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公开(公告)号：US20250044030A1
公开(公告)日：2025-02-06
申请号：US18846786
申请日：2023-03-14
Applicant: EBNER Industrieofenbau GmbH
Inventor： Robert EBNER , Andreas SAUSCHLAGER
Abstract: A device for tempering an object includes a chamber for receiving the object, wherein the chamber is surrounded by a chamber casing, a base element and a cover element, a heating element, a rotor for circulating a first gas, wherein the rotor is arranged in the chamber, and a rotor drive with which the rotor is made to rotate. The heating element is formed by the rotor with the rotor drive.
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公开(公告)号：US10718570B2
公开(公告)日：2020-07-21
申请号：US15744621
申请日：2017-06-15
Inventor： Shengjun Ma
Abstract: A heating furnace for heating an annular component, includes a furnace body, a heat medium driving component, a support part, a guide component, and a hollow cylinder. Part of the heat medium is ejected to the outer circumferential surface of the annular component through the guide part, and part of the heat medium flows through the inner channel of the hollow cylinder, and be ejected to the inner circumferential surface of the bearing via the second heat medium channel arranged on the hollow cylinder to heat the inner circumferential surface of the bearing. In this way, the hollow cylinder plays a role of distributing the gas to some extent, and as the upper end of the hollow cylinder is a sealed structure, the flowing gas is all converted into effective heat exchange gas flow and restricted to a heat exchange space on the bearing surface.
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公开(公告)号：US20070172786A1
公开(公告)日：2007-07-26
申请号：US10599034
申请日：2004-03-18
Applicant: Kazuhiko Katsumata
Inventor： Kazuhiko Katsumata
IPC: F27B11/00
CPC classification number: F27B5/04 , C21D9/0056 , F27B5/13 , F27D15/02
Abstract: A double-chamber type heat-treating furnace comprises a hermetically closable cooling furnace, a hermetically closable heating furnace, and a transfer unit. The transfer unit has free rollers disposed within the heating and cooling chambers and for supporting the object at only both ends in a direction of width thereof, a push-pull member moving while being engaged with the object to push or pull the object, and a drive unit provided at a position adjacent to the heating chamber on a side opposite to a side on which the cooling chamber is disposed and driving the push-pull device.
Abstract translation: 一种双室式热处理炉包括一个可密闭的冷却炉，一个气密封闭的加热炉和一个转运单元。 传送单元具有设置在加热和冷却室内的自由辊，并且用于仅在其宽度方向上的两端支撑物体，推拉构件在与物体接合的同时移动以推动或拉动物体，并且 驱动单元设置在与设置有冷却室的一侧相对的一侧的与加热室相邻的位置，并驱动推挽装置。
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公开(公告)号：US6121579A
公开(公告)日：2000-09-19
申请号：US807772
申请日：1997-02-27
Applicant: Kazutsugu Aoki , Wataru Okase , Hironori Yagi , Masamichi Nomura
Inventor： Kazutsugu Aoki , Wataru Okase , Hironori Yagi , Masamichi Nomura
CPC classification number: H01L21/67115 , C23C16/481 , C30B25/10 , C30B25/14
Abstract: A heat treating apparatus comprises a process chamber within which a wafer is subjected to a heat treatment. A supporting plate for supporting the wafer is arranged within the process chamber. A process gas is supplied from above into the process chamber. A main heating means for heating the wafer is arranged below the process chamber, with a transmitting window interposed therebetween. The main heating means includes a plurality of heating sources for irradiating the supporting plate with heat rays so as to heat the wafer indirectly and a rotatable table having the heating sources arranged on the front surface thereof. The heat treating apparatus also comprises an auxiliary heating means for compensating for an uneven temperature caused on the surface of the wafer by the main heating means. The heating source of the auxiliary heating means is arranged on the surface of the rotatable table together with the heating sources of the main heating means, and the heat output from the heating source of the auxiliary heating means can be controlled independently of the heat output from the heating sources of the main heating means.
