摘要:
To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a pre-determined criterion is met.
摘要:
A system for supplying a process gas to a processing location 7 of a particle beam system 1 comprises a gas reservoir 63; a gas conduit 65; a pipe 69 located close to the processing location; a valve 67 provided between the gas conduit and the pipe; and a controller 71 configured to open and to close the valve to switch the system from a first mode of operation in which process gas is not supplied to the processing location to a second mode of operation in which process gas is supplied to the processing location. The controller can alternately open and close the valve in cycles, wherein each cycle includes a first duration in which the valve is open and a second duration in which the valve is closed, wherein a ratio between the first duration and the second duration can be changed.
摘要:
The invention relates to a method of preparing and imaging a sample (101) using a particle-optical apparatus ( 100 ), equipped with an electron column (120) and an ion beam column (140), a camera system (110), a manipulator (160) the method comprising the steps of Deriving a first ptychographic image of the sample from a first electron image, then thinning the sample, and forming a second ptychographic image of the sample. In an embodiments of the invention the seed image used for the second image is the first ptychografic image. In another embodiment the second ptychographic image is the image of the layer removed during the thinning, In yet another embodiment the inner potential of the sample is determined and dopant concentrations are determined.
摘要:
The present invention relates to a method for the preparation of a sample for microstructure diagnostics, in particular for transmission electron microscopy TEM, scanning electron microscopy or X-ray absorption spectroscopy, wherein a flat, preferably plane-parallel plate is irradiated along each of the two opposite surfaces thereof with a high-energy beam such that, as a result of radiation-induced material removal, there is formed in each of said two surfaces a depression which runs preferably parallel to a central plate plane, wherein said two depressions are formed, so as to run at both sides of said/a central plate plane, such that the longitudinal axes thereof, as viewed in a projection of said longitudinal axes onto said central plate plane, intersect at a predefined angle α > 0°, preferably α ≥ 10°, preferably α ≥ 20°, preferably α ≥ 30°, and that, in the region of intersection of the two depressions, a material portion which is preferably transparent to electron beams and which is of predefined minimum thickness as viewed perpendicular to said central plate plane remains between said depressions as a sample. The invention also relates to a correspondingly designed device.
摘要:
The present invention discloses an electron microscope and FIB system for processing and imaging of a variety of materials using two separate laser beams of different characteristics. The first laser beam is used for large bulk material removal and deep trench etching of a workpiece. The second laser beam is used for finer precision work, such as micromachining of the workpiece, small spot processing, or the production of small heat affected zones. The first laser beam and the second laser beam can come from the same laser source or come from separate laser sources. Having one laser source has the additional benefits of making the system cheaper and being able to create separate external and internal station such that the debris generated from bulk material removal from the first laser beam will not interfere with vacuum or components inside the particle beam chamber.