公开(公告)号：US20100016169A1

公开(公告)日：2010-01-21

申请号：US12375502

申请日：2007-08-01

申请人： Sanaki Horimoto ,  Takuya Nagamine ,  Takehiro Watanabe ,  Fumi Murokawa ,  Yuji Horie ,  Noriyuki Kumasaka ,  Masahiro Hosoi

发明人： Sanaki Horimoto ,  Takuya Nagamine ,  Takehiro Watanabe ,  Fumi Murokawa ,  Yuji Horie ,  Noriyuki Kumasaka ,  Masahiro Hosoi

IPC分类号： H01B13/00 ,  B24B7/13 ,  B24B21/00 ,  H01B12/02 ,  H01L39/02

CPC分类号： B24B7/13 ,  B24B21/00 ,  B24B37/04 ,  H01L39/2454 ,  Y10S505/813 ,  Y10T29/49014 ,  Y10T428/24355

摘要： An oxide superconductor member is composed of a tape-shaped substrate, an intermediate layer formed on this substrate and an oxide superconductor thin film layer formed on this intermediate layer. A surface of the tape-shaped substrate is polished by continuously running the tape-shaped substrate. The polishing step includes initial polishing process and finishing process which are carried out such that the average surface roughness Ra of the substrate becomes 2 nanometers or less and the in-plane directionality of the intermediate layer becomes 5° or less after the polishing step.

摘要翻译： 氧化物超导体构件由带状基板，形成在该基板上的中间层和形成在该中间层上的氧化物超导体薄膜层构成。 通过连续运行带状基板来对带状基板的表面进行抛光。 抛光步骤包括初步抛光工艺和精加工工艺，其进行使得在抛光步骤之后，基板的平均表面粗糙度Ra变为2纳米或更小，并且中间层的面内方向性变为5°或更小。

公开(公告)号：US08143194B2

公开(公告)日：2012-03-27

申请号：US12375502

申请日：2007-08-01

申请人： Sanaki Horimoto ,  Takuya Nagamine ,  Takehiro Watanabe ,  Fumi Murokawa ,  Yuji Horie ,  Noriyuki Kumasaka ,  Masahiro Hosoi

发明人： Sanaki Horimoto ,  Takuya Nagamine ,  Takehiro Watanabe ,  Fumi Murokawa ,  Yuji Horie ,  Noriyuki Kumasaka ,  Masahiro Hosoi

IPC分类号： H01L39/24

CPC分类号： B24B7/13 ,  B24B21/00 ,  B24B37/04 ,  H01L39/2454 ,  Y10S505/813 ,  Y10T29/49014 ,  Y10T428/24355

摘要： An oxide superconductor member is composed of a tape-shaped substrate, an intermediate layer formed on this substrate and an oxide superconductor thin film layer formed on this intermediate layer. A surface of the tape-shaped substrate is polished by continuously running the tape-shaped substrate. The polishing step includes initial polishing process and finishing process which are carried out such that the average surface roughness Ra of the substrate becomes 2 nanometers or less and the in-plane directionality of the intermediate layer becomes 5° or less after the polishing step.

公开(公告)号：US20090054243A1

公开(公告)日：2009-02-26

申请号：US12194346

申请日：2008-08-19

申请人： Yuji Horie ,  Noriyuki Kumasaka ,  Sanaki Horimoto

发明人： Yuji Horie ,  Noriyuki Kumasaka ,  Sanaki Horimoto

IPC分类号： B24B1/00 ,  H01L39/02

CPC分类号： B24B7/13 ,  B24B37/042 ,  H01L39/2454 ,  Y10S505/813

摘要： A target surface of a tape-shaped substrate of an oxide superconductor with an intermediate layer formed on this target surface and an oxide superconductor thin film is polished by causing the tape-shaped substrate to continuously run. The polishing step includes an initial polishing process for carrying out random polishing of the target surface and a finishing process that is carried out after the initial polishing process for forming grooves on the target surface along the running direction of the substrate. The intermediate layer has an in-plane directionality of 7° or less. The tape-shaped substrate is fabricated by rolling nickel, a nickel alloys or stainless steel.

