-
1.发明公开ELECTROMAGNETIC RADIATION MICRO DEVICE, WAFER ELEMENT AND METHOD FOR MANUFACTURING SUCH A MICRO DEVICE 审中-公开电磁辐射元件晶片和方法的微型器件生产这种微型器件
公开(公告)号：EP2828629A1
公开(公告)日：2015-01-28
申请号：EP12715335.1
申请日：2012-03-23
发明人： REINERT, Wolfgang
CPC分类号： H01L31/02165 , G01J5/0215 , G01J5/0235 , G01J5/024 , G01J5/045 , G01J5/046 , G01J5/0803 , G01J5/0806 , G01J5/0862 , G01J5/0875 , G01J5/20 , G02B1/115 , H01L31/18 , H01L2924/16235
摘要： The invention refers to an electromagnetic radiation sensor micro device for detecting electromagnetic radiation, which device comprises a substrate and a cover at least in part consisting of an electromagnetic radiation transparent material, and comprising a reflection reducing coating and providing a hermetic sealed cavity and an electromagnetic radiation detecting unit arranged within the cavity. The reflection reducing coating is arranged in form of a multi-layer thin film stack, which comprises a first layer and a second layer arranged one upon the other. The first layer has a first refractive index and the second layer has a second refractive index different from the one of said first layer. First and second layer are of such layer thickness that for a certain wavelength there is destructive interference. The invention also refers to a wafer element as well as method for manufacturing such a device.
摘要翻译： 本发明涉及用于将电磁辐射传感器微型器件用于检测电磁辐射，该装置包括一个基底和一个盖至少部分地由...组成的电磁辐射透明的材料制成，并包括一个减反射涂层，并提供一气密密封腔和电磁 检测所述空腔内布置辐射单元。 减反射涂层是在多层薄膜叠层，其包括第一层和设置在另一个上的第二层的形式布置。 所述第一层具有第一折射率且所述第二层具有从所述第一层中的所述一个不同的第二折射率。 第一和第二层是寻求层厚度没有为特定波长有破坏性的干扰。 因此，本发明涉及晶片元件以及制造方法的装置搜索。
-
2.发明授权
公开(公告)号：EP1836123B1
公开(公告)日：2008-06-25
申请号：EP06700450.7
申请日：2006-01-04
IPC分类号： B81B7/00
CPC分类号： B81B7/0077 , B81C2203/019
摘要： The invention relates to a method for generation of a given internal pressure in a cavity of a semiconductor component, comprising preparation (S1) of the semiconductor component, whereby the semiconductor component has a semiconductor oxide region, arranged to pass between the cavity of the semiconductor component and an outer surface of the semiconductor component, exposure (S3) of the semiconductor component to a surrounding atmosphere comprising a noble gas at a first temperature for a given duration and setting (S5) a second temperature, different to the first, after expiry of the given duration, whereby the semiconductor oxide region has a higher permeability to the noble gas at the first temperature than at the second temperature.
-
3.发明公开
公开(公告)号：EP4359845A2
公开(公告)日：2024-05-01
申请号：EP22734955.2
申请日：2022-06-22
CPC分类号： G02B27/18 , G02B26/101 , G02B27/14 , B81C1/00317 , H01S5/02255 , H01S5/02253 , H01S5/02208 , H01S5/02345 , H01S5/4093 , H01S5/4012 , B81C2203/03120130101 , B81B2201/04220130101
-
公开(公告)号：EP4214539A1
公开(公告)日：2023-07-26
申请号：EP21782468.9
申请日：2021-09-20
发明人： REINERT, Wolfgang
IPC分类号： G01S7/481
-
5.发明授权VERFAHREN ZUM HERSTELLEN ELEKTRISCH LEITENDER DURCHFÜHRUNGEN DURCH NICHT- ODER HALBLEITENDE SUBSTRATE 有权方法制备导电套 - THROUGH NOR组织基板的半
公开(公告)号：EP1946367B1
公开(公告)日：2016-10-26
申请号：EP06807782.5
申请日：2006-11-08
发明人： REINERT, Wolfgang
IPC分类号： H01L21/768
