公开(公告)号：US20180197716A1

公开(公告)日：2018-07-12

申请号：US15862335

申请日：2018-01-04

申请人： SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

发明人： Haruka Sasaki

IPC分类号： H01J37/317 ,  H01J37/05 ,  H05H15/00

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J37/304 ,  H01J2237/0473 ,  H01J2237/04924 ,  H01J2237/24535 ,  H05H7/001 ,  H05H9/041 ,  H05H15/00 ,  H05H2277/12

摘要： An ion implantation apparatus includes: a multistage linear acceleration unit including a plurality of stages of high-frequency resonators and a plurality of stages of focusing lenses; a first beam measuring unit disposed in the middle of the multistage linear acceleration unit and configured to allow passage of a beam portion adjacent to a center of a beam trajectory and measure a current intensity of another beam portion blocked by an electrode body outside a vicinity of the center of the beam trajectory; a second beam measuring unit disposed downstream of the multistage linear acceleration unit and configured to measure a current intensity of an ion beam exiting from the multistage linear acceleration unit; and a control device configured to adjust a control parameter of the plurality of stages of focusing lenses based on measurement results of the first and second beam measuring units.

公开(公告)号：US20170125213A1

公开(公告)日：2017-05-04

申请号：US15197940

申请日：2016-06-30

申请人： Board of Trustees of Michigan State University

发明人： Wolfgang Bauer ,  Bradley Sherrill

IPC分类号： H01J37/317 ,  H01J37/30

CPC分类号： G21H5/02 ,  B42D25/405 ,  G01N2458/15 ,  G09F3/00 ,  G21G1/0005 ,  G21G1/10 ,  H01J2237/31711 ,  H04W12/00 ,  H05H2277/12 ,  Y10T428/24802

摘要： A method of assisting with authenticating a workpiece is provided. In another aspect, ions are generated, accelerated in an accelerator, an isotope is created, and then the isotope is implanted within a workpiece to assist with authenticating of the workpiece. A further aspect includes a workpiece substrate, a visual marker and an isotope internally located within the substrate adjacent the visual marker.