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    MASK, MASK BLANK, PHOTOSENSITIVE MATERIAL THEREFOR AND FABRICATION THEREOF
    1.
    发明申请
    MASK, MASK BLANK, PHOTOSENSITIVE MATERIAL THEREFOR AND FABRICATION THEREOF 审中-公开
    遮罩，遮罩，其感光材料及其制造

    公开(公告)号：WO2004107044A2

    公开(公告)日：2004-12-09

    申请号：PCT/US2004/015243

    申请日：2004-05-13

    Applicant: CORNING INCORPORATED ,  BELLMAN, Robert, A. ,  BORRELLI, Nicholas, F. ,  HARES, George, B. ,  SMITH, Charlene, M. ,  WALTON, Robin, M.

    Inventor： BELLMAN, Robert, A. ,  BORRELLI, Nicholas, F. ,  HARES, George, B. ,  SMITH, Charlene, M. ,  WALTON, Robin, M.

    IPC: G03F

    CPC classification number: G03F1/30 ,  C03C3/064 ,  C03C3/091 ,  C03C15/00 ,  G03F1/32 ,  G03F1/34

    Abstract: Disclosed are masks and mask blanks for photolithographic processes, photosensitive materials and fabrication method therefor. Photosensitive materials are used in the masks for recording permanent pattern features via UV exposure. The masks are advantageously phase-shifting, but can be gray-scale masks having index patterns with arbitrary distribution of refractive index and pattern dimension. The masks may have features above the surface formed from opaque or attenuating materials. Alumino-boro-germano-silicate glasses having a composition comprising, in terms of mole percentage, 1-6% of Al 2 O 3 , 10-36% of B 2 O 3 , 2-20% of GeO 2 , 40-80% of SiO 2 , 2-10% of R 2 O, where R is selected from Li, Na and K, and expressed in terms of weight percentage of the glass, 0-5% of F, can be used for the mask substrate.

    Abstract translation: 公开了用于光刻工艺的掩模和掩模坯料，感光材料及其制造方法。 光敏材料用于通过紫外线曝光记录永久图案特征的掩模。 掩模有利地是相移，但是可以是具有折射率和图案尺寸的任意分布的索引图案的灰度掩模。 掩模可以具有由不透明或衰减材料形成的表面上方的特征。 氧化铝 - 硼 - 锗酸 - 硅酸盐玻璃，其组成包括以摩尔百分比计为1〜6％的Al 2 O 3，10-36％的B 2 O 3，2〜20％的GeO 2，40〜80％的SiO 2，2-10 R 2选自Li，Na和K的R 2 O％，并且以玻璃重量百分比表示，0-5％的F可以用于掩模基板。

    DIMENSIONAL SILICA-BASED POROUS SILICON STRUCTURES AND METHODS OF FABRICATION
    2.
    发明申请
    DIMENSIONAL SILICA-BASED POROUS SILICON STRUCTURES AND METHODS OF FABRICATION 审中-公开
    尺寸二氧化硅多孔硅结构和制造方法

    公开(公告)号：WO2012027121A3

    公开(公告)日：2012-08-09

    申请号：PCT/US2011047367

    申请日：2011-08-11

    Applicant: CORNING INC ,  BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  DENEKA DAVID A ,  O'MALLEY SHAWN M ,  SCHNEIDER VITOR M

    Inventor： BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  DENEKA DAVID A ,  O'MALLEY SHAWN M ,  SCHNEIDER VITOR M

    IPC: C25D11/32

    CPC classification number: C03C23/0095 ,  C03C23/008 ,  H01L21/02002 ,  H01L21/02422 ,  H01L21/0245 ,  H01L21/02513 ,  H01L21/02532 ,  H01L21/02658 ,  H01L21/2257 ,  H01L21/3221 ,  H01L29/78603 ,  Y10T428/249969

    Abstract: Methods of fabricating dimensional silica-based substrates or structures comprising a porous silicon layers are contemplated. According to one embodiment, oxygen is extracted from the atomic elemental composition of a silica glass substrate by reacting a metallic gas with the substrate in a heated inert atmosphere to form a metal-oxygen complex along a surface of the substrate. The metal-oxygen complex is removed from the surface of the silica glass substrate to yield a crystalline porous silicon surface portion and one or more additional layers are formed over the crystalline porous silicon surface portion of the silica glass substrate to yield a dimensional silica-based substrate or structure comprising the porous silicon layer. Embodiments are also contemplated where the substrate is glass-based, but is not necessarily a silica-based glass substrate. Additional embodiments are disclosed and claimed.

