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    SYSTEM AND METHOD FOR HIGH ACCURACY GAS REFILL IN A TWO CHAMBER GAS DISCHARGE LASER SYSTEM
    21.
    发明公开
    SYSTEM AND METHOD FOR HIGH ACCURACY GAS REFILL IN A TWO CHAMBER GAS DISCHARGE LASER SYSTEM 有权
    系统和方法高精度气体重新在一个两室气体喷出激光系统

    公开(公告)号：EP2727200A1

    公开(公告)日：2014-05-07

    申请号：EP12804856.8

    申请日：2012-06-21

    申请人： Cymer, LLC

    发明人： JIANG, Rui ,  THORNES, Joshua, J. ,  RIGGS, Daniel, J. ,  O'BRIEN, Kevin, M.

    IPC分类号： H01S3/22

    CPC分类号： H01S3/036 ,  H01S3/22 ,  H01S3/225 ,  H01S3/2308 ,  H01S3/2366

    摘要： Systems and methods for automatically performing a high accuracy gas refill, in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. Based, upon a target pressure and halogen concentration that is either predetermined or entered by a user, and with no further user action, a non-halogen containing gas is added to the chamber to a first pressure, followed by the addition of halogen containing gas to a second pressure which is greater than a target pressure for the chamber, such that the halogen content in the gas at the second pressure is at a desired concentration. The gas in the chamber is bled until the pressure drops to the target pressure. The amount of non-halogen containing gas added is estimated automatically, and the amount of halogen containing gas is measured so that the desired concentration is obtained, taking into account both temperature and any gas remaining in the fill pipes from prior laser operation.

    SYSTEM AND METHOD FOR AUTOMATIC GAS OPTIMIZATION IN A TWO-CHAMBER GAS DISCHARGE LASER SYSTEM
    22.
    发明公开
    SYSTEM AND METHOD FOR AUTOMATIC GAS OPTIMIZATION IN A TWO-CHAMBER GAS DISCHARGE LASER SYSTEM 审中-公开
    系统和方法自动气体优化在两腔排气流激光系统

    公开(公告)号：EP2727199A1

    公开(公告)日：2014-05-07

    申请号：EP12803599.5

    申请日：2012-06-05

    申请人： Cymer, LLC

    发明人： O'BRIEN, Kevin, M. ,  THORNES, Joshua, J. ,  RIGGS, Daniel, J. ,  JIANG, Rui

    IPC分类号： H01S3/22

    CPC分类号： H01S3/036 ,  H01S3/104 ,  H01S3/2251 ,  H01S3/2366

    摘要： A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled until the discharge voltage meets/exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again until the voltage and pressure meet/exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled until the discharge voltage meets/exceeds the minimum value and the output energy meets/exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction.

    GAS DISCHARGE MOPA LASER SPECTRAL ANALYSIS MODULE
    25.
    发明授权
    GAS DISCHARGE MOPA LASER SPECTRAL ANALYSIS MODULE 有权
    气体放电MOPA激光光谱分析模块

    公开(公告)号：EP1668313B1

    公开(公告)日：2018-01-31

    申请号：EP04784260.4

    申请日：2004-09-15

    申请人： Cymer, LLC

    发明人： RAO, Rajasekhar, M. ,  MELCHIOR, John, T. ,  GLATZEL, Hoger, K.

    IPC分类号： G01B9/02 ,  G01J3/02 ,  G01J3/26 ,  G01J9/02

    CPC分类号： G01J3/26 ,  G01J3/02 ,  G01J3/027 ,  G01J9/0246

    摘要： A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and according to the formula Deltalambda= lambda0 [DOD DID2] / [8f -D0 ] where lambda0 is an assumed constant wavelength and D0 = (DOD - DID)2, and f is the focal length.

    METHOD AND APPARATUS FOR CONTROLLING LIGHT BANDWIDTH
    27.
    发明公开
    METHOD AND APPARATUS FOR CONTROLLING LIGHT BANDWIDTH 审中-公开

    公开(公告)号：EP2556569A4

    公开(公告)日：2018-01-17

    申请号：EP11766562

    申请日：2011-04-04

    申请人： CYMER LLC

    发明人： O'BRIEN KEVIN M ,  TRINTCHOUK FEDOR B

    IPC分类号： H01S3/10 ,  H01S3/134 ,  H01S3/225 ,  H01S3/23

    CPC分类号： H01S3/2308 ,  H01S3/134 ,  H01S3/225

    摘要： An apparatus includes a light source that produces a light beam, a bandwidth measurement system, a plurality of bandwidth actuation systems, and a control system. Each bandwidth actuation system includes one or more bandwidth actuators and each bandwidth actuation system is connected to an optical feature that is optically coupled to the produced light beam and operable to modify the connected optical feature to select a bandwidth within a bandwidth range of the produced light beam. The control system is connected to the bandwidth measurement system and to the plurality of bandwidth actuation systems. The control system is configured to switch between activating and operating a first bandwidth actuation system and activating and operating a second bandwidth actuation system independently and separately of activating and operating the first bandwidth actuation system based on a provided bandwidth measurement and a selected target bandwidth.

