公开(公告)号：EP2174076A4

公开(公告)日：2011-04-13

申请号：EP08780917

申请日：2008-06-22

Applicant: ADVANCED TECH MATERIALS

Inventor： CARRUTHERS J DONALD ,  BOGGS KARL ,  WANG LUPING ,  WILSON SHAUN ,  ARNO JOSE I ,  MARGANSKI PAUL J ,  BILODEAU STEVEN M ,  ZOU PENG ,  BOBITA BRIAN ,  SWEENEY JOSEPH D ,  EDWARDS DOUGLAS

IPC: F25B17/08 ,  F25B30/04 ,  F25B35/04

CPC classification number: B01J20/26 ,  B01J20/20 ,  B01J20/28054 ,  B01J20/28092 ,  B01J20/30 ,  B01J20/305 ,  B01J20/3078 ,  B01J2220/445 ,  C09K5/047 ,  F25B17/08 ,  F25B27/007 ,  F25B35/04 ,  F25B37/00 ,  F25B2500/01

公开(公告)号：EP1274499A4

公开(公告)日：2004-08-25

申请号：EP01930461

申请日：2001-04-09

Applicant: ADVANCED TECH MATERIALS

Inventor： ARNO JOSE I

IPC: B01D53/34 ,  B01D53/68 ,  C23F4/00 ,  B01D53/14 ,  B01D53/70 ,  B01D53/86

CPC classification number: B01D53/70 ,  B01D53/68 ,  B01D2251/202 ,  B01D2251/208 ,  B01D2257/2027 ,  B01D2257/2066

Abstract: Apparatus and process for the abatement of fluorine and fluorine-containing compounds from gases containing the same, such as effluent gas streams from semiconductor manufacturing operations, wherein a fluorocompound abatement medium (26) is injected into the fluorocompound-containing gas (12). The fluorocompound abatement medium (26) comprises at least one of steam, methane and hydrogen, with the proviso that when the fluorocompound abatement medium (26) contains methane and/or hydrogen, the injection of the fluorocompound abatement medium (26) is conducted under non-combustion conditions.

公开(公告)号：EP1569737A4

公开(公告)日：2006-11-08

申请号：EP03790062

申请日：2003-11-25

Applicant: ADVANCED TECH MATERIALS

Inventor： BRESTOVANSKY DENNIS ,  WODJENSKI MICHAEL J ,  ARNO JOSE I ,  CARRUTHERS J DONALD

IPC: B01D20060101 ,  B01D53/02 ,  B01D53/04 ,  B01D59/26 ,  B67D7/74 ,  B67D99/00 ,  F17C11/00

CPC classification number: B01D53/053 ,  B01D53/0407 ,  B01D2253/102 ,  B01D2253/304 ,  B01D2253/342 ,  B01D2257/40 ,  B01D2257/704 ,  B01D2257/706 ,  B01D2257/93 ,  B01D2258/0216 ,  B01D2259/4525 ,  F17C11/00 ,  F17C13/084 ,  F17C2201/0157 ,  F17C2205/0103 ,  F17C2205/0338 ,  F17C2205/0391 ,  F17C2270/0518 ,  Y02E60/321 ,  Y10T137/0318

公开(公告)号：EP1198283A4

公开(公告)日：2006-06-07

申请号：EP00930328

申请日：2000-05-03

Applicant: ADVANCED TECH MATERIALS

Inventor： ARNO JOSE I

IPC: B01D53/14 ,  B01D53/34 ,  B01D53/50 ,  B01D53/56 ,  B01D53/62 ,  B01D53/68 ,  B01D53/70 ,  C23C16/44

CPC classification number: B01D53/14 ,  B01D53/50 ,  B01D53/56 ,  B01D53/62 ,  B01D53/68 ,  B01D53/70 ,  B01D2251/104 ,  C23C16/4412 ,  Y02C20/30

Abstract: An effluent gas stream treatment system for treatment of gaseous effluents, such as waste gases from semiconductor manufacturing operations (1210). The effluent gas stream treatment system includes an oxidation unit (1238) to which an oxygen-containing gas such as ozone (1220) may be added, with input of energy (e.g. thermal, radio frequency, electrical, microwave, etc.), to effect oxidation of oxidizable species in the effluent, such as halocompounds (e.g., chlorofluorocarbons, perfluorocarbons), CO, NF3, nitrogen oxides, and sulfur oxides. The effluent gas stream treatment system may include a wet scrubber (1248) associated with the oxygen-containing gas source, so that the gas stream is contacted with the oxygen-containing gas (1220) during the wet scrubbing operation, to enhance removal of oxidizable species in the gas stream during treatment.

