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    USE OF AT LEAST ONE BINARY GROUP 15 ELEMENT COMPOUND, A 13/15 SEMICONDUCTOR LAYER AND BINARY GROUP 15 ELEMENT COMPOUNDS.
    1.
    发明公开
    USE OF AT LEAST ONE BINARY GROUP 15 ELEMENT COMPOUND, A 13/15 SEMICONDUCTOR LAYER AND BINARY GROUP 15 ELEMENT COMPOUNDS. 审中-公开
    使用至少一个二元组15元素化合物，13/15个半导体层和二元组15元素化合物。

    公开(公告)号：EP3198053A1

    公开(公告)日：2017-08-02

    申请号：EP15781035.9

    申请日：2015-09-25

    申请人： Philipps Universität Marburg

    发明人： VON HAENISCH, Carsten ,  VOLZ, Kerstin ,  STOLZ, Wolfgang ,  STERZER, Eduard ,  BEYER, Andreas ,  KEIPER, Dominik ,  RINGLER, Benjamin

    IPC分类号： C23C16/30 ,  C07F9/46 ,  C07F9/50 ,  C07F9/72 ,  C07F9/90

    CPC分类号： H01L21/02538 ,  C07F9/46 ,  C07F9/504 ,  C07F9/72 ,  C07F9/904 ,  C23C16/22 ,  C23C16/301 ,  H01L21/0254 ,  H01L21/02543 ,  H01L21/02546 ,  H01L21/02549 ,  H01L21/0262

    摘要： The invention provides the use of at least one binary group 15 element compound of the general formula R1R2E-E′R3R4 (I) or R5E(E′R6R7)2 (II) as the educt in a vapor deposition process. In this case, R1, R2, R3 and R4 are independently selected from the group consisting of H, an alkyl radical (C1-C10) and an aryl group, and E and E′ are independently selected from the group consisting of N, P, As, Sb and Bi. This use excludes hydrazine and its derivatives. The binary group 15 element compounds according to the invention allow the realization of a reproducible production and/or deposition of multinary, homogeneous and ultrapure 13/15 semiconductors of a defined combination at relatively low process temperatures. This makes it possible to completely waive the use of an organically substituted nitrogen compound such as 1.1 dimethyl hydrazine as the nitrogen source, which drastically reduces nitrogen contaminations—compared to the 13/15 semiconductors and/or 13/15 semiconductor layers produced with the known production methods.

    摘要翻译： 本发明提供了至少一种通式R 1 R 2 E-E'R 3 R 4（I）或R 5 E（E'R 6 R 7）2（II）的二元15族元素化合物作为气相沉积工艺中的离析物的用途。 在这种情况下，R1，R2，R3和R4独立地选自由H，烷基（C1-C10）和芳基组成的组，并且E和E'独立地选自N，P ，As，Sb和Bi。 该用途不包括肼及其衍生物。 根据本发明的二元族15元素化合物允许在相对较低的处理温度下实现限定组合的多元，均质和超纯13/15半导体的可再现生产和/或沉积。 这使得可以完全放弃使用有机取代的氮化合物如1,1-二甲基肼作为氮源，与用已知的方法生产的13/15半导体和/或13/15半导体层相比，其显着降低氮污染 生产方法。

    Process for the preparation of nickel ylides containing ylide ligands with a sulfonated group V component
    9.
    发明公开
    Process for the preparation of nickel ylides containing ylide ligands with a sulfonated group V component 失效
    含硫化合物V组分的含有YLID配体的镍基丝的制备方法

    公开(公告)号：EP0046332A3

    公开(公告)日：1982-05-19

    申请号：EP81302659

    申请日：1981-06-15

    申请人： GULF RESEARCH & DEVELOPMENT COMPANY

    发明人： Beach, David L. ,  Harrison, James J.

    IPC分类号： C07F15/04 ,  B01J31/28 ,  C07C02/08

    CPC分类号： B01J31/226 ,  B01J31/1895 ,  B01J31/2247 ,  B01J31/2404 ,  B01J2231/20 ,  B01J2531/847 ,  B01J2540/32 ,  C07C2/36 ,  C07F9/5352 ,  C07F9/723 ,  C07F9/743 ,  C07F9/904 ,  C07F9/92 ,  C07F15/04 ,  C08F110/02 ,  C08F4/80

