公开(公告)号：US07744698B2

公开(公告)日：2010-06-29

申请号：US10310578

申请日：2002-12-05

申请人： Masayuki Toda ,  Masaki Kusuhara ,  Mikio Doi ,  Masaru Umeda ,  Mitsuru Fukagawa ,  Yoichi Kanno ,  Osamu Uchisawa ,  Kohei Yamamoto ,  Toshikatu Meguro

发明人： Masayuki Toda ,  Masaki Kusuhara ,  Mikio Doi ,  Masaru Umeda ,  Mitsuru Fukagawa ,  Yoichi Kanno ,  Osamu Uchisawa ,  Kohei Yamamoto ,  Toshikatu Meguro

IPC分类号： C23C16/00

CPC分类号： C23C16/4486 ,  C23C16/409

摘要： Disclosed is a vaporizer constituted of a dispersing section 8 and a vaporizing section 22. The dispersing section 8 comprises a gas introduction port 4 for introducing a carrier gas 3 under pressure into a gas passage, means for feeding raw material solutions 5a and 5b to the gas passage, and a gas outlet 7 for delivering the carrier gas containing the raw material solutions to the vaporizing section 22. The vaporizing section 22 comprises a vaporizing tube 20 having one end connected to a reaction tube of the MOCVD system and having the other end connected to the gas outlet 7 of the dispersing section 8, and heating means for heating the vaporizing tube 20. The vaporizing section 22 serves to heat and vaporize the raw material solution containing carrier gas 3 delivered from the dispersing section 8. The dispersing section 8 includes a dispersing section body 1 having a cylindrical hollow portion, and a rod 10 having an outer diameter smaller than the inner diameter of the cylindrical hollow portion. The rod 10 has a spiral groove 60 formed in the external periphery closer to the vaporizing section 22, the rod i0 being inserted into the cylindrical hollow portion.

摘要翻译： 公开了由分散部8和蒸发部22构成的蒸发器。分散部8包括用于将载气3在压力下导入气体通道的气体导入口4，将原料溶液5a，5b供给到 气体通道和用于将含有原料溶液的载气输送到汽化部分22的气体出口7.蒸发部分22包括蒸发管20，其一端连接到MOCVD系统的反应管，并具有另一端 连接到分散部8的气体出口7，以及用于加热蒸发管20的加热装置。蒸发部22用于加热和蒸发从分散部8输送的含有载气3的原料溶液。分散部8 包括具有圆柱形中空部分的分散部分主体1和具有小于圆柱形内径的外径的杆10 l中空部分。 杆10具有形成在更靠近蒸发部22的外周中的螺旋槽60，杆i0插入到圆筒形中空部中。

公开(公告)号：US07673856B2

公开(公告)日：2010-03-09

申请号：US11496407

申请日：2006-08-01

申请人： Masayuki Toda ,  Masaki Kusuhara ,  Masaru Umeda ,  Mitsuru Fukagawa

发明人： Masayuki Toda ,  Masaki Kusuhara ,  Masaru Umeda ,  Mitsuru Fukagawa

IPC分类号： B01F3/04

CPC分类号： H01L27/11502 ,  B01B1/005 ,  B01D3/346 ,  B01F3/04021 ,  B01F5/0646 ,  B01F5/0653 ,  B01F5/0656 ,  B01F5/0671 ,  B01F5/0676 ,  C23C16/40 ,  C23C16/409 ,  C23C16/4486 ,  H01L21/31691 ,  H01L27/11507 ,  H01L28/55 ,  Y10S261/65

摘要： A vaporizer has gas passage formed inside of main body of a dispersion part, a gas inlet opening to introduce pressurized carrier gas into gas passage, a part to supply raw materials solution to carrier gas passing gas passage, a gas outlet to send carrier gas including dispersed raw material solution to vaporization part, a dispersion part to flow through gas passage having a part to cool, a vaporization pipe connected with a reaction part and gas outlet of dispersion part of the device, and a heater to heat vaporization pipe is provided, a vaporization part to heat and vaporizes the carrier gas where raw materials solution is dispersed is provided, and a radiation prevention portion having small hole for the outside of gas outlet is provided.

