公开(公告)号：WO2015088778A1

公开(公告)日：2015-06-18

申请号：PCT/US2014/067431

申请日：2014-11-25

Applicant: APPLIED MATERIALS, INC.

Inventor： HOLMGREN, Douglas E. ,  HOWELLS, Samuel C. ,  HUNTER, Aaron Muir ,  MOFFITT, Theodore P. ,  KEDLAYA, Diwakar N.

IPC: H01S3/0941 ,  H01L21/00 ,  H01S3/10

CPC classification number: B23K26/0648 ,  B23K26/0608 ,  B23K26/0738 ,  H01L21/67115

Abstract: Embodiments described herein relate to the rapid thermal processing of substrates. A fiber coupled laser diode array is provided in an optical system configured to generate a uniform irradiance pattern on the surface of a substrate. A plurality of individually controllable laser diodes are optically coupled via a plurality of fibers to one or more lenses. The fiber coupled laser diode array generates a Gaussian radiation profile which is defocused by the lenses to generate a uniform intensity image. In one embodiment, a field stop is disposed within the optical system.

Abstract translation: 本文所述的实施例涉及衬底的快速热处理。 在配置成在衬底的表面上产生均匀辐照度图案的光学系统中提供光纤耦合激光二极管阵列。 多个可单独控制的激光二极管通过多个光纤光耦合到一个或多个透镜。 光纤耦合的激光二极管阵列产生高斯辐射分布，其由透镜散焦以产生均匀的强度图像。 在一个实施例中，场停止件设置在光学系统内。

公开(公告)号：WO2022060635A1

公开(公告)日：2022-03-24

申请号：PCT/US2021/049849

申请日：2021-09-10

Applicant: APPLIED MATERIALS, INC.

Inventor： THOMAS, Timothy N. ,  LEAR, Robert Jordan ,  HOLMGREN, Douglas E. ,  KIDRON, Assaf ,  SWEHLA, Nigel

IPC: G02B26/08

Abstract: Embodiments of the present disclosure relate to mount apparatuses for digital micromirror devices of digital lithography systems and methods of mounting the digital micromirror devices. The mount apparatuses described herein retain spatial light modulators, such as DMDs. The mount apparatus enables the flattening of the DMD by providing a force such that the pair of contact pads contact the DMD. The DMD is positioned in a mounting frame of the mount apparatus. Contact pads of the mounting frame are operable to apply pressure to the DMD.

公开(公告)号：WO2017062852A1

公开(公告)日：2017-04-13

申请号：PCT/US2016/056111

申请日：2016-10-07

Applicant: APPLIED MATERIALS, INC.

Inventor： CHU, Schubert S. ,  HOLMGREN, Douglas E. ,  SHAH, Kartik ,  GAJENDRA, Palamurali ,  MYO, Nyi O. ,  RAO, Preetham ,  BAUTISTA, Kevin Joseph ,  YE, Zhiyuan ,  HILKENE, Martin A. ,  SANCHEZ, Errol Antonio C. ,  COLLINS, Richard O.

IPC: H01L21/67 ,  H01L21/683 ,  H01L21/324 ,  H01L29/861

CPC classification number: H01L21/67115 ,  H01L21/268 ,  H01L21/324 ,  H01L21/68764

Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber. The thermal process chamber may include a substrate support, a first plurality of heating elements disposed over the substrate support, and one or more high-energy radiant source assemblies disposed over the first plurality of heating elements. The one or more high-energy radiant source assemblies are utilized to provide local heating of cold regions on a substrate disposed on the substrate support during processing. Localized heating of the substrate improves temperature profile, which in turn improves deposition uniformity.

Abstract translation: 本公开的实施例一般涉及用于半导体处理的装置和方法，更具体地涉及热处理室。 热处理室可以包括基板支撑件，设置在基板支撑件上方的第一多个加热元件以及设置在第一多个加热元件上的一个或多个高能辐射源组件。 一个或多个高能量辐射源组件用于在处理期间在设置在衬底支撑件上的衬底上提供冷区域的局部加热。 衬底的局部加热改善了温度分布，进而改善了沉积均匀性。

