公开(公告)号：US07955797B2

公开(公告)日：2011-06-07

申请号：US10972542

申请日：2004-10-25

Applicant: James V. McManus ,  James A. Dietz ,  Steven M. Lurcott

Inventor： James V. McManus ,  James A. Dietz ,  Steven M. Lurcott

IPC: C12Q1/68

CPC classification number: G01N33/00 ,  F17C11/00 ,  G01F15/063 ,  G01F22/02 ,  G01F23/0076 ,  G01M3/32 ,  G01M3/3236 ,  G06Q10/087 ,  G06Q30/04 ,  G06Q50/04 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L22/10 ,  H01L23/5389 ,  H01L24/24 ,  H01L24/48 ,  H01L24/82 ,  H01L25/03 ,  H01L25/0652 ,  H01L25/16 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/24011 ,  H01L2224/2518 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01058 ,  H01L2924/01076 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/14 ,  H01L2924/19042 ,  H05K1/185 ,  H05K3/4602 ,  H05K2203/0165 ,  H05K2203/085 ,  H05K2203/1469 ,  Y02P90/30 ,  Y10T29/4913 ,  Y10T29/49133 ,  Y10T29/49165 ,  Y10T29/53183 ,  H01L2224/45099

Abstract: A monitoring system for monitoring fluid in a fluid supply vessel during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor and display operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel.

Abstract translation: 一种用于在操作期间监测流体供应容器中的流体的监测系统，包括从流体供应容器分配流体。 监测系统包括（i）用于监测流体供应容器或从其分配的流体的特性的一个或多个传感器，（ii）可操作地耦合到所述一个或多个传感器以从其接收监测数据的数据采集模块，并且响应地生成 输出与由一个或多个传感器监测的特性相关联，以及（iii）处理器和显示器，其与数据采集模块可操作地耦合并被布置成处理来自数据采集模块的输出并且响应地输出流体在流体中的图形表示 供应船。

公开(公告)号：US07325560B2

公开(公告)日：2008-02-05

申请号：US11453700

申请日：2006-06-15

Applicant: Jose I. Arno ,  James A. Dietz

Inventor： Jose I. Arno ,  James A. Dietz

IPC: G05D11/13

CPC classification number: H01L22/20 ,  G01N21/3504 ,  Y10T137/0329 ,  Y10T137/2509 ,  Y10T137/87676

Abstract: Apparatus and method for delivery of dilute active fluid, e.g., to a downstream active fluid-consuming process unit of a semiconductor manufacturing plant. The delivery system includes an active fluid source, a diluent fluid source, a fluid flow metering device for dispensing of the active fluid at a predetermined flow rate, a mixer arranged to mix active gas from the active fluid source that is dispensed at such predetermined flow rate by the fluid flow metering device, with diluent fluid to form a diluted active fluid mixture, and a monitor arranged to measure concentration of active fluid in the diluted active fluid mixture, and responsively adjust the fluid flow metering device, to control the dispensing rate of the active fluid, and maintain a predetermined concentration of active fluid in the diluted active fluid mixture.

Abstract translation: 用于将稀释的活性流体递送到半导体制造工厂的下游有源流体消耗处理单元的装置和方法。 输送系统包括主动流体源，稀释液流体源，用于以预定流速分配活性流体的流体流量计量装置，设置成混合来自主动流体源的活性气体的混合器，该活性气体以预定流量分配 通过流体流量计量装置利用稀释液形成稀释的活性流体混合物，以及监测器，其布置成测量稀释的活性流体混合物中活性流体的浓度，并且响应地调节流体流量计量装置以控制分配速率 的活性流体，并且在稀释的活性流体混合物中保持预定浓度的活性流体。

公开(公告)号：US20110232367A1

公开(公告)日：2011-09-29

申请号：US13155237

申请日：2011-06-07

Applicant: James V. McManus ,  James A. Dietz ,  Steven M. Lurcott

Inventor： James V. McManus ,  James A. Dietz ,  Steven M. Lurcott

IPC: G01N7/00

CPC classification number: G01N33/00 ,  F17C11/00 ,  G01F15/063 ,  G01F22/02 ,  G01F23/0076 ,  G01M3/32 ,  G01M3/3236 ,  G06Q10/087 ,  G06Q30/04 ,  G06Q50/04 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L22/10 ,  H01L23/5389 ,  H01L24/24 ,  H01L24/48 ,  H01L24/82 ,  H01L25/03 ,  H01L25/0652 ,  H01L25/16 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/24011 ,  H01L2224/2518 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01058 ,  H01L2924/01076 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/14 ,  H01L2924/19042 ,  H05K1/185 ,  H05K3/4602 ,  H05K2203/0165 ,  H05K2203/085 ,  H05K2203/1469 ,  Y02P90/30 ,  Y10T29/4913 ,  Y10T29/49133 ,  Y10T29/49165 ,  Y10T29/53183 ,  H01L2224/45099

Abstract: A monitoring system for monitoring fluid in a fluid supply vessel during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor and display operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel.