    Abstract translation: 考虑制造尺寸二氧化硅基底或包括多孔硅层的结构的方法。 根据一个实施方案，通过在加热的惰性气氛中使金属气体与衬底反应，从石英玻璃衬底的原子元素组合物中提取氧，以沿着衬底的表面形成金属 - 氧络合物。 从石英玻璃基板的表面除去金属 - 氧络合物，得到结晶多孔硅表面部分，并且在石英玻璃基板的结晶多孔硅表面部分上形成一个或多个附加层，得到尺寸二氧化硅基 包括多孔硅层的衬底或结构。 也可以考虑实施方案，其中基材是基于玻璃的，但不一定是二氧化硅基玻璃基材。 公开并要求保护附加实施例。

    MASK, MASK BLANK, PHOTOSENSITIVE MATERIAL THEREFOR AND FABRICATION THEREOF
    5.
    发明申请
    MASK, MASK BLANK, PHOTOSENSITIVE MATERIAL THEREFOR AND FABRICATION THEREOF 审中-公开
    遮罩，遮罩，其感光材料及其制造

    公开(公告)号：WO2004107044A3

    公开(公告)日：2005-04-14

    申请号：PCT/US2004015243

    申请日：2004-05-13

    Applicant: BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  HARES GEORGE B ,  SMITH CHARLENE M ,  WALTON ROBIN M ,  CORNING INC

    Inventor： BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  HARES GEORGE B ,  SMITH CHARLENE M ,  WALTON ROBIN M

    IPC: C03C3/064 ,  C03C3/091 ,  C03C15/00 ,  G03F1/30 ,  G03F1/32 ,  G03F1/34 ,  G03F1/14 ,  G02B6/16 ,  G03F1/00

    CPC classification number: G03F1/30 ,  C03C3/064 ,  C03C3/091 ,  C03C15/00 ,  G03F1/32 ,  G03F1/34

    Abstract: Disclosed are masks and mask blanks for photolithographic processes, photosensitive materials and fabrication method therefor. Photosensitive materials are used in the masks for recording permanent pattern features via UV exposure. The masks are advantageously phase-shifting, but can be gray-scale masks having index patterns with arbitrary distribution of refractive index and pattern dimension. The masks may have features above the surface formed from opaque or attenuating materials. Alumino-boro-germano-silicate glasses having a composition comprising, in terms of mole percentage, 1-6% of Al2O3, 10-36% of B2O3, 2-20% of GeO2, 40-80% of SiO2, 2-10% of R2O, where R is selected from Li, Na and K, and expressed in terms of weight percentage of the glass, 0-5% of F, can be used for the mask substrate.

    Abstract translation: 公开了用于光刻工艺的掩模和掩模坯料，感光材料及其制造方法。 光敏材料用于通过紫外线曝光记录永久图案特征的掩模。 掩模有利地是相移，但是可以是具有折射率和图案尺寸的任意分布的索引图案的灰度掩模。 掩模可以具有由不透明或衰减材料形成的表面上方的特征。 氧化铝 - 硼 - 锗酸 - 硅酸盐玻璃，其组成包括以摩尔百分比计为1〜6％的Al 2 O 3，10-36％的B 2 O 3，2〜20％的GeO 2，40〜80％的SiO 2，2-10 R 2选自Li，Na和K的R 2 O％，并且以玻璃重量百分比表示，0-5％的F可以用于掩模基板。

    MASK, MASK BLANK, PHOTOSENSITIVE FILM THEREFOR AND FABRICATION THEREOF
    6.
    发明申请
    MASK, MASK BLANK, PHOTOSENSITIVE FILM THEREFOR AND FABRICATION THEREOF 审中-公开
    遮罩，遮罩，其感光膜及其制造方法

    公开(公告)号：WO2004107046A2

    公开(公告)日：2004-12-09

    申请号：PCT/US2004014005

    申请日：2004-05-05

    Applicant: BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  WALTON ROBIN M ,  CORNING INC

    Inventor： BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  WALTON ROBIN M

    IPC: C03C17/02 ,  C03C23/00 ,  G03F1/00 ,  G03F1/26 ,  G03F1/60 ,  G03F1/14

    CPC classification number: G03F1/60 ,  C03C17/02 ,  C03C23/002 ,  C03C2217/23 ,  C03C2218/32 ,  C03C2218/328 ,  G03F1/26

    Abstract: Disclosed are masks and mask blanks for photolithographic processes, photosensitive films and fabrication method therefor. Photosensitive films are deposited on a substrate in the masks for recording permanent pattern features via UV exposure. The masks are advantageously phase-shifting, but can be gray-scale masks having index patterns with arbitrary distribution of refractive index and pattern depth. The masks may have features above the surface formed from opaque or attenuating materials. Boro-germano-silicate photosensitive films having a composition consisting essentially, in terms of mole percentage, of: 0-20% of B2O3, 5-25% of GeO2 and the remainder SiO2 can be used for the film. The film is advantageously deposited by using PECVD wherein tetramethoxygermane is used as the germanium source.