摘要翻译： 通过使带状基板连续运行来研磨在该目标表面上形成有中间层的氧化物超导体的带状基板的目标表面和氧化物超导体薄膜。 抛光步骤包括用于进行目标表面的随机抛光的初始抛光工艺和在初始抛光工艺之后进行的精加工工艺，用于沿着衬底的运行方向在目标表面上形成凹槽。 中间层的面内方向性为7°以下。 带状基材通过轧制镍，镍合金或不锈钢制成。

公开(公告)号：US20100160170A1

公开(公告)日：2010-06-24

申请号：US12438601

申请日：2007-08-24

申请人： Sanaki Horimoto ,  Takuya Nagamine ,  Takehiro Watanabe ,  Fumi Murokawa ,  Yuji Horie ,  Noriyuki Kumasaka ,  Masahiro Hosoi

发明人： Sanaki Horimoto ,  Takuya Nagamine ,  Takehiro Watanabe ,  Fumi Murokawa ,  Yuji Horie ,  Noriyuki Kumasaka ,  Masahiro Hosoi

IPC分类号： H01B12/02 ,  B24B7/13 ,  B24B21/00 ,  H01L39/24

CPC分类号： B24B7/13 ,  B24B21/00 ,  B24B37/04 ,  H01L39/2454 ,  Y10S505/813

摘要： A surface polishing method for enhancing crystal orientation on the surface of a tapelike metal substrate in order to enhance the critical current of a superconducting thin film. In an oxide superconductor comprising a tapelike substrate, an intermediate layer formed on the tapelike substrate, and an oxide superconducting thin film layer formed on the intermediate layer, the method for polishing a surface to be polished of the tapelike substrate comprises a step for polishing the surface to be polished while traveling the tapelike substrate continuously, wherein an initial polishing step and a finish polishing step are included. Ultimately, the average surface roughness Ra of the polished surface is 2 nanometer or less and the in-plane orientation Δφ is 5° or less.

摘要翻译： 为了提高超导薄膜的临界电流，在带状金属基板的表面上增强晶体取向的表面研磨方法。 在形成有带状基板的氧化物超导体，形成在带状基板上的中间层和形成在中间层上的氧化物超导薄膜层的情况下，对带状基板的被研磨面进行研磨的方法包括： 连续行进带状基板时要抛光的表面，其中包括初始抛光步骤和精抛光步骤。 最终，研磨表面的平均表面粗糙度Ra为2nm以下，面内取向为Dgr＆amp; 为5°以下。

公开(公告)号：US08148301B2

公开(公告)日：2012-04-03

申请号：US12438601

申请日：2007-08-24

申请人： Sanaki Horimoto ,  Takuya Nagamine ,  Takehiro Watanabe ,  Fumi Murokawa ,  Yuji Horie ,  Noriyuki Kumasaka ,  Masahiro Hosoi

发明人： Sanaki Horimoto ,  Takuya Nagamine ,  Takehiro Watanabe ,  Fumi Murokawa ,  Yuji Horie ,  Noriyuki Kumasaka ,  Masahiro Hosoi

IPC分类号： H01L39/24

CPC分类号： B24B7/13 ,  B24B21/00 ,  B24B37/04 ,  H01L39/2454 ,  Y10S505/813

摘要： An oxide superconductor member is composed of a tape-shaped substrate, an intermediate layer formed on this substrate and an oxide superconductor thin film layer formed on this intermediate layer. A surface of the tape-shaped substrate is polished by continuously running the tape-shaped substrate. The polishing step includes initial polishing process and finishing process which are carried out such that the average surface roughness Ra of the substrate becomes 2 nanometers or less and the in-plane directionality of the intermediate layer becomes 5° or less after the polishing step.

