公开(公告)号：WO2004090582A3

公开(公告)日：2005-06-16

申请号：PCT/US2004009968

申请日：2004-04-01

Applicant: ZETETIC INST ,  HILL HENRY ALLEN

Inventor： HILL HENRY ALLEN

IPC: G02B17/08 ,  G02B21/00 ,  G02B27/10 ,  G02B3/02 ,  G02B3/08 ,  G02B17/00

CPC classification number: G02B21/0056 ,  G02B21/0024

Abstract: A method of fabricating a catadioptric lens system (600), the method involving: fabricating a single catadioptric lens element having a bottom surface and an upper surface, the upper surface having a convex portion and a concave portion, both the convex and concave portions sharing a common axis of symmetry; cutting apart the catadioptric lens element to form 2n pie-shaped segments (630, 632, 640, 642), wherein n is an integer; and reassembling the 2n pie-shaped segments to form the catadioptric lens system with n of the 2n pie-shaped segments being located above a common plane and the rest of the 2n pie-shaped elements being below the common plane.

Abstract translation: 一种制造折反射透镜系统（600）的方法，所述方法包括：制造具有底表面和上表面的单个折反射透镜元件，所述上表面具有凸部和凹部，所述凸部和凹部均共享 一个共同的对称轴; 切割折反射透镜元件以形成2n个饼形段（630,632,640,642），其中n是整数; 并重新组装2n个饼形部分以形成折反射透镜系统，其中n个所述2n个饼形部分位于公共平面上方，并且所述2n个饼形元件的其余部分位于所述共同平面下方。

公开(公告)号：WO2004072695A3

公开(公告)日：2005-05-26

申请号：PCT/US2004004275

申请日：2004-02-13

Applicant: ZETETIC INST ,  HILL HENRY ALLEN

Inventor： HILL HENRY ALLEN

IPC: G01B9/04 ,  G02B21/00 ,  G02B21/04 ,  G01B9/02

CPC classification number: G02B21/0056 ,  G01B9/04 ,  G02B21/0024 ,  G02B21/04

Abstract: An array of conjugated quadratures of fields is measured interferometrically by a confocal interferometer (110) and detector system (70) wherein each conjugated quadratures comprises a difference of conjugated quadratures of fields of beams scattered/reflected or transmitted by a pair of spots (164, 166) in or on a substrate (60). The array of conjugated quadratures is measured jointly, i.e., simultaneously, and the components of each conjugated quadratures may be measured jointly. Each pair of spots generally has a relative displacement on the order of the three or more times the size of the spots in a direction nominally tangent to the surface of the substrate. The relative phases of the beams subsequently scattered/reflected or transmitted by the pair of spots on/in a substrate may be adjusted as a set by control of a single system parameter so that the conjugated quadratures of the array of conjugated quadratures are nominally zero, i.e., information may be obtained about the substrate with the interferometer and detector system operating in a dark field mode. Operation in a dark field mode leads to both reduced systematic and statistical errors in the information and increased throughput. The information may include the transverse derivative of a profile of one or more surfaces of a substrate; onedimensional, two-dimensional, and three-dimensional transverse differential images of a substrate; critical dimensions of features or artifacts on or in a substrate, and the size and location of sub-wavelength defects in or on a substrate.

Abstract translation: 场共轭正交阵列由共焦干涉仪（110）和检测器系统（70）在干涉测量中测量，其中每个共轭正交包括由一对点（164,116）散射/反射或发射的光束的场的共轭正交的差， 166）放置在衬底（60）中或衬底（60）上。 共轭正交阵列共同测量，即同时测量，并且可以共同测量每个共轭正交的分量。 每对点通常在与基板表面正切的方向上的点的尺寸的三次或更多次的量级上具有相对位移。 可以通过单个系统参数的控制将随后由衬底上/上的一对点散射/反射或发射的光束的相对相位调整为一组，使得共轭正交阵列的共轭正交值名义上为零， 即，可以利用干涉仪和检测器系统在暗场模式下操作来获得关于衬底的信息。 在暗场模式下的操作可以减少信息中的系统和统计误差，并提高吞吐量。 信息可以包括衬底的一个或多个表面的轮廓的横向导数; 衬底的二维，二维和三维横向差分图像; 衬底上或衬底中的特征或伪影的关键尺寸，以及衬底中或衬底上的亚波长缺陷的尺寸和位置。

