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    Resist underlayer film composition and patterning process using the same
    2.
    发明授权
    Resist underlayer film composition and patterning process using the same 有权
    抗蚀剂下层膜组合物和使用其的图案化工艺

    公开(公告)号：US08853031B2

    公开(公告)日：2014-10-07

    申请号：US13313650

    申请日：2011-12-07

    申请人： Tsutomu Ogihara ,  Daisuke Kori ,  Yusuke Biyajima ,  Takeru Watanabe ,  Toshihiko Fujii ,  Takeshi Kinsho

    发明人： Tsutomu Ogihara ,  Daisuke Kori ,  Yusuke Biyajima ,  Takeru Watanabe ,  Toshihiko Fujii ,  Takeshi Kinsho

    IPC分类号： H01L21/336 ,  C08G10/02 ,  G03F7/09

    CPC分类号： C08G10/02 ,  G03F7/094

    摘要： There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), and one or more kinds of compounds, represented by the following general formulae (2-1) and/or (2-2), and/or equivalent bodies thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.

    摘要翻译： 公开了一种抗蚀剂下层膜组合物，其中组合物含有通过至少一种或多种由以下通式（1-1）和/或（1-2）表示的化合物的缩合得到的聚合物，以及一种或 更多种由以下通式（2-1）和/或（2-2）表示的化合物和/或其等价物。 可以提供能够形成具有降低的反射率的下层膜（即，具有最佳n值和k值作为抗反射膜的下层膜）的三层抗蚀剂工艺的下层膜组合物， 特别是在60nm以上的高方位线上，特别是在蚀刻后，不会引起线下落或翘曲，以及使用其的图案化处理。

    RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME
    3.
    发明申请
    RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME 有权
    使用相同的底漆膜组合物和图案处理方法

    公开(公告)号：US20120184103A1

    公开(公告)日：2012-07-19

    申请号：US13313650

    申请日：2011-12-07

    申请人： Tsutomu OGIHARA ,  Daisuke KORI ,  Yusuke BIYAJIMA ,  Takeru WATANABE ,  Toshihiko FUJII ,  Takeshi KINSHO

    发明人： Tsutomu OGIHARA ,  Daisuke KORI ,  Yusuke BIYAJIMA ,  Takeru WATANABE ,  Toshihiko FUJII ,  Takeshi KINSHO

    IPC分类号： H01L21/3105 ,  C08L61/12 ,  C08L61/08 ,  C08G8/04

    CPC分类号： C08G10/02 ,  G03F7/094

    摘要： There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), and one or more kinds of compounds, represented by the following general formulae (2-1) and/or (2-2), and/or equivalent bodies thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.

    摘要翻译： 公开了一种抗蚀剂下层膜组合物，其中组合物含有通过至少一种或多种由以下通式（1-1）和/或（1-2）表示的化合物的缩合得到的聚合物，以及一种或 更多种由以下通式（2-1）和/或（2-2）表示的化合物和/或其等价物。 可以提供能够形成具有降低的反射率的下层膜（即，具有最佳n值和k值作为抗反射膜的下层膜）的三层抗蚀剂工艺的下层膜组合物， 特别是在60nm以上的高方位线上，特别是在蚀刻后，不会引起线下落或翘曲，以及使用其的图案化处理。

    Polymeric species production
    7.
    发明授权
    Polymeric species production 失效
    聚合物种生产

    公开(公告)号：US5194563A

    公开(公告)日：1993-03-16

    申请号：US679104

    申请日：1991-04-02

    申请人： Allan S. Hay

    发明人： Allan S. Hay

    IPC分类号： C08G8/02 ,  C08G8/26 ,  C08G10/00 ,  C08G10/02

    CPC分类号： C08G10/02 ,  C08G10/00 ,  C08G8/02 ,  C08G8/26

    摘要： Linear aromatic polymeric species, particularly oligomers and polymers are produced under mild conditions in good yield by reacting an at least binuclear aromatic compound with an alkylidene bisphenol in the presence of a non C-alkylatable hydroxy substituted aromatic compound effective to stabilize a generated carbonium ion intermediate; the alkylidene bisphenol may be formed in situ from a ketone or aldehyde in the presence of a catalytic amount of a hydroxy substituted aromatic compound effective to generate a carbonium ion with the ketone or aldehyde; carrying out the reaction under reduced pressure, particularly high vacuum permits direct production of high polymers; the oligomers are useful in the manufacture of high molecular weight engineering or industrial plastics; the polymers may be used directly as such plastics.

