Step and flash imprint lithography
    2.
    发明授权
    Step and flash imprint lithography 有权
    步进和闪光刻印光刻

    公开(公告)号:US06719915B2

    公开(公告)日:2004-04-13

    申请号:US09908765

    申请日:2001-07-19

    IPC分类号: B44C122

    摘要: A method of forming a relief image in a structure comprising a substrate and a transfer layer formed thereon comprises covering the transfer layer with a polymerizable fluid composition, and then contacting the polymerizable fluid composition with a mold having a relief structure formed therein such that the polymerizable fluid composition fills the relief structure in the mold. The polymerizable fluid composition is subjected to conditions to polymerize polymerizable fluid composition and form a solidified polymeric material therefrom on the transfer layer. The mold is then separated from the solid polymeric material such that a replica of the relief structure in the mold is formed in the solidified polymeric material; and the transfer layer and the solidified polymeric material are subjected to an environment to selectively etch the transfer layer relative to the solidified polymeric material such that a relief image is formed in the transfer layer.

    摘要翻译: 在包括基板和形成在其上的转印层的结构中形成浮雕图像的方法包括用可聚合流体组合物覆盖转印层,然后使可聚合流体组合物与其中形成有浮雕结构的模具接触,使得可聚合的 流体组合物填充模具中的浮雕结构。 可聚合流体组合物经受聚合可聚合流体组合物并在转移层上形成固化的聚合物材料的条件。 然后将模具与固体聚合物材料分离,使得在固化的聚合物材料中形成模具中的浮雕结构的复制品; 并且转印层和固化的聚合物材料经受环境以相对于固化的聚合物材料选择性地蚀刻转印层,使得在转印层中形成浮雕图像。

    Apparatus for imprint lithography using an electric field
    6.
    发明申请
    Apparatus for imprint lithography using an electric field 审中-公开
    用于使用电场进行压印光刻的装置

    公开(公告)号:US20100053578A1

    公开(公告)日:2010-03-04

    申请号:US10923629

    申请日:2004-08-20

    IPC分类号: G03B27/42

    摘要: A lithography process for creating patterns in an activating light curable liquid using electric fields followed by curing of the activating light curable liquid is described. The process involves the use of a template that is formed of non-conductive and electrically conductive portions. The template is brought into close proximity to the activating light curable liquid on the substrate. An external electric field is applied to the template-substrate interface while maintaining a uniform, carefully controlled gap between the template and substrate. This causes the activating light curable liquid to be attracted to the raised portions of the template. Activating light is applied to the curable liquid while an electric field is applied to the template to create a patterned layer on the substrate.

    摘要翻译: 描述了使用电场随后激活活化的光固化液体的固化来在激活光固化液体中产生图案的光刻工艺。 该方法涉及使用由非导电和导电部分形成的模板。 使模板靠近基板上的活化可光固化液体。 外部电场被施加到模板 - 衬底界面,同时保持模板和衬底之间均匀的小心控制的间隙。 这使得激活的可光固化液体被吸引到模板的凸起部分。 将活化光施加到可固化液体,同时向模板施加电场以在基板上产生图案化层。

    Step and flash imprint lithography
    7.
    发明授权
    Step and flash imprint lithography 有权
    步进和闪光刻印光刻

    公开(公告)号:US06334960B1

    公开(公告)日:2002-01-01

    申请号:US09266663

    申请日:1999-03-11

    IPC分类号: B44C122

    摘要: A method of forming a relief image in a structure comprising a substrate and a transfer layer formed thereon comprises covering the transfer layer with a polymerizable fluid composition, and then contacting the polymerizable fluid composition with a mold having a relief structure formed therein such that the polymerizable fluid composition fills the relief structure in the mold. The polymerizable fluid composition is subjected to conditions to polymerize polymerizable fluid composition and form a solidified polymeric material therefrom on the transfer layer. The mold is then separated from the solid polymeric material such that a replica of the relief structure in the mold is formed in the solidified polymeric material; and the transfer layer and the solidified polymeric material are subjected to an environment to selectively etch the transfer layer relative to the solidified polymeric material such that a relief image is formed in the transfer layer.

