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公开(公告)号：US12130558B2
公开(公告)日：2024-10-29
申请号：US17774531
申请日：2020-10-27
申请人： Cymer, LLC
发明人： Yingbo Zhao
IPC分类号： G03F7/00 , H01S3/00 , H01S3/10 , H01S3/1055 , H01S3/23
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , H01S3/10038 , H01S3/10069 , H01S3/1055 , H01S3/0014 , H01S3/2308
摘要： A radiation system for controlling bursts of pulses of radiation comprises: an optical element; a controller; an actuator; and a sensor. The optical element is configured to interact with the pulses of radiation to control a characteristic of the pulses of radiation, the characteristic of the pulses of radiation being dependent on a configuration of the optical element. The controller is operable to generate a control signal. The actuator is configured to receive the control signal from the controller and to control a configuration of the optical element in dependence on the control signal. The sensor is operable to determine the characteristic of pulses having interacted with the optical element. The control signal for a given pulse in a given burst is dependent on the determined characteristic of a corresponding pulse from a previous burst.
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公开(公告)号：US20240258756A1
公开(公告)日：2024-08-01
申请号：US18564335
申请日：2022-05-06
申请人： CYMER, LLC
发明人： Saptaparna Das , Eric Anders Mason
CPC分类号： H01S3/0057 , G02B17/004 , G02B26/00 , H01S3/0071 , H01S3/225 , H01S3/2308
摘要： A system includes: an optical pulse stretcher including: a first reflective optical element: a second reflective optical element; and an optical coupling system, where a distance between the first reflective optical element and the second reflective optical element defines a separation distance in an optical cavity, and the optical coupling system is configured to bring pulses of light into the cavity and to allow pulses of light to exit the cavity. The system also includes an actuation system configured to control the separation distance; a sensor configured to produce data related to at least two pulses of light that exit the cavity; and a control system coupled to the actuation system, where the control system is configured to control the actuation system and the separation distance based on the data.
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公开(公告)号：US11949203B2
公开(公告)日：2024-04-02
申请号：US16965461
申请日：2019-01-10
申请人： Cymer, LLC
IPC分类号： H01S3/00 , B01D53/04 , B01D53/30 , B01F23/10 , B01F35/21 , B01F35/221 , G01N33/00 , H01S3/036 , H01S3/225
CPC分类号： H01S3/036 , B01D53/04 , B01D53/30 , B01F23/191 , B01F35/2132 , B01F35/2211 , G01N33/0004 , H01S3/225 , B01D2253/104 , B01D2256/18 , B01D2257/102 , B01D2257/104 , B01D2257/204 , B01D2257/2066 , B01D2257/504 , B01D2257/553 , B01D2257/80
摘要： A gas chamber supply system includes a gas source configured to fluidly connect to a gas chamber and to supply a gas mixture to the gas chamber, the gas source including: a pre-prepared gas supply including a gas mixture, the gas mixture including a plurality of gas components and lacking a halogen; a recycled gas supply including the gas mixture; and a fluid flow switch connected to the pre-prepared gas supply and to the recycled gas supply. The gas chamber supply also includes a control system configured to: determine if the relative concentration between the gas components within the recycled gas supply is within an acceptable range; and provide a signal to the fluid flow switch to thereby select one of the pre-prepared gas supply and the recycled gas supply to as the gas source based on the determination.
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公开(公告)号：US20240045341A1
公开(公告)日：2024-02-08
申请号：US18266246
申请日：2021-12-09
申请人： ASML NETHERLANDS B.V. , Cymer, LLC
发明人： Willard Earl CONLEY , Duan-Fu Stephen HSU , Joshua Jon THORNES , Johannes Jacobus Matheus BASELMANS
CPC分类号： G03F7/70575 , G03F7/70583 , G03F7/70025 , G03F7/2004
摘要： A method for improving a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus. The method includes computing a multi-variable cost function that is a function of: (i) a plurality of design variables that affect characteristics of the lithographic process and (ii) a radiation bandwidth of a radiation source of the lithographic apparatus; and reconfiguring one or more of the characteristics (e.g., EPE, image contrast, resist, etc.) of the lithographic process by adjusting one or more of the design variables (e.g., source, mask layout, bandwidth, etc.) until a termination condition is satisfied. The termination condition includes a speckle characteristic (e.g., a speckle contrast) maintained within a speckle specification associated with the radiation source and also maintaining an image contrast associated with the lithographic process within a desired range. The speckle characteristic being a function of the radiation bandwidth.