公开(公告)号：EP1807224A4

公开(公告)日：2014-02-19

申请号：EP05823352

申请日：2005-10-21

Applicant: ADVANCED TECH MATERIALS

Inventor： DIMEO FRANK JR ,  DIETZ JAMES ,  OLANDER W KARL ,  KAIM ROBERT ,  BISHOP STEVEN E ,  NEUNER JEFFREY W ,  ARNO JOSE I

IPC: B08B7/00 ,  B08B7/04 ,  H01J37/32

CPC classification number: C23G5/00 ,  C23C14/564 ,  H01J37/08 ,  H01J37/32862 ,  H01J2237/022 ,  H01J2237/31701

公开(公告)号：EP1899041A4

公开(公告)日：2009-04-22

申请号：EP06784388

申请日：2006-05-03

Applicant: ADVANCED TECH MATERIALS

Inventor： OLANDER KARL W ,  MCMANUS JAMES V ,  HULTQUIST STEVEN J ,  ARNO JOSE I ,  VAN BUSKIRK PETER

IPC: B01D53/02 ,  F17C11/00

CPC classification number: F17C11/00 ,  F17C2201/0109 ,  F17C2201/032 ,  F17C2201/035 ,  F17C2201/054 ,  F17C2201/056 ,  F17C2201/058 ,  F17C2203/0639 ,  F17C2203/0678 ,  F17C2205/0184 ,  F17C2205/0326 ,  F17C2205/0329 ,  F17C2205/0338 ,  F17C2205/0391 ,  F17C2221/011 ,  F17C2221/013 ,  F17C2221/014 ,  F17C2221/031 ,  F17C2221/033 ,  F17C2221/035 ,  F17C2221/037 ,  F17C2223/0123 ,  F17C2223/013 ,  F17C2223/033 ,  F17C2223/035 ,  F17C2225/0123 ,  F17C2225/013 ,  F17C2225/033 ,  F17C2225/035 ,  F17C2225/038 ,  F17C2227/0114 ,  F17C2227/0135 ,  F17C2227/0157 ,  F17C2250/032 ,  F17C2250/0443 ,  F17C2250/0636 ,  F17C2270/0168 ,  F17C2270/02 ,  F17C2270/0518

公开(公告)号：EP1627265A4

公开(公告)日：2006-07-26

申请号：EP04758340

申请日：2004-03-25

Applicant: ADVANCED TECH MATERIALS

Inventor： ARNO JOSE I ,  DIETZ JAMES A

IPC: G05D11/00 ,  G01N21/35 ,  H01L21/66

CPC classification number: H01L22/20 ,  G01N21/3504 ,  Y10T137/0329 ,  Y10T137/2509 ,  Y10T137/87676

Abstract: Apparatus and method for delivery of dilute active fluid, e.g., to a downstream active fluid-consuming process unit of a semiconductor manufacturing plant. The delivery system includes an active fluid source, a diluent fluid source, a fluid flow metering device for dispensing of the active fluid at a predetermined flow rate, a mixer arranged to mix active gas from the active fluid source that is dispensed at such predetermined flow rate by the fluid flow metering device, with diluent fluid to form a diluted active fluid mixture, and a monitor arranged to measure concentration of active fluid in the diluted active fluid mixture, and responsively adjust the fluid flow metering device, to control the dispensing rate of the active fluid, and maintain a predetermined concentration of active fluid in the diluted active fluid mixture.

公开(公告)号：EP2021528A4

公开(公告)日：2011-03-23

申请号：EP07761374

申请日：2007-04-26

Applicant: ADVANCED TECH MATERIALS

Inventor： DIMEO FRANK JR ,  DIETZ JAMES ,  OLANDER W KARL ,  KAIM ROBERT ,  BISHOP STEVEN E ,  NEUNER JEFFREY W ,  ARNO JOSE I ,  MARGANSKI PAUL J ,  SWEENEY JOSEPH D ,  ELDRIDGE DAVID ,  YEDAVE SHARAD ,  BYL OLEG ,  STAUF GREGORY T

IPC: C25B7/00

CPC classification number: C23C14/564 ,  C23C16/4405 ,  H01J37/32412 ,  H01J37/32862

公开(公告)号：EP1933992A4

公开(公告)日：2010-12-08

申请号：EP06813979

申请日：2006-08-30

Applicant: ADVANCED TECH MATERIALS

Inventor： OLANDER KARL M ,  ARNO JOSE I ,  KAIM ROBERT

IPC: B05D3/06 ,  C23C14/14 ,  C23C14/24 ,  C23C14/46 ,  C23C14/48 ,  H01J37/08 ,  H01J37/317 ,  H01L21/265 ,  H01L21/425

CPC classification number: H01L21/265 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/006 ,  H01J2237/082 ,  H01L21/26513 ,  H01L21/2658

公开(公告)号：EP1109612A4

公开(公告)日：2002-04-03

申请号：EP99924546

申请日：1999-05-28

Applicant: ADVANCED TECH MATERIALS

Inventor： ARNO JOSE I

IPC: B01D53/14 ,  B01D53/68 ,  B01D53/70 ,  B01D47/00 ,  B01D50/00 ,  B01D53/34

CPC classification number: B01D53/70 ,  B01D53/14 ,  B01D53/68 ,  Y02C20/30

Abstract: A system for abating fluorocompound, e.g., fluorine or gaseous fluorine-containing compounds, in an effluent gas stream containing same, by scrubbing of the effluent gas stream with an aqueous scrubbing medium in the presence of a reducing agent, e.g., sodium thiosulfate, ammonium hydroxide, or potassium iodide. The abatement system of the invention has utility in the treatment of semiconductor manufacturing process effluents containing fluorine and/or fluorocarbon gas species.