公开(公告)号：WO2013090581A1

公开(公告)日：2013-06-20

申请号：PCT/US2012/069518

申请日：2012-12-13

Applicant: APPLIED MATERIALS, INC. ,  MOFFATT, Stephen ,  HOLMGREN, Douglas E. ,  HOWELLS, Samuel C. ,  TONG, Edric ,  ADAMS, Bruce E. ,  LI, Jiping ,  HUNTER, Aaron Muir

Inventor： MOFFATT, Stephen ,  HOLMGREN, Douglas E. ,  HOWELLS, Samuel C. ,  TONG, Edric ,  ADAMS, Bruce E. ,  LI, Jiping ,  HUNTER, Aaron Muir

IPC: H01L21/268 ,  H01L21/26

CPC classification number: G02B27/106 ,  G02B17/0888 ,  G02B27/0025 ,  G02B27/10 ,  G02B27/1006 ,  G02B27/12 ,  G02B27/123 ,  G02B27/126 ,  G02B27/14 ,  G02B27/143 ,  G02B27/30

Abstract: Apparatus and methods for combining beams of amplified radiation are disclosed. A beam combiner has a collimating optic positioned to receive a plurality of coherent radiation beams at a constant angle of incidence with respect to an optical axis of the collimating optic. The respective angles of incidence may also be different in some embodiments. The collimating optic has an optical property that collimates the beams. The optical property may be refractive or reflective, or a combination thereof. A collecting optic may also be provided to direct the plurality of beams to the collimating optic. The beam combiner may be used in a thermal processing apparatus to combine more than two beams of coherent amplified radiation, such as lasers, into a single beam.

Abstract translation: 公开了用于组合放大辐射束的装置和方法。 光束组合器具有准直光学器件，其被定位成以相对于准直光学器件的光轴的恒定入射角接收多个相干辐射束。 在一些实施例中，相应的入射角也可以不同。 准直光学元件具有使光束准直的光学特性。 光学性质可以是折射或反射的，或其组合。 还可以提供收集光学器件以将多个光束引导到准直光学元件。 光束组合器可以用在热处理装置中，以将多于两个的相干放大辐射束（例如激光器）组合成单个光束。

公开(公告)号：WO2016014173A1

公开(公告)日：2016-01-28

申请号：PCT/US2015/035851

申请日：2015-06-15

Applicant: APPLIED MATERIALS, INC.

Inventor： HUNTER, Aaron Muir ,  SADE, Amikam ,  HOWELLS, Samuel C. ,  HOLMGREN, Douglas E. ,  ADAMS, Bruce E. ,  MOFFITT, Theodore P. ,  MOFFATT, Stephen

IPC: H01L21/324 ,  H01L21/67

CPC classification number: B23K26/70 ,  B23K26/0066 ,  B23K26/0622 ,  B23K26/0732 ,  B23K26/082 ,  B23K26/083 ,  B23K26/352 ,  H01L21/268 ,  H01L21/67115

Abstract: Apparatus, system, and method for thermally treating a substrate. A source of pulsed electromagnetic energy can produce pulses at a rate of at least 100 Hz. A movable substrate support can move a substrate relative to the pulses of electromagnetic energy. An optical system can be disposed between the energy source and the movable substrate support, and can include components to shape the pulses of electromagnetic energy toward a rectangular profile. A controller can command the source of electromagnetic energy to produce pulses of energy at a selected pulse rate. The controller can also command the movable substrate support to scan in a direction parallel to a selected edge of the rectangular profile at a selected speed such that every point along a line parallel to the selected edge receives a predetermined number of pulses of electromagnetic energy.

Abstract translation: 用于热处理基底的装置，系统和方法。 脉冲电磁能源可以以至少100Hz的速率产生脉冲。 可移动的衬底支撑件可相对于电磁能的脉冲移动衬底。 光学系统可以设置在能量源和可移动衬底支撑件之间，并且可以包括将电磁能脉冲朝向矩形轮廓成形的部件。 控制器可以命令电磁能量源以选定的脉冲速率产生能量脉冲。 控制器还可以以可选择的速度命令可移动衬底支撑件沿平行于所述矩形轮廓的选定边缘的方向扫描，使得沿着与选定边缘平行的线的每个点接收预定数量的电磁能量脉冲。

公开(公告)号：WO2014143327A1

公开(公告)日：2014-09-18

申请号：PCT/US2013/077128

申请日：2013-12-20

Applicant: APPLIED MATERIALS, INC.

