公开(公告)号：US07776793B2

公开(公告)日：2010-08-17

申请号：US12064942

申请日：2007-07-05

申请人： Takehiro Watanabe ,  Sanaki Horimoto ,  Takuya Nagamine ,  Yuji Horie

发明人： Takehiro Watanabe ,  Sanaki Horimoto ,  Takuya Nagamine ,  Yuji Horie

IPC分类号： H01L39/24

CPC分类号： B24B7/13

摘要： A polishing system and a method are presented for uniformly polishing efficiently at a fast rate the surface of a tape-like metallic base material of several hundred meters in length. The polishing system is provided not only with devices for causing the base material to travel continuously and applying a specified tension in the base material but also with a first polishing device for randomly polishing the target surface and a second polishing device for carrying out a final polishing on the target surface in the direction of travel of the base material. Polishing marks are formed in the direction of travel on the target surface by the final polishing.

摘要翻译： 提出了一种抛光系统和方法，用于以高达数百米长的带状金属基材的表面快速均匀地均匀研磨。 抛光系统不仅具有用于使基材连续行进并在基材中施加特定张力的装置，而且还提供用于随机抛光目标表面的第一抛光装置和用于进行最终抛光的第二抛光装置 在基材的行进方向上的目标表面上。 通过最终研磨，在目标表面上的行进方向上形成抛光标记。

公开(公告)号：US20090092023A1

公开(公告)日：2009-04-09

申请号：US12241420

申请日：2008-09-30

申请人： Yuji Horie ,  Yasuyuki Yokota ,  Jun Tamura ,  Akihiro Sakamoto ,  Noriyuki Kumasaka

发明人： Yuji Horie ,  Yasuyuki Yokota ,  Jun Tamura ,  Akihiro Sakamoto ,  Noriyuki Kumasaka

IPC分类号： G11B23/50 ,  B05D3/00

CPC分类号： G11B23/505 ,  B08B1/02 ,  B08B7/0028 ,  B24D11/00

摘要： A cleaning tape has a base tape made of a synthetic resin and a cleaning layer formed on a surface of this base tape. The cleaning layer has a binding agent and a large number of spherical particles dispersed in the binding agent in a single particle layer. Such a cleaning tape is capable of removing very small unwanted protrusions and particles on the surface of a target object such as a magnetic hard disk without forming scratches.

摘要翻译： 清洁带具有由合成树脂制成的基带和形成在该基带的表面上的清洁层。 清洁层在单个颗粒层中具有粘合剂和分散在粘合剂中的大量球形颗粒。 这样的清洁带能够在没有形成划痕的情况下去除诸如磁性硬盘的目标物体表面上的非常小的不想要的突起和颗粒。

公开(公告)号：US07374473B2

公开(公告)日：2008-05-20

申请号：US11605497

申请日：2006-11-27

申请人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

发明人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

IPC分类号： B24B29/00 ,  B24B21/04

CPC分类号： C09K3/1463 ,  B24B21/12 ,  B24B37/044 ,  C09G1/02

摘要： Texturing slurry for texturing a substrate for a magnetic hard disk is obtained by dispersing abrading particles of a specified kind in a specified kind of dispersant. The abrading particles include diamond clusters formed with artificial diamond particles with primary particle diameter of 20 nm or less and surrounded by impurities containing chlorine at a certain ratio. The cluster diameter and the average cluster diameter of the diamond clusters are each within a specified range. For texturing a substrate surface, the substrate is rotated, texturing slurry of this invention is supplied to the surface and a texturing tape of a specified kind is pressed against the substrate surface while it is caused to run.

