Semiconductor integrated circuit device
    2.
    发明授权
    Semiconductor integrated circuit device 失效
    半导体集成电路器件

    公开(公告)号:US5416366A

    公开(公告)日:1995-05-16

    申请号:US971186

    申请日:1992-11-03

    申请人: Yukinobu Adachi

    发明人: Yukinobu Adachi

    CPC分类号: H03K19/00384 H03K17/145

    摘要: Fluctuation of the minimum voltage value allowing determination of the "H" level of an input signal and of maximum voltage value allowing determination of the "L" level of the input signal dependent on the supply voltage is suppressed, in order to enlarge operation margin. A semiconductor integrated circuit device includes a P channel transistor and an N channel transistor constituting a CMOS inverter, an N channel transistor connected in parallel to N channel transistor, and a plurality of N channel transistors for applying a voltage provided by lowering the supply voltage to the gate electrode of N channel transistor, in which a plurality of N channel transistor are connected in series.

    摘要翻译: 抑制了允许确定输入信号的“H”电平的最小电压值的波动和允许根据电源电压确定输入信号的“L”电平的最大电压值,以便放大操作余量。 半导体集成电路器件包括P沟道晶体管和构成CMOS反相器的N沟道晶体管,N沟道晶体管并联连接到N沟道晶体管,以及多个N沟道晶体管,用于将通过降低电源电压而提供的电压施加到 N沟道晶体管的栅电极,其中多个N沟道晶体管串联连接。

    RF SHUTTER
    3.
    发明申请
    RF SHUTTER 有权
    射频快门

    公开(公告)号:US20080286463A1

    公开(公告)日:2008-11-20

    申请号:US12040298

    申请日:2008-02-29

    IPC分类号: C23C16/453

    摘要: The present invention generally comprises an RF shutter assembly for use in a plasma processing apparatus. The RF shutter assembly may reduce the amount of plasma creep below the substrate and shadow frame during processing, thereby reducing the amount of deposition that occurs on undesired surfaces. By reducing the amount of deposition on undesired surfaces, particle flaking and thus, substrate contamination may be reduced.

    摘要翻译: 本发明通常包括用于等离子体处理装置的RF快门组件。 RF快门组件可以在处理期间减少基板和阴影框架下方的等离子体蠕变的量,从而减少在不期望的表面上发生的沉积量。 通过减少不期望的表面上的沉积量,可能会降低颗粒剥落,从而可能降低底物污染。

    RF shutter
    4.
    发明授权
    RF shutter 有权
    射频快门

    公开(公告)号:US08281739B2

    公开(公告)日:2012-10-09

    申请号:US12040298

    申请日:2008-02-29

    IPC分类号: C23C16/00 H01L21/00

    摘要: The present invention generally comprises an RF shutter assembly for use in a plasma processing apparatus. The RF shutter assembly may reduce the amount of plasma creep below the substrate and shadow frame during processing, thereby reducing the amount of deposition that occurs on undesired surfaces. By reducing the amount of deposition on undesired surfaces, particle flaking and thus, substrate contamination may be reduced.

    摘要翻译: 本发明通常包括用于等离子体处理装置的RF快门组件。 RF快门组件可以在处理期间减少基板和阴影框架下方的等离子体蠕变的量,从而减少在不期望的表面上发生的沉积量。 通过减少不期望的表面上的沉积量,可能会降低颗粒剥落,从而可能降低底物污染。

    Semiconductor storage device requiring short time for program voltage to
rise
    6.
    发明授权
    Semiconductor storage device requiring short time for program voltage to rise 失效
    半导体存储器件需要短时间的编程电压上升

    公开(公告)号:US5631867A

    公开(公告)日:1997-05-20

    申请号:US456328

    申请日:1995-06-01

    CPC分类号: G11C5/147 G11C5/145

    摘要: An external power source voltage Vcc rises until it exceeds the threshold voltage Vth of an NMOS transistor diode-connected between the external power source (voltage Vcc) and an internal boosted power source (voltage Vpp), whereupon the NMOS transistor is turned on, supplying the internal boosted power source with a voltage (Vcc-Vth) until the power source voltage Vcc reaches its final value. And when the internal reset signal ZPOR expires, the internal boosted power source generating circuit is started to operate so that the internal boost source voltage Vpp is boosted to an intended level Vpp. As a result, when the power is turned on, early stabilization of the boosted power source voltage is realized in a semiconductor storage device.

    摘要翻译: 外部电源电压Vcc上升直到其超过连接在外部电源(电压Vcc)和内部升压电源(电压Vpp)之间的NMOS晶体管二极管的阈值电压Vth,于是NMOS晶体管导通, 具有电压(Vcc-Vth)的内部升压电源,直到电源电压Vcc达到其最终值。 并且当内部复位信号ZPOR期满时,内部升压电源发生电路开始工作,使得内部升压电源电压Vpp升压到预期电平Vpp。 结果,当电源接通时,在半导体存储装置中实现升压电源电压的早期稳定。

    Timing coinciding circuit simultaneously supplying two power supply
voltages applied in different timing
    7.
    发明授权
    Timing coinciding circuit simultaneously supplying two power supply voltages applied in different timing 失效
    同步重合电路同时提供不同时序施加的两个电源电压

    公开(公告)号:US5287320A

    公开(公告)日:1994-02-15

    申请号:US846115

    申请日:1992-03-05

    申请人: Yukinobu Adachi

    发明人: Yukinobu Adachi

    摘要: An improved DRAM includes a main circuit and an output driver circuit, respectively, energized by externally applied two power supply voltages. The DRAM includes a timing coinciding circuit for making the supply-timing of the two power supply voltages to the circuits coincided to each other. When power supply voltage only is applied, output driver circuit has a tendency to consume an excessive penetrating current in response to an unstable output signal provided from main circuit. Even though the two power supply voltages are applied in different timing, the excessive current consumption in the output driving circuit is avoided, since timing coinciding circuit simultaneously starts and ends the supply of output power supply voltages.

    摘要翻译: 改进的DRAM包括分别由外部施加的两个电源电压激励的主电路和输出驱动器电路。 DRAM包括用于使电路的两个电源电压的电源定时彼此一致的定时一致电路。 当仅施加电源电压时,输出驱动电路响应于从主电路提供的不稳定的输出信号而具有消耗过大的穿透电流的趋势。 即使以不同的时刻施加了两个电源电压,由于定时重合电路同时开始并且结束输出电源电压的供给,因此避免了输出驱动电路中的过度的电流消耗。