Holographic recording composition, holographic recording medium, information recording method, and acid generation accelerator
    4.
    发明专利
    Holographic recording composition, holographic recording medium, information recording method, and acid generation accelerator 审中-公开
    全息记录组合物,全息记录介质,信息记录方法和酸产生加速器

    公开(公告)号:JP2008275671A

    公开(公告)日:2008-11-13

    申请号:JP2007115676

    申请日:2007-04-25

    发明人: SUZUKI HIROYUKI

    摘要: PROBLEM TO BE SOLVED: To provide a holographic recording medium excellent in characteristics such as high diffraction efficiency, good storage property, low shrinkage, dry processing property and multiple recording characteristics (high recording density). SOLUTION: A holographic recording composition and a holographic recording medium containing at least a recording compound, an acid generator and an acid generation accelerator are disclosed. The recording compound can record interference fringes as refractive index modulation by any method of (1) polymerization reaction, (2) color development reaction, (3) color development of a latent image and self-sensitization and amplification reaction of the color developing material, (4) color development of a latent image and sensitization and polymerization reaction of the color developing material, (5) orientation changes in a compound having intrinsic birefringence, (6) dye decoloration reaction and (7) formation of a latent image of a residual decoloration dye and sensitization and polymerization reaction of the latent image. COPYRIGHT: (C)2009,JPO&INPIT

    摘要翻译: 要解决的问题:提供一种全息记录介质,其衍射效率高,储存性好,收缩率低,干燥处理性能好,记录密度高。 解决方案:公开了一种全息记录组合物和至少含有记录化合物,酸产生剂和酸产生促进剂的全息记录介质。 记录化合物可以通过(1)聚合反应,(2)显色反应,(3)潜像的显色和彩色显影材料的自敏化和扩增反应的任何方法将干涉条纹记录为折射率调制, (4)彩色显影材料的潜像显色和敏化和聚合反应,(5)具有固有双折射的化合物的取向变化,(6)染料脱色反应和(7)残留物的潜像的形成 脱色染料和潜像的敏化和聚合反应。 版权所有(C)2009,JPO&INPIT

    Novel compound, polymer compound, resist composition, and method for forming resist pattern
    6.
    发明专利
    Novel compound, polymer compound, resist composition, and method for forming resist pattern 有权
    新型化合物,聚合物化合物,耐蚀组合物和形成耐药性图案的方法

    公开(公告)号:JP2006063318A

    公开(公告)日:2006-03-09

    申请号:JP2005184673

    申请日:2005-06-24

    摘要: PROBLEM TO BE SOLVED: To provide a polymer compound capable of constituting a high resolution resist composition, a compound suitable for manufacturing the said polymer compound, and a resist composition containing the said polymer compound, and also a method for forming a resist pattern by using the said resist composition. SOLUTION: The novel compound is expressed by general formula (1) [wherein, R is a hydrogen atom or a lower alkyl group; X is a sulfur atom or an oxygen atom; Y is a 1-20C linear, branched or cyclic alkyl group, in which some of hydrogen atoms may be substituted with heteroatom-containing groups, or in which some of carbon atoms are substituted with heteroatoms]. COPYRIGHT: (C)2006,JPO&NCIPI

    摘要翻译: 待解决的问题:提供能够构成高分辨率抗蚀剂组合物的高分子化合物,适用于制备所述高分子化合物的化合物和含有所述高分子化合物的抗蚀剂组合物,以及形成抗蚀剂的方法 图案通过使用所述抗蚀剂组合物。 解决方案:新化合物由通式(1)表示[其中,R是氢原子或低级烷基; X是硫原子或氧原子; Y是1-20C直链,支链或环状的烷基,其中一些氢原子可被含杂原子的基团取代,或其中一些碳原子被杂原子取代]。 版权所有(C)2006,JPO&NCIPI