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公开(公告)号：EP3012276B1
公开(公告)日：2023-06-14
申请号：EP14814175.7
申请日：2014-06-16
IPC分类号： C08G14/12 , B32B15/08 , C08G59/40 , C08G73/06 , C08J5/24 , C09J161/18 , H05K1/03 , B32B7/12 , B32B15/14 , C08G10/04 , C09D161/18 , C09D161/34 , C09D179/04 , C09J161/34 , C09J179/04 , C08L61/34 , C08L79/04
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2.发明公开ACIDIFIED MONO ALKYL NAPHTHALENE FORMALDEHYDE RESIN 审中-公开天然甘油 - 萘普生 - 福尔马德哈尔（ANGESÄUERTESMONOALKYL-NAPHTHALIN-FORMALDEHYDHARZ）
公开(公告)号：EP2821421A1
公开(公告)日：2015-01-07
申请号：EP13754064.7
申请日：2013-02-25
CPC分类号： C08G10/04 , C08G14/04 , C09D161/18 , C09D161/34 , G03F7/091 , G03F7/094 , G03F7/11 , G03F7/20
摘要： Provided are a novel resin and a precursor thereof that are excellent in thermal decomposability and solubility in a solvent. The resin is obtained by subjecting, to an acidic treatment, a monoalkylnaphthalene formaldehyde resin that is obtained by reacting a compound represented by the following formula (1), wherein R 1 represents an alkyl group having 1 to 4 carbon atoms, and formaldehyde in the presence of a catalyst.
摘要翻译： 提供了热分解性和在溶剂中的溶解性优异的新型树脂及其前体。 树脂是通过使酸酐处理得到的单烷基萘甲醛树脂，其通过使下式（1）表示的化合物（其中R 1表示具有1〜4个碳原子的烷基）和甲醛 存在催化剂。
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3.发明公开
公开(公告)号：EP2692784A1
公开(公告)日：2014-02-05
申请号：EP12765698.1
申请日：2012-03-15
发明人： ARII, Kenji , NOMIZU, Kentaro , SOGAME, Masanobu
CPC分类号： C03C25/34 , B32B15/08 , B32B15/14 , B32B2260/021 , B32B2260/046 , B32B2305/076 , B32B2457/08 , C03C25/36 , C03C25/47 , C03C25/48 , C08G10/04 , C08J5/24 , C08J2361/18 , C08J2361/34 , C08J2463/00 , C08K3/013 , C08L61/18 , C08L61/34 , C08L63/00 , H05K1/0366 , H05K1/0373 , H05K3/022 , H05K2201/0209 , Y10T442/2221 , Y10T442/3407 , C08K3/0033
摘要： There are provided a prepreg having low water absorption, and of which deterioration in insulation resistance over time is remarkably suppressed, and further having excellent heat resistance, a metal foil-clad laminate using the prepreg, and a printed wiring board using the metal foil-clad laminate. A prepreg of the present invention is obtained by impregnating or coating a base material (D) with a resin composition comprising: a naphthol-modified dimethylnaphthalene formaldehyde resin (A); an epoxy resin (B) having an epoxy equivalent of 200 to 400 g/eq.; and an inorganic filler (C).
摘要翻译： 本发明提供一种吸水率低，绝缘耐久性的经时劣化显着受到抑制，并且耐热性也优异的预浸料坯，使用该预浸料坯的覆金属箔层压板以及使用该金属箔接合板的印刷电路板， 覆层层压板。 本发明的预浸料坯是通过用包含萘酚改性的二甲基萘甲醛树脂（A）和树脂组合物的树脂组合物浸渍或涂覆基材（D）而获得的。 环氧当量为200〜400g / eq的环氧树脂（B）。 和无机填料（C）。
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4.发明公开
公开(公告)号：EP2210907A4
公开(公告)日：2012-03-07
申请号：EP08848623
申请日：2008-11-11
发明人： KITA SEIJI , OGIWARA MASASHI
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公开(公告)号：EP0474075B1
公开(公告)日：1996-06-05
申请号：EP91114228.9
申请日：1991-08-24
申请人： BAYER AG
发明人： Walz, Klaus, Dr. , Hendricks, Udo, Dr. , Ehlert, Hans-Albert, Dipl.-Ing. , Lesszinsky, Fritz, Ing.-grad.
CPC分类号： C09B67/0086 , B01F17/0028 , B01F17/0057 , C08G8/18 , C08G8/28 , C14C3/18
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公开(公告)号：EP0041128B1
公开(公告)日：1984-03-14
申请号：EP81103143.4
申请日：1981-04-27
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7.发明公开Method of producing a resin for producing heat stable products, the resin and the products 失效一种制备用于增强热稳定的产品，在树脂和产品的改性树脂的方法。
公开(公告)号：EP0017312A1
公开(公告)日：1980-10-15
申请号：EP80300325.0
申请日：1980-02-05
CPC分类号： B32B5/26 , B32B5/02 , B32B2260/021 , B32B2260/046 , C08G10/02 , C08G14/04 , C08J5/24 , C08J2361/34 , C08L61/34 , H01B3/06 , H01B3/084 , H01B3/36
摘要： Method of producing a phenolated resin which can be used to form heat stable (up to 250°) products.
