公开(公告)号：EP3108301B1

公开(公告)日：2018-07-18

申请号：EP15701322.8

申请日：2015-01-20

申请人： ASML Netherlands B.V.

发明人： NAKIBOGLU, Günes ,  VAN BAREN, Martijn ,  VAN BOXTEL, Frank Johannes Jacobus ,  CUYPERS, Koen ,  GOSEN, Jeroen Gerard ,  VAN BOKHOVEN, Laurentius Johannes Adrianus

IPC分类号： G03F7/20

CPC分类号： G03F7/70858 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70908

摘要： A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.

公开(公告)号：EP3210080A1

公开(公告)日：2017-08-30

申请号：EP15775219.7

申请日：2015-10-07

申请人： ASML Netherlands B.V.

发明人： TROMP, Siegfried Alexander ,  VERWEIJ, Antonie Hendrik ,  SOETHOUDT, Abraham Alexander ,  VAN DE POEL, Jan Pieter ,  BAGGEN, Mark Constant Johannes

IPC分类号： G03F7/20 ,  F16C32/06

CPC分类号： F16C32/0611 ,  F16C29/025 ,  F16C32/0607 ,  G03F7/20 ,  G03F7/707 ,  G03F7/708

摘要： A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate,

摘要翻译： 公开了用于光刻设备的支撑台，加载衬底的方法，光刻设备和使用光刻设备制造设备的方法。 在一种布置中，支撑台（100）被构造成支撑基板（W）。 支撑台包括基部表面（101）。 当基板由支撑台支撑时，基座表面面对基板的底表面（103）。 一个或多个气垫构件（102）设置在基部表面上方。 每个气垫元件包括凹槽（108）。 该凹部被成形和构造成使得基板降落到支撑台上的基板由支撑台支撑的位置处引起凹部内的局部压力积聚。 压力的局部积聚在降低基板期间提供了局部的气体缓冲作用。

公开(公告)号：EP3049869A1

公开(公告)日：2016-08-03

申请号：EP14758149.0

申请日：2014-09-02

申请人： ASML Netherlands B.V.

发明人： HOUBEN, Martijn ,  DE KOCK, Alwin ,  VAN ABEELEN, Hendrikus, Johannes, Marinus ,  VAN DEN HEUVEL, Marco, Adrianus, Peter

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/6875

摘要： A support table to support a surface of a substrate, wherein the support table includes: a base surface substantially parallel to the surface of the substrate, a plurality of burls protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions are arranged such that a plurality of the gaps are aligned to form a straight gas flow path towards an edge of the base surface.

摘要翻译： 支承台，以支持一基材的表面上，worin所述支承台包括：基部表面基本上平行于基材的表面，基底表面的上方突出的突节的复数，每个突节的具有respectivement远端和 基底表面上方的第一高度，所述突节布置寻求的是，当基片由支撑台支撑，基板是由respectivement远端支撑，并且细长突起凸出的多元性由间隙隔开，每个细长的凸起突出 具有基表面上方的第二高度，worin提出的突节之间的基底表面的上方突出的突出细长的，并且所述第二高度小于所述第一高度; worin凸出布置搜索做了间隙的多元性对齐以形成朝向在基座表面的边缘的直线气体流路。

公开(公告)号：EP2490073A1

公开(公告)日：2012-08-22

申请号：EP12151380.8

申请日：2012-01-17

申请人： ASML Netherlands BV

发明人： Lafarre, Raymond ,  Ten Kate, Nicolaas ,  Dziomkina, Nina ,  Karade, Yogesh ,  Tromp, Siegfried, ,  Leijssen, Jacobus, ,  Rodenburg, Elisabeth, ,  Feijts, Maurice, ,  Huisman, Hendrik

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  B05D3/02 ,  G01J5/0285 ,  G01J5/20 ,  G03F7/70341 ,  G03F7/70708

摘要： A substrate holder (100) for a lithographic apparatus has a planarization layer (108) provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack (200) forming an electronic component. The thin film stack comprises an (optional) isolation layer (201), a metal layer (202) forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer (203).

摘要翻译： 用于光刻设备的衬底保持器（100）具有设置在其表面上的平坦化层（108）。 平坦化层提供用于形成形成电子部件的薄膜叠层（200）的光滑表面。 薄膜堆叠包括（可选）隔离层（201），形成电极的金属层（202），传感器，加热器，晶体管或逻辑器件以及顶部隔离层（203）。

公开(公告)号：EP3695276A1

公开(公告)日：2020-08-19

申请号：EP18769724.8

申请日：2018-09-19

申请人： ASML Netherlands B.V.

发明人： ROSET, Niek Jacobus Johannes ,  VERMEULEN, Marcus Martinus Petrus Adrianus ,  RAVENSBERGEN, Simon Karel ,  BAGGEN, Mark Constant Johannes ,  KRAMER, Gijs ,  TIMMERMANS, Roger Anton Marie ,  VAN DEN BERKMORTEL, Frank Pieter Albert

IPC分类号： G03F7/20 ,  H01L21/687

公开(公告)号：EP3683627A1

公开(公告)日：2020-07-22

申请号：EP20160382.6

申请日：2013-01-17

申请人： ASML Netherlands B.V.