    摘要： A process is provided for preparing nickel ylides which are themselves novel compounds defined by the following Formula I:
    wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are either alike or different members selected from the group consisting of hydrogen, alkyl radicals having from about one to about 24 carbon atoms, preferably from about one to about 10 carbon atoms; aryl radicals having from about six to about 20 carbon atoms, preferably from about six to about 10 carbon atoms; alkenyl radicals having from about two to about 30 carbon atoms, preferably from about two to about 20 carbon atoms; cycloalkyl radicals having from about three to about 40 carbon atoms, preferably from about three to about 30 carbon atoms; aralkyl and alkaryl radicals having from about six to about 40 carbon atoms, preferably from about six to about 30 carbon atoms; a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, preferably chlorine; a hydroxyl group; an alkoxy or aryloxy group; a hydrocarbyl group, such as defined above, carrying halogen, hydroxyl or alkoxy or aryloxy; and a sulfonato group (-SO 3 -) or an alkyl, aryl, alkenyl, cycloalkyl, aralkyl or alkaryl group carrying a sulfonato group; provided that at least one of R,, R 2 and R 3 is a sulfonato group or an alkyl, aryl, alkenyl, cycloalkyl, aralkyl or alkaryl, as defined above, carrying a sulfonato group; M is sulfur or oxygen, preferably oxygen; E is phosphorus, arsenic, antimony or nitrogen, preferably phosphorus; and F is phosphorus, arsenic or antimony, preferably phosphorus. The process comprises reacting a ligand defined by the following formula:
    with an alpha-substituted ketone or aldehyde or an alpha-substituted thioketone or thioaldehyde defined by the following formula:
    to obtain the metal salt defined by the following Formula II:
    wherein R 1 , R 2 , R 3 , R 7 , R 8 , F and M are as defined above and X is a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, preferably chlorine and bromine, a tosyl group (a tolune sulfonate group), or an acetate group. This metal salt is reacted with a base to obtain the novel ylide defined by the following Formula III:
    wherein R 1 , R 2 , R 3 , R 7 , R 8 , F and M are as defined above. This ylide is then reacted with (1) a zero valent nickel compound and (2) a ligand having the formula:
    wherein R 4 , R 5 , R 6 and E are as defined above.

    Nickel ylides
    10.
    发明公开
    Nickel ylides 失效
    镍叶立德

    公开(公告)号：EP0046331A2

    公开(公告)日：1982-02-24

    申请号：EP81302658.0

    申请日：1981-06-15

    申请人： GULF RESEARCH & DEVELOPMENT COMPANY

    发明人： Beach, David L. ,  Harrison, James J.

    IPC分类号： C07F15/04 ,  B01J31/28 ,  C07C2/08

    CPC分类号： C07F9/5407 ,  B01J31/1895 ,  B01J31/2247 ,  B01J2231/20 ,  B01J2531/847 ,  B01J2540/32 ,  C07C2/36 ,  C07F9/5352 ,  C07F9/5442 ,  C07F9/723 ,  C07F9/743 ,  C07F9/904 ,  C07F9/92 ,  C07F15/04 ,  C07F15/045 ,  C08F110/02 ,  C08F4/80

    摘要： A new group of nickel ylides is provided that is highly active at relatively low operating temperatures and pressures in the oligomerization of ethylene. The compounds can be defined by the following Formula I:
    wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are either alike or different members selected from the group consisting of hydrogen, alkyl radicals having from about one to about 24 carbon atoms, preferably from about one to about 10 carbon atoms; aryl radicals having from about six to about 20 carbon atoms, preferably from about six to about 10 carbon atoms; alkenyl radicals having from about two to about 30 carbons atoms, preferably from about two to about 20 carbon atoms; cycloalkyl radicals having from about three to about 40 carbon atoms, preferably from about three to about 30 carbon atoms; aralkyl and alkaryl radicals having from about six to about 40 carbon atoms, preferably from about six to about 30 carbon atoms; a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, preferably chlorine; a hydroxyl group; an alkoxy or aryloxy group; and a hydrocarbyl group, such as defined above, carrying halogen, hydroxyl or alkoxy or aryloxy; provided that at least one, preferably from about one to about four, of each of R 1 to R 8 is a sulfonato group (-SO 3 -) or an alkyl, aryl, alkenyl, cycloalkyl, aralkyl or alkaryl group carrying a sulfonato group; M is sulfur or oxygen, preferably oxygen; E is phosphorus, arsenic, antimony or nitrogen, preferably phosphorus; and F is phosphorus, arsenic or antimony, preferably phosphorus.

    摘要翻译： 提供了一组新的内鎓盐，在乙烯齐聚反应中在相对较低的操作温度和压力下具有高活性。 所述化合物可以由下式I定义：其中R 1，R 2，R 3，R 4，R 5，R 6，R 7和R 8是相同或不同的成员，选自氢，具有约1至约24 碳原子，优选约1至约10个碳原子; 具有约6至约20个碳原子，优选约6至约10个碳原子的芳基; 具有约2至约30个碳原子，优选约2至约20个碳原子的烯基; 具有约3至约40个碳原子，优选约3至约30个碳原子的环烷基; 具有约6-约40个碳原子，优选约6-约30个碳原子的芳烷基和烷芳基; 选自氟，氯，溴和碘的卤素基团，优选氯; 羟基; 烷氧基或芳氧基; 和如上定义的带有卤素，羟基或烷氧基或芳氧基的烃基; 条件是R 1至R 8中至少一个，优选约1至约4个是磺酸根基团（-SO 3 - ）或带有磺酸根基团的烷基，芳基，链烯基，环烷基，芳烷基或烷芳基; M是硫或氧，优选氧; E是磷，砷，锑或氮，优选磷; F是磷，砷或锑，优选磷。