公开(公告)号：EP2132763B1

公开(公告)日：2014-05-07

申请号：EP08715964.6

申请日：2008-02-22

Applicant: Applied Materials Israel Ltd.

Inventor： ALMOGY, Gilad ,  BARTOV, Avishai ,  FROSIEN, Jürgen ,  ADAMEC, Pavel ,  BANZHOF, Helmut

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/28 ,  H01L21/66 ,  H01J37/10

CPC classification number: H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

公开(公告)号：EP2600380A1

公开(公告)日：2013-06-05

申请号：EP12194516.6

申请日：2012-11-28

Applicant: FEI Company

Inventor： Routh, Jr., Brian

IPC: H01J37/08 ,  H01J37/077 ,  H01J37/05 ,  H01J27/16 ,  H01J37/304 ,  H01J37/305

CPC classification number: H01J37/285 ,  G01T1/28 ,  H01J27/16 ,  H01J37/05 ,  H01J37/077 ,  H01J37/08 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/265 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3056 ,  H01J2237/0817 ,  H01J2237/24415 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/31749

Abstract: A single column inductively coupled plasma source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the ICP to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis.

Abstract translation: 具有用户可选择配置的单列电感耦合等离子体源以离子模式工作，用于FIB操作或SEM操作的电子模式。 配备了X射线检测器，能量色散X射线光谱分析是可能的。 用户可以选择性地配置ICP以在离子模式或FIB模式下准备样品，然后基本上翻转开关选择电子模式或SEM模式，并使用EDS或其他类型的分析来分析样品。

公开(公告)号：EP2525384A2

公开(公告)日：2012-11-21

申请号：EP12167972.4

申请日：2012-05-15

Applicant: FEI Company

Inventor： McGinn, James

IPC: H01J37/05 ,  H01J37/15

CPC classification number: H01J37/05 ,  H01J37/15 ,  H01J49/288 ,  H01J2237/057 ,  H01J2237/31749

Abstract: An ExB Wien mass filter (700) providing a method and structure for mechanically adjusting the magnetic field distributions at the mass filter entrance and exit end caps (722 and 726, respectively). The reluctance of the flux return path may be modified by configuring pluralities of magnetic shims (790, 796) within slots (750, 756) at the outer diameters of the entrance and exit end caps, and also by configuring pluralities of magnetic plug shims (906) within circular flux dams (902) surrounding the entrance and exit apertures (724 and 728, respectively). Advantages of purely mechanical adjustment for the magnetic fields of the present invention, compared with prior art electromagnet adjustment methods include greater reliability, simplicity, lower cost, and lack of power dissipation. The invention may employ either permanent magnets or electromagnets for generation of the mass-separation magnetic field.

公开(公告)号：EP2511934A1

公开(公告)日：2012-10-17

申请号：EP12164204.5

申请日：2012-04-16

Applicant: FEI Company

Inventor： Tuggle, David ,  Parker, N. William

IPC: H01J37/05

CPC classification number: H01J37/05 ,  H01J2237/31749

Abstract: An ExB Wien mass filter provides an independently-adjustable electric field combined with the dipole electric field required for mass separation. The independently adjustable electric field can be used to provide a larger optical aperture, to correct astigmatism and to deflect the beam in direction parallel and/or perpendicular to the magnetic field.

Abstract translation: ExB Wien质量过滤器提供独立可调的电场，并结合质量分离所需的偶极电场。 独立可调的电场可用于提供更大的光学孔径，以校正散光并使光束在平行于和/或垂直于磁场的方向上偏转。

公开(公告)号：EP2461348A1

公开(公告)日：2012-06-06

申请号：EP10193806.6

申请日：2010-12-06

Applicant: FEI Company

Inventor： Luecken, Uwe ,  Kooijman, Cornelis ,  Schuurmans, Frank

IPC: H01J37/244 ,  H01J37/05 ,  H01J37/26

CPC classification number: H01J37/244 ,  H01J37/05 ,  H01J37/26 ,  H01J2237/05 ,  H01J2237/24455 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/2802 ,  H01J2237/2817

Abstract: A detector system for a transmission electron microscope includes a first detector for recording a pattern and a second detector for recording a position of a feature of the pattern. The second detector is preferably a position sensitive detector that provides accurate, rapid position information that can be used as feedback to stabilize the position of the pattern on the first detector. In one embodiment, the first detector detects an electron energy loss electron spectrum, and the second detector, positioned behind the first detector and detecting electrons that pass through the first detector, detects the position of the zero-loss peak and adjusts the electron path to stabilize the position of the spectrum on the first detector.