Abstract translation: 热处理装置包括处理室，在该处理室内对晶片进行热处理。 用于支撑晶片的支撑板布置在处理室内。 处理气体从上方供应到处理室中。 用于加热晶片的主加热装置布置在处理室的下方，其间插入有透射窗。 主加热装置包括多个加热源，用于向支撑板照射热射线以间接加热晶片，并且具有布置在其前表面上的加热源的可旋转工作台。 热处理装置还包括用于补偿由主加热装置在晶片表面引起的不均匀温度的辅助加热装置。 辅助加热装置的加热源与主加热装置的加热源一起布置在可旋转工作台的表面上，并且可以独立于来自辅助加热装置的加热源的热源的输出来控制从辅助加热装置的加热源输出的热量 主要加热装置的加热源。
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公开(公告)号：US6004090A
公开(公告)日：1999-12-21
申请号：US154738
申请日：1998-09-17
Applicant: Orjan Axelsson
Inventor： Orjan Axelsson
CPC classification number: C21B7/20
Abstract: A charging device for being mounted above the top opening of a blast furnace body. The charging device includes a stationary hopper with a closable lower opening, and a rotary hopper with a closable lower opening with the rotary hopper being arranged below the stationary hopper. The device further includes a rotary cover for covering the top opening of the blast furnace body, with the rotary cover being supported and rotated by the rotary hopper. An annular gas sealing device co-operates with the rotary cover so as to provide a gas-tight seal of the top opening of the blast furnace body, and a rotary chute is supported and rotated by the rotary hopper. The rotary chute points downward into the blast furnace body and is pivotable about a horizontal axis.
Abstract translation: 一种用于安装在高炉主体顶部开口上方的充电装置。 充电装置包括具有可关闭的下开口的固定料斗和具有可关闭的下开口的旋转料斗，其中旋转料斗布置在固定料斗的下方。 该装置还包括用于覆盖高炉主体的顶部开口的旋转盖，旋转盖由旋转料斗支撑和旋转。 环形气体密封装置与旋转盖配合，以便提供高炉炉体顶部开口的气密密封，旋转料斗被旋转料斗支撑和转动。 旋转滑槽向下指向高炉主体，并能绕水平轴线转动。
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Patent Agency Ranking
公开(公告)号：US5409543A
公开(公告)日：1995-04-25
申请号：US994793
申请日：1992-12-22
Applicant: Janda K. G. Panitz , James L. Jellison , David J. Staley
Inventor： Janda K. G. Panitz , James L. Jellison , David J. Staley
Abstract: A system for chemically transforming metal surface oxides to metal that is especially, but not exclusively, suitable for preparing metal surfaces for dry soldering and solder reflow processes. The system employs one or more hot, refractory metal filaments, grids or surfaces to thermally dissociate molecular species in a low pressure of working gas such as a hydrogen-containing gas to produce reactive species in a reactive plasma that can chemically reduce metal oxides and form volatile compounds that are removed in the working gas flow. Dry soldering and solder reflow processes are especially applicable to the manufacture of printed circuit boards, semiconductor chip lead attachment and packaging multichip modules. The system can be retrofitted onto existing metal treatment ovens, furnaces, welding systems and wave soldering system designs.
Abstract translation: 用于将金属表面氧化物化学转化成金属的系统，其特别但不排他地适于制备用于干焊和回流焊工艺的金属表面。 该系统采用一种或多种热难熔金属细丝，网格或表面来在诸如含氢气体的工作气体的低压下热解离分子物质，以在反应性等离子体中产生能够化学还原金属氧化物并形成的反应性物质 在工作气体流中被除去的挥发性化合物。 干焊和回流焊工艺特别适用于印刷电路板，半导体芯片引线附件和封装多芯片模块的制造。 该系统可以改装到现有的金属处理炉，炉，焊接系统和波峰焊系统设计上。
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公开(公告)号：US5385437A
公开(公告)日：1995-01-31
申请号：US206138
申请日：1994-03-03
Applicant: Emile Lonardi , Gilbert Bernard , Giovanni Cimenti , Jean-Jacques Venturini
Inventor： Emile Lonardi , Gilbert Bernard , Giovanni Cimenti , Jean-Jacques Venturini
CPC classification number: C21B7/20 , B65D90/582 , B65D90/626 , F27B1/20 , F27D3/0033 , F27D3/10 , B65D2590/547 , B65D2590/662 , F27D2003/105
Abstract: A device is provided for charging a pressurized enclosure, particularly a blast furnace. The device comprises a closing off bell which is movable inside a hopper and is used to close off a discharge opening. A lower sealing member encompasses a closing off element set out below the bell and is capable of moving axially with respect to the latter, and a seat is mounted below the discharge opening. The closing off element is equipped with an inflatable seal, and its seat is equipped with a first peripheral sealing surface which is substantially vertical or points downwardly. The inflatable seal interacts with the first sealing surface in order to ensure sealing of the pressurized enclosure with respect to the hopper.
