公开(公告)号：WO2020254041A1

公开(公告)日：2020-12-24

申请号：PCT/EP2020/063426

申请日：2020-05-14

Applicant: ASML NETHERLANDS B.V.

Inventor： KONIJNENBERG, Alexander, Prasetya ,  COENE, Willem, Marie, Julia, Marcel ,  PANDEY, Nitesh

IPC: G03F7/20 ,  G03H1/04 ,  G02B21/00

Abstract: Disclosed is a method of determining a complex-valued field relating to a sample measured using an imaging system. The method comprises obtaining image data relating to a series of images of the sample, imaged at an image plane of the imaging system, and for which at least two different modulation functions are imposed in a Fourier plane of the imaging system; and determining the complex-valued field from the imaging data based on the imposed modulation functions.

公开(公告)号：WO2020249332A1

公开(公告)日：2020-12-17

申请号：PCT/EP2020/062803

申请日：2020-05-08

Applicant: STICHTING VU ,  ASML NETHERLANDS B.V. ,  STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  UNIVERSITEIT VAN AMSTERDAM

Inventor： TENNER, Vasco, Tomas ,  COENE, Willem, Marie, Julia, Marcel

IPC: G03F1/84 ,  G01N21/956 ,  G03F7/20 ,  G06T7/00 ,  G03H1/04

Abstract: Disclosed is a method of determining a complex-valued field relating to a structure, comprising: obtaining image data relating to a series of images of the structure, for which at least one measurement parameter is varied over the series and obtaining a trained network operable to map a series of images to a corresponding complex-valued field. The method comprises inputting the image data into said trained network and non-iteratively determining the complex-valued field relating to the structure as the output of the trained network. A method of training the trained network is also disclosed.

公开(公告)号：WO2019149477A1

公开(公告)日：2019-08-08

申请号：PCT/EP2019/050306

申请日：2019-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： KUMAR, Nitish ,  QUINTANILHA, Richard ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  TSIGUTKIN, Konstantin ,  COENE, Willem, Marie, Julia, Marcel

IPC: G03F7/20 ,  G03F1/22 ,  G03F1/24 ,  G03F1/60 ,  G03F1/84 ,  G02F1/37 ,  G01N21/956 ,  G21K1/06

Abstract: Disclosed is a method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method comprises performing the inspection using first inspection radiation obtained from a high harmonic generation source and having one or more first wavelengths within a first wavelength range of between 20nm and 150nm. Also disclosed is a method comprising performing (310) a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing (320) a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, said second wavelength range comprising wavelengths shorter than said first wavelength range.

公开(公告)号：WO2018046284A1

公开(公告)日：2018-03-15

申请号：PCT/EP2017/070990

申请日：2017-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： KUMAR, Nitish ,  SCHELLEKENS, Adrianus, Johannes, Hendrikus ,  VAN DER POST, Sietse, Thijmen ,  ZIJP, Ferry ,  COENE, Willem, Marie, Julia, Marcel ,  VAN VOORST, Peter, Danny ,  AKBULUT, Duygu ,  ROY, Sarathi

IPC: G03F7/20

Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a calibration method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a SIL would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.

Abstract translation: 光学系统在与基底上的目标结构相互作用之后提供照射辐射并收集辐射。 测量强度分布用于计算结构性质的测量值。 该光学系统可以包括固体浸没式透镜。 在校准方法中，控制光学系统以使用第一照射轮廓获得第一强度轮廓，并使用第二照射轮廓获得第二强度轮廓。 这些配置文件用于推导用于减轻重影反射影响的修正。 使用例如不同取向的半月照明轮廓，该方法即使在SIL会引起全内反射的情况下也可以测量重影反射。 光学系统可以包括污染物检测系统以基于接收到的散射检测辐射来控制移动。 该光学系统可以包括具有介电涂层的光学部件以增强瞬逝波相互作用。

公开(公告)号：WO2016192865A1

公开(公告)日：2016-12-08

申请号：PCT/EP2016/055388

申请日：2016-03-14

Applicant: ASML NETHERLANDS B.V.

Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  DEN BOEF, Arie, Jeffrey ,  POLO, Alessandro ,  TINNEMANS, Patricius, Aloysius, Jacobus ,  SCHELLEKENS, Adrianus, Johannes, Hendrikus ,  YEGANEGI DASTGERDI, Elahe ,  COENE, Willem, Marie, Julia, Marcel ,  BOGAART, Erik, Willem ,  HUISMAN, Simon, Reinald

IPC: G03F9/00

CPC classification number: G03F9/7088 ,  G03F7/70141

Abstract: An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.

Abstract translation: 提供了一种用于确定对准标记的位置的对准系统，方法和光刻设备，所述对准系统包括被配置为产生相对于彼此旋转大约180度的对准标记的两个重叠图像的第一系统，以及 第二系统，被配置为根据两个重叠图像的强度的空间分布来确定对准标记的位置。

公开(公告)号：WO2016091536A1

公开(公告)日：2016-06-16

申请号：PCT/EP2015/076582

申请日：2015-11-13

Applicant: ASML NETHERLANDS B.V.

Inventor： MIDDLEBROOKS, Scott, Anderson ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  PISARENCO, Maxim ,  KOOPMAN, Adrianus, Cornelis, Matheus ,  HUNSCHE, Stefan ,  COENE, Willem, Marie, Julia, Marcel

IPC: G06T7/00 ,  G03F7/20

CPC classification number: G06T7/001 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G06T2207/10061 ,  G06T2207/20068 ,  G06T2207/30148

Abstract: A method and apparatus of detection, registration and quantification of an image is described. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non- nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.

Abstract translation: 描述了图像的检测，配准和量化的方法和设备。 该方法可以包括获得光刻创建的结构的图像，并且将水平集方法应用于表示图像的结构的对象以创建结构的数学表示。 该方法可以包括：在参数的标称条件下获得表示结构的参考图像对象的第一数据集，以及在参数的非标称条件下获得表示该结构的模板图像对象的第二数据集。 该方法可以进一步包括获得表示第一数据集和第二数据集之间的变化的变形场。 可以通过变换第二数据集以将模板图像对象投影到参考图像对象上来生成变形场。 可以获得变形场与参数变化之间的依赖关系。