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    CONCENTRIC SHOWERHEAD FOR VAPOR DEPOSITION
    3.
    发明公开
    CONCENTRIC SHOWERHEAD FOR VAPOR DEPOSITION 审中-公开
    汽分离同心花洒

    公开(公告)号：EP2359392A2

    公开(公告)日：2011-08-24

    申请号：EP09819996.1

    申请日：2009-10-09

    申请人： Alta Devices, Inc.

    发明人： HEGEDUS, Andreas

    IPC分类号： H01L21/205

    CPC分类号： C23C16/301 ,  C23C16/45519 ,  C23C16/45576 ,  C23C16/4583 ,  C23C16/481 ,  C23C16/54 ,  Y10T137/87571

    摘要： Embodiments of the invention generally relate to a concentric gas manifold assembly used in deposition reactor or system during a vapor deposition process. In one embodiment, the manifold assembly has an upper section coupled to a middle section coupled to a lower section. The middle section contains an inlet, a manifold extending from the inlet to a passageway, and a tube extending along a central axis and containing a channel along the central axis and in fluid communication with the passageway. The lower section of the manifold assembly contains a second manifold extending from a second inlet to a second passageway and an opening concentric with the central axis. The tube extends to the opening to form a second channel between the tube and an edge of the opening. The second channel is concentric with the central axis and is in fluid communication with the second passageway.

    Preparation of monoalkyl group 15 metal dihalides and dihydrides
    5.
    发明公开
    Preparation of monoalkyl group 15 metal dihalides and dihydrides 审中-公开
    Herstellung von monoalkylierten Dihalogeniden und Dihydriden von Metallen der Gruppe 15

    公开(公告)号：EP1335416A1

    公开(公告)日：2003-08-13

    申请号：EP03250286.6

    申请日：2003-01-16

    申请人： Shipley Co. L.L.C.

    发明人： Dicarlo Jr., Ronald L. ,  Shenai-Khatkhate, Deodatta Vinayak ,  Power, Michael Brendan ,  Amamchyan, Artashes

    IPC分类号： H01L21/02 ,  C23C16/30 ,  C07F9/50 ,  C07F9/52 ,  C07F9/72 ,  C07F9/90 ,  C07F9/94

    CPC分类号： C07F9/723 ,  C07F9/5068 ,  C07F9/52 ,  C07F9/72 ,  C23C16/301

    摘要： Disclosed are methods of preparing monoalkyl Group VA metal dihalide compounds in high yield and high purity by the reaction of a Group VA metal trihalide with an organo lithium reagent or a compound of the formula R n M 1 X 3-n where R is an alkyl, M 1 is a Group IIIA metal, X is a halogen and n is an integer fro 1 to 3. Such monoalkyl Group VA metal dihalide compounds are substantially free of oxygenated impurities, ethereal solvents and metallic impurities. Monoalkyl Group VA metal dihydride compounds can be easily produced in high yield and high purity by reducing such monoalkyl Group VA metal dihalide compounds.

    摘要翻译： 公开了通过VA族金属三卤化物与有机锂试剂或式R 1 M 3-n-n的化合物的反应制备高产率和高纯度的单烷基基团VA金属二卤化物的方法，其中R是烷基， M 1是IIIA族金属，X是卤素，n是1至3的整数。这种单烷基基团VA金属二卤化物基本上不含氧化杂质，醚类溶剂和金属杂质。 通过还原这种单烷基基团VA金属二卤化物化合物，可以容易地以高产率和高纯度制备单烷基VA族金属二氢化合物。

    Infrared transmissive protective window
    6.
    发明公开
    Infrared transmissive protective window 失效
    InfrarotdurchlässigesSchutzfenster。

    公开(公告)号：EP0463812A2

    公开(公告)日：1992-01-02

    申请号：EP91305610.7

    申请日：1991-06-20

    申请人： TEXAS INSTRUMENTS INCORPORATED

    发明人： Klocek, Paul ,  Taborek, Peter

    IPC分类号： G01J5/02 ,  G02B1/10

    CPC分类号： G01J5/08 ,  C23C16/301 ,  G01J5/04 ,  G01J5/046 ,  G01J5/048 ,  G01J5/0875 ,  G02B1/10 ,  G02B1/105 ,  G02B1/115 ,  G02B1/14

    摘要： An electro-optic system 10 is described which comprises an infrared sensor 12 and a processing unit 14 protected by a protective infrared transmissive window 16. The window 16 comprises a substrate layer 18 which may comprise gallium arsenide, zinc selenide, zinc sulfide or germanium. A protective layer 22 of gallium phosphide is formed outwardly from the substrate layer 18. An anti-reflective coating 20 is formed inwardly from substrate layer 18 and an outward anti-reflective coating 26 is formed outwardly from protective layer 22. The incorporation of protective layer 22 allows for excellent impact and wear resistance without interfering with the optical characteristics of the protective window 16.

    摘要翻译： 描述了一种电光系统10，其包括由保护性红外透射窗16保护的红外传感器12和处理单元14.窗口16包括可包含砷化镓，硒化锌，硫化锌或锗的基底层18。 从衬底层18向外形成磷化硅保护层22.抗反射涂层20从衬底层18向内形成，并且向外的抗反射涂层26从保护层22向外形成。保护层的结合 22允许优异的冲击和耐磨性而不会干扰保护窗16的光学特性