公开(公告)号：WO2013070917A1

公开(公告)日：2013-05-16

申请号：PCT/US2012/064153

申请日：2012-11-08

Applicant: APPLIED MATERIALS, INC. ,  PAN, Heng ,  ROGERS, Matthew Scott ,  HUNTER, Aaron Muir ,  MOFFATT, Stephen

Inventor： PAN, Heng ,  ROGERS, Matthew Scott ,  HUNTER, Aaron Muir ,  MOFFATT, Stephen

IPC: H01L21/66

CPC classification number: G01J5/08 ,  G01J5/0007 ,  G01J5/0803 ,  G01J2005/0074 ,  G01J2005/0077

Abstract: Embodiments of the present invention generally relate to apparatus for and methods of measuring and monitoring the temperature of a substrate having a 3D feature thereon. The apparatus include a light source for irradiating a substrate having a 3D feature thereon, a focus lens for gathering and focusing reflected light, and an emissometer for detecting the emissivity of the focused reflected light. The apparatus may also include a beam splitter and an imaging device. The imaging device provides a magnified image of the diffraction pattern of the reflected light. The method includes irradiating a substrate having a 3D feature thereon with light, and focusing reflected light with a focusing lens. The focused light is then directed to a sensor and the emissivity of the substrate is measured. The reflected light may also impinge upon an imaging device to generate a magnified image of the diffraction pattern of the reflected light.

Abstract translation: 本发明的实施例一般涉及用于测量和监测其上具有3D特征的基板的温度的方法的装置。 该装置包括用于照射其上具有3D特征的基板的光源，用于聚焦和聚焦反射光的聚焦透镜，以及用于检测聚焦反射光的发射率的发射计。 该装置还可以包括分束器和成像装置。 成像装置提供反射光的衍射图案的放大图像。 该方法包括用光照射具有3D特征的基板，并且将聚焦透镜聚焦在反射光上。 然后将聚焦的光导向传感器，并测量衬底的发射率。 反射光也可能撞击成像装置以产生反射光的衍射图案的放大图像。

公开(公告)号：WO2012148621A4

公开(公告)日：2012-11-01

申请号：PCT/US2012/031140

申请日：2012-03-29

Applicant: APPLIED MATERIALS, INC. ,  STOWELL, Michael W. ,  FOAD, Majeed A. ,  HOFMANN, Ralf ,  ADERHOLD, Wolfgang R. ,  MOFFATT, Stephen

Inventor： STOWELL, Michael W. ,  FOAD, Majeed A. ,  HOFMANN, Ralf ,  ADERHOLD, Wolfgang R. ,  MOFFATT, Stephen

IPC: H01L21/324

Abstract: Methods and apparatus for radiation processing of semiconductor substrates using microwave or millimeter wave energy are provided. The microwave or millimeter wave energy may have a frequency between about 600 MHz and about 1 THz. Alternating current from a magnetron is coupled to a leaky microwave emitter that has an inner conductor and an outer conductor, the outer conductor having openings with a dimension smaller than a wavelength of the emitted radiation. The inner and outer conductors are separated by an insulating material. Interference patterns produced by the microwave emissions may be uniformized by phase modulating the power to the emitter and/or by frequency modulating the frequency of the power itself. Power from a single generator may be divided to two or more emitters by a power divider.

公开(公告)号：WO2009017894A1

公开(公告)日：2009-02-05

申请号：PCT/US2008/067493

申请日：2008-06-19

Applicant: APPLIED MATERIALS, INC. ,  JENNINGS, Dean ,  THOMAS, Timothy N. ,  MOFFATT, Stephen ,  LI, Jiping ,  ADAMS, Bruce E. ,  HOWELLS, Samuel C.

Inventor： JENNINGS, Dean ,  THOMAS, Timothy N. ,  MOFFATT, Stephen ,  LI, Jiping ,  ADAMS, Bruce E. ,  HOWELLS, Samuel C.