摘要翻译： 氧化物超导体构件由带状基板，形成在该基板上的中间层和形成在该中间层上的氧化物超导体薄膜层构成。 通过连续运行带状基板来对带状基板的表面进行抛光。 抛光步骤包括初步抛光工艺和精加工工艺，其进行使得在抛光步骤之后，基板的平均表面粗糙度Ra变为2纳米或更小，并且中间层的面内方向性变为5°或更小。

公开(公告)号：US07811972B2

公开(公告)日：2010-10-12

申请号：US12194346

申请日：2008-08-19

申请人： Yuji Horie ,  Noriyuki Kumasaka ,  Sanaki Horimoto

发明人： Yuji Horie ,  Noriyuki Kumasaka ,  Sanaki Horimoto

IPC分类号： H01L39/24 ,  H01L39/12

CPC分类号： B24B7/13 ,  B24B37/042 ,  H01L39/2454 ,  Y10S505/813

摘要： A target surface of a tape-shaped substrate of an oxide superconductor with an intermediate layer formed on this target surface and an oxide superconductor thin film is polished by causing the tape-shaped substrate to continuously run. The polishing step includes an initial polishing process for carrying out random polishing of the target surface and a finishing process that is carried out after the initial polishing process for forming grooves on the target surface along the running direction of the substrate. The intermediate layer has an in-plane directionality of 7° or less. The tape-shaped substrate is fabricated by rolling nickel, a nickel alloys or stainless steel.

摘要翻译： 通过使带状基板连续运行来研磨在该目标表面上形成有中间层的氧化物超导体的带状基板的目标表面和氧化物超导体薄膜。 抛光步骤包括用于进行目标表面的随机抛光的初始抛光工艺和在初始抛光工艺之后进行的精加工工艺，用于沿着基板的运行方向在目标表面上形成凹槽。 中间层的面内方向性为7°以下。 带状基材通过轧制镍，镍合金或不锈钢制成。

公开(公告)号：US07857876B2

公开(公告)日：2010-12-28

申请号：US12420557

申请日：2009-04-08

申请人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

发明人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

IPC分类号： B24D3/02 ,  C09C1/68 ,  C09K3/14 ,  H01L21/302 ,  C09G1/02 ,  B24B1/00 ,  B24B7/19

CPC分类号： G11B5/8404 ,  B24D11/00 ,  C01B32/25 ,  C09K3/1436 ,  C09K3/1463

摘要： Diamond clusters are used as a polishing material of free abrading particles, each being a combination of artificial diamond particles having primary particle diameters of 20 nm or less and impurities that are attached around these diamond particles. The density of non-diamond carbon contained in the impurities is in the range of 95% or more and 99% or less, and the density of chlorine contained in other than non-diamond carbon in the impurities is 0.5% or more and preferably 3.5% or less. The diameters of these diamond clusters are in the range of 30 nm or more and 500 nm or less, and their average diameter is in the range of 30 nm or more and 200 nm or less. Such polishing material is produced first by an explosion shock method to obtain diamond clusters and then removing the impurities such that density of non-diamond carbon contained in the impurities and density of chlorine contained in other than non-diamond carbon in the impurities become adjusted.

摘要翻译： 金刚石簇用作自由研磨颗粒的抛光材料，每个颗粒是一次粒径为20nm以下的人造金刚石颗粒和附着在这些金刚石颗粒周围的杂质的组合。 杂质中含有的非金刚石碳的密度在95％以上且99％以下的范围，杂质以外的非金刚石碳以外的氯的密度为0.5％以上，优选为3.5 ％ 或更少。 这些金刚石簇的直径在30nm以上且500nm以下的范围内，其平均直径为30nm以上且200nm以下的范围。 首先通过爆炸冲击法制造这种抛光材料，以获得金刚石簇，然后除去杂质，从而调节杂质中包含的非金刚石碳的密度和杂质中除非金刚石碳以外的其它的密度。

