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    HIGH STABILITY ELECTRON GUN FOR THE SHAPING OF MATERIALS
    5.
    发明申请
    HIGH STABILITY ELECTRON GUN FOR THE SHAPING OF MATERIALS 审中-公开
    高稳定性电子枪用于材料形状

    公开(公告)号：WO1981003579A1

    公开(公告)日：1981-12-10

    申请号：PCT/DE1980000086

    申请日：1980-06-07

    Applicant: HELL GMBH R ,  BEISSWENGER S

    Inventor： HELL GMBH R

    IPC: H01J37/063

    CPC classification number: H01J37/063 ,  H01J3/029

    Abstract: The electronic gun intended for the shaping of materials, particularly for the production of printing blocks, comprises a heated cathode (1), a perforated anode (3) and an auxiliary electrode (2) brought to a negative potential higher than that of the cathode. The beam current is determined by the dimension of the active surface (11) of the cathode and the heating regulation of the cathode at a constant temperature.

    Abstract translation: 用于成型材料的电子枪，特别是用于生产印刷块的电子枪包括加热的阴极（1），穿孔的阳极（3）和辅助电极（2），使其具有比阴极更高的负电位 。 束电流由阴极的有源表面（11）的尺寸和恒定温度下阴极的加热调节决定。

    HOLLOW CATHODE ION SOURCE AND METHOD OF EXTRACTING AND ACCELERATING IONS
    6.
    发明申请
    HOLLOW CATHODE ION SOURCE AND METHOD OF EXTRACTING AND ACCELERATING IONS 审中-公开
    中空阴极离子源和提取和加速离子的方法

    公开(公告)号：WO2017105673A1

    公开(公告)日：2017-06-22

    申请号：PCT/US2016/060979

    申请日：2016-11-08

    Applicant: AGC FLAT GLASS NORTH AMERICA, INC. ,  ASAHI GLASS CO., LTD. ,  AGC GLASS EUROPE S.A.

    Inventor： CHAMBERS, John ,  MASCHWITZ, Peter

    IPC: C23C16/513 ,  C23C4/134 ,  H01J37/063 ,  H05H1/02 ,  H05H1/24 ,  H05H1/54

    CPC classification number: H05H1/54 ,  C23C16/513 ,  H01J37/063 ,  H05H1/02 ,  H05H1/24

    Abstract: An ion source and a method of extracting and accelerating ions are provided. The ion source includes a chamber. The ion source further includes a first hollow cathode having a first hollow cathode cavity and a first plasma exit orifice and a second hollow cathode having a second hollow cathode cavity and a second plasma exit orifice. The first and second hollow cathodes are disposed adjacently in the chamber. The ion source further includes a first ion accelerator between and in communication with the first plasma exit orifice and the chamber. The first ion accelerator forms a first ion acceleration cavity. The ion source further includes a second ion accelerator between and in communication with the second plasma orifice and the chamber. The second ion accelerator forms a second ion acceleration cavity. The first hollow cathode and the second hollow cathode are configured to alternatively function as electrode and counterelectrode to generate a plasma.

    Abstract translation: 提供离子源和提取和加速离子的方法。 离子源包括腔室。 离子源还包括具有第一中空阴极腔和第一等离子体出口孔的第一中空阴极以及具有第二中空阴极腔和第二等离子体出口孔的第二中空阴极。 第一和第二中空阴极相邻地设置在腔室中。 离子源还包括在第一等离子体出口孔和腔室之间并与其连通的第一离子加速器。 第一离子加速器形成第一离子加速腔。 离子源还包括在第二等离子体孔口和腔室之间并与其连通的第二离子加速器。 第二离子加速器形成第二离子加速腔。 第一空心阴极和第二空心阴极被配置为交替地用作电极和反电极以产生等离子体。

    PLASMA DRIVEN PARTICLE PROPAGATION APPARATUS AND PUMPING METHOD
    7.
    发明申请
    PLASMA DRIVEN PARTICLE PROPAGATION APPARATUS AND PUMPING METHOD 审中-公开
    等离子体驱动颗粒传播装置和泵送方法

    公开(公告)号：WO2016205857A1

    公开(公告)日：2016-12-29

    申请号：PCT/AU2016/000214

    申请日：2016-06-21

    Applicant: AURORA LABS PTY LTD

    Inventor： BUDGE, David

    IPC: H05H1/24 ,  H01J37/063 ,  C23C14/00

    CPC classification number: H01J37/301 ,  H01J37/305 ,  H01J2237/3132 ,  H05H1/2406 ,  H05H1/54 ,  H05H2001/2412

    Abstract: A charged particle propagation apparatus comprising a generator comprising a vacuum chamber with a gun therein for discharging a charged particle beam from within the vacuum chamber and out of the vacuum chamber through a beam exit disposed in a wall of the vacuum chamber. The apparatus further comprises a higher pressure region adjoining the vacuum chamber at the beam exit that is maintainable at a pressure greater than a pressure of the vacuum chamber and a plasma interface disposed at the beam exit comprising a plasma channel. The plasma channel is aligned with the beam exit, has a first end and a second end and has at least three electrode plates disposed between the first end and the second end. The apparatus further comprises a control system adapted to apply a sequence of electrical currents to the electrode plates. The sequence of electrical currents is configured to cause at least one plasma to move from the first end to the second end of the plasma channel thereby pumping down the beam exit, and, in use, the charged particle beam is propagated from the vacuum chamber through the, or each, plasma in the plasma channel and into the higher pressure region.

