公开(公告)号：EP0880798B1

公开(公告)日：2004-09-22

申请号：EP97908672.5

申请日：1997-02-14

申请人： Axcelis Technologies, Inc.

发明人： BRAILOVE, Adam, A. ,  ROSE, Peter, H. ,  BLAKE, Julian, G. ,  YANG, Zhongmin ,  PURSER, Kenneth, H.

IPC分类号： H01L21/00 ,  H01J37/317

CPC分类号： H01L21/67109 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/083 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31705 ,  H01L21/67069 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/6838

摘要： A system and method for conductively and/or convectively transferring heat away from a workpiece that has been processed by a processing system, such as an ion implantation system. The conductive transfer of heat from the workpiece is effectuated by disposing the workpiece in relatively close proximity with a floor of a load lock, which is maintained at a relatively cool temperature. The chamber pressure is disposed at a selected pressure by a pressure regulator and a vacuum pressure is applied to the backside of the workpiece closest to draw the workpiece into contact with the chamber floor, thereby effecting heat transfer from the workpiece to the cooling surface.

公开(公告)号：EP1179217A1

公开(公告)日：2002-02-13

申请号：EP00932327.0

申请日：2000-05-12

申请人： Applied Materials, Inc.

发明人： SHACHAL, Dov ,  DOTAN, Noam

IPC分类号： H01J37/26 ,  G01N23/22 ,  H01J37/252 ,  H01J37/28

CPC分类号： H01J37/256 ,  H01J27/14 ,  H01J2237/2806 ,  Y10S977/881

摘要： A system and a method for fast characterization of sample's material composition, which is especially beneficial for semiconductor fabrication. The material composition is characterized by analyzing secondary electrons emission from the sample. According to one feature, electron detector is used to collect secondary electrons emanating from the sample. The detector is controlled to collect a specific narrow band of secondary electrons, and the band is controlled to allow for collection of SE at different energies. Two modes are disclosed: spot mode and secondary electron spectroscopy material imaging (SESMI). In the spot mode, a spectrum of SE is obtained from a single spot on the sample, and its characteristics are investigated to obtain information of the material composition of the spot. In the SESMI mode, an SEM image of an area on the sample is obtained. The SE spectrum at each pixel is investigated and correlated to a particular spectrum group. The image is then coded according to the SE spectrum grouping. The coding is preferably a color coding.

公开(公告)号：EP0880793B1

公开(公告)日：2000-09-06

申请号：EP97906006.8

申请日：1997-02-14

申请人： Axcelis Technologies, Inc.

发明人： BLAKE, Julian, G. ,  PURSER, Kenneth, H. ,  BRAILOVE, Adam, A. ,  ROSE, Peter, H. ,  HUGHEY, Barbara, J.

IPC分类号： H01J37/30 ,  H01J37/317

CPC分类号： H01L21/67109 ,  H01J27/14 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/083 ,  H01J2237/31701 ,  H01L21/67069 ,  H01L21/67778

公开(公告)号：EP0751972A4

公开(公告)日：1999-06-16

申请号：EP96910295

申请日：1996-01-23

申请人： SANDIA CORP

发明人： STINNETT REGAN W ,  VANDEVENDER J PACE

IPC分类号： C08J3/28 ,  B05D3/06 ,  B29C35/08 ,  B29C59/16 ,  B44C1/22 ,  C08F2/46 ,  C08J7/12 ,  G21K5/00 ,  H01J27/14 ,  H01J37/317

CPC分类号： C08J7/123 ,  B29C59/16 ,  B29C2035/0872 ,  H01J27/14 ,  H01J37/317 ,  H01J2237/08 ,  H01J2237/3165 ,  H01J2237/31701

摘要： A polymer surface and near surface treatment process produced by irradiation with high energy particle beams. The process is preferably implemented with pulsed ion beams. The process alters the chemical and mechanical properties of the polymer surface in a manner useful for a wide range of commercial applications.

公开(公告)号：EP0880797A1

公开(公告)日：1998-12-02

申请号：EP97907646.0

申请日：1997-02-14

申请人： Eaton Corporation

发明人： ROSE, Peter, H. ,  BLAKE, Julian, G. ,  BRAILOVE, Adam, A. ,  YANG, Zhongmin ,  MCRAY, Richard, F. ,  HUGHEY, Barbara, J.