摘要翻译： 通过将指定种类的研磨颗粒分散在指定种类的分散剂中，获得用于磁化硬盘基片的纹理化浆料。 研磨颗粒包括由一次粒径为20nm以下的人造金刚石颗粒形​​成的金刚石簇，并以一定比例包含含氯的杂质。 金刚石簇的簇直径和平均簇直径均在规定的范围内。 为了使衬底表面纹理化，衬底旋转，本发明的纹理浆料被提供给表面，并且指定类型的纹理带在其被运行时被压靠在衬底表面上。

公开(公告)号：US20070231245A1

公开(公告)日：2007-10-04

申请号：US11805458

申请日：2007-05-23

申请人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

发明人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

IPC分类号： C09K3/14 ,  B01J3/06

CPC分类号： G11B5/8404 ,  B24D11/00 ,  C01B32/25 ,  C09K3/1436 ,  C09K3/1463

摘要： Diamond clusters are used as a polishing material of free abrading particles, each being a combination of artificial diamond particles having primary particle diameters of 20 nm or less and impurities that are attached around these diamond particles. The density of non-diamond carbon contained in the impurities is in the range of 95% or more and 99% or less, and the density of chlorine contained in other than non-diamond carbon in the impurities is 0.5% or more and preferably 3.5% or less. The diameters of these diamond clusters are in the range of 30 nm or more and 500 nm or less, and their average diameter is in the range of 30 nm or more and 200 nm or less. Such polishing material is produced first by an explosion shock method to obtain diamond clusters and then removing the impurities such that density of non-diamond carbon contained in the impurities and density of chlorine contained in other than non-diamond carbon in the impurities become adjusted.

摘要翻译： 金刚石簇用作自由研磨颗粒的抛光材料，每个颗粒是一次粒径为20nm以下的人造金刚石颗粒和附着在这些金刚石颗粒周围的杂质的组合。 杂质中含有的非金刚石碳的密度在95％以上且99％以下的范围，杂质以外的非金刚石碳以外的氯的密度为0.5％以上，优选为3.5 ％ 或更少。 这些金刚石簇的直径在30nm以上且500nm以下的范围内，其平均直径为30nm以上且200nm以下的范围。 首先通过爆炸冲击法制造这种抛光材料，以获得金刚石簇，然后除去杂质，从而调节杂质中包含的非金刚石碳的密度和杂质中除非金刚石碳以外的其它的密度。

公开(公告)号：US20070123153A1

公开(公告)日：2007-05-31

申请号：US11605497

申请日：2006-11-27

申请人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

发明人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

IPC分类号： B24B7/30

CPC分类号： C09K3/1463 ,  B24B21/12 ,  B24B37/044 ,  C09G1/02

摘要： Texturing slurry for texturing a substrate for a magnetic hard disk is obtained by dispersing abrading particles of a specified kind in a specified kind of dispersant. The abrading particles include diamond clusters formed with artificial diamond particles with primary particle diameter of 20 nm or less and surrounded by impurities containing chlorine at a certain ratio. The cluster diameter and the average cluster diameter of the diamond clusters are each within a specified range. For texturing a substrate surface, the substrate is rotated, texturing slurry of this invention is supplied to the surface and a texturing tape of a specified kind is pressed against the substrate surface while it is caused to run.

摘要翻译： 通过将指定种类的研磨颗粒分散在指定种类的分散剂中，获得用于磁化硬盘基片的纹理化浆料。 研磨颗粒包括由一次粒径为20nm以下的人造金刚石颗粒形​​成的金刚石簇，并以一定比例包含含氯的杂质。 金刚石簇的簇直径和平均簇直径均在规定的范围内。 为了使衬底表面纹理化，衬底旋转，本发明的纹理浆料被提供给表面，并且指定类型的纹理带在其被运行时被压靠在衬底表面上。

公开(公告)号：US07134952B2

公开(公告)日：2006-11-14

申请号：US10666987

申请日：2003-09-19

申请人： Yuji Horie ,  Hiromitsu Okuyama ,  Kazuei Yamaguchi

发明人： Yuji Horie ,  Hiromitsu Okuyama ,  Kazuei Yamaguchi

IPC分类号： B32B3/10 ,  B24D11/00

CPC分类号： B24B37/22 ,  Y10T428/24149 ,  Y10T428/24314

摘要： A polishing cloth has a surface layer stacked over a base material. The surface layer is made of a foamed layer and a non-foamed layer, the foamed layer including air bubble cells and the non-foamed layer having an externally exposed surface where linear cuts are formed. These linear cuts reach the air bubble cells such that the air bubble cells communicate with the exterior through the linear cuts. These linear cuts are controlled to be 10 μm or less in length.