Abstract translation: 一种用于在操作期间监测流体供应容器中的流体的监测系统，包括从流体供应容器分配流体。 监测系统包括（i）用于监测流体供应容器或从其分配的流体的特性的一个或多个传感器，（ii）可操作地耦合到所述一个或多个传感器以从其接收监测数据的数据采集模块，并且响应地生成 输出与由一个或多个传感器监测的特性相关联，以及（iii）处理器和显示器，其与数据采集模块可操作地耦合并被布置成处理来自数据采集模块的输出并且响应地输出流体在流体中的图形表示 供应船。

公开(公告)号：US20100112795A1

公开(公告)日：2010-05-06

申请号：US12570995

申请日：2009-09-30

Applicant: Robert KAIM ,  Jose I. ARNO ,  James A. DIETZ

Inventor： Robert KAIM ,  Jose I. ARNO ,  James A. DIETZ

IPC: H01L21/265

CPC classification number: H01L21/26506 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0827 ,  H01L21/26513 ,  H01L21/2654 ,  H01L21/26546 ,  H01L21/26566 ,  H01L21/2658

Abstract: A first method for producing a doped region in a semiconductor substrate includes performing a first implant step in which a carborane cluster molecule is implanted into a semiconductor substrate to form a doped region. A second method for producing a semiconductor device having a shallow junction region includes providing a first gas and a second gas in a container. The first gas includes a first dopant and the second gas includes a second dopant. The second method also includes implanting the first and second dopants into a semiconductor substrate using an ion. The ion source is not turned off between the steps of implanting the first dopant and implanting the second dopant.

Abstract translation: 用于在半导体衬底中制造掺杂区域的第一种方法包括进行第一注入步骤，其中将碳硼烷簇分子注入到半导体衬底中以形成掺杂区域。 用于制造具有浅结区域的半导体器件的第二种方法包括在容器中提供第一气体和第二气体。 第一气体包括第一掺杂剂，第二气体包括第二掺杂剂。 第二种方法还包括使用离子将第一和第二掺杂剂注入到半导体衬底中。 离子源在植入第一掺杂剂和注入第二掺杂剂的步骤之间不被关闭。

公开(公告)号：US06453924B1

公开(公告)日：2002-09-24

申请号：US09624478

申请日：2000-07-24

Applicant: Luping Wang ,  Terry A. Tabler ,  James A. Dietz

Inventor： Luping Wang ,  Terry A. Tabler ,  James A. Dietz

IPC: F17C1100

CPC classification number: F17D1/04 ,  F17C11/00 ,  F17C13/04 ,  F17C2205/0146 ,  F17C2205/0323 ,  F17C2205/0338 ,  F17C2221/05 ,  F17C2223/0153 ,  F17C2223/033 ,  F17C2250/032 ,  F17C2250/0626 ,  F17C2250/0636 ,  F17C2265/01 ,  F17C2270/0518 ,  Y10T137/0318 ,  Y10T137/4807 ,  Y10T137/6416 ,  Y10T137/86187

Abstract: A fluid distribution system for supplying a gas to a process facility such as a semiconductor manufacturing plant. The system includes a main fluid supply vessel coupled by flow circuitry to a local sorbent-containing supply vessel from which fluid, e.g., low pressure compressed gas, is dispensed to a fluid-consuming unit, e.g., a semiconductor manufacturing tool. A fluid pressure regulator is disposed in the flow circuitry or the main liquid supply vessel and ensures that the gas flowed to the fluid-consuming unit is at desired pressure. The system and associated method are particularly suited to the supply and utilization of liquefied compressed gases such as trimethylsilane, arsine, phosphine, and dichlorosilane.

Abstract translation: 一种用于向诸如半导体制造工厂之类的处理设备供应气体的流体分配系统。 该系统包括通过流动回路耦合到局部吸附剂的供应容器的主要流体供应容器，从该液体供应容器将诸如低压压缩气体的流体从其分配到诸如半导体制造工具的流体消耗单元。 流体压力调节器设置在流动回路或主液体供应容器中，并且确保流到流体消耗单元的气体处于期望的压力。 该系统和相关方法特别适用于供应和利用液化压缩气体如三甲基硅烷，胂，膦和二氯硅烷。

