摘要:
A method of forming a pattern includes forming a mask pattern on a substrate; etching the substrate by deep reactive ion etching (DRIE) and by using the mask pattern as an etch mask; partially removing the mask pattern to expose a portion of an upper surface of the substrate; and etching the exposed portion of the upper surface of the substrate. In the method, when a pattern is formed by DRIE, an upper portion of the pattern does not protrude or scarcely protrudes, and scallops of a sidewall of the pattern are smooth, and thus a conformal material layer may be easily formed on a surface of the pattern.
摘要:
A semiconductor device includes a lower conductor having a lower conductor sidewall, a barrier film having a barrier film sidewall formed directly on the lower conductor sidewall, and a via formed on a top surface of the lower conductor. A top portion of the barrier film sidewall is recessed, such that a top surface of the barrier film sidewall is at a level lower than the top surface of the lower conductor.
摘要:
In a light-emitting assembly and a display apparatus having the light-emitting assembly, the light-emitting assembly includes a light guide plate, a first light-emitting module and a second light-emitting module. The light guide plate includes a first surface, a second surface facing the first surface and including a light incident portion and a light exiting portion, and a third surface connecting the first surface with the second surface and inclined toward the first surface. The first light-emitting module is on the light incident portion of the second surface and emits a first light to the light incident portion. The second light-emitting module faces the third surface and emits a second light having a wavelength different from the first light, to the third surface.
摘要:
In a light-emitting assembly and a display apparatus having the light-emitting assembly, the light-emitting assembly includes a light guide plate, a first light-emitting module and a second light-emitting module. The light guide plate includes a first surface, a second surface facing the first surface and including a light incident portion and a light exiting portion, and a third surface connecting the first surface with the second surface and inclined toward the first surface. The first light-emitting module is on the light incident portion of the second surface and emits a first light to the light incident portion. The second light-emitting module faces the third surface and emits a second light having a wavelength different from the first light, to the third surface.
摘要:
The present invention relates to a process for preparing fluoroacrylic acid ester using a pervaporation composite membrane, in particular, to a process for preparing fluoroacrylic acid ester performed in such a manner that water and unreacted fluoroalcohol generated in esterification between fluoroalcohol and (meth)acrylic acid in the presence of an acid catalyst are condensed and then passed through a pervaporation membrane to effectively remove water, followed by recycling the unreacted fluoroalcohol removed of water. The present process exhibits much higher conversion rate of fluoroacrylic acid ester, allows the decrease of energy consumption and could be performed in environment-friendly manner.
摘要:
A method of forming a pattern includes forming a mask pattern on a substrate; etching the substrate by deep reactive ion etching (DRIE) and by using the mask pattern as an etch mask; partially removing the mask pattern to expose a portion of an upper surface of the substrate; and etching the exposed portion of the upper surface of the substrate. In the method, when a pattern is formed by DRIE, an upper portion of the pattern does not protrude or scarcely protrudes, and scallops of a sidewall of the pattern are smooth, and thus a conformal material layer may be easily formed on a surface of the pattern.
摘要:
An information detection device includes: a plurality of light sensing units each configured to detect light; a plurality of sensor scanning drivers each configured to apply sensor scanning signals to the light sensing units; a sensing signal processor configured to receive position information detected by the light sensing units; a plurality of bias applying units each configured to apply bias voltages to the light sensing units; wherein each bias applying unit applies a different polarity of bias voltage.
摘要:
A light-emitting assembly includes a light guide plate (LGP), a first infrared light-emitting part, a second infrared light-emitting part and a visible light-emitting part. The LGP has printed circuit patterns formed on a lower surface thereof. The first infrared light-emitting part includes a plurality of first infrared light-emitting diodes (LEDs) disposed at a first side of the LGP and spaced apart by intervals having different sizes. The second infrared light-emitting part includes a plurality of second infrared LEDs disposed at a second side of the LGP and spaced apart by intervals having different sizes. The visible light-emitting part includes a plurality of visible LEDs disposed at a third side of the LGP and spaced apart by intervals having different sizes, so that infrared light and visible light that is emitted from the two different kinds of light sources may be uniformly provided to a touch screen panel.
摘要:
In a sensing device and a method for sending a light by using the same, the sensing device includes: a lower panel; an upper panel facing the lower panel; a liquid crystal layer disposed between the lower panel and the upper panel; an infrared ray sensor formed in at least one of the lower panel and the upper panel; and a visible ray sensor formed in at least one of the lower panel and the upper panel. The sensing device simultaneously includes the infrared ray sensor and the visible ray sensor such that a touch sensing function or an image sensing function having high reliability may be realized.
摘要:
A method of forming a pattern includes forming a mask pattern on a substrate; etching the substrate by deep reactive ion etching (DRIE) and by using the mask pattern as an etch mask; partially removing the mask pattern to expose a portion of an upper surface of the substrate; and etching the exposed portion of the upper surface of the substrate. In the method, when a pattern is formed by DRIE, an upper portion of the pattern does not protrude or scarcely protrudes, and scallops of a sidewall of the pattern are smooth, and thus a conformal material layer may be easily formed on a surface of the pattern.