摘要翻译： 抛光布具有层叠在基材上的表层。 表面层由发泡层和非发泡层制成，发泡层包括气泡泡孔，非发泡层具有形成线形切口的外露表面。 这些线性切口到达气泡单元，使得气泡单元通过线性切口与外部连通。 这些线性切割的长度控制在10um以下。

公开(公告)号：US20050225001A1

公开(公告)日：2005-10-13

申请号：US11114758

申请日：2005-04-25

申请人： Yuji Horie ,  Hiromitsu Okuyama ,  Naoyuki Hamada

发明人： Yuji Horie ,  Hiromitsu Okuyama ,  Naoyuki Hamada

IPC分类号： B24B37/20 ,  B24B37/24 ,  B24D3/00 ,  B24D3/28 ,  B24D3/32 ,  B24D11/00 ,  B29C33/42 ,  B29C41/00 ,  B29C41/24 ,  B29C44/00 ,  C09D5/00 ,  C09D175/04

CPC分类号： B24B37/24 ,  B24D3/001 ,  B24D3/28 ,  B24D3/32 ,  B29C33/424 ,  B29C41/003 ,  B29C44/005 ,  Y10T428/249953

摘要： A foamed polishing sheet for use in a free particle polishing method using abrading particles with average particle diameter less than 0.1 μm is produced by applying a foaming paint of a foaming resin on a surface of a form-providing film such as a plastic film, foaming the foaming paint by a wet foaming method to form a foamed sheet on the surface of the form-providing film, and peeling off the foamed sheet from the form-providing film so as to form a polishing surface on the foamed sheet having the same shape as the surface of the form-providing film.

摘要翻译： 使用平均粒径小于0.1μm的研磨粒子的自由粒子研磨方法中使用的泡沫抛光片是通过将发泡树脂的发泡性涂料涂布在诸如塑料膜的成形膜的表面上而制成的 通过湿发泡法形成发泡涂料，在形成膜的表面上形成发泡片材，并且从成形膜剥离发泡片材，以在具有相同形状的发泡片材上形成研磨表面 作为形式提供膜的表面。

公开(公告)号：US08148301B2

公开(公告)日：2012-04-03

申请号：US12438601

申请日：2007-08-24

申请人： Sanaki Horimoto ,  Takuya Nagamine ,  Takehiro Watanabe ,  Fumi Murokawa ,  Yuji Horie ,  Noriyuki Kumasaka ,  Masahiro Hosoi

发明人： Sanaki Horimoto ,  Takuya Nagamine ,  Takehiro Watanabe ,  Fumi Murokawa ,  Yuji Horie ,  Noriyuki Kumasaka ,  Masahiro Hosoi

IPC分类号： H01L39/24

CPC分类号： B24B7/13 ,  B24B21/00 ,  B24B37/04 ,  H01L39/2454 ,  Y10S505/813

摘要： An oxide superconductor member is composed of a tape-shaped substrate, an intermediate layer formed on this substrate and an oxide superconductor thin film layer formed on this intermediate layer. A surface of the tape-shaped substrate is polished by continuously running the tape-shaped substrate. The polishing step includes initial polishing process and finishing process which are carried out such that the average surface roughness Ra of the substrate becomes 2 nanometers or less and the in-plane directionality of the intermediate layer becomes 5° or less after the polishing step.