IPC分类号： H01J27 ,  H01J37 ,  H01L21

CPC分类号： H01L21/67109 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/083 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31705 ,  H01L21/67069 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/6838

摘要： An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber (318) that mounts an ion source (330), a single workpiece translating stage (320) and a loadlock (310). The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system. According to one practice, the scanning direction and the longitudinal axis form an angle therebetween that is less than or equal to about 85 degrees.

公开(公告)号：EP0827179A1

公开(公告)日：1998-03-04

申请号：EP96306329.2

申请日：1996-08-30

申请人： VARIAN ASSOCIATES, INC.

发明人： Hablanian,Marsbed ,  Ratnam,Asoka

IPC分类号： H01J27/14 ,  H01J49/12 ,  H01J41/04

CPC分类号： H01J27/14 ,  H01J41/04 ,  H01J49/126

摘要： A single potential ion source 50 includes a single conical electrode 58 encircled by a cylindrical magnet 60. At least one filament 56 is placed proximate to the electrode. This arrangement serves to accelerate electrons created by energy from the filament toward a centre axis 59 of the conical electrode. The electrons collide with gas particles to create a focussed ion stream. The stream may be directed into a magnetic field in a mass spectrometer tube. A base 52 supports pins 54 for electrical connections to the electrode 58 and filaments 56.

摘要翻译： 单个电势离子源50包括由圆柱形磁体60包围的单个圆锥形电极58.至少一个细丝56靠近电极放置。 这种布置用于将由能量产生的电子加速到锥形电极的中心轴线59。 电子与气体颗粒碰撞以产生聚焦的离子流。 流可以被引导到质谱管中的磁场中。 基座52支撑用于电连接到电极58和细丝56的销54

公开(公告)号：EP0729640A4

公开(公告)日：1997-07-16

申请号：EP95901916

申请日：1994-11-16

申请人： SANDIA CORP

发明人： BLOOMQUIST DOUGLAS D ,  BUCHHEIT RUDY ,  GREENLY JOHN B ,  MCINTYRE DALE C ,  NEAU EUGENE L ,  STINNETT REGAN W

IPC分类号： B29C35/08 ,  B29C59/16 ,  C23C8/36 ,  C23C14/48 ,  G21K5/04 ,  H01J3/04 ,  H01J27/00 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01L21/48

CPC分类号： C08J7/123 ,  B29C59/16 ,  B29C2035/0872 ,  C23C8/36 ,  C23C14/48 ,  H01J27/14 ,  H01J2237/08 ,  H01J2237/31701

摘要： A method and apparatus for treating material surfaces (13) using a repetitively pulsed ion beam (11). In particular, the treatment is tailored by adjusting treatment parameters of a pulsed ion beam (11) to a duration less than or equal to 1000 ns and a repetition rate of less than 1 Hz.

公开(公告)号：EP0371894B1

公开(公告)日：1994-03-16

申请号：EP89420467.6

申请日：1989-11-27

申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)

发明人： Menet, Jacques ,  De Gabrielli, Olivier

IPC分类号： H01J27/14

CPC分类号： H05H3/02 ,  H01J27/14

公开(公告)号：EP0145120B1

公开(公告)日：1989-11-08

申请号：EP84305547.6

申请日：1984-08-15

申请人： APPLIED MATERIALS, INC.

发明人： Aitken, Derek

IPC分类号： H01J37/08 ,  H01J3/04

CPC分类号： H01J49/30 ,  H01J27/022 ,  H01J27/028 ,  H01J27/14 ,  H01J37/05 ,  H01J37/08 ,  H01J37/3171

公开(公告)号：EP0095366B1

公开(公告)日：1989-09-13

申请号：EP83302941.6

申请日：1983-05-23

申请人： International Business Machines Corporation ,  Kaufman, Harold Richard

发明人： Kaufman, Harold Richard ,  Cuomo, Jerome John ,  Harper, James KcKell Edwin

IPC分类号： H01J37/08

CPC分类号： H01J27/022 ,  H01J27/14 ,  H01J37/08