公开(公告)号：EP2991121A4

公开(公告)日：2017-02-08

申请号：EP13856064

申请日：2013-10-31

申请人： BOE TECHNOLOGY GROUP CO LTD

发明人： KIM HEECHEOL ,  SONG YOUNGSUK ,  YOO SEONGYEOL ,  CHOI SEUNGJIN

IPC分类号： H01L29/786 ,  G02F1/1362 ,  G02F1/1368 ,  H01L27/12

CPC分类号： H01L27/124 ,  G02F1/1362 ,  G02F1/136227 ,  G02F1/1368 ,  G02F2201/40 ,  H01L21/283 ,  H01L21/32133 ,  H01L21/76802 ,  H01L23/3171 ,  H01L27/1248 ,  H01L27/1259 ,  H01L27/1288 ,  H01L29/1033 ,  H01L29/41733 ,  H01L29/4175 ,  H01L29/66765 ,  H01L29/78696 ,  H01L2924/0002 ,  H01L2924/00

摘要： An array substrate, a manufacturing method thereof and a display device are provided, and the array substrate comprises: a substrate (1); a plurality of data lines (16), formed on the substrate and extending in a first direction; a plurality of gate lines (15), formed on the substrate (1), crossing the plurality of data lines (15), and extending in a second direction perpendicular to the first direction; a plurality of pixel regions, defined by the plurality of gate lines (15) and the plurality of data lines (15) crossing each other and arranged in a matrix form, wherein each of the pixel regions is provided with a thin film transistor and a pixel electrode (12), wherein, the thin film transistor comprises: a gate electrode (2), connected with one of the plurality of gate lines (15); a gate insulating layer (3), provided above the gate line (15) and the gate electrode (2); an active layer (5), formed on the gate insulating layer (3) and disposed corresponding to the gate electrode (2); a drain electrode (8) and a source electrode (9), disposed opposite to each other above the active layer (5) and having a channel region of the thin film transistor therebetween; a filling layer (4), provided between the gate electrode (2) and the gate line (15) connected with the gate electrode, and the drain and source electrodes (8) and (9); and a passivation layer (10), provided on the source electrode (9), the drain electrode (8) and the active layer (5), wherein at a position directly facing the gate line (15), the passivation layer (10) is provided with a passivation layer through hole (11) configured to perform a connection between the drain electrode (8) and the pixel electrode (12).

公开(公告)号：EP3128553A4

公开(公告)日：2018-01-24

申请号：EP14861185

申请日：2014-07-11

申请人： BOE TECHNOLOGY GROUP CO LTD

发明人： CHOI SEUNGJIN ,  KIM HEECHEOL ,  SONG YOUNGSUK ,  YOO SEONGYEOL

IPC分类号： G02F1/1362 ,  G02F1/1343 ,  H01L27/12

CPC分类号： G02F1/134309 ,  G02F1/133345 ,  G02F1/134363 ,  G02F1/13439 ,  G02F1/136227 ,  G02F1/136286 ,  G02F2001/134318 ,  G02F2001/134372 ,  G02F2001/136295 ,  G02F2201/121 ,  G02F2201/123 ,  H01L21/324 ,  H01L21/76802 ,  H01L21/77 ,  H01L27/12 ,  H01L27/124 ,  H01L27/1259 ,  H01L29/45

摘要： The embodiments of the invention disclose an array substrate, a manufacturing method thereof and a display device. Due to the fact that the surfaces of a source electrode, a drain electrode and a data line which are arranged on the same layer are provided with an oxide film which is formed after annealing treatment is conducted on the source electrode, the drain electrode and the data line, in the process that the pattern of a pixel electrode is formed on the source electrode, the drain electrode and the data line by the adoption of a composition technology, the oxide film can protect the source electrode and the data line under the oxide film from being corroded by an etching agent when the pattern of the pixel electrode is formed by etching, and the display quality of a display panel will not be affected; meanwhile, a connecting portion enables the drain electrode to be electrically connected with the pixel electrode through a first via hole arranged over the drain electrode and penetrating through the oxide film, therefore the normal display function of the display panel can be ensured.

公开(公告)号：EP2660651A4

公开(公告)日：2015-07-01

申请号：EP12837626

申请日：2012-12-23

申请人： BOE TECHNOLOGY GROUP CO LTD

发明人： SONG YOUNGSUK ,  HUI GUANBAO ,  YOO SEONGYEOL ,  CHOI SEUNGJIN ,  ZHANG FENG

IPC分类号： G02F1/1362 ,  G02F1/133 ,  G02F1/1343

CPC分类号： H01L27/124 ,  G02F1/1343 ,  G02F1/1362 ,  G02F1/136209 ,  G02F2001/134318 ,  G02F2001/134372 ,  G02F2001/136222 ,  G02F2203/01 ,  G02F2203/02 ,  H01L27/1259

摘要： Embodiments of the invention relate to an array substrate, a manufacturing method thereof and a display device comprising the array substrate. The array substrate comprises a gate line and a data line which define a pixel region, the pixel region comprises a thin film transistor region and an electrode pattern region, a gate electrode, a gate insulation layer, an active layer, a source electrode, a drain electrode and a passivation layer are formed in the thin film transistor region, the gate insulation layer, a pixel electrode, the passivation layer and a common electrode are formed in the electrode pattern region, and the common electrode and the pixel electrode form a multi-dimensional electric field. A color resin layer is formed between the gate insulation layer and the pixel electrode.

