METHOD OF PREPARING A PATTERNED FILM WITH A DEVELOPING SOLVENT
    2.
    发明公开
    METHOD OF PREPARING A PATTERNED FILM WITH A DEVELOPING SOLVENT 有权
    用于生产结构化的薄膜,具有展开溶剂

    公开(公告)号:EP2052292A2

    公开(公告)日:2009-04-29

    申请号:EP07836621.8

    申请日:2007-08-08

    IPC分类号: G03F7/075 G03F7/32

    摘要: A method of preparing a patterned film on a substrate includes applying a silicone composition onto a substrate to form a film of the silicone composition. A portion of the film is exposed to radiation to produce a partially exposed film having an exposed region and a non-exposed region. The partially exposed film is heated for a sufficient amount of time and at a sufficient temperature to substantially insolubilize the exposed region in a developing solvent that includes a siloxane component. The non-exposed region of the partially exposed film is removed with the developing solvent to reveal a film-free region on the substrate and to form the patterned film including the exposed region that remains on the substrate. The film-free regions is substantially free of residual silicone due to the presence of the siloxane component in the developing solvent.