POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORMING METHOD
    74.
    发明申请
    POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORMING METHOD 审中-公开
    用于浸没曝光和图案形成方法的积极抵抗组合物

    公开(公告)号:WO2010035894A1

    公开(公告)日:2010-04-01

    申请号:PCT/JP2009/067192

    申请日:2009-09-25

    Abstract: A positive resist composition for immersion exposure includes the following (A) to (D): (A) a resin capable of decomposing by an action of an acid to increase a solubility of the resin in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a resin having at least either one of a fluorine atom and a silicon atom; and (D) a mixed solvent containing at least one kind of a solvent selected from the group consisting of solvents represented by any one of the following formulae (S1) to (S3) as defined in the specification, in which a total amount of the at least one kind of the solvent is from 3 to 20 mass% based on all solvents of the mixed solvent (D).

    Abstract translation: 用于浸渍曝光的正型抗蚀剂组合物包括以下(A)至(D):(A)能够通过酸的作用分解以增加树脂在碱性显影剂中的溶解度的树脂; (B)能够在用光化射线或辐射照射时能产生酸的化合物; (C)具有氟原子和硅原子中的至少一个的树脂; 和(D)含有至少一种选自由说明书中定义的下式(S1)至(S3)中任一项所示的溶剂的溶剂的溶剂的混合溶剂,其中, 相对于混合溶剂(D)的所有溶剂,至少一种溶剂为3〜20质量%。

    POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
    76.
    发明申请
    POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 审中-公开
    正极性组合物和使用其的图案形成方法

    公开(公告)号:WO2009119894A1

    公开(公告)日:2009-10-01

    申请号:PCT/JP2009/056837

    申请日:2009-03-26

    Abstract: A positive resist composition and a pattern forming method using the resist composition are provided, the resist composition including: (A) a resin containing a repeating structural unit represented by formula (I) as defined in the specification and being capable of decomposing by an action of an acid to increase the solubility in an alkali developer; (B) an acid generator; and (C) a mixed solvent containing at least one solvent selected from the group consisting of the following Group (a) and at least one solvent selected from the group consisting of the following Groups (b) to (d): Group (a): an alkylene glycol monoalkyl ether, Group (b): an alkylene glycol monoalkyl ether carboxylate, Group (c): a linear ketone, a branched chain ketone, a cyclic ketone, a lactone and an alkylene carbonate, and Group (d): a lactic acid ester, an acetic acid ester and an alkoxypropionic acid ester.

    Abstract translation: 提供了一种使用该抗蚀剂组合物的正性抗蚀剂组合物和图案形成方法,该抗蚀剂组合物包括:(A)含有本说明书中定义的式(I)表示的重复结构单元并且能够通过动作分解的树脂 的酸以增加在碱性显影剂中的溶解度; (B)酸发生剂; 和(C)含有至少一种选自下列组(a)和至少一种选自以下组(b)至(d)组的溶剂的溶剂的混合溶剂:组(a) 亚烷基二醇单烷基醚,(b):亚烷基二醇单烷基醚羧酸酯,(c)组:直链酮,支链酮,环酮,内酯和碳酸亚烷基酯,和(d): 乳酸酯,乙酸酯和烷氧基丙酸酯。

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