An aromatic hydrocarbon (e.g. toluene) formaldehyde condensation resin is prepared. The low molecular weight contaminants are removed by a distillation process. The residue contains less than 1% low molecular weight material, and is phenolated to give the final resin. The resin may be cured to give a heat stable product.
The phenolated resin may be used to form glasscloth and asbestos laminates or as a lamp capping cement.摘要翻译： 生产从而可以被用于形成热稳定的（高达250°）产物的酚树脂的方法。 ... 的芳族烃（如甲苯）甲醛缩合树脂制备。 低分子量的污染物通过蒸馏方法除去。 将残余物包含低分子量材料的小于1％，并且酚化，得到最终的树脂。 所述树脂可以被固化以得到热稳定的产品。 ... 的酚树脂可以被用于形成玻璃布和石棉叠层或作为灯封盖水泥。
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8.发明公开NAPHTHALENE-FORMALDEHYDE RESIN, NAPHTHALENE-FORMALDEHYDE RESIN WITH BONDS FORMED BY DEACETALIZATION, AND MODIFIED NAPHTHALENE-FORMALDEHYDE RESIN 有权NAPHTHALENFORMALDEHYDHARZ，NAPHTHALENFORMALDEHYDHARZ与deacetalation形债券及改性NAPHTHALENFORMALDEHYDHARZ
公开(公告)号：EP2810969A4
公开(公告)日：2015-09-02
申请号：EP13743998
申请日：2013-01-31
发明人： UCHIYAMA NAOYA , HIGASHIHARA GO , ECHIGO MASATOSHI
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9.发明公开NOVEL CYANIC ACID ESTER COMPOUND, METHOD FOR PRODUCING SAME, CURABLE RESIN COMPOSITION CONTAINING NOVEL CYANIC ACID ESTER COMPOUND, AND CURED PRODUCT OF CURABLE RESIN COMPOSITION 有权新型氰尿酸酯化合物，用于生产，以新颖的氰尿酸酯化合物与SIZE产物固化树脂组合物固化树脂组合物
公开(公告)号：EP2743283A4
公开(公告)日：2015-01-21
申请号：EP12822244
申请日：2012-07-31
发明人： SUGANO YUUICHI , KATAGIRI MASAYUKI , KITA SEIJI , OHNO DAISUKE , SOGAME MASANOBU
IPC分类号： C08G14/12 , B32B15/08 , B32B15/098 , C08G10/04 , C08G73/06 , C08J5/24 , C08L61/18 , C08L63/00 , C09J161/06 , H01L21/52 , H01L23/29 , H01L23/31
CPC分类号： C08G10/04 , B32B5/022 , B32B5/024 , B32B7/12 , B32B15/098 , B32B15/14 , B32B2250/40 , B32B2260/023 , B32B2260/046 , B32B2262/0261 , B32B2262/0269 , B32B2262/0276 , B32B2262/101 , B32B2307/3065 , C08G14/12 , C08G73/0655 , C08J5/24 , C08J2361/34 , C08L61/18 , C08L61/34 , C08L63/00 , C08L71/00 , C08L79/04 , C09J161/18 , C09J161/34 , C09J179/04 , C09K3/1006 , H01L23/29 , H01L2924/0002 , Y10T428/31688 , H01L2924/00
摘要： To provide a novel cyanate ester compound that can realize a cured product having low dielectric constant and dielectric loss tangent, and excellent flame retardancy and heat resistance, and moreover has relatively low viscosity, excellent solvent solubility, and also excellent handling properties, and a method for producing the cyanate ester compound, and a curable resin composition and the like using the cyanate ester compound. A phenol-modified xylene formaldehyde resin is cyanated.
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10.发明授权COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN 有权成分作为基膜的形成多层光刻和方法的形成抗蚀剂结构
公开(公告)号：EP2219076B1
公开(公告)日：2013-11-20
申请号：EP08857409.0
申请日：2008-12-01
摘要： A composition for forming an underlayer film for lithography for imparting excellent optical characteristics and etching resistance to an underlayer film for lithography, an underlayer film being formed of the composition and having a high refractive index (n) and a low extinction coefficient (k), being transparent, having high etching resistance, containing a significantly small amount of a sublimable component, and a method for forming a pattern using the underlayer film are provided. The composition for forming an underlayer film contains a naphthalene formaldehyde polymer having a specific unit obtained by reacting naphthalene and/or alkylnaphthalene with formaldehyde, and an organic solvent.
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