    Abstract translation: 公开了用于光刻工艺的掩模和掩模坯料，感光膜及其制造方法。 感光膜沉积在掩模中的基底上，用于通过UV曝光记录永久图案特征。 掩模有利地是相移，但是可以是具有折射率和图案深度的任意分布的索引图案的灰度掩模。 掩模可以具有由不透明或衰减材料形成的表面上方的特征。 具有组成基本上以摩尔百分比为基准的硼硅酸盐光敏膜：0-20％的B2O3，5-25％的GeO2和剩余的SiO 2可用于该膜。 该薄膜有利地通过使用四甲氧基锗烷作为锗源的PECVD沉积。

    MASK, MASK BLANK, PHOTOSENSITIVE FILM THEREFOR AND FABRICATION THEREOF
    7.
    发明申请
    MASK, MASK BLANK, PHOTOSENSITIVE FILM THEREFOR AND FABRICATION THEREOF 审中-公开

    公开(公告)号：WO2004107046A3

    公开(公告)日：2004-12-09

    申请号：PCT/US2004/014005

    申请日：2004-05-05

    Applicant: CORNING INCORPORATED ,  BELLMAN, Robert, A. ,  BORRELLI, Nicholas, F. ,  WALTON, Robin, M.

    Inventor： BELLMAN, Robert, A. ,  BORRELLI, Nicholas, F. ,  WALTON, Robin, M.

    IPC: G03F1/14

    Abstract: Disclosed are masks and mask blanks for photolithographic processes, photosensitive films and fabrication method therefor. Photosensitive films are deposited on a substrate in the masks for recording permanent pattern features via UV exposure. The masks are advantageously phase-shifting, but can be gray-scale masks having index patterns with arbitrary distribution of refractive index and pattern depth. The masks may have features above the surface formed from opaque or attenuating materials. Boro-germano-silicate photosensitive films having a composition consisting essentially, in terms of mole percentage, of: 0-20% of B2O3, 5-25% of GeO2 and the remainder SiO2 can be used for the film. The film is advantageously deposited by using PECVD wherein tetramethoxygermane is used as the germanium source.

    DIMENSIONAL SILICA-BASED POROUS SILICON STRUCTURES AND METHODS OF FABRICATION
    8.
    发明申请
    DIMENSIONAL SILICA-BASED POROUS SILICON STRUCTURES AND METHODS OF FABRICATION 审中-公开
    二维硅基多孔硅结构和制造方法

    公开(公告)号：WO2012027121A2

    公开(公告)日：2012-03-01

    申请号：PCT/US2011/047367

    申请日：2011-08-11

    Applicant: CORNING INCORPORATED ,  BELLMAN, Robert A ,  BORRELLI, Nicholas F ,  DENEKA, David A. ,  O'MALLEY, Shawn M ,  SCHNEIDER, Vitor M

    Inventor： BELLMAN, Robert A ,  BORRELLI, Nicholas F ,  DENEKA, David A. ,  O'MALLEY, Shawn M ,  SCHNEIDER, Vitor M

    IPC: C25D11/32

    CPC classification number: C03C23/0095 ,  C03C23/008 ,  H01L21/02002 ,  H01L21/02422 ,  H01L21/0245 ,  H01L21/02513 ,  H01L21/02532 ,  H01L21/02658 ,  H01L21/2257 ,  H01L21/3221 ,  H01L29/78603 ,  Y10T428/249969

    Abstract: Methods of fabricating dimensional silica-based substrates or structures comprising a porous silicon layers are contemplated. According to one embodiment, oxygen is extracted from the atomic elemental composition of a silica glass substrate by reacting a metallic gas with the substrate in a heated inert atmosphere to form a metal-oxygen complex along a surface of the substrate. The metal-oxygen complex is removed from the surface of the silica glass substrate to yield a crystalline porous silicon surface portion and one or more additional layers are formed over the crystalline porous silicon surface portion of the silica glass substrate to yield a dimensional silica-based substrate or structure comprising the porous silicon layer. Embodiments are also contemplated where the substrate is glass-based, but is not necessarily a silica-based glass substrate. Additional embodiments are disclosed and claimed.

    Abstract translation: 考虑制造尺寸二氧化硅基衬底或包含多孔硅层的结构的方法。 根据一个实施例，通过在加热的惰性气氛中使金属气体与衬底反应以沿着衬底的表面形成金属 - 氧复合物，从二氧化硅玻璃衬底的原子元素组合物中提取氧。 将金属 - 氧复合物从二氧化硅玻璃基材的表面去除以产生结晶多孔硅表面部分，并且在石英玻璃基材的结晶多孔硅表面部分上形成一个或多个另外的层，以产生基于二氧化硅的尺寸 基材或包含多孔硅层的结构。 也考虑了其中衬底是基于玻璃的，但不一定是二氧化硅基玻璃衬底的实施例。 另外的实施例被公开和要求保护。

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