公开(公告)号：WO2008121620A1

公开(公告)日：2008-10-09

申请号：PCT/US2008/058150

申请日：2008-03-25

Applicant: ADVANCED TECHNOLOGY MATERIALS, INC. ,  KAIM, Robert ,  ARNO, Jose, I. ,  DIETZ, James, A.

Inventor： KAIM, Robert ,  ARNO, Jose, I. ,  DIETZ, James, A.

IPC: C30B31/08 ,  H01L21/265

CPC classification number: C30B31/22 ,  H01L21/26513

Abstract: A first method for producing a doped region in a semiconductor substrate includes performing a first implant step in which a carborane cluster molecule is implanted into a semiconductor substrate to form a doped region. A second method for producing a semiconductor device having a shallow junction region includes providing a first gas and a second gas in a container. The first gas includes a first dopant and the second gas includes a second dopant. The second method also includes implanting the first and second dopants into a semiconductor substrate using an ion. The ion source is not turned off between the steps of implanting the first dopant and implanting the second dopant.

Abstract translation: 用于在半导体衬底中制造掺杂区域的第一种方法包括进行第一注入步骤，其中将碳硼烷簇分子注入到半导体衬底中以形成掺杂区域。 用于制造具有浅结区域的半导体器件的第二种方法包括在容器中提供第一气体和第二气体。 第一气体包括第一掺杂剂，第二气体包括第二掺杂剂。 第二种方法还包括使用离子将第一和第二掺杂剂注入到半导体衬底中。 离子源在植入第一掺杂剂和注入第二掺杂剂的步骤之间不被关闭。

公开(公告)号：WO03040882A3

公开(公告)日：2003-09-12

申请号：PCT/US0235415

申请日：2002-11-05

Applicant: ADVANCED TECH MATERIALS ,  LURCOTT STEVEN M ,  TOM GLENN M ,  DUBOIS RAY ,  DIETZ JAMES A ,  ZITZMANN OLIVER A

Inventor： LURCOTT STEVEN M ,  TOM GLENN M ,  DUBOIS RAY ,  DIETZ JAMES A ,  ZITZMANN OLIVER A

IPC: G05B23/02 ,  G06F19/00 ,  G06F11/30

CPC classification number: G05B21/02 ,  G05B2219/13 ,  G05B2219/25204 ,  G05B2219/31457 ,  Y02P80/40 ,  Y02P90/86

Abstract: A method and apparatus (400) are provided for remotely configuring, operating and monitoring equipment (320, 330) in a manufacturing facility. An interface (230) is provided that allows a remote user to establish a connection with desired equipment (320, 330) in order to configure, operate or monitor the equipment (320,330). The disclosed interface (230) performs any required translation between the diverse equipment (320, 330) and protocols of different equipment manufacturers. A web-based connection to remote equipment allows a variety of diverse equipment systems to be accessed and controlled in a uniform manner. Historical data can be analyzed following a failure using pattern recognition techniques to identify data patterns that suggest an imminent failure.

Abstract translation: 提供了一种方法和装置（400），用于在制造设施中远程配置，操作和监视设备（320,330）。 提供了一种接口（230），其允许远程用户与所需设备（320,330）建立连接，以便配置，操作或监视设备（320,330）。 公开的接口（230）执行不同设备（320,330）和不同设备制造商的协议之间的任何所需的转换。 与远程设备的基于Web的连接允许以统一的方式访问和控制各种各样的设备系统。 历史数据可以在故障之后使用模式识别技术进行分析，以识别提示即将发生故障的数据模式。

公开(公告)号：WO2004088718A3

公开(公告)日：2005-04-28

申请号：PCT/US2004009168

申请日：2004-03-25

Applicant: ADVANCED TECH MATERIALS ,  ARNO JOSE I ,  DIETZ JAMES A

Inventor： ARNO JOSE I ,  DIETZ JAMES A

IPC: G01N21/35 ,  H01L21/66 ,  G05D11/00

CPC classification number: H01L22/20 ,  G01N21/3504 ,  Y10T137/0329 ,  Y10T137/2509 ,  Y10T137/87676

Abstract: Apparatus and method for delivery of dilute active fluid, e.g., to a downstream active fluid-consuming process unit of a semiconductor manufacturing plant. The delivery system includes an active fluid source, a diluent fluid source, a fluid flow metering device for dispensing of the active fluid at a predetermined flow rate, a mixer arranged to mix active gas from the active fluid source that is dispensed at such predetermined flow rate by the fluid flow metering device, with diluent fluid to form a diluted active fluid mixture, and a monitor arranged to measure concentration of active fluid in the diluted active fluid mixture, and responsively adjust the fluid flow metering device, to control the dispensing rate of the active fluid, and maintain a predetermined concentration of active fluid in the diluted active fluid mixture.

