公开(公告)号：US20180019119A1

公开(公告)日：2018-01-18

申请号：US15650140

申请日：2017-07-14

申请人： Applied Materials Inc.

发明人： Eric J. Bergman ,  John L. Klocke ,  Paul McHugh ,  Stuart Crane ,  Richard W. Plavidal

IPC分类号： H01L21/02 ,  F26B21/14 ,  B08B7/00

CPC分类号： H01L21/02101 ,  B08B7/0021 ,  B08B7/0035 ,  F26B5/005 ,  F26B21/145 ,  H01L21/02046 ,  H01L21/02054 ,  H01L21/02057 ,  H01L21/02082 ,  H01L21/02096 ,  H01L21/02661

摘要： Methods of drying a semiconductor substrate may include applying a drying agent to a semiconductor substrate, where the drying agent wets the semiconductor substrate. The methods may include heating a chamber housing the semiconductor substrate to a temperature above an atmospheric pressure boiling point of the drying agent until a vapor-liquid equilibrium of the drying agent within the chamber has been reached. The methods may further include venting the chamber, where the venting vaporizes the liquid phase of the drying agent from the semiconductor substrate.

公开(公告)号：US20160243461A1

公开(公告)日：2016-08-25

申请号：US15000532

申请日：2016-01-19

申请人： SCREEN Holdings Co., Ltd.

发明人： Yosuke HANAWA ,  Katsuhiko MIYA

IPC分类号： B01D5/00 ,  B01D53/26 ,  F26B5/00 ,  B01D1/00

CPC分类号： F26B5/00 ,  B01D53/263 ,  B01D53/265 ,  B01D53/268 ,  B01D2256/24 ,  F26B21/145

摘要： When a substrate on which a fine pattern is formed is dried with vapor, prevention of collapse of the pattern due to water originally contained in IPA to be stored has been a problem to be solved. A mixed liquid stored in a mixed liquid storage is vaporized to generate mixed vapor containing the IPA and water (water vapor). Then, a vapor dewatering unit connected to a vapor supply pipe through which the mixed vapor is fed removes water in the mixed vapor. This can reduce the concentration of water originally contained in the IPA to be stored before the IPA is supplied to the substrate, thereby suppressing collapse of the pattern.

摘要翻译： 当形成微细图案的基板用蒸气干燥时，防止由于最初包含在待存储的IPA中的水所引起的图案的崩溃是一个需要解决的问题。 将储存在混合液体储存器中的混合液体蒸发以产生含有IPA和水（水蒸气）的混合蒸汽。 然后，与蒸气供给管连接的蒸气脱水装置，混合蒸气通过该蒸气供给管除去混合蒸汽中的水。 这可以降低在将IPA提供给基板之前要储存的IPA中最初含有的水的浓度，从而抑制图案的崩溃。

公开(公告)号：US5653045A

公开(公告)日：1997-08-05

申请号：US484921

申请日：1995-06-07

申请人： Gary W. Ferrell

发明人： Gary W. Ferrell

IPC分类号： B08B3/10 ,  B08B3/12 ,  F26B5/00 ,  F26B21/14 ,  H01L21/00 ,  H01L21/306

CPC分类号： H01L21/02052 ,  B08B3/102 ,  B08B3/12 ,  F26B21/145 ,  F26B5/005 ,  H01L21/67028

摘要： An apparatus and method for drying single or multiple parts or objects wherein the apparatus uses a drying chamber for containing said object or objects, said drying chamber having a closeable entryway for providing access to said drying chamber, the use of a sonic head disposed in said drying chamber attached to a source of drying liquid and an adjustable supply and drain attached to said drying chamber for introducing and removing said drying fluid to and from said drying chamber.

摘要翻译： 一种用于干燥单个或多个部件或物体的设备和方法，其中所述设备使用用于容纳所述物体的干燥室，所述干燥室具有用于提供通向所述干燥室的可密闭入口，使用设置在所述干燥室中的声波头 干燥室，其连接到干燥液源，以及连接到所述干燥室的可调节的供应和排出物，用于将所述干燥流体引入和从所述干燥室中排出。

公开(公告)号：US5535525A

公开(公告)日：1996-07-16

申请号：US214481

申请日：1994-03-17

申请人： Keith R. Gardner

发明人： Keith R. Gardner

IPC分类号： F26B21/14 ,  F26B21/06

CPC分类号： F26B21/145

摘要： An Isopropyl Alcohol (IPA) tank vapor/liquid phase separator for collecting liquid while still allowing for efficient vapor flow in an IPA tank includes a first row and a second row of spaced-apart coplanar parallel catch trays. Vapor flows upwardly through the openings between the catch trays. The catch trays are arranged so that contaminated IPA condensate falls into either the first or second row of catch trays. In one embodiment, both of the catch trays are upright V-shaped or upright semi-circular-shaped. In another embodiment the catch trays are formed as plates with staggered holes formed therein for upward passage of vapor and for downward collection of condensate.

