公开(公告)号：WO2022117295A1

公开(公告)日：2022-06-09

申请号：PCT/EP2021/081134

申请日：2021-11-09

Applicant: ASML NETHERLANDS B.V.

Inventor： SLOT, Erwin ,  MANGNUS, Albertus, Victor, Gerardus ,  SMAKMAN, Erwin, Paul ,  REN, Yan ,  SCOTUZZI, Marijke

IPC: H01J37/304

Abstract: A charged-particle tool configured to generate a plurality of sub- beams from a beam of charged particles and direct the sub-beams downbeam toward a sample (600) position, the tool charged-particle tool comprising at least three charged-particle-optical components (201,111,235,234); a detector module (240); and a controller. The detector module is configured to generate a detection signal in response to charged particles that propagate upbeam from the direction of the sample position. The controller is configured to operate the tool in a calibration mode.. The charged-particle-optical components include: a charged-particle source 201 configured to emit a beam of charged particles and a beam generator (111) configured to generate the sub-beams. The detection signal contains information about alignment of at least two of the charged-particle-optical components. The charged-particle optical components comprise two or more charged-particle optical elements comprising an array of apertures for which the charged particles may be monitored.

公开(公告)号：WO2022112027A1

公开(公告)日：2022-06-02

申请号：PCT/EP2021/081584

申请日：2021-11-12

Applicant: ASML NETHERLANDS B.V.

Inventor： HASPESLAGH, Luc, Roger, Simonne ,  PANDEY, Nitesh ,  VAN DER WOORD, Ties, Wouter ,  YEGEN, Halil, Gökay YEGEN ,  OVERKAMP, Jim, Vincent ,  BRONDANI TORRI, Guilherme ,  GOORDEN, Sebastianus, Adrianus ,  KLEIN, Alexander, Ludwig ,  OSORIO OLIVEROS, Edgar, Alberto

IPC: G03F7/20 ,  G02B26/08 ,  H01L41/047 ,  H01L41/083

Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.

公开(公告)号：WO2022111975A1

公开(公告)日：2022-06-02

申请号：PCT/EP2021/080873

申请日：2021-11-08

Applicant: ASML NETHERLANDS B.V.

Inventor： HASPESLAGH, Luc, Roger, Simonne ,  PANDEY, Nitesh ,  VAN DER WOORD, Ties, Wouter ,  YEGEN, Halil, Gökay ,  OVERKAMP, Jim, Vincent ,  GOORDEN, Sebastianus, Adrianus ,  HUMBLET, Alexis ,  KLEIN, Alexander, Ludwig ,  BRONDANI TORRI, Guilherme ,  OSORIO OLIVEROS, Edgar, Alberto

IPC: G03F7/20 ,  B81B7/00 ,  G02B26/08 ,  H01L41/09

Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.

公开(公告)号：WO2022111928A1

公开(公告)日：2022-06-02

申请号：PCT/EP2021/079532

申请日：2021-10-25

Applicant: ASML NETHERLANDS B.V.

Inventor： JANSEN, Maarten, Jozef

IPC: G01B9/02001

Abstract: The invention provides a positioning system to determine an absolute position of a moveable target relative to a reference, comprising an interferometer system with a first light source to emit light at a fixed frequency and a second light source to emit light at at least two different frequencies. The positioning system is configured to determine, based on movement of the target, a phase difference curve associated with a first frequency of the second light source and a phase difference curve associated with a second frequency of the second light source as a function of a phase difference associated with the fixed frequency of the first light source and to determine a cross-point to determine the absolute position of the moveable target. The invention also relates to a lithographic apparatus and corresponding method.

公开(公告)号：WO2022111919A1

公开(公告)日：2022-06-02

申请号：PCT/EP2021/079380

申请日：2021-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： ROPS, Cornelius, Maria ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  GATTOBIGIO, Giovanni, Luca ,  BERENDSEN, Christianus, Wilhelmus, Johannes

IPC: G03F7/20

Abstract: Disclosed herein is a fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus whereby a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system comprising: a damper arranged between a first extraction member and a second extraction member both configured to extract fluid; wherein the damper is configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate.

公开(公告)号：WO2022106161A1

公开(公告)日：2022-05-27

申请号：PCT/EP2021/079725

申请日：2021-10-26

Applicant: ASML NETHERLANDS B.V.