公开(公告)号：EP3151279A4

公开(公告)日：2018-02-14

申请号：EP14861123

申请日：2014-10-01

申请人： BOE TECHNOLOGY GROUP CO LTD

发明人： SUN SHUANG ,  CHOI SEUNGJIN ,  NIU JING ,  ZHANG FANGZHEN

IPC分类号： H01L27/12 ,  G02F1/1362 ,  H01L21/77

CPC分类号： H01L27/1288 ,  G02F1/133345 ,  G02F1/134309 ,  G02F1/13439 ,  G02F1/136227 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2001/136231 ,  G02F2001/136236 ,  G02F2001/13625 ,  G02F2001/136295 ,  H01L21/77 ,  H01L27/12 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/127 ,  H01L27/32 ,  H01L29/41733 ,  H01L29/42384 ,  H01L29/4908 ,  H01L29/78642 ,  H01L29/7869 ,  H01L29/78696

摘要： An array substrate and manufacturing method thereof and a display device. The display device includes a pixel electrode (8), including a portion (a) in a display region and a portion (b) in a non-display region; a first electrode (6) formed on the non-display region (b) of the pixel electrode (8); a passivation layer (9) formed on the pixel electrode (8) and the first electrode (6), which includes a via hole (11) located over the first electrode (6); an active layer (4) and a second electrode (7) that are formed on the passivation layer (9), the active layer (4) being connected to the first electrode (6) through the via hole (11) of the passivation layer (9). With the array substrate and the manufacturing method thereof, the manufacturing cost is reduced, the corrosion to an electrode material is lessened, and quality of the array substrate is enhanced.

公开(公告)号：EP2876676A4

公开(公告)日：2016-11-30

申请号：EP12861051

申请日：2012-12-13

申请人： BOE TECHNOLOGY GROUP CO LTD

发明人： CHOI SEUNGJIN ,  KIM HEECHEOL ,  SONG YOUNGSUK ,  YOO SEONGYEOL

IPC分类号： G02F1/1343 ,  G02F1/1362 ,  H01L27/12

CPC分类号： H01L29/7869 ,  G02F1/134363 ,  G02F2001/134372 ,  G02F2001/136231 ,  H01L21/02565 ,  H01L21/02664 ,  H01L27/1203 ,  H01L27/1225

摘要： A method for fabricating array substrate, an array substrate and a display device. The method for fabricating the array substrate comprises forming a thin film transistor, a first transparent electrode (14) and a second transparent electrode (19), wherein a multi dimensional electric field is created by the first transparent electrode (17) and the second transparent electrode (19), wherein forming the first transparent electrode (17) comprises: forming a metal oxide film presenting semiconductor properties; forming the first transparent electrode (17) by subjecting a portion of the metal oxide film to metallization treatment, and forming a semiconductor active layer (141) from a portion which is not subjected to the metallization treatment.

公开(公告)号：EP3089213A4

公开(公告)日：2017-02-08

申请号：EP14856805

申请日：2014-05-29

申请人： BOE TECHNOLOGY GROUP CO LTD

发明人： KIM HEECHEOL ,  SONG YOUNGSUK ,  YOO SEONGYEOL ,  CHOI SEUNGJIN

IPC分类号： H01L29/423 ,  H01L27/12 ,  H01L29/417 ,  H01L29/66 ,  H01L29/786

CPC分类号： H01L27/1248 ,  H01L21/441 ,  H01L21/56 ,  H01L21/76831 ,  H01L23/3171 ,  H01L23/5226 ,  H01L23/528 ,  H01L24/03 ,  H01L24/05 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/1259 ,  H01L27/1262 ,  H01L29/24 ,  H01L29/41733 ,  H01L29/42384 ,  H01L29/66969 ,  H01L29/78603 ,  H01L29/78636 ,  H01L29/7869 ,  H01L29/78696 ,  H01L2224/08052 ,  H01L2924/13069

摘要： An array substrate, a method for fabricating the same and a display device are disclosed. The array substrate includes: a gate electrode of a TFT and a gate insulation layer sequentially formed on a base substrate; a semiconductor active layer, an etch stop layer and a source electrode and a drain electrode of the TFT sequentially formed on a part of the gate insulation layer that corresponds to the gate electrode of the TFT, the source and drain electrodes of the TFT are respectively in contact with the semiconductor active layer by way of via holes. The array substrate further includes: a first insulation layer formed between the gate electrode of the TFT and the gate insulation layer, the first insulation layer corresponds to at least one of the source electrode or the drain electrode of the TFT; and the gate electrode is in contact with the gate insulation layer at a channel region of the TFT between the source electrode and the drain electrode of the TFT. The array substrate reduces the parasitic capacitances between the source/drain electrodes and the gate electrode of the TFT, improving the quality of the display device.

公开(公告)号：EP2975642A4

公开(公告)日：2016-11-30

申请号：EP13857663

申请日：2013-10-12

申请人： BOE TECHNOLOGY GROUP CO LTD

发明人： CHOI SEUNGJIN ,  YOO SEONGYEOL ,  SONG YOUNGSUK

IPC分类号： H01L27/12 ,  G02F1/1333 ,  G02F1/1343 ,  G02F1/1368 ,  G03F7/00 ,  H01L29/786

CPC分类号： G02F1/134363 ,  G02F1/133345 ,  G02F1/13439 ,  G02F1/1368 ,  G02F2001/133357 ,  G03F7/00 ,  H01L21/77 ,  H01L27/12 ,  H01L27/1218 ,  H01L27/124 ,  H01L27/1248 ,  H01L27/1262 ,  H01L27/1288 ,  H01L29/42384 ,  H01L29/4908 ,  H01L29/78606 ,  H01L29/78636 ,  H01L29/7869

摘要： An array substrate and a manufacturing method thereof and a display device are provided, and the array substrate comprises: a substrate (1); a thin film transistor, a passivation layer (5) and a transparent electrode (6), sequentially formed on the substrate, wherein a groove (51) is formed in an upper surface of the passivation layer (5), and the transparent electrode (6) is provided in the groove (51).