摘要翻译： 用于收集液体同时允许在IPA罐中有效蒸汽流动的异丙醇（IPA）罐蒸汽/液相分离器包括第一排和第二排间隔开的共面平行捕集盘。 蒸汽向上流过捕获盘之间的开口。 捕集托盘布置成使被污染的IPA冷凝物落入第一或第二排捕集盘中。 在一个实施例中，两个捕获盘是直立的V形或直立的半圆形的。 在另一个实施例中，捕获托盘形成为具有形成在其中的交错孔的板，用于向上通过蒸气并用于向下收集冷凝物。

公开(公告)号：US5431179A

公开(公告)日：1995-07-11

申请号：US197285

申请日：1994-02-16

申请人： Takanori Miyazaki ,  Kazuhiko Kobayashi ,  Yuuji Kamikawa ,  Chihaya Tashima

发明人： Takanori Miyazaki ,  Kazuhiko Kobayashi ,  Yuuji Kamikawa ,  Chihaya Tashima

IPC分类号： F26B21/14 ,  F26B25/00 ,  H01L21/00 ,  H01L21/304 ,  H01L21/677 ,  B08B13/00

CPC分类号： H01L21/67034 ,  F26B21/145 ,  F26B25/009 ,  H01L21/67781 ,  Y10S134/902 ,  Y10S203/07

摘要： A wafer drying apparatus incorporated in a semiconductor wafer cleaning system includes a bath for storing IPA. A heater for generating an IPA vapor is arranged on the bath. The bath is surrounded by a housing. The housing has opening portions at three positions. The opening portions are opened/closed by shutters. A sensor for detecting a fire and a nozzle for discharging CO.sub.2 gas into the bath are arranged around the bath. A plurality of wafers are held by a chuck of a convey robot and are conveyed from the outside of the housing into the housing via the opening portions. When a fire is detected by the sensor, the chuck immediately retreats from the housing, and the shutters are closed. Signals for closing the shutters are transmitted to shutter drive sources again 10 seconds after the fire is detected, and discharging of CO.sub.2 gas is started 20 seconds after the fire is detected.

摘要翻译： 结合在半导体晶片清洁系统中的晶片干燥装置包括用于存储IPA的浴槽。 用于产生IPA蒸汽的加热器布置在浴缸上。 浴室被房屋包围。 壳体在三个位置具有开口部分。 开口部分由百叶窗打开/关闭。 用于检测火的传感器和用于将CO 2气体排放到浴中的喷嘴布置在浴周围。 多个晶片由传送机器人的卡盘保持，并且经由开口部分从壳体的外部输送到壳体中。 当传感器检测到火灾时，卡盘立即从壳体退出，并且快门关闭。 在检测到火灾后10秒钟，关闭快门的信号再次传送到快门驱动源，并且在检测到火灾20秒后开始排放CO2气体。

公开(公告)号：US4777970A

公开(公告)日：1988-10-18

申请号：US108555

申请日：1987-10-14

申请人： Masaki Kusuhara

发明人： Masaki Kusuhara

IPC分类号： B01D12/00 ,  C23G5/04 ,  F26B21/14 ,  H01L21/00 ,  B08B7/04

CPC分类号： H01L21/67034 ,  B01D12/00 ,  C23G5/04 ,  F26B21/145 ,  Y10S134/902

摘要： A vapor drying apparatus for semiconductor wafers, which is capable of preventing dust particles from entering the interior of the vapor drying apparatus incorporating therein a water washing part and a vapor drying part for a semiconductor wafer and, at the same time, thoroughly removing from the surface of a vapor dried semiconductor wafer the vapor cleaner adhering in the form of film or in a molecular thickness to the surface or an organic substance contained in the cleaner thereby bringing the surface of the semiconductor wafer to an ideally cleaned and dried state.