IPC: B23K26/067 ,  H01L21/268

CPC classification number: G02B27/283 ,  B23K26/0604 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/067 ,  G02B27/10 ,  G02B27/144 ,  G02B27/145 ,  G02B27/48 ,  H01L21/268 ,  H01L21/67115

Abstract: A method and apparatus for decorrelating coherent light from a light source, such as a pulsed laser, in both time and space in an effort to provide intense and uniform illumination are provided. For some embodiments employing a pulsed light source, the output pulse may be stretched relative to the input pulse width. The methods and apparatus described herein may be incorporated into any application where intense, uniform illumination is desired, such as pulsed laser annealing, welding, ablating, and wafer stepper illuminating.

Abstract translation: 提供了一种用于在时间和空间上从光源（例如脉冲激光）去除相干光的方法和装置，以提供强烈和均匀的照明。 对于采用脉冲光源的一些实施例，可以相对于输入脉冲宽度拉伸输出脉冲。 本文描述的方法和装置可以结合到需要强烈均匀照明的任何应用中，例如脉冲激光退火，焊接，烧蚀和晶片步进照明。

公开(公告)号：WO2013191863A1

公开(公告)日：2013-12-27

申请号：PCT/US2013/043401

申请日：2013-05-30

Applicant: APPLIED MATERIALS, INC. ,  SADE, Amikam ,  MOFFATT, Stephen ,  ADAMS, Bruce, E.

Inventor： SADE, Amikam ,  MOFFATT, Stephen ,  ADAMS, Bruce, E.

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/7025 ,  G03F7/70858

Abstract: Device for processing a substrate are described herein. Devices can include a radiation source and an aperture positioned to receive radiant energy from the radiation source. The aperture can include one or more members, and one or more interfering areas, wherein the interfering areas surround a transmissive area. The one or more structures can affect transmission of radiant energy through a portion of the transmissive area of the aperture. Structures disposed on the aperture can reduce or redirect transmission to provide for more uniform overall transmission of radiant energy through the aperture.

Abstract translation: 本文描述了用于处理衬底的装置。 设备可以包括辐射源和定位成接收来自辐射源的辐射能的孔。 孔可以包括一个或多个构件以及一个或多个干扰区域，其中干扰区域围绕透射区域。 一个或多个结构可以影响通过孔的透射区域的一部分的辐射能的传输。 设置在孔径上的结构可以减少或重定向透射以提供通过孔径的辐射能的更均匀的全面透射。

公开(公告)号：WO2013090581A1

公开(公告)日：2013-06-20

申请号：PCT/US2012/069518

申请日：2012-12-13

Applicant: APPLIED MATERIALS, INC. ,  MOFFATT, Stephen ,  HOLMGREN, Douglas E. ,  HOWELLS, Samuel C. ,  TONG, Edric ,  ADAMS, Bruce E. ,  LI, Jiping ,  HUNTER, Aaron Muir

Inventor： MOFFATT, Stephen ,  HOLMGREN, Douglas E. ,  HOWELLS, Samuel C. ,  TONG, Edric ,  ADAMS, Bruce E. ,  LI, Jiping ,  HUNTER, Aaron Muir

IPC: H01L21/268 ,  H01L21/26

CPC classification number: G02B27/106 ,  G02B17/0888 ,  G02B27/0025 ,  G02B27/10 ,  G02B27/1006 ,  G02B27/12 ,  G02B27/123 ,  G02B27/126 ,  G02B27/14 ,  G02B27/143 ,  G02B27/30

Abstract: Apparatus and methods for combining beams of amplified radiation are disclosed. A beam combiner has a collimating optic positioned to receive a plurality of coherent radiation beams at a constant angle of incidence with respect to an optical axis of the collimating optic. The respective angles of incidence may also be different in some embodiments. The collimating optic has an optical property that collimates the beams. The optical property may be refractive or reflective, or a combination thereof. A collecting optic may also be provided to direct the plurality of beams to the collimating optic. The beam combiner may be used in a thermal processing apparatus to combine more than two beams of coherent amplified radiation, such as lasers, into a single beam.