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公开(公告)号：US20240030671A1
公开(公告)日：2024-01-25
申请号：US18039613
申请日：2021-12-02
申请人： Cymer, LLC
发明人： Hong Ye , Eric Anders Mason
CPC分类号： H01S3/0057 , G02B17/0804 , G02B27/145 , G03F7/7055
摘要： Apparatus for and method of aligning optical components such as beam splitters in an optical pulse stretcher in which a landing spot of a beam which has traversed a portion of the optical beam splitter and a coincident landing spot of a beam split from a retroreflected input beam are made to align on a target spot. Also disclosed is an apparatus and method for aligning the retroreflector to facilitate proper beam alignment. A fluorescent material may be used to render a beam landing spot visible.
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公开(公告)号：US11799261B2
公开(公告)日：2023-10-24
申请号：US18020718
申请日：2021-08-10
申请人： Cymer, LLC
发明人： Hong Ye
CPC分类号： H01S3/0057 , G02B5/208 , G03F7/7055 , G03F7/70141
摘要： Apparatus for and method of aligning optical components such as mirrors to facilitate proper beam alignment using an image integration optical system is used to integrate images from multiple optical features such as from both left mirror bank and right mirror bank to present the images simultaneously to the camera system. A fluorescent material may be used to render a beam footprint visible and the relative positions of the footprint and an alignment feature may be used to align the optical feature.
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公开(公告)号：US11747739B2
公开(公告)日：2023-09-05
申请号：US17434802
申请日：2020-02-10
申请人： ASML Netherlands B. V. , Cymer, LLC
CPC分类号： G03F7/70575 , G03F7/705
摘要： Systems, methods, and computer programs for increasing a contrast for a lithography system are disclosed. In one aspect, a method of optimizing a process for imaging a feature on a substrate using a photolithography system is disclosed, the method including obtaining an optical spectrum of a light beam for the imaging, wherein the light beam includes pulses having a plurality of different wavelengths, and narrowing the optical spectrum of the pulses of the light beam for the imaging to improve a quality metric of the imaging.
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公开(公告)号：US20230055090A1
公开(公告)日：2023-02-23
申请号：US17797791
申请日：2021-02-19
申请人： Cymer, LLC
发明人： Kuo-Tai Teng
IPC分类号： H01S3/10
摘要： In some general aspects, a light beam control apparatus includes: a spectral feature actuator associated with a set of different states, each state configured to cause an optical apparatus to generate one or more pulses of a light beam at a discrete value of a spectral feature of the light beam; and a controller in communication with the spectral feature actuator. The controller includes: an actuator drive module configured to cause the spectral feature actuator to transition among the set of different states according to a control waveform; a waveform module configured to compute the control waveform for the spectral feature actuator that governs the transition among the set of discrete values; and a predictive module configured to receive one or more sensed aspects of the spectral feature actuator and instruct the waveform module to adjust the control waveform based on the received sensed aspects.
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公开(公告)号：US20230040812A1
公开(公告)日：2023-02-09
申请号：US17971103
申请日：2022-10-21
申请人： Cymer, LLC
摘要： A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.
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公开(公告)号：US11561407B2
公开(公告)日：2023-01-24
申请号：US17034132
申请日：2020-09-28
申请人： Cymer, LLC
发明人： Eric Anders Mason
IPC分类号： G02B26/00 , G02B27/14 , G02B27/12 , G02B5/04 , G02B27/42 , G01J3/06 , G01J3/14 , G01J3/18 , G03F7/20 , H01S3/08 , H01L21/027 , H01S3/00 , H01S3/23 , G01J3/12 , H01S3/225
摘要： A spectral feature selection apparatus includes a dispersive optical element arranged to interact with a pulsed light beam; three or more refractive optical elements arranged in a path of the pulsed light beam between the dispersive optical element and a pulsed optical source; and one or more actuation systems, each actuation system associated with a refractive optical element and configured to rotate the associated refractive optical element to thereby adjust a spectral feature of the pulsed light beam. At least one of the actuation systems is a rapid actuation system that includes a rapid actuator configured to rotate its associated refractive optical element about a rotation axis. The rapid actuator includes a rotary stepper motor having a rotation shaft that rotates about a shaft axis that is parallel with the rotation axis of the associated refractive optical element.
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