公开(公告)号：US4736758A

公开(公告)日：1988-04-12

申请号：US821545

申请日：1986-01-21

申请人： Masaki Kusuhara

发明人： Masaki Kusuhara

IPC分类号： B01D12/00 ,  C23G5/04 ,  F26B21/14 ,  H01L21/00 ,  B08B7/04 ,  B08B15/02

CPC分类号： H01L21/67034 ,  B01D12/00 ,  C23G5/04 ,  F26B21/145 ,  Y10S134/902

摘要： A vapor drying apparatus for semiconductor wafers, which is capable of preventing dust particles from entering the interior of the vapor drying apparatus incorporating therein a water washing part and a vapor drying part for a semiconductor wafer and, at the same time, thoroughly removing from the surface of a vapor dried semiconductor wafer the vapor cleaner adhering in the form of film or in a molecular thickness to the surface of an organic substance contained in the cleaner thereby bring the surface of the semiconductor wafer to an ideally cleaned and dried state.

摘要翻译： 一种用于半导体晶片的蒸汽干燥装置，其能够防止灰尘颗粒进入其中装有水洗部分的蒸气干燥装置的内部和用于半导体晶片的蒸气干燥部分，并且同时从 蒸气干燥的半导体晶片的表面，蒸气清洁剂以膜的形式或分子厚度粘附到包含在清洁器中的有机物质的表面，从而使半导体晶片的表面达到理想的清洁和干燥状态。

公开(公告)号：US20120260517A1

公开(公告)日：2012-10-18

申请号：US13089186

申请日：2011-04-18

申请人： Eric Lenz ,  Mike Ravkin ,  Katrina Mikhaylichenko

发明人： Eric Lenz ,  Mike Ravkin ,  Katrina Mikhaylichenko

IPC分类号： F26B3/00

CPC分类号： F26B3/04 ,  F26B21/145 ,  H01L21/02057 ,  H01L21/67034

摘要： Apparatuses and methods for drying a surface of a substrate includes a proximity drying head having a head body that includes a process surface configured to be disposed opposite a surface of a substrate when present. The process surface includes a first region, a second region and a third region. The first region is defined at a leading edge of the head body and includes a cavity region that is recessed into the head body. The cavity region includes a plurality of inlet ports that are used to introduce a vapor fluid to the cavity region. The second region is disposed proximate to the surface of the substrate when present and is located beside the first region. The third region is disposed proximate to the surface of the substrate when present and is located beside the second region. A plurality of vacuum ports is defined at the interface of the second region and the third region. The third region includes a plurality of angled inlet ports that are directed toward the second region. A method for performing a drying operation includes applying heated isopropyl alcohol as vapor to a wafer surface in the first region and heating the underside region of the wafer corresponding to the first region. Heated Nitrogen is injected to the surface of the wafer in the third region. The deionized water and isopropyl alcohol are removed from the surface of the wafer through the vacuum ports along with the Nitrogen so as to leave the wafer surface substantially dry.

摘要翻译： 用于干燥基材表面的装置和方法包括：接近干燥头，其具有头部本体，头部主体包括被配置为当存在时与基底的表面相对设置的处理表面。 处理表面包括第一区域，第二区域和第三区域。 第一区域被限定在头部主体的前缘，并且包括凹入到头部本体中的空腔区域。 空腔区域包括多个入口端口，用于将蒸汽流体引入空腔区域。 当存在时，第二区域靠近衬底的表面设置并且位于第一区域旁边。 当存在时，第三区域靠近基板的表面设置并且位于第二区域旁边。 在第二区域和第三区域的界面处限定多个真空口。 第三区域包括指向第二区域的多个成角度的入口端口。 执行干燥操作的方法包括将加热的异丙醇作为蒸气施加到第一区域中的晶片表面并加热与第一区域相对应的晶片的下侧区域。 在第三区域中将加热的氮气注入晶片的表面。 去离子水和异丙醇通过真空端口与氮气一起从晶片表面除去，以使晶片表面基本上干燥。