CPC分类号： H01L23/3114 , H01L21/486 , H01L21/76898 , H01L23/147 , H01L24/10 , H01L24/13 , H01L2224/05001 , H01L2224/05022 , H01L2224/05024 , H01L2224/05548 , H01L2224/05647 , H01L2224/05655 , H01L2224/05666 , H01L2224/13 , H01L2224/131 , H01L2924/00013 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01016 , H01L2924/01018 , H01L2924/01022 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01068 , H01L2924/01072 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/09701 , H01L2924/10329 , H01L2924/14 , H01L2924/1433 , H01L2924/1461 , Y10T29/49165 , H01L2224/13099 , H01L2924/00 , H01L2224/05099
-
6.发明公开MIKROMECHANISCHE GEHÄUSUNG MIT MINDESTENS ZWEI KAVITÄTEN MIT UNTERSCHIEDLICHEM INNENDRUCK UND/ODER UNTERSCHIEDLICHER GASZUSAMMENSETZUNG SOWIE VERFAHREN ZU DEREN HERSTELLUNG 有权MICRO机械GEHÄUSUNG有至少两个不同与内部压力和/或不同的气体成分及其制造方法孔洞
公开(公告)号：EP2004542A1
公开(公告)日：2008-12-24
申请号：EP07727811.7
申请日：2007-04-04
IPC分类号： B81B7/00
CPC分类号： B81B7/0038 , B81B7/02 , B81C1/00285
摘要： The invention relates to a multiple component which is to be subsequently individualised by forming components containing active structures, in addition to a corresponding component which can be used in microsystem technology systems. Said multiple component and/or component comprises a flat substrate and also a flat cap structure which are bound to each other such that they surround at least one first and one second cavity per component, which are sealed against each other and towards the outside. Said component is characterised in that the first of the two cavities is provided with getter material and due to said getter material has a different internal pressure and/or a different gas composition than the second cavity. The invention also relates to a method for producing said type of component and/or components for which gas mixtures of various types of gas have a different absorption ratio in relation to the getter material.
-
7.发明授权
公开(公告)号：EP3078089B1
公开(公告)日：2019-07-03
申请号：EP14805628.6
申请日：2014-12-02
-
公开(公告)号：EP1945563B1
公开(公告)日：2018-10-31
申请号：EP06819339.0
申请日：2006-11-08
发明人： OLDSEN, Marten , REINERT, Wolfgang , MERZ, Peter
IPC分类号： B81C1/00
CPC分类号： B81C1/00269 , Y10T428/23
-
公开(公告)号：EP2443655B1
公开(公告)日：2018-08-29
申请号：EP10725764.4
申请日：2010-06-21
IPC分类号： H01L27/146
CPC分类号： H01L27/14618 , G01J5/045 , G01J5/0875 , H01L27/14649 , H01L27/14683 , H01L2224/16 , H01L2924/01019 , H01L2924/01057 , H01L2924/01077 , H01L2924/01078 , H01L2924/01079 , H01L2924/01322 , H01L2924/01327 , H01L2924/10157 , H01L2924/10158 , H01L2924/1461 , H01L2924/00
摘要： Infrared radiation micro device, cover for such a device and method for its fabrication, the device comprising a substrate and a cover and an infrared radiation detecting, emitting or reflecting infrared micro unit, the infrared micro unit being arranged in a cavity defined between the substrate and the cover, the cover comprising an antireflective surface texture to enhance the transmissibility of infrared radiation, wherein a distance frame formed in an additive process on the substrate side of the cover and/or the cover side of the substrate is arranged between substrate and cover.
-
10.发明授权MIKROMECHANISCHE GEHÄUSUNG MIT MINDESTENS ZWEI KAVITÄTEN MIT UNTERSCHIEDLICHEM INNENDRUCK UND/ODER UNTERSCHIEDLICHER GASZUSAMMENSETZUNG SOWIE VERFAHREN ZU DEREN HERSTELLUNG 有权MICRO机械GEHÄUSUNG有至少两个不同与内部压力和/或不同的气体成分及其制造方法孔洞
公开(公告)号：EP2004542B1
公开(公告)日：2014-06-11
申请号：EP07727811.7
申请日：2007-04-04
CPC分类号： B81B7/0038 , B81B7/02 , B81C1/00285
-
-
-
-
-
-
-
-
-
搜索结果
20 条记录 (耗时 0.024 秒)