Abstract translation: 公开了用于组合放大辐射束的装置和方法。 光束组合器具有准直光学器件，其被定位成以相对于准直光学器件的光轴的恒定入射角接收多个相干辐射束。 在一些实施例中，相应的入射角也可以不同。 准直光学元件具有使光束准直的光学特性。 光学性质可以是折射或反射的，或其组合。 还可以提供收集光学器件以将多个光束引导到准直光学元件。 光束组合器可以用在热处理装置中，以将多于两个的相干放大辐射束（例如激光器）组合成单个光束。

公开(公告)号：WO2009023442A1

公开(公告)日：2009-02-19

申请号：PCT/US2008/071761

申请日：2008-07-31

Applicant: APPLIED MATERIALS, INC. ,  ADAMS, Bruce, E. ,  HOWELLS, Samuel, C. ,  JENNINGS, Dean ,  LI, Jiping ,  THOMAS, Timothy, N. ,  MOFFATT, Stephen

Inventor： ADAMS, Bruce, E. ,  HOWELLS, Samuel, C. ,  JENNINGS, Dean ,  LI, Jiping ,  THOMAS, Timothy, N. ,  MOFFATT, Stephen

IPC: H01L21/20

CPC classification number: B23K26/073 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/067 ,  B23K26/0732 ,  B23K2203/56 ,  G02B27/0961

Abstract: The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be square or rectangular in shape. Generally, the optical system and methods of the present invention are used to preferentially anneal one or more regions found within the anneal regions by delivering enough energy to cause the one or more regions to re-melt and solidify.

Abstract translation: 本发明一般涉及能够在包含在基板的表面上的退火区域上可靠地输送均匀的能量的光学系统。 光学系统适于在衬底的表面上的期望区域上传送或投影具有期望的二维形状的均匀量的能量。 通常，退火区域可以是正方形或矩形形状。 通常，本发明的光学系统和方法用于通过递送足够的能量以使一个或多个区域再熔化和固化来优先退火在退火区域内发现的一个或多个区域。

公开(公告)号：WO2008021747A2

公开(公告)日：2008-02-21

申请号：PCT/US2007/075119

申请日：2007-08-02

Applicant: APPLIED MATERIALS, INC. ,  THAKUR, Randhir P.s. ,  MOFFATT, Stephen ,  HANSSON, Per-ove ,  GHANAYEM, Steve

Inventor： THAKUR, Randhir P.s. ,  MOFFATT, Stephen ,  HANSSON, Per-ove ,  GHANAYEM, Steve

IPC: H01L21/47

CPC classification number: H01L21/76254 ,  H01L21/02052

Abstract: Methods for cleaning substrate surfaces utilized in SOI technology are provided. In one embodiment, the method for cleaning substrate surfaces includes providing a first substrate and a second substrate, wherein the first substrate has a silicon oxide layer formed thereon and a cleavage plane defined therein, performing a wet cleaning process on the surfaces of the first substrate and the second substrate, and bonding the cleaned silicon oxide layer to the cleaned surface of the second substrate.

Abstract translation: 提供了用于清洁SOI技术中使用的衬底表面的方法。 在一个实施例中，用于清洁衬底表面的方法包括提供第一衬底和第二衬底，其中第一衬底具有形成在其上的氧化硅层和限定在其中的解理面，在第一衬底的表面上进行湿式清洁处理 和第二基板，并且将清洁的氧化硅层接合到第二基板的清洁表面。

公开(公告)号：WO2013109328A2

公开(公告)日：2013-07-25

申请号：PCT/US2012/061676

申请日：2012-10-24

Applicant: APPLIED MATERIALS, INC. ,  MOFFATT, Stephen

Inventor： MOFFATT, Stephen

IPC: H01L31/18 ,  H01L31/042

CPC classification number: H01L31/1872 ,  B23K26/0066 ,  B23K26/067 ,  B23K26/0732 ,  B23K26/082 ,  B23K26/0821 ,  C30B1/02 ,  C30B29/06 ,  C30B35/00 ,  H01L21/67115 ,  H01L21/6776 ,  Y02E10/50 ,  Y02P70/521

Abstract: Apparatus and methods of thermally processing semiconductor substrates are disclosed. Aspects of the apparatus include a source of intense radiation and a rotating energy distributor that distributes the intense radiation to a rectifier. The rectifier directs the radiation toward the substrate. Aspects of the method include using a rotating energy distributor to distribute pulsed energy to a substrate for processing. The rotational rate of the energy distributor is set based on the pulse repetition rate of the energy source. A substrate may be continuously translated with respect to the energy distributor at a rate set based on the pulse repetition rate of the energy source.