公开(公告)号：US6108927A

公开(公告)日：2000-08-29

申请号：US174406

申请日：1998-10-19

申请人： Helmut Strzala

发明人： Helmut Strzala

IPC分类号： B01D3/10 ,  B01D5/00 ,  F26B5/04 ,  F26B21/14 ,  F26B21/06

CPC分类号： B01D3/10 ,  B01D5/0036 ,  F26B21/145 ,  F26B5/04

摘要： Equipment provides more rapid drying of heating parts comprising hygroscopic, electric insulation made of cellulose and/or plastics. At least two condensers are present, one being used when heating the parts and the other in the distillation stage. As a result removal by distillation is possible any time during heating and during the time intervals when heating is interrupted and the pressure-dropping procedure is carried out in the vacuum vessel. Due to the second condenser (with a second, associated vacuum pump), the heating medium can be cleansed or distilled during the pressure-dropping procedure and simultaneously the suction or drying procedure can be carried out in the vacuum vessel. This feature leads to drying the electrical parts more rapidly than heretofore because the steps of drying the electrical parts and regenerating the heating medium no longer require being consecutive, but instead regeneration can be implemented simultaneously with the evacuation of the vicinity around the electrical parts. By using a two-condenser design and different connecting lines, the versatility of the equipment is substantially increased. For instance the two condensers together with their associated vacuum pumps can be used in parallel for drying to achieve higher drying output and a higher operational rate. However, the two condensers may just as well be used to cleanse the heating medium; in this case they are separate from the vacuum chamber and cool only the heating medium heated by the evaporator and fed through the bypass line.

摘要翻译： 设备提供更快速的加热部件干燥，包括由纤维素和/或塑料制成的吸湿性电绝缘。 存在至少两个冷凝器，一个用于在蒸馏阶段中加热部件和另一个时使用。 因此，可以在加热期间和在加热中断的时间间隔期间通过蒸馏除去并且在真空容器中进行降压过程。 由于第二冷凝器（具有第二相关联的真空泵），所以可以在降压过程中清洗或蒸馏加热介质，同时可以在真空容器中进行抽吸或干燥过程。 该特征导致电气部件比以前更快地干燥，因为干燥电气部件和再生加热介质的步骤不再需要连续的，而是可以在围绕电气部件的附近排气的同时实现再生。 通过使用双冷凝器设计和不同的连接线，设备的通用性大大提高。 例如，两个冷凝器及其相关联的真空泵可以并联用于干燥以实现更高的干燥输出和更高的操作速率。 然而，两个冷凝器也可以用于清洁加热介质; 在这种情况下，它们与真空室分开，并且仅仅冷却由蒸发器加热的加热介质，并通过旁通管线供给。

公开(公告)号：US5749159A

公开(公告)日：1998-05-12

申请号：US861967

申请日：1997-05-22

申请人： Robert S. Schwenkler

发明人： Robert S. Schwenkler

IPC分类号： F26B21/14 ,  H01L21/00 ,  F26B7/00

CPC分类号： H01L21/67028 ,  F26B21/145 ,  H01L2224/16

摘要： This invention pertains to a substrate cleaner and dryer or a dryer alone, and in particular, to an improved method of isopropyl alcohol (IPA) vapor drying having "closed loop" processing and capability to process extremely large substrates. The invention uses an inert gas, typically nitrogen (N.sub.2) or argon (Ar), as a process gas for carrying the vapor of a drying fluid in a "closed loop" cycle through a process vessel. The carrier gas and is pumped through a vapor generator and the process vessel in a rapid "closed loop" manner with extremely pure IPA vapor. Various embodiments employ the invention including two different vapor drying methods, a water rinse and vapor dry method and a solvent clean and vapor dry method. In either the water rinse and vapor dry method and a solvent clean and vapor dry method rinse water or cleaning fluid is rapidly drained in an unimpeded manner from the vessel while the process vessel is vented.

摘要翻译： 本发明涉及单独的基底清洁剂和干燥器或干燥器，特别涉及具有“闭环”处理和处理极大基材的能力的异丙醇（IPA）蒸气干燥的改进方法。 本发明使用惰性气体，通常为氮气（N 2）或氩气（Ar），作为在“闭环”循环中通过处理容器运送干燥流体的蒸气的工艺气体。 载气，并以非常纯的IPA蒸气以快速“闭环”方式泵送通过蒸气发生器和处理容器。 各种实施方案采用本发明，其包括两种不同的蒸气干燥方法，水冲洗和蒸汽干燥方法以及溶剂清洁和蒸汽干燥方法。 在水冲洗和蒸气干燥方法和溶剂清洁和蒸气干燥方法中，当处理容器排气时，漂洗水或清洗液以无阻碍的方式从容器中迅速排出。