    摘要翻译: 在包括基板和形成在其上的转印层的结构中形成浮雕图像的方法包括用可聚合流体组合物覆盖转印层,然后使可聚合流体组合物与其中形成有浮雕结构的模具接触,使得可聚合的 流体组合物填充模具中的浮雕结构。 可聚合流体组合物经受聚合可聚合流体组合物并在转移层上形成固化的聚合物材料的条件。 然后将模具与固体聚合物材料分离,使得在固化的聚合物材料中形成模具中的浮雕结构的复制品; 并且转印层和固化的聚合物材料经受环境以相对于固化的聚合物材料选择性地蚀刻转印层,使得在转印层中形成浮雕图像。

    Step and Flash Imprint Lithography
    9.
    发明申请
    Step and Flash Imprint Lithography 审中-公开
    步骤和闪光印记平版印刷

    公开(公告)号:US20120133078A1

    公开(公告)日:2012-05-31

    申请号:US13364101

    申请日:2012-02-01

    摘要: A method of forming a relief image in a structure comprising a substrate and a transfer layer formed thereon comprises covering the transfer layer with a polymerizable fluid composition, and then contacting the polymerizable fluid composition with a mold having a relief structure formed therein such that the polymerizable fluid composition fills the relief structure in the mold. The polymerizable fluid composition is subjected to conditions to polymerize polymerizable fluid composition and form a solidified polymeric material therefrom on the transfer layer. The mold is then separated from the solid polymeric material such that a replica of the relief structure in the mold is formed in the solidified polymeric material; and the transfer layer and the solidified polymeric material are subjected to an environment to selectively etch the transfer layer relative to the solidified polymeric material such that a relief image is formed in the transfer layer.

    摘要翻译: 在包括基板和形成在其上的转印层的结构中形成浮雕图像的方法包括用可聚合流体组合物覆盖转印层,然后使可聚合流体组合物与其中形成有浮雕结构的模具接触,使得可聚合的 流体组合物填充模具中的浮雕结构。 可聚合流体组合物经受聚合可聚合流体组合物并在转移层上形成固化的聚合物材料的条件。 然后将模具与固体聚合物材料分离,使得在固化的聚合物材料中形成模具中的浮雕结构的复制品; 并且转印层和固化的聚合物材料经受环境以相对于固化的聚合物材料选择性地蚀刻转印层,使得在转印层中形成浮雕图像。

    Method for fabricating nanoscale patterns in light curable compositions using an electric field
    10.
    发明授权
    Method for fabricating nanoscale patterns in light curable compositions using an electric field 失效
    使用电场在光固化组合物中制造纳米尺度图案的方法

    公开(公告)号:US06964793B2

    公开(公告)日:2005-11-15

    申请号:US09905718

    申请日:2001-05-16

    摘要: A high-throughput lithography process for creating high-resolution patterns in a polymerizable composition using carefully controlled electric field followed by curing of the polymerizable composition is described. The process involves the use of a template that includes the desired patterns. This template is brought into close proximity to the polymerizable composition on the substrate. An external electric file is applied to the template-substrate interface while maintaining a uniform, carefully controlled gap between the template and substrate. This causes the polymerizable composition to be attracted to the raised portions of the template. By appropriately choosing the various process parameters such as the viscosity of the polymerizable composition, the magnitude of the electric field, and the distance between the template and substrate, the resolution of the structures formed in the liquid may be controlled to conform to that of the template.

    摘要翻译: 描述了使用仔细控制的电场随后固化可聚合组合物在可聚合组合物中产生高分辨率图案的高通量光刻工艺。 该过程涉及使用包含所需图案的模板。 使该模板靠近基材上的可聚合组合物。 外部电文件被施加到模板 - 基板界面上,同时保持模板和基板之间均匀且谨慎控制的间隙。 这使得可聚合组合物被吸引到模板的凸起部分。 通过适当地选择各种工艺参数,例如可聚合组合物的粘度,电场的大小以及模板和衬底之间的距离,可以控制在液体中形成的结构的分辨率以符合 模板。