公开(公告)号：EP2128885A1

公开(公告)日：2009-12-02

申请号：EP08156906.3

申请日：2008-05-26

Applicant: FEI COMPANY

Inventor： Henstra, Alexander

IPC: H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/153 ,  H01J37/04

CPC classification number: H01J37/05 ,  H01J3/027 ,  H01J3/04 ,  H01J37/063 ,  H01J2237/045 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/1534

Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 103 eccentrically through a lens 107. As a result of this, energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit 109 in an energy selecting diaphragm 108, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 113 will have a reduced energy spread. Deflection unit 112 deflects the beam to the optical axis 101. One can also elect to deflect a beam 105 going through the middle of the lens toward the optical axis and having, for example, greater current.
The energy dispersed spot is imaged on the slit by a deflector 111. When positioning the energy dispersed spot on the slit, central beam 105 is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector 112 is avoided.

Abstract translation: 本发明描述了发生能量选择的粒子源。 通过透过透镜107偏心地发送带电粒子103的束来进行能量选择。其结果是，由透镜形成的图像中会发生能量分散。 通过将该图像投影到能量选择膜108中的狭缝109上，可以仅允许能量谱的有限部分中的粒子通过。 因此，通过的梁113将具有减小的能量扩展。 偏转单元112将光束偏转到光轴101.还可以选择将穿过透镜中间的光束105偏转到光轴并具有例如更大的电流。 能量分散点通过偏转器111在狭缝上成像。当将能量分散点定位在狭缝上时，中心光束105从轴线偏转到由能量选择膜片停止的程度。 因此避免了在隔膜之后的区域中由该光束产生的反射和污染。 避免了在偏转器112的区域中与来自中心光束的电子与能量过滤光束相互作用的电子 - 电子相互作用。

公开(公告)号：EP1783811A2

公开(公告)日：2007-05-09

申请号：EP05111064.1

申请日：2005-11-22

Applicant: FEI COMPANY

Inventor： Henstra, Alexander ,  Scheinfein, Michael R.

IPC: H01J37/153 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/1534

Abstract: The invention describes a corrector for the correction of chromatic aberrations in a particle lens, such as used in a SEM or a TEM. So as to reduce the stability demands on the power supplies of such a corrector, the energy with which the particle beam passes through the corrector is lower than the energy with which the beam passes through the lens to be corrected.

Abstract translation: 本发明描述了用于校正像在SEM或TEM中使用的粒子透镜中的色差的校正器。 为了降低对这种校正器的电源的稳定性要求，粒子束通过校正器的能量低于光束通过透镜的能量，以被校正。

公开(公告)号：EP3923314A1

公开(公告)日：2021-12-15

申请号：EP21178118.2

申请日：2021-06-08

Applicant: FEI Company

Inventor： Deng, Yuchen ,  Trompenaars, Piet ,  Buijsse, Bart ,  Henstra, Alexander

IPC: H01J37/30

Abstract: Methods for using a dual beam microscope system to simultaneously process a sample and image the processed portions of the sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, splitting the plurality of electrons into two electron beams, and then modifying the focal properties of at least one of the electron beams such that the two electron beams have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam. The STEM beam is then used to process a region of the sample to induce a physical change (e.g., perform milling, deposition, charge adjustment, phase change, etc.). The second electron beam is focused to act as a TEM beam to perform imaging of the region of the sample being processed.

公开(公告)号：EP3901980A2

公开(公告)日：2021-10-27

申请号：EP21164759.9

申请日：2021-03-25

Applicant: FEI Company

Inventor： Henstra, Alexander ,  Deng, Yuchen ,  Kohr, Holger

IPC: H01J37/04 ,  H01J37/26

Abstract: Methods for using a single electron microscope system for investigating a sample with TEM and STEM techniques include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam that is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the STEM beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image and a STEM image.

公开(公告)号：EP3889591A1

公开(公告)日：2021-10-06

申请号：EP21164764.9

申请日：2021-03-25

Applicant: FEI Company

Inventor： Buijsse, Bart ,  Henstra, Alexander ,  Deng, Yuchen

IPC: G01N23/20058 ,  H01J3/00 ,  H01J37/00

Abstract: Diffraction patterns of a sample at various tilt angles are acquired by irradiating a region of interest using a first charged particle beam. Sample images are acquired by irradiating the region of interest using a second charged particle beam. The first and second charged particle beams are formed by splitting charged particles generated by a charged particle source.

公开(公告)号：EP3637452A1

公开(公告)日：2020-04-15

申请号：EP18200039.8

申请日：2018-10-12

Applicant: FEI Company

Inventor： Sluijterman, Albertus Aemillius Seyno ,  Bosch, Eric Gerardus Theodoor ,  Henstra, Alexander

IPC: H01J37/153

Abstract: The invention relates to a charged particle microscope for examining a specimen, and a method of calibrating a charged particle microscope. The charged particle microscope comprises an optics column, including a charged particle source, a final probe forming lens and a scanner, for focusing and scanning a beam of charged particles emitted from said charged particle source along an optical axis onto a specimen. Furthermore, a specimen stage is positioned downstream of said final probe forming lens and arranged for holding said specimen. Additionally, a detector device is provided, comprising at least two detector segment elements that are annularly spaced about said optical axis. A control unit is provided that is arranged for obtaining, for the at least two detector segment elements, corresponding detector segment images of said specimen by scanning the beam over said specimen. Based on a relative movement between the detector segment images, an aberration parameter of the charged particle microscope can be determined. The aberration parameter may be defocus, astigmatism and/or coma.