Abstract translation: 提供一种用于对加压外壳，特别是高炉进行充电的装置。 该装置包括可在料斗内移动并用于关闭排出口的关闭钟。 下密封构件包括设置在钟罩下方的关闭元件，并且能够相对于钟形件轴向运动，并且座椅安装在排出口下方。 关闭元件配备有可膨胀密封件，并且其座椅配备有基本上垂直或向下指向的第一周边密封表面。 充气密封件与第一密封表面相互作用，以确保加压外壳相对于料斗的密封。
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公开(公告)号：US4596526A
公开(公告)日：1986-06-24
申请号：US708068
申请日：1985-03-04
Applicant: Mohamed M. Soliman
Inventor： Mohamed M. Soliman
CPC classification number: C21D1/767 , C21D9/663 , Y10T137/877
Abstract: An apparatus for heat treating a work item includes a cover member and a base member on which the cover member is supported. A work space is defined between the base member and the cover member for receiving at least one work item which is positioned therein. A seal member is located between the base member and the cover member for sealing the work space against the entry and exit of gas. A valving system is provided for regulating the entrance and exit of a gas to and from the work space. The valving system is in fluid communication with the work space and includes a relief valve member for allowing the exhaust of the gas from the work space when gas pressure therein exceeds a predetermined limit.
Abstract translation: 一种用于对工件进行热处理的设备包括盖构件和支撑盖构件的基座构件。 在基部构件和盖构件之间限定工作空间，用于接收位于其中的至少一个工件。 密封构件位于基部构件和盖构件之间，用于密封工作空间以抵抗气体的入口和出口。 提供了一种阀门系统，用于调节进出工作空间的气体的入口和出口。 阀系统与工作空间流体连通，并且包括安全阀构件，用于当气体压力超过预定极限时允许从工作空间排出气体。
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公开(公告)号：US4202997A
公开(公告)日：1980-05-13
申请号：US773263
申请日：1977-03-01
Applicant: Patrick J. Wooding
Inventor： Patrick J. Wooding
IPC: C22B9/18 , F27B3/06 , F27B3/08 , F27B3/14 , F27B3/18 , F27B11/00 , F27D1/18 , F27D3/00 , F27D7/06 , F27D99/00
CPC classification number: F27D1/1816 , C22B9/18 , F27B11/00 , F27B3/065 , F27B3/085 , F27B3/14 , F27B3/183 , F27D2003/0065 , F27D2003/009 , F27D2007/066 , F27D99/0073
Abstract: A graphite lined crucible includes an upper horizontally extending flange having a seal ring around its periphery. The crucible may be raised by a hydraulic cylinder so as to bring the seal ring into engagement with the inside of a refractory lined roof. Electrodes supported by the roof extend downwardly into the crucible for melting the flux within the crucible. The roof and the crucible are air-tight thereby preventing air from entering the crucible. An exhaust port located in the upper portion of the roof is connected to a vacuum device for exhausting fumes from the crucible and for controlling the atmosphere within the crucible.
Abstract translation: 石墨衬里坩埚包括一个上部水平延伸的凸缘，其周边具有密封环。 坩埚可以由液压缸升高，以使密封环与耐火材料内衬的屋顶接合。 由屋顶支撑的电极向下延伸到坩埚中，以熔化坩埚内的焊剂。 屋顶和坩埚是气密的，从而防止空气进入坩埚。 位于屋顶上部的排气口与真空装置连接，用于排出坩埚中的烟雾并控制坩埚内的气氛。
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公开(公告)号：US3722866A
公开(公告)日：1973-03-27
申请号：US3722866D
申请日：1971-04-05
Applicant: PRODUITS REFRACTAIRES
Inventor： HERZBERG C
CPC classification number: F27D99/0001 , F23D14/16 , F23D2212/103 , F27B11/00 , F27D1/0009 , F27D1/1808 , F27D99/0033 , F27D2001/0073
Abstract: A method and apparatus for providing substantially uniform temperature in a furnace or kiln heated by combustion of an airfuel mixture. A distribution chamber is provided having at least one permeable wall adjacent the combustion chamber. The permeable wall comprises a refractory material, either fabric or felt, of ceramic fibers. The air-fuel mixture is introduced into the distribution chamber at a pressure in excess of that in the combustion chamber. In this way the air-fuel mixture slowly passes through the permeable wall and is ignited and burned over a large area within the combustion chamber.
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