Abstract translation: 用于透射电子显微镜的检测器系统包括用于记录图案的第一检测器和用于记录图案的特征位置的第二检测器。 第二检测器优选地是位置敏感检测器，其提供精确，快速的位置信息，其可以用作反馈以稳定图案在第一检测器上的位置。 在一个实施例中，第一检测器检测电子能量损失电子光谱，并且位于第一检测器后面的第二检测器检测通过第一检测器的电子，检测零损耗峰值的位置并调整电子通道 稳定第一个检测器上的光谱位置。

公开(公告)号：EP1469503B1

公开(公告)日：2012-06-06

申请号：EP04009132.4

申请日：2004-04-16

Applicant: Carl Zeiss NTS GmbH

Inventor： Steigerwald, Michael, Dr. ,  Essers, Erik

IPC: H01J37/28 ,  H01J37/05 ,  H01J37/12 ,  H01J37/153

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/12 ,  H01J37/153

公开(公告)号：EP1634316B1

公开(公告)日：2011-11-23

申请号：EP04755134.6

申请日：2004-06-14

Applicant: Axcelis Technologies, Inc.

Inventor： BENVENISTE, Victor ,  RATHMELL, Robert ,  HUANG, Yougzhang

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/147 ,  H01J2237/057

Abstract: A magnetic deflector for an ion beam is disclosed and comprises first and second coils. The coils are positioned above and below the beam, respectively, and extend along a width of the beam. Current passes through the coils to generate a magnetic field therebetween that is generally perpendicular to a direction of travel of the beam along substantially the entire width thereof. In another aspect of the invention, a method of deflecting a beam prior to implantation into a workpiece is disclosed. The method includes determining one or more properties associated with the beam and selectively activating one of a magnetic deflection module and an electrostatic deflection module based on the determination. Plasma may be introduced for reducing space charge.

公开(公告)号：EP2331946A2

公开(公告)日：2011-06-15

申请号：EP09791973.2

申请日：2009-08-27

Applicant: Carl Zeiss NTS, LLC.

Inventor： RAHMAN, FHM-Faridur ,  FARKAS, Louis, S., III ,  NOTTE, John, A., IV

IPC: G01N23/225 ,  H01J37/08 ,  H01J27/26

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/08 ,  H01J37/265 ,  H01J2237/057 ,  H01J2237/0807 ,  H01J2237/24514

Abstract: Ion microscope methods and systems are disclosed. In general, the systems and methods provide high ion beam stability.

Abstract translation: 公开了离子显微镜的方法和系统。 通常，这些系统和方法提供了高离子束稳定性。

公开(公告)号：EP1124251B1

公开(公告)日：2011-03-02

申请号：EP01100857.0

申请日：2001-01-16

Applicant: Carl Zeiss NTS GmbH

Inventor： Rose, Harald, Prof. Dr.

IPC: H01J49/48

CPC classification number: H01J37/05 ,  H01J49/48

公开(公告)号：EP1863067A3

公开(公告)日：2010-12-22

申请号：EP07109256.3

申请日：2007-05-30

Applicant: SEN Corporation, an SHI and Axcelis Company

Inventor： Tsukihara, Mitsukuni, SEN Corporation ,  Kabasawa, Mitsuaki, SEN Corporation

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/04 ,  H01J37/05 ,  H01J2237/055 ,  H01J2237/30483

Abstract: The invention provides for a beam processing system for causing a particle beam extracted from a beam generating source to pass through a mass analysis magnet device, a mass analysis slit, and a deflection scanner in the order named, thereby irradiating the particle beam onto a processing object. The mass analysis slit is installed between the mass analysis magnet device and the deflection scanner at a position where the particle beam having passed through the mass analysis magnet device converges most in a lateral direction. A first DC quadruple electromagnet and a second DC quadruple electromagnet are installed on an upstream side and a downstream side of the mass analysis slit, respectively.