    摘要翻译： 线性芳族聚合物种类，特别是低聚物和聚合物是在温和条件下以良好的产率通过使一种至少双核芳族化合物与亚烷基双酚在非可C可烷基化的羟基取代的芳族化合物存在下反应生成的，该化合物有效稳定生成的碳鎓离子中间体 ; 亚烷基双酚可以在有助于与酮或醛产生碳鎓离子的催化量的羟基取代的芳族化合物的存在下，从酮或醛原位形成; 在减压下进行反应，特别是高真空允许直接生产高分子; 低聚物可用于制造高分子量工程或工业塑料; 聚合物可以直接用作这种塑料。

    Phenanthrene/HCHO derived polyamide-imide
    8.
    发明授权
    Phenanthrene/HCHO derived polyamide-imide 失效
    菲/ HCHO衍生的聚酰胺 - 酰亚胺

    公开(公告)号：US4346212A

    公开(公告)日：1982-08-24

    申请号：US174152

    申请日：1980-07-31

    申请人： Joseph G. Robinson ,  David I. Barnes ,  Angela M. Carswell

    发明人： Joseph G. Robinson ,  David I. Barnes ,  Angela M. Carswell

    IPC分类号： C08G73/00 ,  C07C51/31 ,  C07C65/34 ,  C08G10/02 ,  C08G73/14 ,  C08G2/16 ,  C08G73/10

    CPC分类号： C08G73/14 ,  C07C51/31 ,  C07C65/34 ,  C08G10/02 ,  Y10T428/31721

    摘要： This invention relates to thermally stable resins and provides such a resin made from cheaply available coal-derived materials, whereas presently available resins are made from increasingly expensive oil-derived materials.The resin comprises the condensation product of a reaction between an aromatic diamine and a phenanthrene-formaldehyde reaction product, which product has been oxidized to produce keto groups bridging the phenanthrene moieties and carboxy groups. The condensation product is a poly-(amide-imide).The invention also includes a method of making the resin and varnishes containing the resin.The resin will find use for instance as a high temperature insulator or in glass or asbestos laminates in compressor blades.

    摘要翻译： 本发明涉及热稳定树脂，并且提供由廉价的煤源材料制成的这种树脂，而目前可用的树脂由越来越昂贵的石油衍生材料制成。 树脂包括芳族二胺和菲 - 甲醛反应产物之间的反应的缩合产物，该产物已被氧化以产生桥接菲部分和羧基的酮基。 缩合产物是聚（酰胺 - 酰亚胺）。 本发明还包括制备含树脂的树脂和清漆的方法。 该树脂将用作例如高温绝缘体或在压缩机叶片中的玻璃或石棉层压材料中。

    Method of producing a resin for producing heat stable products, the resin and the products
    9.
    发明授权
    Method of producing a resin for producing heat stable products, the resin and the products 失效
    生产热稳定产品的树脂，树脂和产品的方法

    公开(公告)号：US4276408A

    公开(公告)日：1981-06-30

    申请号：US120395

    申请日：1980-02-11

    申请人： Joseph G. Robinson ,  Sally A. Brain

    发明人： Joseph G. Robinson ,  Sally A. Brain

    IPC分类号： C08G10/02 ,  C08G14/04 ,  C08J5/24 ,  C08L61/34 ,  H01B3/06 ,  H01B3/08 ,  H01B3/36 ,  C08G16/02

    CPC分类号： C08J5/24 ,  C08G10/02 ,  C08G14/04 ,  C08L61/34 ,  H01B3/06 ,  H01B3/084 ,  H01B3/36 ,  C08J2361/34

    摘要： This invention relates to a method of producing a phenolated resin which can be used to form heat stable (up to 250.degree.) products.Previously used resins are either very expensive or do not provide the requisite high temperature properties. An aim of the invention is to provide a cheap equivalent to commercially available high temperature resins.An aromatic hydrocarbon (e.g. toluene) formaldehyde condensation resin is prepared. The low molecular weight contaminants are removed by a distillation process. The residue contains less than 1% low molecular weight material, and is phenolated to give the final resin. The resin may be cured to give a heat stable product.The phenolated resin may be used to form glasscloth and asbestos laminates or as a lamp capping cement.

    摘要翻译： 本发明涉及可用于形成热稳定（高达250°）产品的苯酚树脂的制备方法。 以前使用的树脂非常昂贵或不提供必要的高温性能。 本发明的目的是提供与市售的高温树脂相当的便宜的等价物。 制备芳族烃（如甲苯）甲醛缩合树脂。 通过蒸馏过程除去低分子量污染物。 残余物含有低于1％的低分子量材料，并被酚化以得到最终的树脂。 树脂可以固化以产生热稳定的产物。 苯酚树脂可用于形成玻璃纤维和石棉层压材料或作为灯头水泥。