Abstract:
PROBLEM TO BE SOLVED: To provide a light-emitting device with top emission structure capable of achieving low power consumption.SOLUTION: A convex structure body is formed on a substrate on which an organic EL element is to be formed, and then, an upper electrode layer is formed. Thereby, the upper electrode layer has structure with a shape fitting the convex shape. A conductive layer is formed on the substrate encapsulating the organic EL layer. By encapsulating a formation surface of the upper electrode layer and a formation surface of the conductive layer in a state that the both formation surfaces are opposed to each other, at least a part of an electrode layer overlapped with the convex structure body contacts with the conductive layer, and a resistivity of the upper electrode layer is drastically reduced. Thereby, the power consumption of a light-emitting element can be reduced.
Abstract:
PROBLEM TO BE SOLVED: To prevent a defect such as a crack from being generated when press-bonding an FPC to a device after transferred to a flexible substrate having flexibility such as a plastic film substrate.SOLUTION: A layer 405a including a circuit having an element, and a terminal electrode 405b are formed as a transferring layer to be separated, and a resin protection layer 405c is formed thereon to prevent the crack. An electrode face of the terminal electrode is exposed in a portion connected with the FPC. The FPC 407 is press-bonded to be connected by an anisotropic conductive film 406. A wire is protected by the protection layer 405c in the press-bonding process to prevent thereby the crack from being generated due to pressurization deformation.
Abstract:
PROBLEM TO BE SOLVED: To provide a film forming method with a material layer, containing two or more kinds of film formation materials having different sublimation temperatures, formed on a support substrate by heating treatment on a film-formed substrate, without generating concentration gradient of two or more kinds of film formation material having different sublimation temperatures. SOLUTION: In the film formation method, with one of the surfaces of a first substrate having an absorption layer formed on a surface of the substrate, and a material layer formed on the absorption layer and containing a first film formation material, a second film formation material and a polymer compound satisfies the formula (1): Ta-100≤S≤400 (in the formula, S indicates the glass transition temperature (°C) of the polymer compound, and T a indicates a higher temperature (°C) of the sublimation temperatures (°C) of the first and the second film formation materials); and a film-formed surface of a second substrate are arranged mutually facing; and a layer including the first and the second film formation materials is formed on the film-formed surface of the second substrate, by carrying out heat treatment from the other surface side of the first substrate. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide: a semiconductor device which is not easily damaged even when pressure is locally applied thereto from the outside; and a method for manufacturing a highly-reliable semiconductor device, which is not destroyed by external local pressure, with a high yield. SOLUTION: A structural body, in which high-strength fiber of an organic compound or an inorganic compound is impregnated with an organic resin, is provided over an element layer having a semiconductor element formed using a non-single crystal semiconductor layer, and heating and pressure bonding are performed, whereby a semiconductor device is manufactured, to which the element layer and the structural body in which the high-strength fiber of an organic compound or an inorganic compound is impregnated with the organic resin are firmly fixed together. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing, with a high yield, a reliable semiconductor device that cannot be destroyed by pressure applied locally from outside. SOLUTION: A semiconductor device is manufactured by forming an element substrate having a semiconductor element formed by a single-crystal semiconductor substrate or an SOI substrate, or a single-crystal substrate or an SOI substrate, providing the fibrous body of an organic or inorganic compound on the element substrate, applying a composition including an organic resin from the element substrate and the fibrous body, and forming a sealing layer, where the fibrous body of the organic or inorganic compound is impregnated with the organic resin, on the element substrate by heating. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a very thin, low-cost thin film integrated circuit that can be mass-produced and differs from conventional glass substrates or monocrystal silicon substrates, and the structure or process of a thin film integrated circuit device or IC chip that uses the thin film integrated circuit. SOLUTION: A first insulating film is formed on either of the surfaces of a silicon substrate, a layer having at least two thin film integrated circuits is formed on the above first insulating layer, a resin layer is formed over a layer having the above thin film integrated circuit, a film is formed over the above resin layer, the rear of a surface is ground with a layer having the above thin film integrated circuit of the above silicon substrate, and the ground surface of the above silicon substrate is polished. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor device having a conductive film capable of sufficiently functioning as an antenna and a method of fabricating the semiconductor device. SOLUTION: The semiconductor device has an element formation layer including a transistor provided on a substrate, an insulating film provided on the element formation layer, and conductive films provided on the insulating film and adapted to function as an antenna, wherein the transistor and the conductive films are electrically connected and the insulating film has grooves, the conductive films being provided along the surface and grooves of the insulating film. In addition, the grooves formed in the insulating film may be provided to penetrate the insulating film, or may be provided to form recesses on the insulating film without penetrating the insulating film. The grooves may be optionally structured; for example, it may be provided to have a tapered shape etc. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a wireless chip that can be used without being attached to a product and to specifically provide the wireless chip that adds a new function to the wireless chip by sealing an integrated circuit and a manufacturing method of the same. SOLUTION: The wireless chip has a structure in which the integrated circuit is encompassed by films. In particular, the films sealing the integrated circuit have a hollow structure; therefore the new function is added to the wireless chip. By employing the hollow structure, the wireless chip can be configured so that, for example, an inert gas, an inert liquid or an inert gel is encapsulated in a hollow portion. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide thin IC chips by enabling mass production of IC chips to lower a unit cost thereof. SOLUTION: This method enables mass production and lowers a unit cost of IC chips by using no silicon substrate and using a substrate such as a glass substrate on which no restriction is imposed in size. Furthermore, the thin IC chips is obtained by grinding and polishing the substrates such as glass substrates. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor device which has a lightweight/highly reliable sealing structure which shuts off impurities finding their way into the device, typically, moisture as a factor for undermining the properties of an element, and a method for manufacturing this semiconductor device. SOLUTION: In this method for manufacturing the semiconductor device, a protecting film with high gas barrier properties(a protecting film with high gas barrier properties which is feared that would inflict any damage to the element, in case the film is formed directly on the element), is previously formed on another heat-resistant substrate and the protecting film is transferred to a substrate with the element to seal them. COPYRIGHT: (C)2005,JPO&NCIPI