公开(公告)号：US06561213B2

公开(公告)日：2003-05-13

申请号：US09874084

申请日：2001-06-05

Applicant: Luping Wang ,  Terry A. Tabler ,  James A. Dietz

Inventor： Luping Wang ,  Terry A. Tabler ,  James A. Dietz

IPC: F17C1100

CPC classification number: F17D1/04 ,  F17C11/00 ,  F17C13/04 ,  F17C2205/0146 ,  F17C2205/0323 ,  F17C2205/0338 ,  F17C2221/05 ,  F17C2223/0153 ,  F17C2223/033 ,  F17C2250/032 ,  F17C2250/0626 ,  F17C2250/0636 ,  F17C2265/01 ,  F17C2270/0518 ,  Y10T137/0318 ,  Y10T137/4807 ,  Y10T137/6416 ,  Y10T137/86187

Abstract: A fluid distribution system for supplying a gas to a process facility such as a semiconductor manufacturing plant. The system includes a main fluid supply vessel coupled by flow circuitry to a local sorbent-containing supply vessel from which fluid, e.g., low pressure compressed gas, is dispensed to a fluid-consuming unit, e.g., a semiconductor manufacturing tool. A fluid pressure regulator is disposed in the flow circuitry or the main liquid supply vessel and ensures that the gas flowed to the fluid-consuming unit is at desired pressure. The system and associated method are particularly suited to the supply and utilization of liquefied compressed gases such as trimethylsilane, arsine, phosphine, and dichlorosilane.

公开(公告)号：US07063097B2

公开(公告)日：2006-06-20

申请号：US10402759

申请日：2003-03-28

Applicant: Jose I. Arno ,  James A. Dietz

Inventor： Jose I. Arno ,  James A. Dietz

IPC: G05D11/13 ,  B01F3/02

CPC classification number: H01L22/20 ,  G01N21/3504 ,  Y10T137/0329 ,  Y10T137/2509 ,  Y10T137/87676

Abstract: Apparatus and method for delivery of dilute active fluid, e.g., to a downstream active fluid-consuming process unit of a semiconductor manufacturing plant. The delivery system includes an active fluid source, a diluent fluid source, a fluid flow metering device for dispensing of the active fluid at a predetermined flow rate, a mixer arranged to mix active gas from the active fluid source that is dispensed at such predetermined flow rate by the fluid flow metering device, with diluent fluid to form a diluted active fluid mixture, and a monitor arranged to measure concentration of active fluid in the diluted active fluid mixture, and responsively adjust the fluid flow metering device, to control the dispensing rate of the active fluid, and maintain a predetermined concentration of active fluid in the diluted active fluid mixture.

Abstract translation: 用于将稀释的活性流体递送到半导体制造工厂的下游有源流体消耗处理单元的装置和方法。 输送系统包括主动流体源，稀释液流体源，用于以预定流量分配活性流体的流体流量计量装置，设置成混合来自主动流体源的活性气体的混合器，该活性气体以预定流量分配 通过流体流量计量装置利用稀释液形成稀释的活性流体混合物，以及监测器，其布置成测量稀释的活性流体混合物中活性流体的浓度，并且响应地调节流体流量计量装置以控制分配速率 的活性流体，并且在稀释的活性流体混合物中保持预定浓度的活性流体。

公开(公告)号：US07051749B2

公开(公告)日：2006-05-30

申请号：US10720357

申请日：2003-11-24

Applicant: Michael J. Wodjenski ,  James A. Dietz

Inventor： Michael J. Wodjenski ,  James A. Dietz

IPC: G05D7/00

CPC classification number: F17C13/04 ,  F17C2205/0142 ,  F17C2205/0146 ,  F17C2205/0326 ,  F17C2205/0329 ,  F17C2205/0335 ,  F17C2205/0338 ,  F17C2223/033 ,  F17C2223/035 ,  F17C2223/036 ,  F17C2223/038 ,  F17C2227/0114 ,  F17C2227/044 ,  F17C2270/0518 ,  Y10T137/0396 ,  Y10T137/0419 ,  Y10T137/4259 ,  Y10T137/7043 ,  Y10T137/87877

Abstract: A gas cabinet including an enclosure containing at least one gas supply vessel and flow circuitry coupled to the gas supply vessel(s). The flow circuitry is constructed and arranged to flow dispensed gas from an on-stream gas supply vessel to multiple sticks of the flow circuitry, with each of the multiple sticks being joined in gas flow communication to a respective gas-utilizing process unit. The flow circuitry is valved to enable sections of the flow circuitry associated with respective ones of the multiple sticks to be isolated from other sections of the flow circuitry, so that process gas can be flowed to one or more of the sticks, while other sticks are being evacuated and purged, or otherwise are closed to dispensed gas flow therethrough.