摘要翻译： 氧化物超导体构件由带状基板，形成在该基板上的中间层和形成在该中间层上的氧化物超导体薄膜层构成。 通过连续运行带状基板来对带状基板的表面进行抛光。 抛光步骤包括初步抛光工艺和精加工工艺，其进行使得在抛光步骤之后，基板的平均表面粗糙度Ra变为2纳米或更小，并且中间层的面内方向性变为5°或更小。

公开(公告)号：US07857876B2

公开(公告)日：2010-12-28

申请号：US12420557

申请日：2009-04-08

申请人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

发明人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

IPC分类号： B24D3/02 ,  C09C1/68 ,  C09K3/14 ,  H01L21/302 ,  C09G1/02 ,  B24B1/00 ,  B24B7/19

CPC分类号： G11B5/8404 ,  B24D11/00 ,  C01B32/25 ,  C09K3/1436 ,  C09K3/1463

摘要： Diamond clusters are used as a polishing material of free abrading particles, each being a combination of artificial diamond particles having primary particle diameters of 20 nm or less and impurities that are attached around these diamond particles. The density of non-diamond carbon contained in the impurities is in the range of 95% or more and 99% or less, and the density of chlorine contained in other than non-diamond carbon in the impurities is 0.5% or more and preferably 3.5% or less. The diameters of these diamond clusters are in the range of 30 nm or more and 500 nm or less, and their average diameter is in the range of 30 nm or more and 200 nm or less. Such polishing material is produced first by an explosion shock method to obtain diamond clusters and then removing the impurities such that density of non-diamond carbon contained in the impurities and density of chlorine contained in other than non-diamond carbon in the impurities become adjusted.

摘要翻译： 金刚石簇用作自由研磨颗粒的抛光材料，每个颗粒是一次粒径为20nm以下的人造金刚石颗粒和附着在这些金刚石颗粒周围的杂质的组合。 杂质中含有的非金刚石碳的密度在95％以上且99％以下的范围，杂质以外的非金刚石碳以外的氯的密度为0.5％以上，优选为3.5 ％ 或更少。 这些金刚石簇的直径在30nm以上且500nm以下的范围内，其平均直径为30nm以上且200nm以下的范围。 首先通过爆炸冲击法制造这种抛光材料，以获得金刚石簇，然后除去杂质，从而调节杂质中包含的非金刚石碳的密度和杂质中除非金刚石碳以外的其它的密度。

公开(公告)号：US07811972B2

公开(公告)日：2010-10-12

申请号：US12194346

申请日：2008-08-19

申请人： Yuji Horie ,  Noriyuki Kumasaka ,  Sanaki Horimoto

发明人： Yuji Horie ,  Noriyuki Kumasaka ,  Sanaki Horimoto

IPC分类号： H01L39/24 ,  H01L39/12

CPC分类号： B24B7/13 ,  B24B37/042 ,  H01L39/2454 ,  Y10S505/813

摘要： A target surface of a tape-shaped substrate of an oxide superconductor with an intermediate layer formed on this target surface and an oxide superconductor thin film is polished by causing the tape-shaped substrate to continuously run. The polishing step includes an initial polishing process for carrying out random polishing of the target surface and a finishing process that is carried out after the initial polishing process for forming grooves on the target surface along the running direction of the substrate. The intermediate layer has an in-plane directionality of 7° or less. The tape-shaped substrate is fabricated by rolling nickel, a nickel alloys or stainless steel.

摘要翻译： 通过使带状基板连续运行来研磨在该目标表面上形成有中间层的氧化物超导体的带状基板的目标表面和氧化物超导体薄膜。 抛光步骤包括用于进行目标表面的随机抛光的初始抛光工艺和在初始抛光工艺之后进行的精加工工艺，用于沿着基板的运行方向在目标表面上形成凹槽。 中间层的面内方向性为7°以下。 带状基材通过轧制镍，镍合金或不锈钢制成。