Method and apparatus for making a micro device
    15.
    发明公开
    Method and apparatus for making a micro device 失效
    用于制备微阵列的方法和装置

    公开(公告)号:EP0880077A3

    公开(公告)日:2003-05-14

    申请号:EP98303499.2

    申请日:1998-05-05

    IPC分类号: G03F9/00 G03F1/14

    CPC分类号: G03F9/00 C23C14/042

    摘要: A hinged mask and a method for its use in manufacturing MEMS device are disclosed. According to the invention, the hinged mask and a portion of the MEMS device are formed at the same time on a support. Openings are formed in the mask, the openings defining a pattern that is transferable in the form of a patterned layer. After release of the MEMS device, the hinged mask is rotated out-of-plane about 180° to lie on top of the MEMS device. The hinged mask is used as a micro-sized shadow mask to deposit a patterned film of arbitrary composition on the MEMS device. Since the hinged plate is formed by the original lithography, it is aligned to the MEMS device with a high degree of accuracy.