylhexamethylene diisocyanate and/or isophorone diisocynate dihydric alcohol and an acrylic or methacrylic monoester of a dihydric alcohol, (b) 20 to 75 parts by weight of a linear polymeric compound having a glass transition temperature of about 40.degree. to 150.degree. C., and (c) a sensitizer and/or a sensitizer system which generate free radicals owing to actinic light, is excellent in heat resistance, resistance to thermal shock and solvent resistance, and is suitable for forming a soldering mask. Further, a photosensitive element produced by forming a layer of the above-mentioned composition on a support gives a protective coating film excellent in heat resistance, resistance to thermal shock and solvent resistance, and is particularly suitable for a soldering mask.

摘要翻译： 一种感光性树脂组合物，其含有（a）20〜75重量份通过使三甲基六亚甲基二异氰酸酯和/或异佛尔酮二异氰酸酯二元醇与二元醇的丙烯酸或甲基丙烯酸单酯反应得到的氨基甲酸酯二丙烯酸酯或二甲基丙烯酸酯化合物，（b）20〜75 重量的玻璃化转变温度为约40〜150℃的线性高分子化合物，和（c）由于光化性光而产生自由基的敏化剂和/或敏化剂体系，耐热性优异， 耐热冲击和耐溶剂性，并且适于形成焊接掩模。 此外，通过在支撑体上形成上述组合物层而制造的感光元件形成耐热性，耐热冲击性和耐溶剂性优异的保护涂膜，特别适用于焊接掩模。

公开(公告)号：US4154709A

公开(公告)日：1979-05-15

申请号：US883706

申请日：1978-03-06

申请人： Ryoji Ukita ,  Asao Isobe ,  Takao Hirayama ,  Shigeyoshi Tanaka

发明人： Ryoji Ukita ,  Asao Isobe ,  Takao Hirayama ,  Shigeyoshi Tanaka

IPC分类号： C08G63/66 ,  C09D167/08 ,  C09D3/64 ,  C09D3/66 ,  C09D5/02

CPC分类号： C08G63/66 ,  C09D167/08

摘要： A water-dispersible epoxy modified alkyd resin produced by reacting (A) 0-50 parts by weight of oil or oil fatty acid, (B) 10-50 parts by weight of polyhydric alcohol, (C) 0-25 parts by weight of monobasic acid having 6 to 18 carbon atoms, (D) 15-70 parts by weight of polybasic acid having 4 to 10 carbon atoms or its anhydride, (E) 5-25 parts by weight of polyoxyalkylene glycol having a molecular weight of 600 to 20,000, and (F) an epoxy compound, wherein the ratio of the hydroxyl groups to the carboxyl groups in the components (A) through (E) is 0.625-1.8 and the amount of the component (F) is 3-50 parts by weight per 100 parts by weight of the total weight of the components (A) through (E), can provide water-dispersible coatings having improved drying characteristics and water resistance as well as corrosion resistance.

摘要翻译： （A）0-50重量份的油或油脂肪酸，（B）10-50重量份的多元醇，（C）0-25重量份的 具有6至18个碳原子的一元酸，（D）15-70重量份的具有4至10个碳原子的多元酸或其酸酐，（E）5-25重量份的分子量为600至100的聚氧化亚烷基二醇 20,000和（F）环氧化合物，其中组分（A）至（E）中羟基与羧基的比例为0.625-1.8，组分（F）的量为3-50份， （A）至（E）中每100重量份的重量，可以提供具有改进的干燥特性和耐水性以及耐腐蚀性的水分散性涂料。

公开(公告)号：US5215858A

公开(公告)日：1993-06-01

申请号：US326740

申请日：1989-03-21

申请人： Shigeru Koibuchi ,  Asao Isobe ,  Michiaki Hashimoto

发明人： Shigeru Koibuchi ,  Asao Isobe ,  Michiaki Hashimoto

IPC分类号： G03C1/00 ,  G03C1/72 ,  G03F7/004 ,  G03F7/022 ,  H01L21/027

CPC分类号： G03F7/0226

摘要： A photosensitive resin composition comprising (A) an alkaline aqueous solution-soluble novolak resin, (B) a photosensitizer obtained by reacting a polyhydroxy compound with 1,2-naphthoquinone-(2)-diazido-5(or 4)-sulfonyl chloride, and (C) an ultraviolet absorber such as 2-(2'-hydroxy-5'-methylphenyl)-benzotriazole, has a strong absorption against a light of a wavelength of 365 nm and is suitable for producing semiconductor elements, etc.

