Particle beam system including a supply of process gas to a processing location
    22.
    发明公开
    Particle beam system including a supply of process gas to a processing location 有权
    与处理气体供给至处理站粒子束系统

    公开(公告)号:EP2618361A3

    公开(公告)日:2015-07-22

    申请号:EP13000334.6

    申请日:2013-01-23

    IPC分类号: H01J37/305 H01J37/02

    摘要: A system for supplying a process gas to a processing location 7 of a particle beam system 1 comprises a gas reservoir 63; a gas conduit 65; a pipe 69 located close to the processing location; a valve 67 provided between the gas conduit and the pipe; and a controller 71 configured to open and to close the valve to switch the system from a first mode of operation in which process gas is not supplied to the processing location to a second mode of operation in which process gas is supplied to the processing location. The controller can alternately open and close the valve in cycles, wherein each cycle includes a first duration in which the valve is open and a second duration in which the valve is closed, wherein a ratio between the first duration and the second duration can be changed.

    VERFAHREN UND VORRICHTUNG ZUR PRÄPARATION EINER PROBE FÜR DIE MIKROSTRUKTURDIAGNOSTIK
    27.
    发明公开
    VERFAHREN UND VORRICHTUNG ZUR PRÄPARATION EINER PROBE FÜR DIE MIKROSTRUKTURDIAGNOSTIK 有权
    工艺用于样品的FOR显微诊断研制

    公开(公告)号:EP2748579A1

    公开(公告)日:2014-07-02

    申请号:EP12753432.9

    申请日:2012-08-09

    发明人: HÖCHE, Thomas

    IPC分类号: G01N1/32 H01J37/305

    摘要: The present invention relates to a method for the preparation of a sample for microstructure diagnostics, in particular for transmission electron microscopy TEM, scanning electron microscopy or X-ray absorption spectroscopy, wherein a flat, preferably plane-parallel plate is irradiated along each of the two opposite surfaces thereof with a high-energy beam such that, as a result of radiation-induced material removal, there is formed in each of said two surfaces a depression which runs preferably parallel to a central plate plane, wherein said two depressions are formed, so as to run at both sides of said/a central plate plane, such that the longitudinal axes thereof, as viewed in a projection of said longitudinal axes onto said central plate plane, intersect at a predefined angle α > 0°, preferably α ≥ 10°, preferably α ≥ 20°, preferably α ≥ 30°, and that, in the region of intersection of the two depressions, a material portion which is preferably transparent to electron beams and which is of predefined minimum thickness as viewed perpendicular to said central plate plane remains between said depressions as a sample. The invention also relates to a correspondingly designed device.

    Dual laser beam system used with an fib and/or electron microscope
    28.
    发明公开
    Dual laser beam system used with an fib and/or electron microscope 有权
    用FIB和/或电子的双激光系统中使用的

    公开(公告)号:EP2733722A2

    公开(公告)日:2014-05-21

    申请号:EP13192845.9

    申请日:2013-11-14

    申请人: FEI COMPANY

    发明人: Bruland, Kelly

    IPC分类号: H01J37/305 H01J37/22

    摘要: The present invention discloses an electron microscope and FIB system for processing and imaging of a variety of materials using two separate laser beams of different characteristics. The first laser beam is used for large bulk material removal and deep trench etching of a workpiece. The second laser beam is used for finer precision work, such as micromachining of the workpiece, small spot processing, or the production of small heat affected zones. The first laser beam and the second laser beam can come from the same laser source or come from separate laser sources. Having one laser source has the additional benefits of making the system cheaper and being able to create separate external and internal station such that the debris generated from bulk material removal from the first laser beam will not interfere with vacuum or components inside the particle beam chamber.