摘要翻译： 蒸发器在分散部分的主体内部形成气体通道，气体入口用于将加压的载气引入气体通道，将原料溶液供应到载气通过气体通道的部分，气体出口以输送载气，包括 将原料溶液分散到蒸发部分，分散部分流过具有部分冷却的气体通道，提供与装置的分散部分的反应部分和气体出口连接的蒸发管和加热器以加热蒸发管， 设置用于使分散有原料溶液的载气加热蒸发的蒸发部，具有用于气体出口外部的小孔的防辐射部。

公开(公告)号：US20080210086A1

公开(公告)日：2008-09-04

申请号：US10569137

申请日：2004-08-23

申请人： Masayuki Toda ,  Masaki Kusuhara

发明人： Masayuki Toda ,  Masaki Kusuhara

IPC分类号： B01D53/22 ,  C10J1/12

CPC分类号： C23C16/4481

摘要： An object of the present invention is to provide a disperser for vaporizer capable of preventing a fluid dispersion from being crystallized when a carrier gas into which thin-film forming materials are dispersed is injected from a terminus end injection port, a vaporizer for MOCVD using the disperser for vaporizer, and a carrier gas vaporizing method. A plurality of thin-film forming materials are dispersed into a carrier gas introduced into a gas passage by a dispersion section located in a midway portion of a gas passage 35 into which the carrier gas is introduced. An air flow substantially along the injection direction of carrier gas into which the plurality of thin-film forming materials injected from an terminus end injection port 35b are dispersed is injected from an air flow injection port 38 formed near the terminus end injection port 35b located in the downstream end portion of the gas passage 35.

摘要翻译： 本发明的目的是提供一种用于蒸发器的分散器，其能够在从终端注入口注入分散了薄膜形成材料的载气时，防止流体分散结晶，使用MOCVD的蒸发器 蒸发器用分散器和载气蒸发法。 多个薄膜形成材料通过位于导入载气的气体通道35的中间部分的分散部分分散到引入气体通道的载气中。 从终端注入口35b​​附近形成的多个成膜材料分散在其中的基本上沿着载气的注入方向的气流从形成在末端注入口35b​​附近的空气流注入口38注入 位于气体通道35的下游端部。

公开(公告)号：US08486196B2

公开(公告)日：2013-07-16

申请号：US12601314

申请日：2008-05-15

申请人： Masayuki Toda ,  Masaki Kusuhara ,  Masaru Umeda ,  Mitsuru Fukagawa

发明人： Masayuki Toda ,  Masaki Kusuhara ,  Masaru Umeda ,  Mitsuru Fukagawa

IPC分类号： C23C16/00 ,  F01M11/03 ,  B01D21/24 ,  B01D24/38 ,  B01D29/88 ,  B01D33/70

CPC分类号： C23C16/407 ,  C23C16/4486

摘要： Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.

摘要翻译： 由于用于MOCVD膜沉积系统的蒸发装置具有多个气体通道从上方引入气体的结构，所以该装置难以定位喷嘴，并且该装置不能精确地控制 与要发放到蒸发单元中的原料溶液混合的载气的压力和流速，因此难以高精度地控制MOCVD膜的组成。 多个气体通道设置在平坦的盘形板上。 利用这种结构，可以使喷嘴的精确定位变得更容易，并且可以高精度地控制MOCVD膜的组成。

公开(公告)号：US20100173073A1

公开(公告)日：2010-07-08

申请号：US12601314

申请日：2008-05-15

申请人： Masayuki Toda ,  Masaki Kusuhara ,  Masaru Umeda ,  Mitsuru Fukagawa

发明人： Masayuki Toda ,  Masaki Kusuhara ,  Masaru Umeda ,  Mitsuru Fukagawa

IPC分类号： C23C16/455 ,  C23C16/00

CPC分类号： C23C16/407 ,  C23C16/4486

摘要： Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.