公开(公告)号：US08348721B2

公开(公告)日：2013-01-08

申请号：US12394461

申请日：2009-02-27

申请人： Yuji Horie ,  Tatsuya Tanifuji ,  Noriyuki Kumasaka

发明人： Yuji Horie ,  Tatsuya Tanifuji ,  Noriyuki Kumasaka

IPC分类号： B24B7/22

CPC分类号： G11B5/7315 ,  B24B21/04 ,  B24B37/04 ,  C03C19/00 ,  C03C21/002 ,  C03C2204/08 ,  G11B5/8404

摘要： A glass substrate for perpendicular magnetic recording, having a surface with an average surface roughness of 2.0Å or less and surface height variations of 1Å or less with wavelengths in the range of 0.05 mm-0.5 mm in both radial and circumferential directions, is produced by rotating a glass substrate, supplying polishing slurry containing a specified amount of abrading particles of artificial diamond on its surface, pressing a polishing tape on the surface and causing this polishing tape to travel in a direction opposite to the direction of rotation of the glass substrate.

摘要翻译： 用于垂直磁记录的玻璃基板，其具有平均表面粗糙度为2.0或更小的表面，以及在径向和圆周方向上的波长在0.05mm-0.5mm范围内的表面高度变化为1或更小的表面，其由 旋转玻璃基板，在其表面上供给含有规定量的人造金刚石研磨颗粒的研磨浆料，将研磨带压在表面上，使该研磨带沿与玻璃基板的旋转方向相反的方向行进。

公开(公告)号：US20090163117A1

公开(公告)日：2009-06-25

申请号：US12394461

申请日：2009-02-27

申请人： Yuji Horie ,  Tatsuya Tanifuji ,  Noriyuki Kumasaka

发明人： Yuji Horie ,  Tatsuya Tanifuji ,  Noriyuki Kumasaka

IPC分类号： B24B7/24 ,  B24B7/26

CPC分类号： G11B5/7315 ,  B24B21/04 ,  B24B37/04 ,  C03C19/00 ,  C03C21/002 ,  C03C2204/08 ,  G11B5/8404

摘要： A glass substrate for perpendicular magnetic recording, having a surface with an average surface roughness of 2.0 Å or less and surface height variations of 1 Å or less with wavelengths in the range of 0.05 mm-0.5 mm in both radial and circumferential directions, is produced by rotating a glass substrate, supplying polishing slurry containing a specified amount of abrading particles of artificial diamond on its surface, pressing a polishing tape on the surface and causing this polishing tape to travel in a direction opposite to the direction of rotation of the glass substrate.

摘要翻译： 制造用于垂直磁记录的玻璃基板，具有平均表面粗糙度为2.0或更小的表面，以及在径向和圆周方向上的波长在0.05mm-0.5mm的范围内的表面高度变化为1或更小的表面高度变化 通过旋转玻璃基板，在其表面上供给包含特定量的人造金刚石研磨颗粒的研磨浆料，将表面上的研磨带压制，并使该研磨带沿与玻璃基板的旋转方向相反的方向行进 。

公开(公告)号：US08049990B2

公开(公告)日：2011-11-01

申请号：US12241420

申请日：2008-09-30

申请人： Yuji Horie ,  Yasuyuki Yokota ,  Jun Tamura ,  Akihiro Sakamoto ,  Noriyuki Kumasaka

发明人： Yuji Horie ,  Yasuyuki Yokota ,  Jun Tamura ,  Akihiro Sakamoto ,  Noriyuki Kumasaka

IPC分类号： G11B5/41

CPC分类号： G11B23/505 ,  B08B1/02 ,  B08B7/0028 ,  B24D11/00

摘要： A cleaning tape has a base tape made of a synthetic resin and a cleaning layer formed on a surface of this base tape. The cleaning layer has a binding agent and a large number of spherical particles dispersed in the binding agent in a single particle layer. Such a cleaning tape is capable of removing very small unwanted protrusions and particles on the surface of a target object such as a magnetic hard disk without forming scratches.

摘要翻译： 清洁带具有由合成树脂制成的基带和形成在该基带的表面上的清洁层。 清洁层在单个颗粒层中具有粘合剂和分散在粘合剂中的大量球形颗粒。 这样的清洁带能够在没有形成划痕的情况下去除诸如磁性硬盘的目标物体表面上的非常小的不想要的突起和颗粒。