Inventor： LI, Jiping ,  HUNTER, Aaron Muir ,  ADAMS, Bruce E. ,  HOLMGREN, Douglas E. ,  HOWELLS, Samuel C. ,  MOFFITT, Theodore P. ,  MOFFATT, Stephen

IPC: H01L21/324

CPC classification number: G02B3/0037 ,  G02B27/48

Abstract: Embodiments described herein relate to thermal processing of semiconductor substrates. More specifically, embodiments described herein relate to laser thermal processing of semiconductor substrates. In certain embodiments, a uniformizer is provided to spatially and temporally decorrelate a coherent light image.

Abstract translation: 本文所述的实施例涉及半导体衬底的热处理。 更具体地，本文所述的实施例涉及半导体衬底的激光热处理。 在某些实施例中，提供均匀器来空间和时间地去相关联相干光图像。

公开(公告)号：WO2014143298A1

公开(公告)日：2014-09-18

申请号：PCT/US2013/076175

申请日：2013-12-18

Applicant: APPLIED MATERIALS, INC.

Inventor： HOLMGREN, Douglas E.

IPC: B23K26/06 ,  B23K26/352 ,  C21D1/09

CPC classification number: G02B27/0988 ,  G02B27/0911 ,  H01L21/268 ,  H01L21/2686 ,  H01L21/324

Abstract: Embodiments of the invention generally relate to laser annealing systems with optics for imaging a pattern on a substrate. The optics may comprise an aperture or plurality of apertures which shape an image to be exposed on a surface of a substrate. The image may be determined by the shape of an aperture within the optics system.

Abstract translation: 本发明的实施例通常涉及具有用于对衬底上的图案进行成像的光学器件的激光退火系统。 光学元件可以包括孔或多个孔，其形成要暴露在基底表面上的图像。 图像可以由光学系统内的孔的形状来确定。

公开(公告)号：WO2013066600A1

公开(公告)日：2013-05-10

申请号：PCT/US2012/059991

申请日：2012-10-12

Applicant: APPLIED MATERIALS, INC. ,  HOLMGREN, Douglas E. ,  HOWELLS, Samuel C.

Inventor： HOLMGREN, Douglas E. ,  HOWELLS, Samuel C.

IPC: H01L21/268 ,  H01L21/324

CPC classification number: B23K26/0648 ,  B23K26/00 ,  B23K26/0006 ,  B23K26/034 ,  B23K26/06 ,  B23K26/0626 ,  B23K26/082 ,  B23K26/0853 ,  B23K26/0876 ,  B23K2201/40 ,  B23K2203/56 ,  G02B27/09 ,  G02B27/0911 ,  G02B27/0961 ,  G02B27/0966 ,  G02B27/10 ,  H01L21/268 ,  H01L21/67115 ,  H01L24/80

Abstract: Embodiments of the invention provides an apparatus including a substrate support, a source of laser radiation emitting laser radiation along an optical path, and an illumination optics disposed along the optical path. The illumination optics includes a set of slow-axis and fast-axis lenses. The apparatus further includes a homogenizer disposed between of the illumination optics and the substrate support along the optical path. The homogenizer includes a first and a second micro-optic lenslet arrays of cylindrical lenses, wherein the second micro-optic lenslet array of cylindrical lenses has a relatively larger lenslet pitch than that of the first micro-optic lenslet array of cylindrical lenses, and lenslet axes of the first micro-optic lenslet array and lenslet axes of the second micro-optic lenslet array are oriented along an axis that is parallel to a fast axis of the source of laser radiation.

Abstract translation: 本发明的实施例提供了一种装置，其包括基板支撑件，沿着光路发射激光辐射的激光辐射源，以及沿着光路布置的照明光学器件。 照明光学器件包括一组慢轴和快轴透镜。 该装置还包括沿着光路设置在照明光学器件和衬底支撑件之间的均质器。 均化器包括柱面透镜的第一和第二微小透镜阵列阵列，其中柱面透镜的第二微小透镜小透镜阵列具有比第一微小透镜柱面透镜阵列更小的小透镜间距，以及透镜 第一微光学小透镜阵列的轴线和第二微小透镜阵列的小透镜轴线沿着平行于激光辐射源的快轴的轴线定向。