公开(公告)号：WO2004072688A3

公开(公告)日：2004-12-02

申请号：PCT/US2004003377

申请日：2004-02-06

Applicant: ZETETIC INST ,  HILL HENRY ALLEN

Inventor： HILL HENRY ALLEN

IPC: G02B6/124 ,  G02B6/26 ,  G02B6/34 ,  G02B6/42 ,  G02B21/00

CPC classification number: G02B6/4206 ,  G02B6/124 ,  G02B6/4215 ,  G02B21/0056

Abstract: A multiple source array including a guided-wave structure having a dielectric core and a cladding covering the dielectric core; and an array of dielectric-filled, guided-wave cavities in the cladding extending transversely from the dielectric core and forming an array of apertures through which optical energy that is introduced into the core exits from the core.

Abstract translation: 一种多源阵列，包括具有介电芯的导波结构和覆盖所述介质芯的包层; 以及在所述包层中的电介质填充的导波腔的阵列，其从所述介质芯横向延伸并且形成孔阵列，通过所述孔的阵列引入到所述芯中的光能从所述芯离开。

公开(公告)号：WO2004074880A3

公开(公告)日：2005-05-19

申请号：PCT/US2004004945

申请日：2004-02-19

Applicant: ZETETIC INST ,  HILL HENRY ALLEN

Inventor： HILL HENRY ALLEN

IPC: G01B9/04 ,  G02B17/08 ,  G02B21/00 ,  G02B27/10 ,  G01B9/02

CPC classification number: G01B9/04 ,  G02B21/0024 ,  G02B21/0056 ,  G02B27/108 ,  G02B27/143 ,  G02B27/144 ,  G02B27/145

Abstract: A differential interferometric confocal microscope for measuring an object, the microscope including a source-side pinhole array; a detector-side pinhole array; and an interferometer that images the array of pinholes of the source-side pinhole array onto a first array of spots located in front of an object plane located near where the object is positioned (166, 164I) and onto a second array of spots behind the object plane (164, 166I), wherein the first and second arrays of spots are displaced form each other in both a direction normal to the object plane and a direction parallel to the object plane, the interferometer also imaging the first arrays of spots onto a first image plane that is behind the detector-side pinhole array (190, 192) and imaging the second array of spots onto a second image plane that is in front of the detector-side pinhole array (194, 196) wherein each spot of the imaged first array of spots is aligned with a corresponding different spot of the imaged second array of spots and a corresponding different pinhole of the detector-side pinhole array.

Abstract translation: 用于测量物体的差分干涉式共焦显微镜，显微镜包括源极针孔阵列; 检测器侧针孔阵列; 以及干涉仪，其将源侧针孔阵列的针孔阵列成像到位于物体平面附近的物平面前方的第一阵列上，并位于第二阵列的位置 物镜平面（164,161I），其中第一和第二光斑阵列在垂直于物平面的方向和平行于物平面的方向上彼此移位，干涉仪还将第一阵列阵列成像到 第一图像平面，其位于检测器侧针孔阵列（190,192）后面，并将第二阵列阵列成像到位于检测器侧针孔阵列（194,196）前面的第二图像平面上，其中每个点 成像的第一阵列阵列与成像的第二阵列阵列的对应的不同点和检测器侧针孔阵列的对应的不同针孔对准。

公开(公告)号：WO0210828A9

公开(公告)日：2004-05-06

申请号：PCT/US0123656

申请日：2001-07-27

Applicant: ZETETIC INST ,  HILL HENRY ALLEN

Inventor： HILL HENRY ALLEN

IPC: G02B21/00 ,  G01Q10/06 ,  G01Q60/18 ,  G01Q60/22 ,  G12B21/06

CPC classification number: G01Q60/22 ,  G01Q10/06 ,  G01Q70/06

Abstract: Systems and methods for near-field, interferometric microscopy are disclosed in which a mask having an array of sub-wavelength apertures is used to couple near-field probe beams to a sample. The periphery of the mask further includes one or more larger apertures to couple light to the sample that forms the basis of an interferometric signal indicative of the relative distance between the mask and the sample. The interferometric signal can be the basis of a control signal in a servo system that dynamically positions the mask relative to the sample.