Abstract translation: 一种气柜，包括包含至少一个气体供应容器和耦合到气体供应容器的流动回路的外壳。 流动电路被构造和布置成将分配的气体从流动气体供应容器流动到流动电路的多个棒，其中每个多个棒以气体流动连通的方式连接到相应的气体利用处理单元。 流动电路是阀门，以使得与多个棒中的相应的一个杆相关联的流动回路的部分与流动回路的其它部分隔离，使得处理气体可以流到一个或多个棒，而其他棒是 被排空和吹扫，或以其他方式关闭以分配气体流过其中。

公开(公告)号：US06474076B2

公开(公告)日：2002-11-05

申请号：US10017970

申请日：2001-11-12

Applicant: Luping Wang ,  Glenn M. Tom ,  James A. Dietz ,  Steven M. Lurcott ,  Steven J. Hultquist

Inventor： Luping Wang ,  Glenn M. Tom ,  James A. Dietz ,  Steven M. Lurcott ,  Steven J. Hultquist

IPC: F17C704

CPC classification number: F17C7/04 ,  F17C7/02 ,  F17C13/025 ,  F17C13/04 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/032 ,  F17C2201/058 ,  F17C2203/0643 ,  F17C2203/0646 ,  F17C2205/018 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/0382 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2223/0123 ,  F17C2223/0153 ,  F17C2223/035 ,  F17C2250/032 ,  F17C2250/034 ,  F17C2250/043 ,  F17C2250/0636 ,  F17C2265/04 ,  F17C2270/025 ,  F17C2270/05 ,  F17C2270/0518

Abstract: A fluid storage and dispensing system including a fluid storage and dispensing vessel enclosing an interior volume for holding a fluid. The vessel includes a fluid discharge port for discharging fluid from the vessel. A pressure regulating element in the interior volume of the fluid storage and dispensing vessel is arranged to flow fluid therethrough to the fluid discharge port at a set pressure for dispensing thereof. A controller external of the fluid storage and dispensing vessel is arranged to transmit a control input into the vessel to cause the pressure regulating element to change the set pressure of the fluid flowed from the pressure regulating element to the fluid discharge port. By such arrangement, the respective storage and dispensing operations can have differing regulator set point pressures, as for example a subatmospheric pressure set point for storage and a superatmospheric pressure set point for dispensing.

Abstract translation: 一种流体存储和分配系统，包括包围用于保持流体的内部容积的流体存储和分配容器。 容器包括用于从容器排出流体的流体排出口。 流体存储和分配容器的内部容积中的压力调节元件布置成以一定的压力使流体流过流体排出口，用于分配。 流体存储和分配容器外部的控制器布置成将控制输入传送到容器中，以使压力调节元件将从压力调节元件流出的流体的设定压力改变到流体排出口。 通过这种布置，相应的存储和分配操作可以具有不同的调节器设定点压力，例如用于存储的低于大气压的压力设定点和用于分配的超大气压力设定点。

公开(公告)号：US06360546B1

公开(公告)日：2002-03-26

申请号：US09635961

申请日：2000-08-10

Applicant: Luping Wang ,  Glenn M. Tom ,  James A Dietz ,  Steven M. Lurcott ,  Steven J. Hultquist

Inventor： Luping Wang ,  Glenn M. Tom ,  James A Dietz ,  Steven M. Lurcott ,  Steven J. Hultquist

IPC: F17C704

CPC classification number: F17C7/04 ,  F17C7/02 ,  F17C13/025 ,  F17C13/04 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/032 ,  F17C2201/058 ,  F17C2203/0643 ,  F17C2203/0646 ,  F17C2205/018 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/0382 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2223/0123 ,  F17C2223/0153 ,  F17C2223/035 ,  F17C2250/032 ,  F17C2250/034 ,  F17C2250/043 ,  F17C2250/0636 ,  F17C2265/04 ,  F17C2270/025 ,  F17C2270/05 ,  F17C2270/0518

Abstract: A fluid storage and dispensing system including a fluid storage and dispensing vessel enclosing an interior volume for holding a fluid. The vessel includes a fluid discharge port for discharging fluid from the vessel. A pressure regulating element in the interior volume of the fluid storage and dispensing vessel is arranged to flow fluid therethrough to the fluid discharge port at a set pressure for dispensing thereof. A controller external of the fluid storage and dispensing vessel is arranged to transmit a control input into the vessel to cause the pressure regulating element to change the set pressure of the fluid flowed from the pressure regulating element to the fluid discharge port. By such arrangement, the respective storage and dispensing operations can have differing regulator set point pressures, as for example a subatmospheric pressure set point for storage and a super atmospheric pressure set point for dispensing.

Abstract translation: 一种流体存储和分配系统，包括包围用于保持流体的内部容积的流体存储和分配容器。 容器包括用于从容器排出流体的流体排出口。 流体存储和分配容器的内部容积中的压力调节元件布置成以一定的压力使流体流过流体排出口，用于分配。 流体存储和分配容器外部的控制器布置成将控制输入传送到容器中，以使压力调节元件将从压力调节元件流出的流体的设定压力改变到流体排出口。 通过这种布置，相应的存储和分配操作可以具有不同的调节器设定点压力，例如用于存储的低于大气压的压力设定点和用于分配的超大气压设定点。