    HIGH POWER LASER FLAT PANEL WORKPIECE TREATMENT SYSTEM CONTROLLER
    28.
    发明公开
    HIGH POWER LASER FLAT PANEL WORKPIECE TREATMENT SYSTEM CONTROLLER 审中-公开
    HOCHLEISTUNGS-STEUERGERÄTFÜREIN SYSTEM ZUR BEARBEITUNG EINES LASER-FLACHTAFEL-WERKSTÜCKS

    公开(公告)号：EP2030293A4

    公开(公告)日：2017-08-09

    申请号：EP07809287

    申请日：2007-05-31

    申请人： CYMER LLC

    发明人： CONWAY JOSEPH E ,  SHARMA YOGESH

    IPC分类号： H01S3/22 ,  C30B13/24 ,  C30B29/06 ,  C30B33/02 ,  C30B35/00

    CPC分类号： C30B35/00 ,  B23K26/064 ,  C30B1/02 ,  C30B29/06 ,  C30B33/02

    摘要： A pulsed DUV workpiece treatment apparatus and method for delivering light to irradiate the workpiece, for crystallization of a material on the workpiece, carried on a work stage, which may comprise a pulsed laser DUV light source and an optical train producing a very narrow width very elongated beam of light pulses with a set of parameters required to be maintained within a respective selected narrow range of values on a pulse to pulse basis is disclosed, which may comprise: a laser controller; a work stage controller; a system controller receiving process recipe control demands from a customer recipe control command generator and providing control signals to the laser controller and the workstage controller, which may comprise: a database driven process controller which may comprise: a database containing generic process command steps selectable by a user through an external process user interface.

    摘要翻译： 脉冲DUV工件处理设备和方法用于传送光以照射工件，用于工件上材料的结晶，在工作台上承载，该工作台可以包括脉冲激光DUV光源和产生非常窄的宽度的光学系统 公开了一种具有一组参数的细长光脉冲光束，该脉冲光束脉冲以脉冲为单位被保持在相应的选定的窄范围值内，该参数可以包括：激光器控制器; 工作台控制器; 系统控制器接收来自用户配方控制命令发生器的处理配方控制要求并向激光控制器和工作台控制器提供控制信号，该控制信号可以包括：数据库驱动的过程控制器，其可以包括：包含通用过程命令步骤的数据库， 用户通过外部过程用户界面。

    ESTIMATION OF SPECTRAL FEATURE OF PULSED LIGHT BEAM
    29.
    发明公开
    ESTIMATION OF SPECTRAL FEATURE OF PULSED LIGHT BEAM 审中-公开
    KALKULATION DER SPEKTRALEIGENSCHAFTEN EINES GEPULSTEN LICHTSTRAHLS

    公开(公告)号：EP3152624A1

    公开(公告)日：2017-04-12

    申请号：EP15802551.0

    申请日：2015-06-03

    申请人： Cymer, LLC ,  ASML Netherlands BV

    发明人： DUFFEY, Thomas Patrick ,  GODFRIED, Herman Philip

    IPC分类号： G03F7/20

    CPC分类号： G01J3/28 ,  G01J3/027 ,  G01J3/14 ,  G01J3/26 ,  G01J9/00 ,  G01J11/00 ,  G01J2003/2853 ,  G03F7/70041 ,  G03F7/70058 ,  G03F7/70575

    摘要： A method is described for estimating a spectral feature of a pulsed light beam produced by an optical source and directed toward a wafer of a lithography apparatus. The method includes receiving a set of N optical spectra of pulses of the light beam; saving the received N optical spectra to a saved set; transforming the optical spectra in the saved set to form a set of transformed optical spectra; averaging the transformed optical spectra to form an averaged spectrum; and estimating a spectral feature of the pulsed light beam based on the averaged spectrum.

    摘要翻译： 描述了一种用于估计由光源产生并指向光刻设备的晶片的脉冲光束的光谱特征的方法。 该方法包括接收光束的脉冲的一组N个光谱; 将接收到的N光谱保存到保存的集合; 转换保存集中的光谱，形成一组变换光谱; 对变换的光谱进行平均以形成平均光谱; 以及基于所述平均光谱估计所述脉冲光束的光谱特征。