Abstract translation: 公开了用于近场干涉显微镜的系统和方法，其中具有亚波长孔径阵列的掩模用于将近场探测光束耦合到样品。 掩模的周边还包括一个或多个较大的孔，以将光耦合到样品，其形成指示掩模和样品之间的相对距离的干涉信号的基础。 干涉信号可以是伺服系统中的控制信号的基础，该控制信号相对于样品动态地定位掩模。

公开(公告)号：WO0210832A3

公开(公告)日：2003-01-23

申请号：PCT/US0141445

申请日：2001-07-27

Applicant: ZETETIC INST ,  HILL HENRY ALLEN

Inventor： HILL HENRY ALLEN

IPC: G01N21/45 ,  G01Q60/18 ,  G01Q60/22 ,  G02B21/00

CPC classification number: G01Q60/22 ,  G01Q70/06

Abstract: The invention features systems and methods for near-field, interferometric microscopy in which one or more phase retardation plates are positioned in the measurement and/or reference arms to reduce the contribution to the interference signal of background sources including, e.g., a beam component scattered from a near-field aperture used to couple a probe beam to a sample. The systems may operate in either reflective or transmissive modes.

Abstract translation: 本发明的特征在于用于近场干涉显微镜的系统和方法，其中一个或多个相位延迟板位于测量和/或参考臂中以减少对背景源的干扰信号的贡献，包括例如散射的光束分量 来自用于将探测光束耦合到样品的近场光圈。 系统可以以反射或透射模式操作。

公开(公告)号：WO0210831A3

公开(公告)日：2002-10-31

申请号：PCT/US0141444

申请日：2001-07-27

Applicant: ZETETIC INST ,  HILL HENRY ALLEN

Inventor： HILL HENRY ALLEN

IPC: G01B9/04 ,  G01Q30/02 ,  G01Q60/18 ,  G01Q60/22 ,  G02B21/00 ,  G11B7/005 ,  G11B7/013 ,  G11B7/135

CPC classification number: G01Q60/22 ,  G02B21/0056 ,  G11B7/005 ,  G11B7/1387 ,  G11B7/24088

Abstract: An interferometric optical microscopy system for imaging an object, the system including: a measurement beam mask array having an array of aperture pairs positioned to receive radiation emitted from the object in response to a measurement beam, radiation emerging from the array of aperture pairs defining a measurement return beam; a reference beam source array positioned to receive a reference beam, the reference beam source array comprising an array of elements each configured to radiate a portion of the reference beam, the radiated reference beam portions defining a reference return beam; and imaging optics positioned to direct the measurement and reference return beams to the photo-detector and configured to produce overlapping conjugate images of the array of reference elements and the array of apertures pairs, wherein the conjugate image for each aperture pair overlaps with the conjugate image of a corresponding reference element, wherein the imaging optics include a pinhole array positioned in the conjugate image plane, the pinhole array having an array of pinholes each aligned with a corresponding aperture pair image, and wherein the measurement and reference beams are derived from a common source.

Abstract translation: 一种用于对物体成像的干涉光学显微镜系统，所述系统包括：测量光束掩模阵列，其具有孔径对阵列，所述孔径对阵列被设置为响应于测量光束接收从物体发射的辐射，从孔径对阵列发射的辐射限定 测量返回光束; 定位成接收参考光束的参考光束源阵列，所述参考光束源阵列包括各自配置成辐射所述参考光束的一部分的元件阵列，所述辐射参考光束部分限定参考返回光束; 以及成像光学器件，所述成像光学器件定位成将所述测量和参考返回光束引导至所述光电检测器并且被配置为产生所述参考元件阵列和所述孔径对阵列的重叠共轭图像，其中每个孔径对的所述共轭图像与所述共轭图像重叠 其中所述成像光学器件包括定位在所述共轭图像平面中的针孔阵列，所述针孔阵列具有针孔阵列，每个针孔阵列与对应的孔径对图像对齐，并且其中所述测量光束和参考光束从公共图像 资源。

公开(公告)号：WO2005114095A3

公开(公告)日：2008-03-27

申请号：PCT/US2005018060

申请日：2005-05-23

Applicant: ZETETIC INST ,  HILL HENRY ALLEN

Inventor： HILL HENRY ALLEN

IPC: G01B9/02 ,  G01B11/24 ,  G03F9/00

CPC classification number: G01B11/2441 ,  G01B9/02002 ,  G01B9/02014 ,  G01B9/02042 ,  G01B9/02072 ,  G01B9/02079 ,  G01B2290/70 ,  G03F9/7034 ,  G03F9/7049

Abstract: Methods and apparatus (100, 110) are disclosed for measurement of critical dimensions (CD) of features and detection of defects in reflecting UV, VUV, and EUV lithography masks and in transmitting UV and VUV lithography masks. The measured CD's may be used in the determination of optical proximity corrections (OPC) and/or in mask fabrication process control. The transmitting masks may comprise binary and various types of phase shift masks.