Inventor： NIHTIANOV, Stoyan ,  KANAI, Kenichi ,  RAMACHANDRA RAO, Padmakumar

IPC: H01J37/244 ,  G01T1/24

Abstract: A detector may be provided for a charged particle apparatus comprising: a sensing element including a diode; and a circuit configured to detect an electron event caused by an electron impacting the sensing element, wherein the circuit comprises a voltage monitoring device and a reset device, wherein the reset device is configured to regularly reset the diode by setting a voltage across the diode to a predetermined value, and wherein the voltage monitoring device is connected to the diode to monitor a voltage across the diode in between resets.

公开(公告)号：WO2022106157A1

公开(公告)日：2022-05-27

申请号：PCT/EP2021/079524

申请日：2021-10-25

Applicant: ASML NETHERLANDS B.V.

Inventor： PARAYIL VENUGOPALAN, Syam ,  KURGANOVA, Evgenia ,  FARAMARZI, Vina

IPC: C23C16/04 ,  C23C16/48 ,  G03F7/004 ,  G03F7/16 ,  H01L21/02 ,  H01L21/027 ,  H01L29/739

Abstract: Methods of forming a patterned layer of material are disclosed. In one arrangement, a substrate having a layered structure is provided. The layered structure comprises a base layer, a support layer, and a thermally insulating layer between the base layer and the support layer. The support layer comprises a plurality of sub-units that are thermally insulated from each other. A selected portion of the support layer is selectively irradiated during a pattern-forming process. The irradiation locally drives the pattern-forming process to form a layer of material in a pattern defined by the selected portion.

公开(公告)号：WO2022101204A1

公开(公告)日：2022-05-19

申请号：PCT/EP2021/081116

申请日：2021-11-09

Applicant: ASML NETHERLANDS B.V.

Inventor： TEN HAAF, Gijs ,  ADYANTHAYA, Shreya

IPC: G03F7/20 ,  G03F9/00

Abstract: Disclosed is a method for modeling measurement data over a substrate area relating to a substrate in a lithographic process. The method comprises obtaining measurement data relating to said substrate and performing a combined fitting to fit to the measurement data: at least a first interfield model which describes distortion over the substrate and a field distortion model which describes distortion within an exposure field; wherein either: said at least a first interfield model comprises a radial basis function model or an elastic energy minimizing spline model; or said method further comprises fitting a radial basis function model or an elastic energy minimizing spline model to a distortion residual of the combined fit of a different interfield model and the field distortion model.

公开(公告)号：WO2022083954A1

公开(公告)日：2022-04-28

申请号：PCT/EP2021/075812

申请日：2021-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： DE NIVELLE, Martin, Jules, Marie-Emile ,  SELEN, Jori ,  BONTEKOE, Marcel ,  TORUMBA, Doru, Cristian

IPC: G03F9/00 ,  G03F7/20

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus comprises a substrate table configured to support a substrate; actuators configurable to move the substrate table in a plane substantially parallel to the surface of the substrate; a projection system configured to pattern the substrate with fields aligned in a scanning exposure direction; a level sensor configured to sense a height of the substrate using a plurality of measurement spots; and a controller configured to control the actuators to generate strokes of relative movement between the substrate and the level sensor for mapping the height of the substrate, said strokes being at an angle of less than 20 degrees relative to the scanning exposure direction. Also disclosed is an associated method of mapping the height of a substrate.

公开(公告)号：WO2022073679A1

公开(公告)日：2022-04-14

申请号：PCT/EP2021/073138

申请日：2021-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： BUSTRAAN, Krijn, Frederik ,  GIJSBERTSEN, Arjan ,  VAN DONGEN, Paul ,  ACAN, Ibrahim

IPC: G03F7/20 ,  H01L21/687

Abstract: The invention provides a substrate holder to hold a substrate in a substrate holding position, comprising: a frame, multiple surface clamping devices arranged on the frame to clamp a substrate at an upper surface thereof, wherein the surface clamping devices each have a clamping pad to be arranged on the upper surface of the substrate, the surface clamping pads being movable with respect to each other at least in a first direction substantially perpendicular to the upper surface of a substrate held by the surface clamping pads, and one or more actuators to move the surface clamping pads with respect to each other in the first direction.