Abstract:
The invention relates to a silica glass compound having improved physical and chemical properties. In one embodiment, the present invention relates to a silica glass having a desirable brittleness in combination with a desirable density while still yielding a glass composition having a desired hardness and desired strength relative to other glasses. In another embodiment, the present invention relates to a silica glass composition that contains at least about 85 mole percent silicon dioxide and up to about 15 mole percent of one or more dopants selected from F, B, N, Al, Ge, one or more alkali metals (e.g., Li, Na, K, etc.), one or more alkaline earth metals (e.g., Mg, Ca, Sr, Ba, etc.), one or more transition metals (e.g., Ti, Zn, Y, Zr, Hf, etc.), one or more lanthanides (e.g., Ce, etc.), or combinations of any two or more thereof.
Abstract:
According to embodiments, an optical fiber may include a core portion comprising an outer radius rC and a maximum relative refractive index ΔCmax. A cladding may surround the core portion and include a low-index trench and an outer cladding. The low index trench may surround the core portion and includes an outer radius rT and relative refractive index ΔT. The outer cladding may surround and be in direct contact with the low-index trench. The outer cladding may be formed from silica-based glass comprising greater than 1.0 wt. % bromine and has a relative refractive index ΔOC, wherein Δcmas>ΔOC>ΔT. The optical fiber may have a cable cutoff of less than or equal to 1530 nm. An attenuation of the optical fiber may be less than or equal to 0.185 dB/km at a wavelength of 1550 nm.
Abstract:
A co-doped optical fiber is provided having an attenuation of less than about 0.17 dB/km at a wavelength of 1550 nm. The fiber includes a core in the fiber having a graded refractive index profile with an alpha of greater than 5. The fiber also includes a cladding in the fiber that surrounds the core addition, the core includes silica that is co-doped with two or more halogens.
Abstract:
A method for processing a silica-containing soot article includes exposing a silica-containing soot article to a removal gas including bromine such that the removal gas removes chlorine from the soot article.
Abstract:
The invention relates to a silica glass compound having improved physical and chemical properties. In one embodiment, the present invention relates to a silica glass having a desirable brittleness in combination with a desirable density while still yielding a glass composition having a desired hardness and desired strength relative to other glasses. In another embodiment, the present invention relates to a silica glass composition that contains at least about 85 mole percent silicon dioxide and up to about 15 mole percent of one or more dopants selected from F, B, N, Al, Ge, one or more alkali metals (e.g., Li, Na, K, etc.), one or more alkaline earth metals (e.g., Mg, Ca, Sr, Ba, etc.), one or more transition metals (e.g., Ti, Zn, Y, Zr, Hf, etc.), one or more lanthanides (e.g., Ce, etc.), or combinations of any two or more thereof.
Abstract:
The present invention relates to a TiO2-containing quartz glass substrate, having a TiO2 concentration of from 3 to 8% by mass, an OH concentration of 50 ppm by mass or less, and an internal transmittance T365 per 1 mm thickness at a wavelength of 365 nm of 95% or more.
Abstract:
The invention concerns a quartz glass body for an optical component for the transmission of UV radiation with a wavelength of 250 nm and less, especially for a wavelength of 157 nm, as well as a process for the manufacture of the quartz glass body where fine quartz glass particles are formed by flame hydrolysis of a silicon compound, deposited and vitrified. Suitability of a quartz glass as represented by high base transmission and radiation resistance depends on structural properties caused by local stoichiometric deviations, and on the chemical composition. The quartz glass body according to the inventions is distinguished by a uniform base transmission (relative change of base transmission ≦1%) in the wavelength range from 155 nm to 250 nm (radiation penetration depth of 10 mm) of at least 80%, a low OH content (less than 10 ppm by weight) and a glass structure substantially free from oxygen defect centers. A quartz glass body of this kind is manufactured by a process which allows bulk embedding of hydrogen or oxygen into the glass network in that at least a two stage heat treatment takes place at temperatures ranging from 850° C. to 1600° C. before the vitrification, the last stage comprising sintering at a temperature between 1300° C. and 1600° C. in an atmosphere containing hydrogen or oxygen, or a nonflammable mixture of these substances.
Abstract:
A nonlinear optical silica material mainly consisting of SiO2—GeO2 to which hydrogen or halogen element X is added. Oxygen bonded to Ge contained in the nonlinear optical silica material is replaced by H or X, and one Ge has two Ge—O bonds and one Ge—H (or Ge—X) bond at Ge· points where nonlinearity is exhibited in the silica material. The Ge—H (or Ge—X) bond does not relate to a crystal network, so that when the polarity is oriented in order to exhibit nonlinearity at Ge·, an electric field to be applied can be lowered, and when a optical semiconductor hybrid element or the like is produced, other portions of the semiconductor elements can be prevented from being broken or degraded in performance. An insulating film can be interposed between the semiconductor substrate and the nonlinear optical silica film to prevent undesired impurities from dispersing into the semiconductor substrate and other elements and preventing a defect from being caused in the crystal of the substrate due to the silica film.