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    IMPRINT LITHOGRAPHY APPARATUS
    1.
    发明申请
    IMPRINT LITHOGRAPHY APPARATUS 有权

    公开(公告)号：US20110008483A1

    公开(公告)日：2011-01-13

    申请号：US12821806

    申请日：2010-06-23

    申请人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

    发明人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

    IPC分类号： B29C59/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

    摘要： An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.

    摘要翻译： 公开了一种压印光刻设备，其包括远离衬底保持器并延伸穿过衬底保持器的结构，并且使得压印模板布置在使用中位于结构和衬底保持器之间，其中结构具有一个或 更多的线阵列或一个或多个编码器，并且衬底或衬底保持器和压印模板具有对应的一个或多个编码器，其面向一个或多个线阵列或一个或多个面阵列阵列 朝向一个或多个编码器中的一个或多个，并且配置确定装置被配置为确定衬底或衬底保持器与结构之间的相对配置，和/或压印模板布置和结构之间的相对配置，和/ 或压印模板布置和基板或基板保持器之间的相对配置。

    Stage system calibration method, stage system and lithographic apparatus comprising an encoder measurement system to measure position of stage system
    10.
    发明授权
    Stage system calibration method, stage system and lithographic apparatus comprising an encoder measurement system to measure position of stage system 有权
    舞台系统校准方法，舞台系统和光刻设备，包括测量舞台系统位置的编码器测量系统

    公开(公告)号：US08446567B2

    公开(公告)日：2013-05-21

    申请号：US12418089

    申请日：2009-04-03

    申请人： Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch

    发明人： Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70775 ,  G03F7/70516

    摘要： A calibration method to calibrate an encoder position measurement system of a stage, the encoder position measurement system including an encoder grid and at least two sensor heads cooperating with the encoder grid, each sensor head providing a sensor head output signal showing a position sensitivity in a horizontal and a vertical direction, the method including a) moving the stage such that the sensor heads are moved with respect to the encoder grid, or vice versa; b) during the moving, measuring the position of the stage with respect to the encoder grid by the two sensor heads; c) determining a vertical position data map from the sensor head output signals of the dual sensor heads; d) calculating a horizontal position data map from the vertical position data map; and e) calibrating the encoder position measurement system applying the calculated horizontal position data map.

    摘要翻译： 一种用于校准级的编码器位置测量系统的校准方法，编码器位置测量系统包括编码器网格和与编码器网格协作的至少两个传感器头，每个传感器头提供传感器头部输出信号，其中示出了位置灵敏度 水平和垂直方向，所述方法包括：a）移动所述台，使得所述传感器头相对于所述编码器格栅移动，反之亦然; b）在移动期间，通过两个传感器头测量相对于编码器网格的平台的位置; c）从双传感器头的传感器头输出信号确定垂直位置数据图; d）从垂直位置数据图计算水平位置数据图; 以及e）校准应用计算出的水平位置数据图的编码器位置测量系统。