    Abstract translation: 一种带电粒子传播装置，包括发生器，该发生器包括具有枪的真空室，用于从真空室内排出带电粒子束，并通过布置在真空室壁中的射束出口离开真空室。 该装置还包括邻近在出口处的真空室的较高压力区域，该压力区域可维持在大于真空室压力的压力以及设置在包括等离子体通道的束出口处的等离子体界面。 等离子体通道与光束出口对准，具有第一端和第二端，并且具有设置在第一端和第二端之间的至少三个电极板。 该装置还包括适于将电流序列施加到电极板的控制系统。 电流的顺序被配置为使至少一个等离子体从等离子体通道的第一端移动到第二端，从而使光束出口向下泵送，并且在使用中，带电粒子束从真空室传播通过 等离子体通道中的或每个等离子体并进入较高压力区域。

    CATHODE ARRANGEMENT, ELECTRON GUN, AND LITHOGRAPHY SYSTEM COMPRISING SUCH ELECTRON GUN
    8.
    发明申请
    CATHODE ARRANGEMENT, ELECTRON GUN, AND LITHOGRAPHY SYSTEM COMPRISING SUCH ELECTRON GUN 审中-公开

    公开(公告)号：WO2015101537A4

    公开(公告)日：2015-07-09

    申请号：PCT/EP2014/078993

    申请日：2014-12-22

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： DINU-GÜRTLER, Laura ,  HOGERVORST, Eric Petrus

    IPC: H01J3/02 ,  H01J37/063 ,  H01J1/28 ,  H01J1/46 ,  H01J37/07 ,  H01J37/075

    Abstract: The invention relates to a cathode arrangement (20) comprising: a cathode body housing an emission surface (32) for emitting electrons in a longitudinal direction (Z), wherein the emission surface is bounded by an emission perimeter (35); a focusing electrode (40) at least partially enclosing the cathode body in a transversal direction and comprising an electron transmission aperture (44) for focusing the electrons emitted by the emission surface, wherein the aperture is bounded by an aperture perimeter (45), wherein the cathode body is moveably arranged within the focusing electrode over a maximum transversal distance (d1) from an aligned position (R0), and wherein the aperture perimeter transversally extends over the emission surface and beyond the emission perimeter over an overlap distance (d2) that exceeds the maximum transversal distance.

    電子源
    9.
    发明申请
    電子源 审中-公开
    电子源

    公开(公告)号：WO2008140080A1

    公开(公告)日：2008-11-20

    申请号：PCT/JP2008/058766

    申请日：2008-05-13

    Applicant: 電気化学工業株式会社 ,  照井 良典 ,  野々垣 良三

    Inventor： 照井 良典 ,  野々垣 良三

    IPC: H01J1/26 ,  H01J1/20 ,  H01J37/063

    CPC classification number: H01J37/063 ,  H01J1/20 ,  H01J1/26 ,  H01J37/073 ,  H01J37/075 ,  H01J2237/0216 ,  H01J2237/06316

    Abstract: 　電子源を用いる装置が外部より振動を受けても、安定した電子線を与える電子源を提供する。 この電子源は、一端部に電子放出部を有する針状チップ（１）と、針状チップ（１）の一端部と異なる他端部に接合されているカップ状部品（６）と、カップ状部品（６）を加熱するためのフィラメント（３）とを備える。また、このフィラメント（３）は、カップ状部品（６）の内部に設けられている空隙中に、カップ状部品（６）に対して非接触状態になるように配置されている。

    Abstract translation: 提供一种电子源，即使从使用电子源的装置的外部施加振动时也能提供稳定的电子束。 电子源设置有在一端具有电子放电部的针状芯片（1） 结合到针状芯片（1）的另一端的杯状部件（6）; 以及用于加热杯状部件（6）的丝（3）。 灯丝（3）以杯状部件（6）的非接触状态配置在杯状部件（6）内的间隙内。

    CHARGED PARTICLE BEAM EMITTING ASSEMBLY
    10.
    发明申请
    CHARGED PARTICLE BEAM EMITTING ASSEMBLY 审中-公开
    充电颗粒光束发射组件

    公开(公告)号：WO9916101A3

    公开(公告)日：1999-06-17

    申请号：PCT/GB9802882

    申请日：1998-09-24

    Applicant: WELDING INST ,  SANDERSON ALLAN

    Inventor： SANDERSON ALLAN

    IPC: H01J37/063 ,  H01J37/065 ,  H01J37/075 ,  H01J37/301

    CPC classification number: H01J37/075 ,  H01J37/063 ,  H01J37/065 ,  H01J37/301 ,  H01J2237/3104

    Abstract: A charged particle emitting assembly comprises an emitter member (5) for emitting charged particles of one polarity. A tubular shield electrode (6) circumferentially surrounds the emitter member and is held in use at the same polarity as the charged particles. A tubular accelerating electrode (7) is positioned substantially coaxially with the shield electrode (6) and is held in use at the opposite polarity to the shield electrode. The arrangement is such that charged particles from the emitter member (5) initially spread laterally outwardly and then are focused into a beam which passes through the tubular accelerating electrode (7).

    Abstract translation: 带电粒子发射组件包括用于发射一个极性的带电粒子的发射器件（5）。 管状屏蔽电极（6）周向地围绕发射器件并且以与带电粒子相同的极性保持在使用中。 管状加速电极（7）与屏蔽电极（6）基本同轴地定位，并以与屏蔽电极相反的极性保持使用。 该布置使得来自发射器件（5）的带电粒子最初横向向外扩展，然后聚焦成穿过管状加速电极（7）的光束。

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