摘要:
An inkjet recording ink, including: water; a water-soluble organic solvent; a pigment; and a phosphate group-containing copolymer, wherein the phosphate group-containing copolymer contains a structural unit represented by the following General Formula (1) and a structural unit represented by the following General Formula (2): where R1 denotes a hydrogen atom or a methyl group; M+ denotes an alkali metal ion, an organic amine ion, or a hydrogen ion; half or more of M+ in the copolymer is the alkali metal ion or the organic amine ion, the remainder of M+ is the hydrogen ion; n and m each denote an integer of 0 to 6, provided that both of n and m are not 0; and a block of (C2H4O) and a block of (C3H6O) may be exchanged with each other, where R2 denotes a hydrogen atom or a methyl group.
摘要:
The present invention provides a copolymer used as oily gelling agent with which a stable oily gelled composition can be prepared. The copolymer of the present invention is characterized by comprising a hydrophobic monomer represented by the following general formula (1) and a hydrophilic monomer represented by the following general formula (2) and/or the following general formula (3). (In formula (1), R 1 is a straight-chain or branched-chain alkyl group having 16 to 22 carbon atoms. R 2 is a hydrogen atom or a methyl group.) (In formula (2), R 3 is a hydrogen atom, a glyceryl group, a straight-chain or branched-chain hydroxyalkyl group having 1 to 4 carbon atoms, or a polypropylene glycol group represented by -(C 3 H 6 O) n H (here, n is an integer of 2 to 10). R 4 is a hydrogen atom or a methyl group.) (In formula (3), R 5 is a hydrogen atom or a methyl group, R 6 is a straight-chain or branched-chain alkyl group or hydroxyalkyl group having 1 to 4 carbon atoms, or a substituent represented by the following structural formula (4).)
摘要:
The present invention aims to provide a liquid solder resist composition that has high reflectivity and is capable of forming a solder resist layer with suppressed deterioration especially due to light. A liquid solder resist composition according to the present invention contains a carboxyl group-containing resin, a photopolymerizable compound containing at least one compound selected from a group consisting of a photopolymerizable monomer and a photopolymerizable prepolymer, a photopolymerization initiator, a titanium dioxide, and a compound having a cyclic ether skeleton. The titanium dioxide contains both of a rutile titanium dioxide manufactured by a sulfuric acid method and a rutile titanium dioxide manufactured by a chlorine method.
摘要:
The present invention aims to provide a liquid solder resist composition in which a solder resist layer formed with the liquid solder resist composition can have a matte surface due to resin components in the composition. A liquid solder resist composition according to the present invention contains a carboxyl group-containing resin (A), a thermosetting component (B), a photopolymerizable component (C), a photopolymerization initiator (D), and a coloring agent (E). The thermosetting component (B) contains a powdery epoxy compound (B11) represented by following formula (1). An amount of the epoxy compound (B11) with respect to a total amount of the carboxyl group-containing resin (A), the thermosetting component (B), and the photopolymerizable component (C) is within a range of 15 to 40 weight%
摘要:
A liquid solder resist composition contains: a carboxyl group-containing resin; a photopolymerizable compound which contains one or more kinds of compounds selected from a group consisting of a photopolymerizable monomer and a photopolymerizable prepolymer; a photopolymerization initiator; an epoxy compound; and titanium dioxide. The carboxyl group-containing resin is obtained by polymerization of a monomer composition which contains: a carboxyl group-containing monomer represented by following formula (1); and a maleimide compound represented by following formula (2). The carboxyl group-containing resin does not contain a photopolymerizable functional group. In the formula (1), X represents R a -COO.
摘要:
A solder resist composition includes: (A) a carboxyl group-containing resin; (B) an epoxy compound; (C) titanium dioxide; (D) a photopolymerization initiator; and (E) an antioxidant. The component (B) contains a hydroquinone epoxy compound represented by following formula (1). The component (D) contains (D1) a bisacylphosphine oxide-based photopolymerization initiator and (D2) an α-hydroxy alkylphenone-based photopolymerization initiator.
摘要:
The present invention aims to provide a liquid solder resist composition that has high reflectivity and is capable of forming a solder resist layer with suppressed deterioration especially due to light. A liquid solder resist composition according to the present invention contains a carboxyl group-containing resin, a photopolymerizable compound containing at least one compound selected from a group consisting of a photopolymerizable monomer and a photopolymerizable prepolymer, a photopolymerization initiator, a titanium dioxide, and a compound having a cyclic ether skeleton. The titanium dioxide contains both of a rutile titanium dioxide manufactured by a sulfuric acid method and a rutile titanium dioxide manufactured by a chlorine method.
摘要:
This photosensitive resin composition includes: (A) a photopolymerizable compound including at least one of a photopolymerizable monomer and a photopolymerizable oligomer; (B) titanium dioxide; and (C) a photopolymerization initiator. The component (C) includes (C1) an acylphosphine oxide-containing photopolymerization initiator and (C2) a phenylglyoxylic acid-containing photopolymerization initiator.
摘要:
A liquid solder resist composition contains a carboxyl group-containing resin, a photopolymerizable compound containing at least one compound selected from a group consisting of a photopolymerizable monomer and a photopolymerizable prepolymer, a photopolymerization initiator, and a titanium dioxide. The photopolymerization initiator contains a bisacylphosphine oxide-based photopolymerization initiator, a first α-hydroxyalkyl phenone-based photopolymerization initiator that is a liquid at 25°C, and a second α-hydroxyalkyl phenone-based photopolymerization initiator that is a solid at 25°C.