公开(公告)号：EP3399537B1

公开(公告)日：2019-10-16

申请号：EP18170249.9

申请日：2018-05-01

Applicant: FEI Company

Inventor： Mohammadi-Gheidari, Ali ,  Henstra, Alexander ,  Tiemeijer, Peter Christiaan ,  Liu, Kun ,  Dona, Pleun ,  Schwind, Gregory A. ,  Van de Water, Gerbert Jeroen ,  Bischoff, Maarten

IPC: H01J37/065 ,  H01J37/067 ,  H01J37/145 ,  H01J37/28

公开(公告)号：EP3370247A1

公开(公告)日：2018-09-05

申请号：EP18159059.7

申请日：2018-02-28

Applicant: FEI Company

Inventor： Henstra, Alexander ,  Tiemeijer, Peter Christiaan

IPC: H01J37/153

CPC classification number: H01J37/265 ,  H01J37/08 ,  H01J37/1472 ,  H01J37/153 ,  H01J2237/1534

Abstract: A method of operating a charged particle microscope comprising the following steps:
- Providing a specimen on a specimen holder;
- Using a source to produce a beam of charged particles;
- Passing said beam through an illuminator comprising:
▪ A source lens, with an associated particle-optical axis;
▪ A condenser aperture, which is disposed between the source lens and specimen and is configured to define a footprint of said beam upon the specimen;

- Irradiating the specimen with the beam emerging from said illuminator;
- Using a detector to detect radiation emanating from the specimen in response to said irradiation, and producing an associated image,
specifically comprising the following steps:
- Choosing a set of emission angles from said source;
- For each emission angle in said set, selecting a corresponding sub-beam that emits from the source at that emission angle, and storing a test image formed by that sub-beam, thereby compiling a set of test images corresponding to said set of emission angles;
- Analyzing said set of test images to evaluate illuminator aberrations generated prior to said condenser aperture.

公开(公告)号：EP3065160A1

公开(公告)日：2016-09-07

申请号：EP15192573.2

申请日：2015-11-02

Applicant: FEI Company

Inventor： Henstra, Alexander ,  Tiemeijer, Peter

IPC: H01J37/05 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/14 ,  H01J37/22 ,  H01J37/263 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/2802

Abstract: The invention relates to a post-column filter (a PCF) for a (Scanning) Transmission Electron Microscope (a (S)TEM). Traditionally these filters use excitations of the optical elements before the slit plane that are identical in both the EFTEM and the EELS mode. Although this eases the task for the person skilled in the art of developing and tuning a PCF, as it reduces the number of degrees of freedom to a manageable amount. Inventors found ways to determine settings of the optical elements before the slit plane for EELS mode that are different from the EFTEM mode and where the performance of the PCF in EELS mode is improved (especially the relative energy range that can be imaged) without degrading the performance of the PCF in EFTEM mode.

Abstract translation: 本发明涉及一种用于（扫描）透射电子显微镜（（S）TEM）的柱后过滤器（PCF）。 传统上，这些滤光片在EFTEM和EELS模式之间相同的狭缝平面之前使用光学元件的激发。 尽管这样可以减轻开发和调整PCF的技术熟练人员的任务，因为它将自由度减少到可管理的数量。 发明人发现了确定EELS模式的狭缝平面与EFTEM模式不同的光学元件的设置方式，并且改善了EELS模式下PCF的性能（特别是可以成像的相对能量范围），而不会降低 PCF在EFTEM模式下的性能。

公开(公告)号：EP2838108A1

公开(公告)日：2015-02-18

申请号：EP13180022.9

申请日：2013-08-12

Applicant: FEI COMPANY

Inventor： Tiemeijer, Peter ,  Henstra, Alexander ,  Konings, Stan

IPC: H01J37/26

CPC classification number: H01J37/261 ,  H01J37/147 ,  H01J37/22 ,  H01J37/26 ,  H01J37/263 ,  H01J2237/006 ,  H01J2237/2605 ,  H01J2237/262

Abstract: An Environmental Transmission Electron Microscope suffers from gas-induced resolution deterioration. It is found that this deterioration was not a function of the current density on the sample, but of the total current of the beam of electrons. Inventors conclude that the deterioration is due to ionization of gas in the sample chamber of the ETEM, and propose to use an electric field in the sample chamber to remove the ionized gas, thereby diminishing the gas-induced resolution deterioration. The electric field need not be a strong field, and can be caused by, for example, biasing the sample 114 with respect to the sample chamber 138. A bias voltage of 100 V applied via voltage source 144 is sufficient for a marked improvement the gas-induced resolution deterioration. Polarization is not important. Alternatively an electric field perpendicular to the optical axis 104 can be used, for example by placing an electrically biased wire or gauze 154 off-axis in the sample chamber.

Abstract translation: 环境透射电子显微镜遭受气体分解降解。 发现这种劣化不是样品上的电流密度，而是电子束的总电流的函数。 发明人得出结论，劣化是由于ETEM的样品室中的气体的离子化，并且建议在样品室中使用电场来去除电离气体，从而减少气体诱导的分辨率劣化。 电场不需要是强场，并且可以由例如相对于样品室138偏置样品114引起。经由电压源144施加的100V的偏置电压足以显着改善气体 引起分辨率恶化。 极化并不重要。 或者，可以使用垂直于光轴104的电场，例如通过将偏置电线或纱布154离轴放置在样品室中。