Abstract translation: 公开了用于测量特征的关键尺寸（CD）和检测反射UV，VUV和EUV光刻掩模中的缺陷以及传输UV和VUV光刻掩模的方法和装置（100,110）。 所测量的CD可用于确定光学邻近校正（OPC）和/或掩模制造工艺控制。 发射掩模可以包括二进制和各种类型的相移掩模。

公开(公告)号：WO2004070434A3

公开(公告)日：2005-04-07

申请号：PCT/US2004003062

申请日：2004-02-04

Applicant: ZETETIC INST ,  HILL HENRY ALLEN

Inventor： HILL HENRY ALLEN

IPC: G02B17/08 ,  G02B21/00 ,  G02B21/14 ,  G02B27/10 ,  G01B9/02

CPC classification number: G02B21/0056 ,  G02B21/0024 ,  G02B21/14 ,  G02B27/1086 ,  G02B27/147

Abstract: An interferometric microscope (110) for making interferometric measurements of locations within an object (60) that is in a medium, there being a mismatch between indices of refraction of said object and said medium, the microscope (110) including a source (18) for generating an input beam; an interferometer (10) which is configured to receive the input beam and generate therefrom a measurement beam, to focus the measurement beam onto a selected spot in the object (60) and produce for that selected spot a return measurement beam, and to combine the return measurement beam and a reference beam to produce an interference beam; and a detector system (70) which is positioned to receive the interference beam, wherein the return measurement beam travels along a path from the object (60) to the detector system (70) and wherein the interferometer includes a compensating layer of material (50B) positioned in the path of the return measurement beam, the compensating layer (50B) producing a mismatch in the index of refraction along the path of the return measurement beam that compensates for the mismatch between the indices of refraction of the object and the medium.

Abstract translation: 一种用于对位于介质中的物体（60）内的位置进行干涉测量的干涉测量显微镜（110），所述物体和所述介质的折射率之间存在不匹配，所述显微镜（110）包括源（18）， 用于产生输入光束; 干涉仪（10），被配置为接收所述输入光束并从其产生测量光束，以将所述测量光束聚焦到所述物体（60）中的选定光点上，并为所述选定光点产生返回测量光束，并将 返回测量光束和参考光束以产生干涉光束; 以及检测器系统（70），其被定位成接收所述干涉光束，其中所述返回测量光束沿着从所述物体（60）到所述检测器系统（70）的路径传播，并且其中所述干涉仪包括物质补偿层（50B ），所述补偿层（50B）沿着所述返回测量光束的路径产生折射率的失配，其补偿所述物体和所述介质的折射率之间的失配。

公开(公告)号：WO2004090582A9

公开(公告)日：2005-03-31

申请号：PCT/US2004009968

申请日：2004-04-01

Applicant: ZETETIC INST ,  HILL HENRY ALLEN

Inventor： HILL HENRY ALLEN

IPC: G02B17/08 ,  G02B21/00 ,  G02B

CPC classification number: G02B21/0056 ,  G02B21/0024

Abstract: A method of fabricating a catadioptric lens system (600), the method involving: fabricating a single catadioptric lens element having a bottom surface and an upper surface, the upper surface having a convex portion and a concave portion, both the convex and concave portions sharing a common axis of symmetry; cutting apart the catadioptric lens element to form 2n pie-shaped segments (630, 632, 640, 642), wherein n is an integer; and reassembling the 2n pie-shaped segments to form the catadioptric lens system with n of the 2n pie-shaped segments being located above a common plane and the rest of the 2n pie-shaped elements being below the common plane.

Abstract translation: 一种制造反射折射透镜系统（600）的方法，所述方法包括：制造具有底表面和上表面的单个反射折射透镜元件，所述上表面具有凸部和凹部，所述凸部和凹部共享 共同的对称轴; 切割反射折射透镜元件以形成2n个饼形片段（630,632,640,642），其中n是整数; 并且重新组装2n个饼状部分以形成反射折射透镜系统，其中2n个饼状部分中的n个位于公共平面之上，其余的2n个饼状部分位于公共平面之下。