Abstract translation: 公开了热处理半导体衬底的设备和方法。 装置的各个方面包括强辐射源和将强辐射分配到整流器的旋转能量分配器。 整流器将辐射导向基板。 该方法的各方面包括使用旋转能量分配器来将脉冲能量分配到基板以进行处理。 能量分配器的转速基于能量源的脉冲重复率来设定。 衬底可以以基于能量源的脉冲重复率设置的速率相对于能量分配器连续平移。

公开(公告)号：WO2013074444A1

公开(公告)日：2013-05-23

申请号：PCT/US2012/064638

申请日：2012-11-12

Applicant: APPLIED MATERIALS, INC. ,  MOFFATT, Stephen

Inventor： MOFFATT, Stephen

IPC: H01S3/10 ,  H01S3/13

CPC classification number: H01S3/10092 ,  H01S3/0602 ,  H01S3/08086 ,  H01S3/091 ,  H01S3/10007 ,  H01S3/10015 ,  H01S3/10038 ,  H01S3/10084 ,  H01S3/11 ,  H01S3/1611 ,  H01S3/163 ,  H01S3/1643 ,  H01S3/2375 ,  H01S5/0622

Abstract: A laser that emits light at all available frequencies distributed throughout the spectral bandwidth or emission bandwidth of the laser in a single pulse or pulse train is disclosed. The laser is pumped or seeded with photons having frequencies distributed throughout the superunitary gain bandwidth of the gain medium. The source of photons is a frequency modulated photon source, and the frequency modulation is controlled to occur in one or more cycles timed to occur within a time scale for pulsing the laser.

Abstract translation: 公开了一种在单个脉冲或脉冲串中分布在整个光谱带宽或发射带宽上的所有可用频率发射光的激光器。 激光器被泵浦或种子，光子的频率分布在增益介质的超级增益带宽内。 光子源是频率调制的光子源，并且频率调制被控制在一个或多个周期中发生，定时地在时间尺度内发生以激发激光。

公开(公告)号：WO2012170567A2

公开(公告)日：2012-12-13

申请号：PCT/US2012/041144

申请日：2012-06-06

Applicant: APPLIED MATERIALS, INC. ,  MOFFATT, Stephen

Inventor： MOFFATT, Stephen

IPC: H01L21/268 ,  H01L21/324

CPC classification number: B23K26/0648 ,  B23K26/0006 ,  B23K26/0081 ,  B23K26/0626 ,  B23K26/064 ,  B23K26/0643 ,  B23K2203/56 ,  C30B13/22 ,  C30B35/00 ,  H01L21/67115

Abstract: A method and apparatus for annealing semiconductor substrates is disclosed. The apparatus has a pulsed energy source that directs pulsed energy toward a substrate. A homogenizer increases the spatial uniformity of the pulsed energy. A pulse shaping system shapes the temporal profile of the pulsed energy. A pulse circulator may be selected using a bypass system. The pulse circulator allows a pulse of energy to circulate around a path of reflectors, and a partial reflector allows a portion of the pulse to exit the pulse circulator with each cycle. The pulse circulator may have delaying elements and amplifying elements to tailor the pulses exiting from the circulator.

Abstract translation: 公开了半导体衬底退火的方法和装置。 该装置具有将脉冲能量引向衬底的脉冲能量源。 均化器增加了脉冲能量的空间均匀性。 脉冲整形系统对脉冲能量的时间分布进行整形。 可以使用旁路系统选择脉冲循环器。 脉冲循环器允许能量脉冲围绕反射器的路径循环，并且部分反射器允许脉冲的一部分在每个周期内离开脉冲循环器。 脉冲循环器可以具有延迟元件和放大元件以调节从循环器排出的脉冲。