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公开(公告)号：WO2002085808A1
公开(公告)日：2002-10-31
申请号：PCT/JP2002/003951
申请日：2002-04-19
IPC: C03C3/06
CPC classification number: C03C4/0071 , C03B19/1423 , C03B19/1453 , C03B19/1492 , C03B2201/07 , C03B2201/21 , C03B2201/23 , C03B2207/00 , C03C3/06 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2203/40 , C03C2203/44 , C03C2203/46 , C03C2203/52 , C03C2203/54 , G02B1/02 , G02B13/143 , G03F7/70241 , G03F7/70958
Abstract: A quartz glass member, wherein when the composition thereof is represented by SiOx, x takes a value of 1.85 to 1.95, the concentration of hydrogen molecules contained therein is 1 X 10 molecules/cm to 5 X 10 molecules/cm , and the value of (A-B) is 0.002 cm or less, where A represents the absorption coefficient observed immediately before the termination of irradiation when the irradiation of ArF excimer laser light is carried out in 1 X 10 pulses at one pulse energy density of 2 mJ/cm and B represents a second absorption coefficient observed 600 seconds after the stop of the above ArF excimer laser light irradiation. The use of the quartz glass member in optical systems for illumination and projection in a projection aligner allows the reduction of variation in the illuminance in an exposure region on a reticle plane or a wafer, which leads to a uniform exposure.
Abstract translation: 石英玻璃构件，当其组成由SiO x表示时，x取1.85〜1.95的值，其中所含的氢分子的浓度为1×10 16分子/ cm 3〜5×10 18 >分子/ cm 3，（AB）的值为0.002cm -1以下，其中A表示在ArF准分子激光的照射下进行照射结束之前观察到的吸收系数 1×10 4脉冲，脉冲能量密度为2mJ / cm 2，B表示在停止上述ArF准分子激光照射后600秒观察到的第二吸收系数。 在投影对准器中用于照明和投影的光学系统中使用石英玻璃构件允许减少在掩模版平面或晶片上的曝光区域中的照度的变化，这导致均匀的曝光。
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公开(公告)号：WO2004065315A1
公开(公告)日：2004-08-05
申请号：PCT/JP2004/000467
申请日：2004-01-21
IPC: C03B20/00
CPC classification number: C03C3/06 , C03B19/1423 , C03B19/1453 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2207/36 , C03C4/0085 , C03C2201/12 , C03C2201/21 , C03C2201/23
Abstract: 合成石英ガラス部材は、ＯＨ基濃度が１ｐｐｂ～１０ｐｐｍであり、Ｓｉに結合しているＦ濃度が０．５ｗｔ％～３．０ｗｔ％であり、水素分子濃度が１×１０ １６ 個／ｃｍ ３ ～５×１０ １７ 個／ｃｍ ３ である。高い紫外光透過率及び耐紫外線特性を有するとともに、緩和率が小さく、しかも面内分布に優れる。１９０ｎｍ以下の波長領域の紫外線に使用することが好適である。
Abstract translation: OH基浓度为1ppb〜10ppm的合成石英玻璃光学构件，与Si结合的F的浓度为0.5〜3.0重量％，氢分子浓度为1×10 16分子〜5× 10 17分子/ cm 3。 光学构件对于紫外线具有增强的透射率和改善的抗紫外线，并且还可以表现出降低的松弛率和在平面内的优异分布，因此可以适用于波长为190的紫外线 nm以下。
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公开(公告)号：WO2005005694A1
公开(公告)日：2005-01-20
申请号：PCT/JP2004/009839
申请日：2004-07-09
IPC: C30B29/18
CPC classification number: G03F7/70075 , G02B5/04 , G03F7/70958
Abstract: An artificial crystal member capable of being used as an optical element such as a prism and various optical elements constituting an optical integrator in a device using as a light source an ultrasonic laser such as an excimer laser having a wavelength shorter than 250 nm. An exposure system comprising a lighting optical system for lighting a mask using as a light source a laser beam having a wavelength shorter than 250 nm, and a projection optical system for projecting and exposing the pattern image of the above mask onto a substrate to be exposed, wherein disposed in the lighting optical system and/or the projection optical system is an optical element consisting of an artificial crystal member that has an initial transmittance with respect to a light with a wavelength of 150 nm of at least 60% per cm, striae of a first class or second class as defined by Japanese Optical Glass Industry Standard (JOGIS), an absorption coefficient alpha in an infrared absorption band of hydroxyl positioned at 3585 cm of up to 0.035/cm, an aluminum content of up to 1 ppm and a lithium content of up to 0.5 ppm.
Abstract translation: 可以在使用波长短于250nm的准分子激光器等超声波激光器作为光源的装置中使用能够用作诸如棱镜的光学元件和构成光学积分器的各种光学元件的人造晶体部件。 一种曝光系统，包括用于使用波长短于250nm的激光束作为光源照亮掩模的照明光学系统，以及投影光学系统，用于将上述掩模的图案图像投射并曝光到待曝光的基板上 其特征在于，配置在所述照明光学系统和/或投影光学系统中的是由相对于波长为150nm的光的初始透射率为至少60％/ cm的人造晶体构成的光学元件，条纹 由日本光学玻璃工业标准（JOGIS）定义的第一类或第二类，位于3585cm -1的羟基的红外吸收带的吸收系数α高达0.035 / cm，铝含量上升 至1ppm，锂含量高达0.5ppm。
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