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130 条记录 (耗时 0.026 秒)

    Resist underlayer film composition and patterning process using the same
    3.
    发明授权
    Resist underlayer film composition and patterning process using the same 有权
    抗蚀剂下层膜组合物和使用其的图案化工艺

    公开(公告)号：US08853031B2

    公开(公告)日：2014-10-07

    申请号：US13313650

    申请日：2011-12-07

    申请人： Tsutomu Ogihara ,  Daisuke Kori ,  Yusuke Biyajima ,  Takeru Watanabe ,  Toshihiko Fujii ,  Takeshi Kinsho

    发明人： Tsutomu Ogihara ,  Daisuke Kori ,  Yusuke Biyajima ,  Takeru Watanabe ,  Toshihiko Fujii ,  Takeshi Kinsho

    IPC分类号： H01L21/336 ,  C08G10/02 ,  G03F7/09

    CPC分类号： C08G10/02 ,  G03F7/094

    摘要： There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), and one or more kinds of compounds, represented by the following general formulae (2-1) and/or (2-2), and/or equivalent bodies thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.

    摘要翻译： 公开了一种抗蚀剂下层膜组合物，其中组合物含有通过至少一种或多种由以下通式（1-1）和/或（1-2）表示的化合物的缩合得到的聚合物，以及一种或 更多种由以下通式（2-1）和/或（2-2）表示的化合物和/或其等价物。 可以提供能够形成具有降低的反射率的下层膜（即，具有最佳n值和k值作为抗反射膜的下层膜）的三层抗蚀剂工艺的下层膜组合物， 特别是在60nm以上的高方位线上，特别是在蚀刻后，不会引起线下落或翘曲，以及使用其的图案化处理。

    Method for removing residual monomers from polyoxymethylenes
    4.
    发明授权
    Method for removing residual monomers from polyoxymethylenes 有权
    从聚甲醛中除去残留单体的方法

    公开(公告)号：US07598339B2

    公开(公告)日：2009-10-06

    申请号：US11568824

    申请日：2005-05-17

    申请人： Claudius Schwittay ,  Elmar Stockelmann ,  Johannes Heinemann ,  Knut Zollner ,  Achim Stammer

    发明人： Claudius Schwittay ,  Elmar Stockelmann ,  Johannes Heinemann ,  Knut Zollner ,  Achim Stammer

    IPC分类号： C08G10/02

    CPC分类号： C08G2/10 ,  C08G2/08 ,  C08J11/02

    摘要： A process for removing residual monomers from polyoxymethylene homo- or copolymers, comprising the following process steps: a) the residual monomers are removed in gaseous form as vapors from the polymer in a devolatilization apparatus, b) the residual monomer vapors are removed through a vapor pipe, c) the residual monomers are condensed from the vapors in a condensation apparatus at from 1.09 to 102.4 bar and from 102 to 230° C., the temperature not falling below 102° C. at any point of the condensation apparatus, and those surfaces of the condensation apparatus which come into contact with the vapors being coated with a liquid film of condensed residual monomers.

    摘要翻译： 一种用于从聚甲醛均聚物或共聚物中除去残余单体的方法，包括以下工艺步骤：a）在脱挥发分装置中，残余单体以气体形式从聚合物中除去，b）通过蒸气除去残留的单体蒸汽 管，c）残留单体在冷凝设备中的蒸气从1.09至102.4巴和102至230℃冷凝，在冷凝设备的任何点处温度不低于102℃，而那些 与蒸发器接触的冷凝装置的表面涂覆有冷凝的残余单体的液膜。

    Styryl polymer, production method and use thereof
    5.
    发明授权
    Styryl polymer, production method and use thereof 失效
    苯乙烯基聚合物，其制备方法和用途

    公开(公告)号：US6066712A

    公开(公告)日：2000-05-23

    申请号：US74914

    申请日：1998-05-08

    申请人： Hideaki Ueda ,  Takeshi Kitahora ,  Tsuyoshi Nozaki

    发明人： Hideaki Ueda ,  Takeshi Kitahora ,  Tsuyoshi Nozaki

    IPC分类号： C08G61/02 ,  C08G61/12 ,  C08G10/02 ,  C08G79/02

    CPC分类号： C08G61/02 ,  C08G61/12

    摘要： The present invention relates to a styryl polymer, represented by the following formula (I) or (II), a production method thereof and use thereof to a photosensitive member and a electroluminescence element: ##STR1## in which Ar.sub.11 is an arylene group which may have a substituent; Ar.sub.12 is an aryl group, a polycondensed ring group or a heterocyclic ring group; n.sub.1 is a natural number; ##STR2## in which Ar.sub.21, Ar.sub.22, and Ar.sub.24 are respectively an arylene group which may have a substituent; Ar.sub.25 is an arylene group or a bivalent polycondensed ring group, which may have a substituent; Ar.sub.23 and Ar.sub.26 are respectively an alkyl group, an aralkyl group or an aryl group, which may have a substituent; m.sub.2 is 0, 1, 2 or 3; n.sub.2 is a natural number.

    摘要翻译： 本发明涉及由下式（I）或（II）表示的苯乙烯基聚合物，其制备方法及其在光敏元件和电致发光元件中的应用：其中Ar 11为可具有取代基的亚芳基 ; Ar 12是芳基，缩聚环基或杂环基; n1是自然数; 其中Ar 21，Ar 22和Ar 24分别是可以具有取代基的亚芳基; Ar25是可以具有取代基的亚芳基或二价缩聚环基; Ar 23和Ar 26分别是可以具有取代基的烷基，芳烷基或芳基; m2为0,1,2或3; n2是自然数。

    Polymeric species production
    9.
    发明授权
    Polymeric species production 失效
    聚合物种生产

    公开(公告)号：US5194563A

    公开(公告)日：1993-03-16

    申请号：US679104

    申请日：1991-04-02

    申请人： Allan S. Hay

    发明人： Allan S. Hay

    IPC分类号： C08G8/02 ,  C08G8/26 ,  C08G10/00 ,  C08G10/02

    CPC分类号： C08G10/02 ,  C08G10/00 ,  C08G8/02 ,  C08G8/26

    摘要： Linear aromatic polymeric species, particularly oligomers and polymers are produced under mild conditions in good yield by reacting an at least binuclear aromatic compound with an alkylidene bisphenol in the presence of a non C-alkylatable hydroxy substituted aromatic compound effective to stabilize a generated carbonium ion intermediate; the alkylidene bisphenol may be formed in situ from a ketone or aldehyde in the presence of a catalytic amount of a hydroxy substituted aromatic compound effective to generate a carbonium ion with the ketone or aldehyde; carrying out the reaction under reduced pressure, particularly high vacuum permits direct production of high polymers; the oligomers are useful in the manufacture of high molecular weight engineering or industrial plastics; the polymers may be used directly as such plastics.

    摘要翻译： 线性芳族聚合物种类，特别是低聚物和聚合物是在温和条件下以良好的产率通过使一种至少双核芳族化合物与亚烷基双酚在非可C可烷基化的羟基取代的芳族化合物存在下反应生成的，该化合物有效稳定生成的碳鎓离子中间体 ; 亚烷基双酚可以在有助于与酮或醛产生碳鎓离子的催化量的羟基取代的芳族化合物的存在下，从酮或醛原位形成; 在减压下进行反应，特别是高真空允许直接生产高分子; 低聚物可用于制造高分子量工程或工业塑料; 聚合物可以直接用作这种塑料。