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公开(公告)号：EP1415321A1
公开(公告)日：2004-05-06
申请号：EP02767344.1
申请日：2002-08-07
发明人： BEHLE, Stephan , BEWIG, Lars , KÜPPER, Thomas , MARING, Wolfram , MÖLLE, Christoph , WALTHER, Marten
IPC分类号： H01J37/32
CPC分类号： H01J37/32229 , C23C16/511 , H01J37/32192
摘要： The invention relates to a device for the coating of objects. Said invention is characterised by the following features: a single microwave source, two or more coating chambers, all coating chambers are connected to the single microwave source and an impedance structure or a hollow guide structure is provided for distribution of the microwave energy for generation of the plasma in the individual chambers.
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2.发明公开EINRICHTUNG ZUR ÜBERTRAGUNG OPTISCHER SIGNALE MIT VERBESSERTEN ÜBERTRAGUNGSEIGENSCHAFTEN 有权装置上使用改进的传输结构的光学传输信号
公开(公告)号：EP1334389A1
公开(公告)日：2003-08-13
申请号：EP01992906.6
申请日：2001-11-01
发明人： PAWLOWSKI, Edgar , GERSTNER, Klaus , SCHLATTERBECK, Dirk , PEUCHERT, Ulrich , SPRENGARD, Rüdiger , KÄLBER, Tobias , BRINKMANN, Matthias , WALTHER, Marten
IPC分类号： G02B6/293
CPC分类号： G02B6/12011 , G02B6/12019 , G02B6/12033
摘要： According to the invention, the signal quality on passing through a device for the transmission of optical signals, comprising a waveguide with a doped region, containing a material suitable for the amplification of optical signals may be impaired as little as possible, whereby the doped region has a pre-defined absorption and may have the amplification thereof altered by the injection of pumping light.
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公开(公告)号：EP1417042A2
公开(公告)日：2004-05-12
申请号：EP02748647.1
申请日：2002-03-28
发明人： KUHR, Markus , WOLFF, Detlef , WALTHER, Marten , BEHLE, Stephan , BAUER, Stefan , KLIPPE, Lutz , MOELLE, Christoph , BEWIG, Lars , KOPPE, Frank , KÜPPER, Thomas , MARING, Wolfram , HEINZ, Jochen;
IPC分类号： B05D7/24
CPC分类号： G02B1/111 , B05D1/62 , B05D7/02 , B05D7/52 , C23C16/029 , C23C16/515 , G02B1/10
摘要： The invention relates to the coating of a synthetic substrate for producing a coated body, a device for carrying out such a method and the use thereof.
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4.发明授权PLASMA-CVD-ANLAGE MIT EINEM ARRAY VON MIKROWELLEN-PLASMAELEKTRODEN UND PLASMA-CVD-VERFAHREN 失效微波等离子电极和等离子体CVD法的数组等离子体CVD系统
公开(公告)号：EP0922122B1
公开(公告)日：2003-03-12
申请号：EP97940121.3
申请日：1997-08-23
发明人： WALTHER, Marten , MÖHL, Wolfgang , DANIELZIK, Burkhard , KUHR, Markus , HOCHHAUS, Roland , BAUCH, Hartmut , HEMING, Martin , KÜPPER, Thomas , BEWIG, Lars
IPC分类号： C23C16/52
CPC分类号： H01J37/32192 , C23C16/402 , C23C16/511 , C23C16/545
摘要： The invention concerns a plasma CVD system (in particular a plasma pulse CVD system) with an array of microwave plasma electrodes (2a, b, c, d). According to the invention, in order to improve the homogeneity of the layer, interference is prevented by controlling adjacent plasma electrodes (2a, 2b; 2b, 2c; 2c, 2d) in a chronologically offset manner. To that end, micropulses (A, B) are provided within the macropulses of the plasma pulse CVD process. Additionally, the uniformity of the layer deposition at the interfaces between adjacent modules can be optimized by radio-frequency excitation by means of suitable electrodes (6, 62a-c), magnetic fields or the configuration of the gas inlets (5). The surface coated in an operating cycle can thus be scaled as required.
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5.发明公开VERFAHREN UND VORRICHTUNG ZUM GLEICHZEITIGEN BESCHICHTEN UND FORMEN EINES KÖRPERS 有权FOR同时涂布和方法以及装置形成一体
公开(公告)号：EP1412101A2
公开(公告)日：2004-04-28
申请号：EP02758443.2
申请日：2002-08-07
CPC分类号： B05D1/62 , B05D7/227 , B29C45/0053 , B29C45/1703 , B29C2045/0079
摘要： The invention relates to a method and device for the simultaneous coating and moulding of a body (11) comprising the following steps: two mould halves (1.1, 1.2) of a moulding tool (1) for moulding a moulded body are brought together and mounted on the unit, an injection material is introduced into the mould halves (1.1, 1.2), so as to produce a moulded body (11), the moulded body (11) is evacuated, a gas is introduced into the moulded body (11), the plasma in the moulded body (11) is ignited, such that a coating is deposited on the inner side of the moulded body (11). After the completion of the coating the mould halves (1.1, 1.2) are separated, whereupon the moulded body drops out.