公开(公告)号：US4513077A

公开(公告)日：1985-04-23

申请号：US503634

申请日：1983-06-13

申请人： Asao Isobe ,  Daisuke Makino ,  Hiroshi Shiraishi

发明人： Asao Isobe ,  Daisuke Makino ,  Hiroshi Shiraishi

IPC分类号： G03C1/00 ,  C08G8/08 ,  C08L61/06 ,  C08L61/08 ,  C08L81/06 ,  G03C1/72 ,  G03F7/039 ,  G03F7/26 ,  H01L21/027 ,  G03C1/495

CPC分类号： G03F7/039 ,  C08G8/08 ,  C08L61/06 ,  C08L81/06 ,  Y10S430/106 ,  Y10S430/143 ,  Y10S430/167

摘要： There is disclosed an image-formable resinous composition comprising a poly(olefinsulfone) and a matrix polymer, in which the matrix polymer being a novolac phenol resin obtained from:(1) m-cresol and p-cresol as main components, the molar ratio of m-cresol/p-cresol being within the range from 40/60 to 55/45, and(2) formaldehyde, the molar ratio of formaldehyde/(phenol or phenol derivatives) being within the range from 5/10 to 8/10.The image-formable resinous composition has a high sensitivity and a high dissolution.

摘要翻译： 公开了包含聚（烯烃砜）和基质聚合物的成像树脂组合物，其中基质聚合物是由以下物质获得的酚醛清漆酚醛树脂：（1）间甲酚和对甲酚作为主要组分，摩尔比 间甲酚/对甲酚在40/60至55/45范围内，和（2）甲醛，甲醛/（苯酚或苯酚衍生物）的摩尔比在5/10至8 / 10。 成像树脂组合物具有高灵敏度和高溶解度。

公开(公告)号：US4295947A

公开(公告)日：1981-10-20

申请号：US74660

申请日：1979-09-12

申请人： Eiichi Ohtani ,  Kengo Kobayashi ,  Asao Isobe ,  Shigeyoshi Tanaka

发明人： Eiichi Ohtani ,  Kengo Kobayashi ,  Asao Isobe ,  Shigeyoshi Tanaka

IPC分类号： C08F2/00 ,  C08F2/48 ,  C08F2/50 ,  C08F20/36 ,  C08F290/00 ,  C08F299/00 ,  C08F299/06 ,  C08G18/67 ,  C09D175/14 ,  C09D175/16 ,  B32B27/16

CPC分类号： C08G18/675 ,  C08F20/36 ,  C08F299/06 ,  C08G18/6705 ,  C09D175/16 ,  Y10S525/92 ,  Y10S525/922

摘要： A photo-curable coating composition for building materials which comprises(a) an isocyanate-modified epoxy ester obtained by the reaction of an acrylic or methacrylic ester of an epoxy compound having not less than two epoxy groups in the molecule with a polyisocyanate;(b) a photopolymerizable monomer being copolymerizable with the epoxy ester (a);(c) a ketone resin;(d) a photo-sensitizer; and(e) a sensitizing auxiliary.

摘要翻译： 一种用于建筑材料的光固化涂料组合物，其包含（a）通过分子中具有不少于两个环氧基的环氧化合物的丙烯酸或甲基丙烯酸酯与多异氰酸酯反应得到的异氰酸酯改性环氧酯; （b）可与环氧酯（a）共聚的光聚合单体; （c）酮树脂; （d）光敏剂; 和（e）敏化辅助剂。