摘要:
Provided are a soldering device and method which allow for oldering at low cost with high yield and high reliability. To solve the above problems, the soldering device has: a first processing section that immerses workpiece member 10 having copper electrode 2 in organic fatty acid-containing solution, and horizontally move immersed workpiece member 10 in organic fatty acid-containing solution 31; a second processing section having ejection unit 33 to spray a jet stream of molten solder 5a to workpiece member 10 while pulling out workpiece member 10 processed in the first processing section to space section 24 that has a pressurized steam atmosphere and is provided above organic fatty acid-containing solution 31; a third processing section having ejection unit 34 to spray organic fatty acid-containing solution 31 to excess molten solder 5a on workpiece member 10 for removal while pulling down workpiece member 10 processed in the second processing section after horizontally moving in space section 24; and a fourth processing section that picks up workpiece member 10 processed in the third processing section by pulling out from organic fatty acid-containing solution 31 after horizontally moving in organic fatty acid-containing solution 31.
摘要:
The present invention relates to a method for generating a power semiconductor module (14) using a heat applying joining technique for joining two joining partners (10, 16), the heat applying joining technique comprising the steps of: a) Providing a first joining partner (16) with a joining surface; b) Coating the joining surface of the first joining partner (16) at least partly with a protection coating (22), the protection coating (22) having a decomposition temperature t 1 at which the material of the protection coating (22) goes into the gaseous phase; c) Optionally applying a joining material (23) to at least a part of the protection coating (22) or to a joining surface of the second joining partner (16); and d) Joining the joining surfaces of the two joining partners (10, 16) by applying heat with a temperature t 2 , wherein t 2 ≥ t 1 and by optionally applying pressure to the joining partners (10, 16). One of the first and second joining partners (10, 16) is a substrate (10) and the further of the first and second joining partners (10, 16) is a power semiconductor device (16), a baseplate or a terminal. The heat applying joining technique may be a sintering process, a soldering process or an ultrasonic welding process. Such a method provides an especially gentle and cost-saving method for heat applying joining techniques, such as die-attachment.
摘要:
Erstellen eines Wafers (2), Aufbringen von Strukturen von Bauelementen (1) auf den Wafer (2), um einen Waferverbund auszubilden, Aufbringen einer Metallschicht (5) auf den Wafer (2), Entfernen der Metallschicht (5) in Nichtkontaktbereichen der Bauelemente (1), Aufbringen von Passivierungsrändem auf die Randbereiche der Bauelemente (1), Aufbringen des Wafers (2) auf eine von einem Spannring gehaltenen Folie (4), Vereinzeln der von der Folie (4) getragenen Bauelemente (1) voneinander aus dem Waferverbund heraus, Auflegen einer abdeckenden Maske (3) auf nicht zu beschichtende Bereiche der von der Folie (4) getragenen vereinzelten Bauelemente (1), Aufbringen einer Metallschicht (5) auf die mit der Maske (3) maskierten vereinzelten Bauelemente (1), Entfernen der Maske (3) und Abnehmen der Bauelemente (1) von der Folie (4) und Weiterbehandeln der vereinzelten Bauelemente (2), bei dem das Aufbringen einer Metallschicht (5) auf die mit der Maske (3) maskierten vereinzelten Bauelemente (1) mittels thermischem Spritzen erfolgt.