发明人： DONDERS, Sjoerd Nicolaas Lambertus ,  LAFARRE, Raymond Wilhelmus Louis ,  DZIOMKINA, Nina Vladimirovna ,  KARADE, Yogesh. Pramod ,  RODENBURG, Elisabeth Corinne ,  TEN KATE, Nicolaas

IPC分类号： G03F7/20

摘要： Substrate holder (100) for use in a lithographic apparatus, the substrate holder comprising a main body having a first surface and a second surface opposite the first surface.
A plurality of first burls are provided on the first surface, the first burls having end surfaces to support a substrate. A plurality of second burls are provided on the second surface to support the substrate holder on a structure. The plurality of first burls each comprise a lower body portion protruding from the first surface and an upper body portion above the lower body portion, the lower body portions comprise a different material from the upper body portions, and the upper body portions comprise diamond-like carbon.

公开(公告)号：EP3314332B1

公开(公告)日：2019-08-07

申请号：EP16731124.0

申请日：2016-06-21

申请人： ASML Netherlands B.V.

发明人： JEUNINK, Andre Bernardus ,  DE JONG, Robbert ,  LEENDERS, Martinus Hendrikus Antonius ,  PACITTI, Evelyn Wallis ,  POIESZ, Thomas ,  VAN DEN BERKMORTEL, Frank Pieter Albert

IPC分类号： G03F7/20

公开(公告)号：EP3314332A1

公开(公告)日：2018-05-02

申请号：EP16731124.0

申请日：2016-06-21

申请人： ASML Netherlands B.V.

发明人： JEUNINK, Andre Bernardus ,  DE JONG, Robbert ,  LEENDERS, Martinus Hendrikus Antonius ,  PACITTI, Evelyn Wallis ,  POIESZ, Thomas ,  VAN DEN BERKMORTEL, Frank Pieter Albert

IPC分类号： G03F7/20

CPC分类号： G03F7/707 ,  G03F7/70341 ,  G03F7/70783 ,  G03F7/70858 ,  G03F7/70875

摘要： A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.

公开(公告)号：EP3287848A1

公开(公告)日：2018-02-28

申请号：EP17181223.3

申请日：2004-12-15

申请人： ASML Netherlands B.V.

发明人： VAN SANTEN, Helmar ,  KOLESNYCHENKO, Aleksey Yurievich

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/7085

摘要： A lithographic apparatus, comprising: a projection system (PL) configured to project a patterned beam onto a target portion of a substrate (W); a barrier member (10) surrounding the projection system (PL) and comprising a liquid inlet port (20) configured to supply immersion liquid (5) to a space between the substrate (W) and the projection system (PL); and a substrate table (WT) configured to hold the substrate (W), the substrate table (WT) movable relative to the liquid inlet port (20) and the substrate table (WT) comprising: a first outlet (66) at the edge of the substrate (W), the first outlet (66) configured to remove at least part of the immersion liquid (5); a sensor (70) located at a top side of the substrate table (WT) and located horizontally outward of the first outlet (66); and a second outlet (63), located horizontally outward of the first outlet (63) and configured to remove at least part of the immersion liquid (5).

摘要翻译： 1。一种光刻设备，包括：投影系统（PL），其被配置为将图案化的光束投影到衬底（W）的目标部分上; 围绕所述投影系统（PL）并且包括液体入口端口（20）的障碍构件（10），所述液体入口端口被构造成将浸没液体（5）供应到所述基板（W）和所述投影系统（PL）之间的空间; 和衬底台（WT），所述衬底台被构造成保持所述衬底（W），所述衬底台（WT）相对于所述液体入口端口（20）和所述衬底台（WT）可移动，所述衬底台包括：第一出口（66） （W）的第一出口（66），所述第一出口（66）构造成去除所述浸没液体（5）的至少一部分; 位于衬底台（WT）的顶侧且位于第一出口（66）的水平外侧的传感器（70）;位于衬底台（WT） 和第二出口（63），其位于第一出口（63）的水平外部并且构造成去除浸没液体（5）的至少一部分。

公开(公告)号：EP3049869B1

公开(公告)日：2017-11-08

申请号：EP14758149.0

申请日：2014-09-02

申请人： ASML Netherlands B.V.

发明人： HOUBEN, Martijn ,  DE KOCK, Alwin ,  VAN ABEELEN, Hendrikus, Johannes, Marinus ,  VAN DEN HEUVEL, Marco, Adrianus, Peter

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/6875

摘要： A support table to support a surface of a substrate, wherein the support table includes: a base surface substantially parallel to the surface of the substrate, a plurality of burls protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions are arranged such that a plurality of the gaps are aligned to form a straight gas flow path towards an edge of the base surface.