GAS FLOW CONTROL APPARATUS
    5.
    发明申请
    GAS FLOW CONTROL APPARATUS 审中-公开
    气体流量控制装置

    公开(公告)号:WO9011822A3

    公开(公告)日:1990-11-15

    申请号:PCT/US9001011

    申请日:1990-03-05

    Applicant: UNIT INSTR INC

    Abstract: Gas flow control apparatus for controlling the flow of a process gas through a conduit system to a process site, for halting the flow of gas when the process is completed, and for then developing a partial vacuum in the conduit system sufficiently high to reduce the concentration of process gas and maintain it in a gaseous state. The partial vacuum is developed by carrier gas flowing through a venturi in communication with the conduit system supplying the process gas. The carrier gas also expels any remnants of the process gas from all points between the venturi and the process site. Further, the system can be used for vaporizing gases from liquids for use in an atmospheric process at the process site, the carrier gas flowing through the venturi and vaporizing a liquid in a chamber upstream of the venturi. The vaporized gases can then be regulated by a mass flow controller.

    Abstract translation: 用于控制工艺气体通过导管系统流向工艺现场的气流控制装置,用于在工艺完成时停止气体流动,然后在导管系统中产生足够高的部分真空以降低浓度 的过程气体并将其保持在气态。 部分真空通过流经与供应工艺气体的管道系统连通的文丘里管的载气产生。 载气也从文氏管和加工现场之间的所有点排出任何剩余的过程气体。 此外,该系统可用于蒸发来自液体的气体,用于在加工现场的大气过程中使用,载气流过文丘里管并蒸发文氏管上游的腔室中的液体。 蒸发的气体可以通过质量流量控制器进行调节。

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