Abstract translation: 用于将稀释的活性流体递送到半导体制造工厂的下游有源流体消耗处理单元的装置和方法。 输送系统包括主动流体源，稀释液流体源，用于以预定流量分配活性流体的流体流量计量装置，设置成混合来自主动流体源的活性气体的混合器，该活性气体以预定流量分配 通过流体流量计量装置利用稀释液形成稀释的活性流体混合物，以及监测器，其布置成测量稀释的活性流体混合物中活性流体的浓度，并且响应地调节流体流量计量装置以控制分配速率 的活性流体，并且在稀释的活性流体混合物中保持预定浓度的活性流体。

公开(公告)号：WO2005051510A3

公开(公告)日：2005-06-09

申请号：PCT/US2004/039405

申请日：2004-11-23

Applicant: ADVANCED TECHNOLOGY MATERIALS, INC. ,  WODJENSKI, Michael, J. ,  DIETZ, James, A.

Inventor： WODJENSKI, Michael, J. ,  DIETZ, James, A.

IPC: G05D7/00

Abstract: A gas cabinet including an enclosure containing at least one gas supply vessel and flow circuitry coupled to the gas supply vessel(s). The flow circuitry is constructed and arranged to flow dispensed gas from an on-stream gas supply vessel to multiple sticks of the flow circuitry, with each of the multiple sticks being joined in gas flow communication to a respective gas-utilizing process unit. The flow circuitry is valved to enable sections of the flow circuitry associated with respective ones of the multiple sticks to be isolated from other sections of the flow circuitry, so that process gas can be flowed to one or more of the sticks, while other sticks are being evacuated and purged, or otherwise are closed to dispensed gas flow therethrough.

公开(公告)号：WO2005051510A2

公开(公告)日：2005-06-09

申请号：PCT/US2004039405

申请日：2004-11-23

Applicant: ADVANCED TECH MATERIALS ,  WODJENSKI MICHAEL J ,  DIETZ JAMES A

Inventor： WODJENSKI MICHAEL J ,  DIETZ JAMES A

IPC: B01D20060101 ,  F17C13/04 ,  G05D7/00 ,  B01D

CPC classification number: F17C13/04 ,  F17C2205/0142 ,  F17C2205/0146 ,  F17C2205/0326 ,  F17C2205/0329 ,  F17C2205/0335 ,  F17C2205/0338 ,  F17C2223/033 ,  F17C2223/035 ,  F17C2223/036 ,  F17C2223/038 ,  F17C2227/0114 ,  F17C2227/044 ,  F17C2270/0518 ,  Y10T137/0396 ,  Y10T137/0419 ,  Y10T137/4259 ,  Y10T137/7043 ,  Y10T137/87877

Abstract: A gas cabinet including an enclosure containing at least one gas supply vessel and flow circuitry coupled to the gas supply vessel(s). The flow circuitry is constructed and arranged to flow dispensed gas from an on-stream gas supply vessel to multiple sticks of the flow circuitry, with each of the multiple sticks being joined in gas flow communication to a respective gas-utilizing process unit. The flow circuitry is valved to enable sections of the flow circuitry associated with respective ones of the multiple sticks to be isolated from other sections of the flow circuitry, so that process gas can be flowed to one or more of the sticks, while other sticks are being evacuated and purged, or otherwise are closed to dispensed gas flow therethrough.