摘要翻译： 由于用于MOCVD膜沉积系统的蒸发装置具有多个气体通道从上方引入气体的结构，所以该装置难以定位喷嘴，并且该装置不能精确地控制 与要发放到蒸发单元中的原料溶液混合的载气的压力和流速，因此难以高精度地控制MOCVD膜的组成。 多个气体通道设置在平坦的盘形板上。 利用这种结构，可以使喷嘴的精确定位变得更容易，并且可以高精度地控制MOCVD膜的组成。

公开(公告)号：US20060160360A1

公开(公告)日：2006-07-20

申请号：US10561512

申请日：2004-06-21

申请人： Masayuki Toda ,  Masaki Kusuhara

发明人： Masayuki Toda ,  Masaki Kusuhara

IPC分类号： H01L21/44

CPC分类号： C23C16/4481

摘要： A vaporization method and a vaporizer capable of greatly reducing the number of fine particles scattered in a film after film formation. A raw material solution is brought into contact with a heated carrier gas and carried to a subsequent step. The vaporizer includes: a vaporization chamber; a carrier gas passage communicating with the vaporization chamber; a raw material solution lead-in port through which the raw material solution is led into the passage; and elements for heating the carrier gas.

摘要翻译： 蒸发法和蒸发器，其能够大大减少成膜后在膜中散射的微粒的数量。 使原料溶液与加热的载气接触并携带到随后的步骤。 蒸发器包括：蒸发室; 与气化室连通的载气通道; 原料溶液引入口，原料溶液通过该原料溶液引入通道; 以及用于加热载气的元件。

公开(公告)号：US20050189620A1

公开(公告)日：2005-09-01

申请号：US10789795

申请日：2004-02-25

申请人： Takashi Sugino ,  Masaki Kusuhara ,  Masaru Umeda

发明人： Takashi Sugino ,  Masaki Kusuhara ,  Masaru Umeda

IPC分类号： H01L21/28 ,  H01L21/283 ,  H01L21/314 ,  H01L21/331 ,  H01L21/335 ,  H01L21/768 ,  H01L23/522 ,  H01L29/12 ,  H01L29/20

CPC分类号： H01L21/02175 ,  H01L21/02274 ,  H01L21/314 ,  H01L29/2003 ,  H01L29/66318 ,  H01L29/66462

摘要： A high performance semiconductor device that can realize surface protection and surface inactivation and is fabricated using a film formation method and technique that enable improvement of high frequency characteristics, and an electronic device for a communication system including the semiconductor device, are provided. The semiconductor device is characterized in that a film having boron, carbon, and nitrogen as main components and to which sulfur is added serves as a surface protection film, and at least part of a surface is covered.

摘要翻译： 提供一种能够实现表面保护和表面失活的高性能半导体器件，并且使用能够提高高频特性的成膜方法和技术以及包括该半导体器件的通信系统的电子设备来制造。 半导体器件的特征在于，以硼，碳和氮为主要成分并加入硫的膜用作表面保护膜，并且覆盖表面的至少一部分。

公开(公告)号：US06540840B1

公开(公告)日：2003-04-01

申请号：US09488764

申请日：2000-01-21

申请人： Masayuki Toda ,  Masaki Kusuhara ,  Mikio Doi ,  Masaru Umeda ,  Mitsuru Fukagawa ,  Yoichi Kanno ,  Osamu Uchisawa ,  Kohei Yamamoto ,  Toshikatu Meguro

发明人： Masayuki Toda ,  Masaki Kusuhara ,  Mikio Doi ,  Masaru Umeda ,  Mitsuru Fukagawa ,  Yoichi Kanno ,  Osamu Uchisawa ,  Kohei Yamamoto ,  Toshikatu Meguro

IPC分类号： C23C1600

CPC分类号： C23C16/4486 ,  C23C16/409

摘要： Disclosed is a vaporizer constituted of a dispersing section 8 and a vaporizing section 22. The dispersing section 8 comprises a gas introduction port 4 for introducing a carrier gas 3 under pressure into a gas passage, means for feeding raw material solutions 5a and 5b to the gas passage, and a gas outlet 7 for delivering the carrier gas containing the raw material solutions to the vaporizing section 22. The vaporizing section 22 comprises a vaporizing tube 20 having one end connected to a reaction tube of the MOCVD system and having the other end connected to the gas outlet 7 of the dispersing section 8, and heating means for heating the vaporizing tube 20. The vaporizing section 22 serves to heat and vaporize the raw material solution containing carrier gas 3 delivered from the dispersing section 8. The dispersing section 8 includes a dispersing section body 1 having a cylindrical hollow portion, and a rod 10 having an outer diameter smaller than the inner diameter of the cylindrical hollow portion. The rod 10 has a spiral groove 60 formed in the external periphery closer to the vaporizing section 22, the rod 10 being inserted into the cylindrical hollow portion.