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6.发明公开PLASMA-CVD-ANLAGE MIT EINEM ARRAY VON MIKROWELLEN-PLASMAELEKTRODEN UND PLASMA-CVD-VERFAHREN 失效微波等离子电极和等离子体CVD法的数组等离子体CVD系统
公开(公告)号：EP0922122A1
公开(公告)日：1999-06-16
申请号：EP97940121.0
申请日：1997-08-23
发明人： WALTHER, Marten , MÖHL, Wolfgang , DANIELZIK, Burkhard , KUHR, Markus , HOCHHAUS, Roland , BAUCH, Hartmut , HEMING, Martin , KÜPPER, Thomas , BEWIG, Lars
CPC分类号： H01J37/32192 , C23C16/402 , C23C16/511 , C23C16/545
摘要： The invention concerns a plasma CVD system (in particular a plasma pulse CVD system) with an array of microwave plasma electrodes (2a, b, c, d). According to the invention, in order to improve the homogeneity of the layer, interference is prevented by controlling adjacent plasma electrodes (2a, 2b; 2b, 2c; 2c, 2d) in a chronologically offset manner. To that end, micropulses (A, B) are provided within the macropulses of the plasma pulse CVD process. Additionally, the uniformity of the layer deposition at the interfaces between adjacent modules can be optimized by radio-frequency excitation by means of suitable electrodes (6, 62a-c), magnetic fields or the configuration of the gas inlets (5). The surface coated in an operating cycle can thus be scaled as required.
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7.发明公开
公开(公告)号：EP1415018A1
公开(公告)日：2004-05-06
申请号：EP02762433.7
申请日：2002-08-07
申请人： Schott Glas
IPC分类号： C23C16/515 , C23C16/30 , C23C16/40 , B65D65/42
CPC分类号： C23C16/401 , C23C16/045 , C23C16/30 , C23C16/405 , C23C16/515 , Y10T428/24967 , Y10T428/24975 , Y10T428/265 , Y10T428/31507 , Y10T428/31565 , Y10T428/31587 , Y10T428/31667
摘要： The invention relates to a composite material with a substrate material and at least one barrier coating on one side of the substrate material. The invention is characterised in that the barrier coating is applied to the substrate material by means of plasma impulse chemical vapour deposition (PICVD) and the barrier layer comprises at least one of the following materials: SiOx with x⊂[0.2], TiOx with x⊂[0.2], amorphous hydrocarbons, electrically conducting layers, SnOx with x⊂[0.2], SixNy with x⊂[0.3], y⊂[0.4], NbxOy with x⊂[0.2], y⊂[0.5], AlxOy with x⊂[0.2], y⊂[0.3].
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8.发明公开
公开(公告)号：EP1112586A2
公开(公告)日：2001-07-04
申请号：EP99939446.3
申请日：1999-08-03
CPC分类号： H01J9/14 , H01J2217/49207 , H05K3/184
摘要： Modern ultrawide flat screens known as PDPs and PALCs have a glass plate with a micro-channel structure and an address electrode in each channel. Until now, address electrodes have been mounted using printing techniques or by direct selective sputtering in accordance with channel structure or indirectly by means of selective etching of large-surface metal layers deposited with no external current and/or galvanically leaving the printed conductor structures in place. In order to avoid the disadvantages of said known methods, the invention provides that the metal printed conductors of the address electrodes be mounted selectively in the electrode areas solely using a deposition method with no external current and/or galvanically.
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9.发明授权
公开(公告)号：EP0753082B1
公开(公告)日：1999-07-07
申请号：EP95914322.3
申请日：1995-03-29
发明人： HEMING, Martin , LANGE, Ulrich , LANGFELD, Roland , MÖHL, Wolfgang , OTTO, Jürgen , PAQUET, Volker , SEGNER, Johannes , WALTHER, Marten
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/45561 , C23C16/511 , C23C16/515 , C23C16/52
摘要： A PCVD process is disclosed for producing coating layers of uniform thickness on domed substrates. The substrate surface to be coated is arranged in relation to the gas passage surface of a gas shower. In order to determine the appropriate processing parameters, in a first series of tests for one type of substrate to be coated the size of the gas passage surfaces and gas mass flows through the gas passage surfaces are kept constant while the intervals between plasma impulses are gradually modified, starting from an initial value tA until an optimum value teff is determined and until the uniformity of the thickness profile of the layers generated on the substrate may no longer be improved. If required, during a second series of tests the value teff may be kept constant while the thickness profile of the layers is further modified by further optimising the local parameters and/or the gas mass flows until its uniformity may no longer be improved. The device has a gas shower (10) subdivided into zones and whose gas passage surfaces (11) are arranged in relation to a substrate to be coated (1). The zones (13, 14 and 15) are connected by supply lines (21, 21a and 22) to a source of non film-forming gas (27) and to a gas source (28) that supplies fresh gas.
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