Abstract translation: 一种包括外壳的气柜，所述外壳包含至少一个气体供应容器和联接到所述气体供应容器的流动回路。 流动回路被构造和布置成使分配的气体从在线气体供应容器流动到流动回路的多个支杆，其中多个支杆中的每一个以气流连通的方式连接到相应的气体利用处理单元。 流动回路被阀门控制以使得与多个杆中的相应杆相关联的流动回路的部分能够与流动回路的其他部分隔离，使得处理气体可以流到一个或多个杆，而其他杆是 被抽空并被吹扫，或者被关闭以分配通过其中的气流。

公开(公告)号：WO2004088718A2

公开(公告)日：2004-10-14

申请号：PCT/US2004/009168

申请日：2004-03-25

Applicant: ADVANCED TECHNOLOGY MATERIALS INC. ,  ARNO, Jose, I. ,  DIETZ, James, A.

Inventor： ARNO, Jose, I. ,  DIETZ, James, A.

IPC: H01L

CPC classification number: H01L22/20 ,  G01N21/3504 ,  Y10T137/0329 ,  Y10T137/2509 ,  Y10T137/87676

Abstract: Apparatus and method for delivery of dilute active fluid, e.g., to a downstream active fluid-consuming process unit of a semiconductor manufacturing plant. The delivery system includes an active fluid source, a diluent fluid source, a fluid flow metering device for dispensing of the active fluid at a predetermined flow rate, a mixer arranged to mix active gas from the active fluid source that is dispensed at such predetermined flow rate by the fluid flow metering device, with diluent fluid to form a diluted active fluid mixture, and a monitor arranged to measure concentration of active fluid in the diluted active fluid mixture, and responsively adjust the fluid flow metering device, to control the dispensing rate of the active fluid, and maintain a predetermined concentration of active fluid in the diluted active fluid mixture.

Abstract translation: 用于将稀释的活性流体递送到半导体制造工厂的下游有源流体消耗处理单元的装置和方法。 输送系统包括主动流体源，稀释液流体源，用于以预定流量分配活性流体的流体流量计量装置，设置成混合来自主动流体源的活性气体的混合器，该活性气体以预定流量分配 通过流体流量计量装置利用稀释液形成稀释的活性流体混合物，以及监测器，其布置成测量稀释的活性流体混合物中活性流体的浓度，并且响应地调节流体流量计量装置以控制分配速率 的活性流体，并且在稀释的活性流体混合物中保持预定浓度的活性流体。

公开(公告)号：WO2003040882A2

公开(公告)日：2003-05-15

申请号：PCT/US2002/035415

申请日：2002-11-05

Applicant: ADVANCED TECHNOLOGY MATERIALS, INC. ,  LURCOTT, Steven, M. ,  TOM, Glenn, M. ,  DUBOIS, Ray ,  DIETZ, James, A. ,  ZITZMANN, Oliver, A.

Inventor： LURCOTT, Steven, M. ,  TOM, Glenn, M. ,  DUBOIS, Ray ,  DIETZ, James, A. ,  ZITZMANN, Oliver, A.

IPC: G06F

CPC classification number: G05B21/02 ,  G05B2219/13 ,  G05B2219/25204 ,  G05B2219/31457 ,  Y02P80/40 ,  Y02P90/86

Abstract: A method and apparatus are provided for remotely configuring, operating and monitoring equipment in a manufacturing facility. An interface is provided that allows a remote user to establish a connection with desired equipment in order to configure, operate or monitor the equipment. The disclosed interface performs any required translation between the diverse equipment and protocols of different equipment manufacturers. A web-based connection to remote equipment allows a variety of diverse equipment systems to be accessed and controlled in a uniform manner. Historical data can be analyzed following a failure using pattern recognition techniques to identify data patterns that suggest an imminent failure. The remote monitoring of ancillary equipment from a number of vendors in a semiconductor factory allows a multipoint failure to be analyzed and a root cause to be identified.

Abstract translation: 提供了用于在制造设施中远程配置，操作和监视设备的方法和装置。 提供了一个接口，允许远程用户建立与所需设备的连接，以配置，操作或监视设备。 所公开的接口在不同设备制造商的不同设备和协议之间执行任何所需的转换。 与远程设备的基于Web的连接允许以统一的方式访问和控制各种各样的设备系统。 历史数据可以在故障之后使用模式识别技术进行分析，以识别提示即将发生故障的数据模式。 半导体工厂的多家供应商对辅助设备的远程监控允许对多点故障进行分析，并确定根本原因。