公开(公告)号：US20140186990A1

公开(公告)日：2014-07-03

申请号：US14122028

申请日：2012-05-31

申请人： Masaki Kusuhara

发明人： Masaki Kusuhara

IPC分类号： H01J37/32 ,  H01L31/0216

CPC分类号： H01J37/3255 ,  C23C16/345 ,  C23C16/45563 ,  C23C16/45574 ,  C23C16/45595 ,  C23C16/50 ,  H01L21/0217 ,  H01L21/02274 ,  H01L31/02168 ,  H05H1/2406 ,  H05H2001/2418 ,  H05H2001/2431 ,  H05H2001/245 ,  H05H2001/2456

摘要： As the antireflection film of solar cells, a nitride film was used which was conventionally formed by reduced pressure plasma CVD. However, reducing solar cell production costs has been difficult due to high equipment costs and processing costs involved in reduced pressure treatment. By means of a plasma head comprising multiple plasma head unit members which, arranged in rows, apply an electric or magnetic field via a dielectric member and generate plasma, this CVD film production method forms a nitride film with atmospheric pressure plasma CVD using dielectric-barrier discharge. The dielectric discharge is capable of forming a glow discharge plasma stable even at atmospheric pressure, and, by generating and reacting different plasmas from neighboring plasma outlets, it is possible to form a nitride film in atmospheric pressure, making it possible to produce low-cost solar cells.

摘要翻译： 作为太阳能电池的防反射膜，使用通常通过减压等离子体CVD形成的氮化膜。 然而，降低太阳能电池生产成本是困难的，因为设备成本和处理成本都较低。 通过等离子体头，其包括排列成行的多个等离子体头单元构件，通过电介质构件施加电场或磁场并产生等离子体，该CVD膜制备方法使用介电阻挡层形成具有大气压等离子体CVD的氮化物膜 卸货。 介电放电能够在大气压下形成辉光放电等离子体稳定，并且通过产生和反应来自相邻等离子体出口的不同等离子体，可以在大气压下形成氮化物膜，从而可以产生低成本 太阳能电池。

公开(公告)号：US20080193645A1

公开(公告)日：2008-08-14

申请号：US11496407

申请日：2006-08-01

申请人： Masayuki Toda ,  Masaki Kusuhara ,  Masaru Umeda ,  Mitsuru Fukagawa

发明人： Masayuki Toda ,  Masaki Kusuhara ,  Masaru Umeda ,  Mitsuru Fukagawa

IPC分类号： C23C16/44

CPC分类号： H01L27/11502 ,  B01B1/005 ,  B01D3/346 ,  B01F3/04021 ,  B01F5/0646 ,  B01F5/0653 ,  B01F5/0656 ,  B01F5/0671 ,  B01F5/0676 ,  C23C16/40 ,  C23C16/409 ,  C23C16/4486 ,  H01L21/31691 ,  H01L27/11507 ,  H01L28/55 ,  Y10S261/65

摘要： A vaporizer has gas passage formed inside of main body of a dispersion part, a gas inlet opening to introduce pressurized carrier gas into gas passage, a part to supply raw materials solution to carrier gas passing gas passage, a gas outlet to send carrier gas including dispersed raw material solution to vaporization part, a dispersion part to flow through gas passage having a part to cool, a vaporization pipe connected with a reaction part and gas outlet of dispersion part of the device, and a heater to heat vaporization pipe is provided, a vaporization part to heat and vaporizes the carrier gas where raw materials solution is dispersed is provided, and a radiation prevention portion having small hole for the outside of gas outlet is provided.

摘要翻译： 蒸发器在分散部分的主体内部形成气体通道，气体入口用于将加压的载气引入气体通道，将原料溶液供应到载气通过气体通道的部分，气体出口以输送载气，包括 将原料溶液分散到蒸发部分，分散部分流过具有部分冷却的气体通道，提供与装置的分散部分的反应部分和气体出口连接的蒸发管和加热器以加热蒸发管， 设置用于使分散有原料溶液的载气加热蒸发的蒸发部，具有用于气体出口外部的小孔的防辐射部。